水浴沉积法制备硫化镉薄膜的初步研究

采用化学水浴沉积法制备了半导体薄膜硫化镉（CdS）太阳能电池材料,对影响成膜的因素以及薄膜的结构和光学性能进行了初步测试研究。结果表明,反应溶液的pH值以及薄膜的退火温度是影响成膜的重要因素。实验中pH值范围控制在10．5—10．8之间,最佳退火温度为400℃。另外退火时滴加CdCl2溶液并将其涂抹于薄膜表面,可以使薄膜在可见光范围的透过率得到进一步的提高。     

沉积温度对多元醇法制备硫化镉薄膜的影响

CdS thin films were successfully deposited onto glass substrates for the first time by the polyol method using cadmium acetate, thiourea and diethylene glycol as the raw materials. The effects of the deposition tempera- ture from 120 to 200 ℃ in steps of 20 ℃on the structure, morphology and optical properties of the resultant films were investigated. It was found that the crystallinity was improved and the value of the surface average roughness was decreased with increasing the deposition temperature. The average grain sizes of the CdS thin films were 77.16 and 76.61 nm at 140 and 180 ℃, respectively. All samples showed excellent transmittance and the band gaps were found to reduce from 2.55 to 2.45 eV with the increase of the deposition temperature, which was attributed to the improvement of crystallinity.     

激光化学气相沉积法制备TiO2薄膜

利用激光化学气相沉积(LCVD)方法,以钛金属有机化合物为前驱体,以O2为反应气体,在激光功率PL为0～200 w、基板预热温度为400～700℃的条件下,制备出了金红石型TiO2薄膜和金红石型与锐钛矿型混合TiO2薄膜.研究表明,激光功率和基板预热温度对所沉积的TiO2薄膜的物相组成、截面组织,表面形貌和薄膜生长速度均有着显著的影响.     

微波辅助化学浴沉积法制备ZnO薄膜

采用微波辅助化学浴沉积法在玻璃衬底上制备了氧化锌(ZnO)薄膜。初步探讨了化学浴沉积法制备ZnO薄膜的反应机理。X射线衍射分析结果表明所得的ZnO薄膜为六方纤锌矿结构的多晶薄膜,不具有任何晶面的择优生长取向;随着反应时间从15min延长至30min,薄膜结晶性能提高,晶粒尺寸从27nm长大到73nm。扫描电子显微镜分析显示反应沉积12min时,薄膜比较均匀、致密,无裂纹出现;反应沉积25min后,薄膜厚度增加,同时出现开裂现象。     

微波等离子体化学气相沉积法制备C3N4薄膜的研究

本文采用微波等离子体化学气相沉积法（ＭＰＣＶＤ）,高纯Ｎ２（９９．９９９％）和ＣＨ４（９９．９％）作反应气体,在多晶Ｐｔ（９９．９９％）基片上沉积Ｃ３Ｎ４薄膜。Ｘ－射线能谱（ＥＤＸ）分析结果表明Ｎ／Ｃ原子比为１．０～１．４,接近Ｃ３Ｎ４的化学比;Ｘ射线衍射谱说明薄膜主要由β和α－Ｃ３Ｎ４组成;ＦＴ－ＩＲ谱和Ｒａｍａｎ谱支持Ｃ－Ｎ键的存在。     

热解CVD方法制备氧化铍薄膜的研究

本文用碱式甲酸铍为源,在源区温度250—330℃,沉积区温度440—650℃的条件下,利用热解CVD方法制得了BeO薄膜,并对BeO 薄膜的物理和化学性能做了测量和试验.     

PECVD技术在微结构表面沉积薄膜的复形性北大核心CSCD

采用光刻技术、刻蚀技术和等离子体增强化学气相沉积(PECVD)技术,在线阵掩模微结构表面沉积了SiO2和Si3N4薄膜,研究了线阵掩模的宽度和厚度,以及薄膜的厚度和沉积速率对SiO2和Si3N4薄膜复形性的影响,制备得到了具有良好微结构形貌的微结构滤光片阵列。结果表明,薄膜沉积速率越大,薄膜的复形性越好;掩模厚度和薄膜沉积厚度的增加会导致薄膜的复形性变差;SiO2薄膜的复形性优于Si3N4薄膜的。     

金刚石薄膜的低温合成技术

本文综述了国内外低温和室温合成金刚石薄膜的发展现状和动态，介绍了几种典型的低温和室温合成金刚石薄膜的方法及工艺特点，给出了低温合成金刚石薄膜的一些基本规律。     

溅射沉积功率对PZT薄膜的组分、结构和性能的影响

用射频(RF)溅射法在镀LaNiO3(LNO)底电极的Si片上沉积PbZr0.52 Ti0.48 O3(PZT)铁电薄膜，沉积过程中基底温度为370℃，然后在大气环境中对沉积的PZT薄膜样品进行快速热退火处理(650℃，5min)．用电感耦合等离子体发射光谱(ICP-AES)测量其组分，X射线衍射(XRD)分析PZT薄膜的结晶结构和取向，扫描电子显微镜(SEM)分析薄膜的表面形貌和微结果，RT66A标准铁电综合测试系统分析Pt／PZT／LNO电容器的铁电与介电特性，结果表明，PZT薄膜的组分、结构和性能都与溅射沉积功率有关．     

氩离子束辅助反应溅射沉积氧化锆薄膜的微观分析

对离子束反应溅射沉积过程中,同时经氩离子束轰击形成的氧化锆薄膜进行了RBS,XPS,TEM及XRD的微观分析。结果表明,在本实验条件下的形成膜体部分为标准化学计量配比的ZrO_2;形成膜由非晶和微晶构成,晶化程度与薄膜沉积用的衬底材料有关;在Al衬底上沉积膜有介稳立方相和单斜相出现;所有沉积膜表面均沾污碳。     

Ag—SiO2纳米复合薄膜微结构研究

本文采用基片可旋转并利用红外灯管加热基片多靶磁控溅射台的制备了不同成分及基片温度的Ag～Sio2复合薄膜。采用XRD、TEM、SEM等手段分析了薄膜的微观组织结构，并测定了薄膜的电阻率。研究结果表明：复合薄膜的微结构由多晶富Ag区和细密的Ag晶体和非晶SiO2混合物组成；室温下随SiO2含量的增加．薄膜中金属Ag呈网状分布．晶粒细化，电阻率上升；随基片温度的升高．复合薄膜中银晶体最终聚集成孤立的纳米颗粒；与微结构相对应，薄膜的电阻率可在大范围（102～106μΩcm）内变化。     

化学溶液分解法制备的Bi2Ti2O7薄膜的红外光学性质研究

采用化学溶液分解法在n-GaAs(100)衬底上制备了Bi2 Ti2 O7薄膜．利用红外椭圆偏振光谱仪测量了波长为：2.8-12.5μm范围内Bi2 Ti2 O7薄膜的椭偏光谱,采用Lorentz-Drude色散模型拟合获得Bi2 Ti2 O7薄膜的红外介电常数,并进一步计算得到折射率n、消光系数κ和吸收系数α,拟合计算得到Bi2 Ti2 O7薄膜的厚度为139．2nm.     

化学沉积法低温生长锰钴镍薄膜结晶性及红外椭偏光谱研究

使用化学沉积方法,在600℃温度下,成功制备锰钴镍(MnxCoyNi3-x-y)O4(MCN)薄膜.传统的固熔烧结工艺合成MCN材料需要的温度条件约为1050~1200℃,与这一温度相比,本文的方法使合成温度降低了许多.随着退火后处理温度从600℃升高到900℃,MCN薄膜的晶粒尺寸大小从20nm增大到50nm.同时还利用红外椭偏光谱测量获得MCN薄膜的介电常数和吸收系数.     

化学溶液法制备的Ba0.9Sr0.1TiO3薄膜的结构及光学特性研究

采用高度稀释的前驱体溶液在LaNiO3(LNO)薄膜上沉积了Ba0.9Sr0.1TiO3(BST)薄膜。X-射线衍射分析表明BST薄膜呈高度的（100）择优取向。原子力显微镜测量发现制备的BST薄膜具有大的晶粒尺寸80-200nm。用椭偏光谱仪测量了光子能量为0.7-3.4eV范围内BST薄膜的椭偏光谱，用Cauchy模型描述BST薄膜的光学性质，获得了BST薄膜的光学常数谱和禁带宽度Eg=3.36eV。     

Substrate temperature dependent studies on properties of chemical spray pyrolysis deposited CdS thin films for solar cell applications

Thin films of CdS have been prepared by chemical spray pyrolysis by spraying precursor solution directly onto soda lime glass(SLG) substrates. Influence of substrate temperature on structural, optical, morphological and electrical properties have been investigated by using various techniques such as low angle X-ray diffraction(XRD), Raman spectroscopy, X-ray photoelectron spectroscopy(XPS), field emission scanning electron microscopy(FESEM), atomic force microscopy(AFM), transmission electron microscopy(TEM), UV-visible spectroscopy photoluminescence(PL) spectroscopy etc. Formation of CdS has been confirmed by low angle XRD, Raman spectroscopy and XPS analysis. XRD pattern showed that CdS films are polycrystalline, have hexagonal structure and prefer orientation of crystallites shifts from(101) to(002) with increase in substrate temperature. Raman spectroscopy revealed that exciton-phonon coupling depends on substrate temperature and hence on crystallite size. Optical band gap increased from 2.43 to 2.99 eV when substrate temperature increased from 325 to 475℃. Transmittance of the film also showed an increasing trend from ~52% to ~80% with increase in substrate temperature. Such high band gap and transmittance values of CdS films prepared at 475℃ make it a useful window material in CdS/CdTe and CdS/Cu₂S heterojunction solar cells.     

La0.5Sr0.5CoO3薄膜的化学溶液法制备及椭偏光谱研究

用化学溶液沉积法在Si衬底上制备了La0.5Sr0.5CoO 3(LSCO)导电薄膜.X-射线衍射结果表明退火温度600℃可以使LSCO薄膜晶化,薄膜没 有明显的择优取向并呈单一的钙钛矿相.原子力显微镜研究结果表明LSCO薄膜表面平整、无 裂纹及晶粒尺寸较大.用椭偏光谱仪测量了波长300～1700nm范围内LSCO薄膜的椭偏光谱.用适当的拟合模型进行拟合,获得了LSCO 薄膜的光学常数(包括折射率,消光系数,吸收系数等)谱.     

Growth modes of solution-grown CdS thin films

The growth modes of CdS thin films on glass in a chemical bath were analysed using scanning electron microscopy and optical microscopy. The results of these studies show that the film growth occurs by ion-by-ion condensation and by colloidal particles of CdS adhering to the substrate. Both mechanisms are operative from the initial stages of film growth. The predominance of one or other of these two growth modes depends on the abundance of Cd and S ions present in the solution, which is determined by the amount of complexing and sulphurising agents and ammonia used for the controlled release of Cd and S ions into the solution. The growth mode influences the optical properties of the films.