具有窄光致发光谱的纳米Si晶薄膜的激光烧蚀制备

采用XeCl脉冲准分子激光器，在10Pa的Ar气环境下，烧蚀高阻单晶Si靶，分别在距靶3cm的玻璃和单晶Si衬底上制备了纳米Si薄膜. 相应的Raman谱和x射线衍射谱均证实了薄膜中纳米Si晶粒的形成. 扫描电子显微镜图像显示，所形成的薄膜呈均匀的纳米Si晶粒镶嵌结构. 相应的光致发光峰位出现在599nm，峰值半高宽为56nm，与相同参数下以He气为缓冲气体的结果相比，具有较窄的光致发光谱，并显示出谱峰蓝移现象. 关键词： 纳米Si晶粒 脉冲激光烧蚀 薄膜形貌 光致发光     

纳米ZnO薄膜的光致发光性质

利用溶胶－凝胶法制备了纳米ZnO薄膜,室温下测量了样品的光致发光谱(PL)、吸收谱(ABS)、X射线衍射谱(XRD)．X射线衍射(XRD)的结果表明：纳米ZnO薄膜呈多晶状态,具有六角纤锌矿晶体结构和良好的C轴取向．观察到二个荧光发射带,中心波长分别位于395 nm的紫带、524 nm的绿带和450 nm附近的蓝带．证实了纳米ZnO薄膜绿光可见发射带来自氧空位(VO)形成的浅施主能级和锌空位(VZn)形成的浅受主能级之间的复合;450 nm附近的蓝带来自电子从VO的浅施主能级到价带顶或锌填隙(Zni) 到价带顶或导带底到VZn的浅受主能级的复合．     

纳米微晶结构ZnO及其紫外激光

本文介绍了近年来研制Ⅱ Ⅵ族半导体激光器的一个新的途径———ZnO的纳米微晶结构。它分为两大类别 :即六角柱形蜂巢状结构和粉末状颗粒结构。都已在近紫外波段实现了室温下光泵激发的受激发射。它将是继Ⅱ Ⅵ族硒化物和Ⅲ Ⅴ族氮化物之后的新型半导体激光器材料。     

ZnO/CuO 核壳结构纳米线光致发光性能 与CuO壳层厚度的关系

通过分别生长核层与壳层制备出了ZnO/CuO核壳结构的纳米线。形貌和结构分析表明,ZnO核为单晶纳米线而CuO则以多晶形式覆盖在核层表面上。光致发光(PL)研究表明,ZnO纳米线PL强度随CuO壳层厚度的变化而变化。当壳层比较薄时ZnO的PL强度增大,这主要是由于CuO壳层对ZnO核层的修饰减少了表面态,而当壳层厚度增加到一定程度时,ZnO的PL强度不再变化,这主要是由于在核壳结构中形成了type-I型结构的原因。我们对这一现象做了详细的讨论。     

激光烧蚀高纯Zn形成的微米金属球体对后续脉冲激光的耦合增强效应

脉冲激光束在低真空(约2 Pa)环境下聚焦到高纯Zn靶表面, 烧蚀区域不仅有中心深孔的宏观损伤, 而且还发现大量微米量级的类似足球形状的金属Zn球体结构附着生长在孔洞内侧表面. 实验过程中采用等离子体光谱诊断技术研究宏观和微观损伤对后续脉冲激光的影响程度. 与聚焦于金属Zn平滑表面相比, 宏观损伤可以使后续激光诱导的Zn原子334.5 nm谱线强度提高10.3%, 在此基础上大量Zn微米球体附着在内表面可以使谱线强度再提高34.3%. 因此, 推断这些金属Zn微球表面镶嵌着光洁的纳米量级六边形和五边形小平面, 可以对后续脉冲激光产生镜面反射, 使得激光能量汇聚并耦合增强, 提高烧蚀效率. 实验结果还表明, 这些微米球体的数目随着激光脉冲次数的增加而增多, 使得后续激光能够诱导产生更为致密高温的等离子体. 研究结果有望为激光-金属微孔技术提供新思路. 关键词： 脉冲激光烧蚀 微纳米结构 激光诱导等离子体     

掺Sb纳米ZnO的光致发光的研究

用柠檬酸盐法合成了不同掺杂浓度的纳米ZnO,粒径约为15nm。探讨了Sb掺杂对ZnO光致发光峰的影响。随着掺杂量的提高,样品的发射峰从428nm移至444nm。未掺杂ZnO的发光主要是源于电子从锌填隙形成的缺陷能级到价带顶的跃迁;随着掺杂量的提高,体系的氧空位增加,从而使得电子从氧空位所形成的缺陷能级到价带顶的跃迁占据主导,光致发射峰向长波方向移动。     

水热合成ZnO:Cd纳米棒的微结构及光致发光特性

采用水热法制备了ZnO和不同掺杂浓度的ZnO:Cd纳米棒,通过SEM,XRD、拉曼光谱等的分析,研究了ZnO和ZnO:Cd的微结构并测试分析了其光致发光特性.结果表明,ZnO和ZnO:Cd纳米棒呈六角纤锌矿结构,Cd掺杂使得纳米棒体积更小.由于内部张应力的影响,Cd掺杂使得材料光学带隙减少.当掺杂浓度为2%时,合成的材料光致发光谱中出现了位于2.67 eV处,由导带底和Zn空位(VZn)缺陷能级跃迁造成的蓝光发射峰,并且Cd的掺入使得位于2.90 eV附近的紫光发射峰强度增强,对于研究ZnO蓝紫发光器件具有重要的意义.     

ZnO/Zn界面对纳米ZnO薄膜光学性质的影响

采用氧等离子体辅助电子束蒸发金属Zn后低温退火的方法制备纳米ZnO薄膜。利用X射线衍射(XRD)谱、拉曼(Raman)谱、X射线光电子能谱(XPS)以及光致发光(PL)谱等手段,分析了退火温度及ZnO/Zn界面对样品的结构和发光性质的影响。Raman结果表明随着退火温度的升高,界面模式(Es)振动减弱并向低波数方向移动。当退火温度为400℃时,界面振动消失,Zn全部转化成具有六方纤锌矿结构的ZnO,得到化学配比的纳米ZnO薄膜。PL谱表明,经400℃退火处理的样品紫外发射最强,发光性质最好。     

脉冲激光沉积(PLD)法生长高质量ZnO薄膜及其发光性能

采用脉冲激光沉积(PLD)法在单晶Si(100)衬底上生长ZnO薄膜,以X射线衍射(XRD)、原子力显微镜(AFM)和透射电镜(TEM)等手段分析了所得ZnO薄膜的晶体结构和微观形貌。优化工艺(700℃,20Pa)下生长的ZnO薄膜呈c轴高度择优取向,柱状晶垂直衬底表面生长,结构致密均匀。室温光致发光(PL)谱分析结果表明,随着薄膜生长时O₂分压的增大,近带边紫外发光峰与深能级发光峰之比显著增强,表明薄膜的结晶性能和化学计量比都有了很大的改善。O₂分压为20Pa时所生长的ZnO薄膜具有较理想的化学计量比和较高的光学质量。     

高质量纳米ZnO薄膜的光致发光特性研究

报道了利用低压-金属有机物化学气相沉积技术生长纳米ZnS薄膜，然后，将ZnS薄膜在氧气中于800℃温度下进行热氧化制备高质量纳米ZnO薄膜.x射线衍射结果表明，纳米ZnO薄膜具有六角纤锌矿多晶结构.室温下观察到一束强的紫外(3.26 eV) 光致发光和很弱的深能级发射.根据激子峰的半高宽度与温度的关系确定了激子-纵向光学声子（LO）的耦合强度（ГLO）.由于量子限域效应使ГLO减少较多. 关键词： 光致发光 热氧化 激子 纳米ZnO薄膜     

Growth and characterization of pulsed laser deposited ZnO thin films

One of the most important and promising materials from metal oxides is ZnO with specific properties for near UV emission and absorption optical devices. The properties of ZnO thin films strongly depend on the deposition method. Among them, pulsed laser deposition (PLD) plays an important role for preparing various kinds of ZnO films, e.g. doped, undoped, monocrystalline, and polycrystalline. Different approaches — ablation of sintered ZnO pellets or pure metallic Zn as target material are described. This contribution is comparing properties of ZnO thin films deposited from pure Zn target in oxygen atmosphere and those deposited from sintered ZnO target. There is a close connection between final thin film properties and PLD conditions. The surface properties of differently grown ZnO thin films are measured by secondary ion mass spectrometry (SIMS), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Furthermore, different approaches — ablation of sintered ZnO pellet or pure metallic Zn as target materials are described. The main results characterize typical properties of ZnO films versus technological parameters are presented. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia     

脉冲激光烧蚀制备纳米Si晶粒成核区位置的确定

为了确定纳米Si晶粒气相成核的位置，采用XeCl准分子激光器，在10Pa氩气环境下，烧蚀高阻抗单晶Si靶，在距离等离子羽正下方2.0cm处、与其轴线平行放置一系列单晶Si或玻璃衬底，沉积制备了纳米Si薄膜. X射线衍射、Raman散射、扫描电子显微镜和原子力显微镜结果均显示，纳米Si晶粒只在距靶约0.5—2.8cm平行距离范围内的样品上形成，在此范围内，随着离靶平行距离的增大，所形成的纳米Si晶粒的平均尺寸逐渐减小，并且晶粒尺寸的分布也发生变化. 根据成核区起始和终止的突变特征，结合晶粒形成后的平抛运动规律，对晶粒气相成核的位置进行了估算. 关键词： 纳米Si晶粒 脉冲激光烧蚀 成核区     

Ar环境气压对脉冲激光烧蚀制备纳米Si晶粒平均尺寸的影响

采用XeCl脉冲准分子激光器，烧蚀高阻抗单晶Si靶，在1—500 Pa的Ar气环境下沉积制备了纳米Si薄膜. x射线衍射谱测量证实，纳米Si晶粒已经形成.利用扫描电子显微镜观测了所形成纳米Si薄膜的表面形貌，结果表明，随着环境气压的增加，所形成的纳米Si晶粒的平均尺寸增大，气压为100 Pa时达到最大值20 nm，而后开始减小. 从晶粒形成动力学角度，对实验结果进行了定性分析. 关键词： 纳米Si晶粒 脉冲激光烧蚀 表面形貌     

Synthesis of ZnO nanoparticles using nanosecond pulsed laser ablation in aqueous media and their self-assembly towards spindle-like ZnO aggregates

ZnO nanoparticles were fabricated by pulsed laser ablation (PLA) of a Zn metal in aqueous media, and aging effects on the morphology and photoluminescence properties of ZnO nanoparticles were investigated. The crystalline phase and particle morphology were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). It was found that small, well-defined ZnO nanoparticles were obtained by PLA of a Zn plate in aqueous media, and subsequent aging of the obtained ZnO nanoparticle suspension produced in cetyltrimethylammonium bromide (CTAB) solution led to the formation of spindle-like ZnO aggregates. However, in deionized water not the spindle-like ZnO aggregates but fluffy round aggregates were obtained. High-resolution transmission electron microscopic (HRTEM) observation indicated that the spindle-like ZnO aggregates were composed of many well-defined nanoparticles. Spindle-like aggregates exhibited strong exciton emission, while green emission could be suppressed via an aging process in the presence of CTAB. Moreover, thin films prepared by electrophoretic deposition (EPD) of ZnO nanoparticles after PLA in the presence of CTAB also possessed highly elongated aggregate structures that were possibly formed by surrounding the ZnO nanoparticles with double layers of CTAB molecules.     

脉冲激光沉积法制备的ZnO薄膜的低阈值电抽运紫外随机激射

分别采用直流反应溅射法和脉冲激光沉积法在硅衬底上沉积ZnO薄膜, 用X射线衍射、扫描电镜、光致发光谱等手段对两种方法沉积的ZnO薄膜的结晶状态、 表面形貌和光致发光等进行了表征. 进一步对比研究了以上述两种方法制备的ZnO薄膜作为发光层的金属-绝缘体-半导体结构器件的电抽运紫外随机激射. 结果表明, 与以溅射法制备的ZnO薄膜作为发光层的器件相比, 以脉冲激光沉积法制备的ZnO薄膜为发光层的器件具有更低的紫外光随机激射阈值电流和更高的输出光功率. 这是由于脉冲激光沉积法制备的ZnO薄膜中的缺陷更少, 从而显著地减少了紫外光在光散射过程中的光损耗. 关键词： 随机激射 ZnO薄膜 脉冲激光沉积 溅射     

脉冲激光烧蚀制备纳米Si晶粒成核气压阈值及动力学研究

采用脉冲激光烧蚀技术,在室温、低压Ar气条件下通过改变气体压强及靶与衬底间距,对纳米Si晶粒成核的气压阈值进行了研究.根据扫描电子显微镜图像、拉曼散射谱和X射线衍射谱对制备样品的表征结果,确定了在室温、激光能量密度为4 J/cm²、靶与衬底间距为3 cm条件下形成纳米Si晶粒的阈值气压为0.6 Pa.结合流体力学模型和成核分区模型,对纳米晶粒的成核动力学过程进行了分析.通过Monte Carlo数值模拟,表明在气相成核过程中,烧蚀Si原子的温度和过饱和密度共同影响着纳米晶粒的成核. 关键词： 脉冲激光烧蚀 成核 气压阈值 Monte Carlo数值模拟     

电场中不同能量密度激光烧蚀制备纳米硅晶粒分布特性

在室温和10 Pa氩气环境中,引入平行于靶面方向的直流电场,通过改变脉冲激光能量密度烧蚀单晶硅靶,在与羽辉轴线呈不同角度的衬底上沉积纳米硅晶薄膜。利用扫描电子显微镜和拉曼散射谱对沉积样品进行分析,结果表明：随着激光能量密度的增加,位于相同角度衬底上的晶粒尺寸和面密度逐渐变大;在同一激光能量密度下,零度角处衬底上的晶粒尺寸和面密度最大,且靠近接地极板处的值比与之对称角度处略大。通过朗缪尔探针对不同能量密度下烧蚀羽辉中硅离子密度变化的诊断、结合成核区内晶粒成核生长动力学过程,对晶粒分布特性进行了分析。     

Nanocomposite ZnO/Au formation by pulsed laser irradiation

The ZnO/Au nanocomposite formation involves synthesis of Au and ZnO colloidal solutions by 532 nm pulse laser ablation of metal targets in deionized water followed by laser irradiation of the mixed colloidal solution. The transmission electron microscope (TEM) and high-resolution transmission electron microscope (HRTEM) images show evolution of spherical particles into ZnO/Au nanonetworks with irradiation time. The formation mechanism of the nanonetwork can be explained on the basis of near resonance absorption of 532 nm irradiation by gold nanoparticles which can cause selective melting and fusion of gold nanoparticles to form network. The ZnO/Au nanocomposites show blue shift in the ZnO exciton absorption and red shift in the Au plasmon resonance absorption due to interfacial charge transfer.     

Femtosecond pulsed laser ablation with spatial filtering

With the rise in demand for miniaturized features with better acute edge acuity and negligible thermal damage zone, one of the key vital areas lies in the refinement of the quality of the laser beam itself. Spatial filter is routinely used in optical micromachining systems to smoothen the Gaussian profile of the machining spot in order to obtain a feature of the desired quality. However, its profile smoothening effect has never been investigated for femtosecond pulsed laser micromachining process since the extremely high peak power of femtosecond pulses will cause damage on the filtering aperture of spatial filter. During the development of an acousto-optical micromachining system using femtosecond pulses, we found that if the damage of the filtering aperture can be circumvented, spatial filter can improve the machining quality of femtosecond pulse ablation, especially when ablation is conducted at low-fluency range (just above the ablation threshold fluency). In this paper, we investigate and demonstrate both the improvement and potential that beam refinement can bring about. In our experiment, a series of test patterns were ablated with a 400 nm second-harmonic Ti:Sapphire femtosecond laser of 150 fs duration at varying pulse energy ranging from 31 to 39 nJ. The specimen used in the experiment is a platinum- (Pt) sputtered coating of 100 nm thickness on a quartz substrate. The results show a significant improvement in the constancy of the shape as well as the size of ablated feature, revealing an improved beam profile and beam energy distribution due to spatial filtering.