道路反光标志带用玻璃微珠的表面化学修饰

道路反光标志带用的反光材料--玻璃微珠的反光性是人们关注的研究课题.国内外对玻璃微珠表面曾采用"真空镀铝"[1]、"NDI-301(或302)偶联剂"[2]进行改性.前者虽可提高玻璃微珠的反光性,但操作繁琐和成本高,后者只能提高玻璃微珠对树脂层的亲合力和粘接强度,反光性未获改善;并且两者均不能赋予发光性.鉴此,以铝-钛偶联剂、BCP-1170荧光粉及辅剂等化学修饰玻璃微珠表面,镀上光亮的铝-钛反光膜、发光膜,既提高了玻璃微珠的反光性,同时赋予发光性.     

液相沉积法制备TiO2颗粒表面包覆SiO2纳米膜

研究了用液相沉积法在TiO2颗粒表面包覆SiO2纳米膜的过程.通过透射电镜(TEM)和酸溶实验分析,证实本实验在TiO2颗粒表面包覆了一层连续、致密的SiO2纳米膜.ζ-电位分析表明,颗粒表面只需少量包覆就可以显著改变颗粒表面的电动力学行为.采用 X射线荧光光谱分析仪（XRF）测定SiO2包覆量随包覆过程的变化.通过X射线光电子能谱（XPS）分析,获得Ti 2p、Si 2p及 O 1s电子结合能及其相对强度随包覆过程的变化规律,揭示硅酸分子在TiO2颗粒表面的包覆过程.分析表明,初期形成的活性硅酸分子与TiO2颗粒表面的羟基反应形成Ti－O－Si键,后期形成的硅酸分子与已键合在表面的硅酸发生缩合反应,形成连续致密的硅膜,膜层在陈化过程中继续缓慢生长.     

新型光、 热双响应形状记忆聚合物的制备与性能

通过多巴胺表面原位聚合反应修饰玻璃微珠, 利用X光电子能谱仪(XPS)和傅里叶变换红外光谱仪 (FTIR)对修饰前后玻璃微珠表面的化学组成进行了表征, 用热失重分析仪(TGA)对其热稳定性进行了测试, 并利用透射电子显微镜(TEM)和扫描电子显微镜(SEM)对其形貌进行了观察; 研究了改性玻璃微珠对形状记忆共混物聚己内酯和聚氨酯(PCL/TPU)的热性能、 力学性能和形状记忆性能的影响. 结果表明, 成功制备了表面包覆聚多巴胺的玻璃微珠(PHGM), 改性玻璃微珠的加入不仅增强了复合材料的力学性能(当改性玻璃微珠含量为3%时, 材料的拉伸强度提高到53.3 MPa, 杨氏模量提高到178.4 MPa), 还赋予了复合材料优异的光热效应. 所制备的形状记忆复合材料在808 nm近红外光的照射下, 可以在短时间内(7 s)升高到材料的开关温度并回复到初始形状.     

掺杂纳米CeO2的纳米玻璃的微观结构研究

采用溶胶-凝胶技术制备了掺杂纳米CeO2的纳米玻璃. XRD分析表明, 掺杂CeO2纳米玻璃为无定形. SEM分析表明, 掺杂纳米CeO2的纳米玻璃中掺杂的纳米粒子分布均匀, 无团聚现象; 玻璃各成分之间混合均匀; 采用不同溶剂所制备的纳米玻璃的致密程度不同. 热分析表明, 掺杂纳米CeO2的纳米玻璃在68 ℃附近有1个吸热峰, 故在该温度时, 应长期保温, 使样品中溶剂充分挥发, 当温度达到500 ℃附近时, 样品几乎不再失重, 仅发生致密化.     

钛、铝和玻璃上TiO2光催化膜的失活研究

采用浸渍提拉法，在平行条件下制备了钛、铝和玻璃载体上的TiO₂膜TiO₂ / Ti、TiO₂ / Al和TiO₂ / G，利用X射线光电子能谱(XPS)、原子力显微镜(AFM)和光催化降解实验等手段对膜样品进行了表征和活性评价。实验结果表明，在铝和玻璃基材上制膜时发生了显著的基材元素溢出，使各膜样品的化学组成不同，同时TiO₂粒子和膜表面形貌也因前驱物烧结行为不同而差异较大。TiO_{2相似文献}   

水热法制备TiO2纳米管阵列

在(NH4)2TiF6的水溶液中,以铝基阳极氧化铝膜为模板,采用水热法制备了TiO2纳米管阵列. 采用场发射扫描电镜、 X射线能量色散谱及X射线光电子能谱对所得纳米管阵列进行了表征,并探讨了其形成机制. 结果表明,控制水热处理时间对制备形貌规整的纳米管阵列至关重要,较佳的水热处理时间为90 min. 采用本方法制备的纳米管阵列具有特殊的形貌,即表面的连续多孔结构和断面的不连续、分离的管状特征. 这种特殊形貌的形成是由于[TiF6]2-与阳极氧化铝模板的表面和断面具有不同的反应速率,水解产物优先在阳极氧化铝模板的表面沉积所致.     

化学气相淀积法合成氮化铝薄膜及其工艺设计

对ＡｌＢｒ３－ＮＨ３－Ｎ２体系化学气相淀积法合成Ａ１Ｎ膜进行了热力学分析和工艺设计，研究了在不同淀积温度和体系总压时，体系中主要气态物种的平衡分压和Ａ１Ｎ膜的理论淀积速率与源温和载气流量的关系，并与微波等离子体化学气相淀积Ａ１Ｎ膜的实验结果进行了比较。     

离子液体AlCl3/Et3NHCl中电沉积法制备金属铝

在AlCl3/Et3NHCl型离子液体中铝电极上通过恒电位电解沉积制备出金属铝. 测定了不同摩尔比的AlCl3/Et3NHCl离子液体在不同温度下的电导率, 考察了离子液体AlCl3/Et3NHCl摩尔比为2/1中Al电极上铝沉积的晶核成核过程, 以及恒电位电解沉积铝的工艺条件对电流效率和沉积铝表面形貌的影响. 结果表明, 不同比例AlCl3/Et3NHCl离子液体的电导率随温度升高而升高, 符合Arrhenius规律; 在Al电极上铝沉积的成核机理为三维瞬时成核过程; 恒电位电解沉积结果表明, 室温下在电位-2.4 V(vs Pt)和电解时间20 min条件下, 沉积铝的表面形貌比较平整致密,电流效率达73%, 沉积铝的纯度达96%(w).     

自组装成膜技术制备TiO2薄膜的XPS研究

采用自组装成膜技术制备里TiO2薄膜,应用X射线光电子能谱研究自组装膜及其氧化膜和淀积的TiO2薄膜，结果表明，硅烷偶联剂成功地组装在玻璃基片上，足够长时间的氧化对使端基（-SH）完全氧化为磺酸基，淀积在基片上的TiO2膜牢固性好，平均膜厚在10nm．淀积膜中的钛可能有几种不同的氧化态，不同的酸度影响TiO2的淀积效果     

Pt/Ti双层电极应力的微观分析研究

常温下用直流溅射法在Si（100）上淀积Pt/Ti电极薄膜.采用X射线衍射、原子力显微镜检测不同退火温度的薄膜,结果表明,退火初期Pt层内首先产生了压应力,从而使Pt表面形成了小丘凸起;退火过程产生的热应力在Pt层残余应力的产生中占主导地位,这种热应力使得Pt层最后的应力状态为张应力状态并且随着Pt层中Pt3Ti金属间化合物数量的增多而增大.     

Influence of substrate nature and growth conditions on the morphology of thin DMOAP films

We report some preliminary results on the morphology of thin N,N -dimethyl- n -octadecyl-3-aminopropyltrimethoxysilyl chloride (DMOAP) films. When deposited on a glass substrate, DMOAP forms a mono- or multi-layer structure parallel to the substrate. The surface topography of the film is probed by atomic force microscopy. In general, the free surface of such a film is not flat and smooth. Islands and holes are formed on the free surface of the films when a sufficiently flat substrate is used. The thin film surface topography depends strongly on the nature of the bare substrate, the curing conditions, and the immersion time of the substrate in the DMOAP solution. The film is always rougher than the bare substrate used. Annealing roughens the surface of the alkoxysilane thin films deposited on a glass substrate. For films on glass plates covered with an indium tin oxide layer, annealing has minor effects. The surface topography affects the microstructure of homeotropic smectic samples.     

Influence of substrate nature and growth conditions on the morphology of thin DMOAP films

We report some preliminary results on the morphology of thin N,N -dimethyl-n-octadecyl-3-aminopropyltrimethoxysilyl chloride (DMOAP) films. When deposited on a glass substrate, DMOAP forms a mono- or multi-layer structure parallel to the substrate. The surface topography of the film is probed by atomic force microscopy. In general, the free surface of such a film is not flat and smooth. Islands and holes are formed on the free surface of the films when a sufficiently flat substrate is used. The thin film surface topography depends strongly on the nature of the bare substrate, the curing conditions, and the immersion time of the substrate in the DMOAP solution. The film is always rougher than the bare substrate used. Annealing roughens the surface of the alkoxysilane thin films deposited on a glass substrate. For films on glass plates covered with an indium tin oxide layer, annealing has minor effects. The surface topography affects the microstructure of homeotropic smectic samples.     

Studies of host-guest thin films of corona-poled betaine-type polar molecules by kelvin probe technique and atomic force microscopy

In this work betaine-type molecules were investigated. As a result of the asymmetry of charge distribution, molecules possess in the ground state a considerable permanent dipole moment. The decay of surface potential of poled polymer films is dependent at least on two relaxation processes. The influence of glass transition of PMMA on thermal dependence of the surface potential is shown. The transition temperature, where no changes of the surface potential appeared, is related to glass transition temperature of the host-guest system. The topography of the film surface was obtained by AFM.     

Effects of gold‐induced crystallization process on the structural and electrical properties of germanium thin films

Gold‐induced (Au‐) crystallization of amorphous germanium (α‐Ge) thin films was investigated by depositing Ge on aluminum‐doped zinc oxide and glass substrates through electron beam evaporation at room temperature. The influence of the postannealing temperatures on the structural properties of the Ge thin films was investigated by employing Raman spectra, X‐ray diffraction, and scanning electron microscopy. The Raman and X‐ray diffraction results indicated that the Au‐induced crystallization of the Ge films yielded crystallization at temperature as low as 300°C for 1 hour. The amount of crystallization fraction and the film quality were improved with increasing the postannealing temperatures. The scanning electron microscopy images show that Au clusters are found on the front surface of the Ge films after the films were annealed at 500°C for 1 hour. This suggests that Au atoms move toward the surface of Ge film during annealing. The effects of annealing temperatures on the electrical conductivity of Ge films were investigated through current‐voltage measurements. The room temperature conductivity was estimated as 0.54 and 0.73 Scm⁻¹ for annealed samples grown on aluminum‐doped zinc oxide and glass substrates, respectively. These findings could be very useful to realize inexpensive Ge‐based electronic and photovoltaic applications.     

Rough silver films studied by surface enhanced raman spectroscopy and low temperature scanning tunnelling microscopy

The surface topography of Ag films and surface enhanced Raman scattering (SERS) from benzene on Ag films have been simultaneously recorded. The Ag films were formed by vacuum deposition at temperatures ranging from 100 K to 500 K. Analysis of scanning tunnelling microscopy (STM) images shows that films formed below 250 K are fractal structures with Hausdorff-Besicovitch dimension 2.55 < D < 2.72, while for those formed above 250 K, D≈2. The lower temperature, rough films exhibit strong surface enhanced Raman scattering but the higher temperature, smooth films do not. We consider the consequences of fractal character and the possible correlation between this and the SERS activity of these films.     

金属铝诱导法低温制备多晶硅薄膜

以氢气稀释的硅烷(SiH₄)和硼烷(B₂H₆)为气源,利用等离子体增强化学气相沉积法(PECVD)制备出p型a-Si薄膜.采用铝诱导晶化技术对不同厚度的铝膜对a-Si薄膜晶化的影响进行了研究.实验中发现,铝膜溅射为10 s的非晶硅薄膜样品在450℃下退火10 min后,p型a-Si结构仍为非晶态,铝膜溅射为20 s的非晶硅薄膜在450℃下退火20 min后,p型a-Si薄膜开始晶化为poly-Si薄膜,并且铝膜厚度越厚,则a-Si薄膜晶化程度越强.     

Preparing of high-quality carbon film from polyimide films by gradient heat treatment process

A series of carbon-graphite films were prepared via the gradient heating based on polyimide films under nitrogen atmosphere. FTIR spectroscopy, X-ray diffraction, Raman spectrum were used to systemically investigate the evolutions of chemical structure, crystal structure, thermal stability, morphological microstructure and properties of the carbon-graphite films. The study shows that the segment fracture and thermal cross-linking reaction occur first during the low temperature pyrolysis process of PI films, and the thermal cross-linking reaction changes the structure of polyimide. Radicals start restructuring and the thermal condensation becomes sharp with the increase of heat treatment temperature, and the amorphous structure of film is transformed into the ordered graphite structure, at the same time the crystallinity and orientation of the films are improved. When it reaches a certain temperature, the crystal lattice is further improved, and the structure of film can be transformed into polycrystalline graphite structure. With the increase of the temperature, the carbon content of film is gradually increasing, and the surface resistivity is smaller and smaller. It is obvious that once the continuous conductive network of carbon formed, the conductivity of composite sheet films hardly changed.     

Ultrasmooth silver thin film electrodes with high polar liquid wettability for OLED microcavity application

For a lab-on-chip application, we fabricate a blue bottom emitting strong microcavity organic light emitting diode (OLED), using very smooth and optically thin (25 nm) silver film as anode on a glass substrate. To improve the hole injection in the OLED device, PEDOT-PSS (poly(3,4-ethylenedioxythiophene)-poly(styrene sulfonic acid)) has been used, so the silver anode must present not only a very smooth surface but also a strong adherence on the glass and a high wettability to allow a good PEDOT-PSS spin coating deposition. To obtain these physical properties, different 5 nm thick nucleation layers (germanium, chromium, and hydrogenated amorphous carbon) have been used to grow the silver thin films by e-beam deposition. The Ge/Ag bilayer presents all the desired properties: this bilayer, investigated by ellipsometry, optical profilometry, contact angle measurements, and XPS analysis, highlights an ultrasmooth surface correlated with the film growth mode and a high wettability related to its surface chemical composition.     

Surface hydration and its effect on fluorinated SAM formation on SiO2 surfaces

Substrate hydration is demonstrated to be crucial to film quality during self-assembled (SA) film deposition of tridecafluoro-1,1,2,2,-tetrahydrooctyltrichlorosilane (FOTS) from the vapor phase. The surface hydration was studied by thermogravimetric analysis, and a model was developed to predict the conditions necessary to desorb all of the water adsorbed on a fused silica surface without significantly altering the concentration of the surface hydroxyl groups. The nature of the SA film was investigated as a function of the degree of rehydration of the dehydrated silica surface. The wettability and microstructure of the SA films were examined by water contact angle, ellipsometry, X-ray photoelectron spectroscopy, and atomic force microscopy. There is an optimum degree of substrate hydration, on the order of 1-1.2 monolayers of adsorbed water, required to produce a dense, durable and uniform FOTS film with high water repellency and a smooth surface.     

EFFECTS OF BLENDING CHITOSAN WITH PEG ON SURFACE MORPHOLOGY,CRYSTALLIZATION AND THERMAL PROPERTIES

Biodegradable blend films composed of chitosan and PEG with various composition ratios were prepared.The chemical structure of the blend films was characterized with FTIR and X-ray,which showed no chemical bond formations but certain interactions probably coming from the hydrogen bonds.Morphologies of these blend films were viewed using AFM and SEM,suggesting that pure chitosan film had a smooth surface structure and the blend films surface showed a plenty of holes with varying size.Through the DMA measu...