Comparative study on Cu2ZnSn(S,Se)4 based thin film solar cell performances by adding various back surface field (BSF) layers

In this research work, SCAPS-1D (Solar Cell Capacitance Simulator in one Dimension) is used to simulate the CZTSSe (Cu2ZnSn(S,Se)4) solar cell with Al/ZnO:Al/ZnO(i)/CdS/CZTSSe/Mo structure. The simulation results have been compared and validated with real experimental results. After that, an effective receipt is proposed with the aim of improving the efficiency of the CZTSSe solar cell, in which a BSF layer is inserted using various materials (SnS, CZTSSe and CZTSe). The obtained results show that the efficiencies of CZTSSe solar cells are increased from 12.3% to 15.7%, 15.3% and 15% by the insertion of SnS, CZTSSe and CZTSe materials as BSF layers, respectively. This enhancement corresponds with a BSF layer thickness of 30 nm and doping concentration of 1E18 cm⁻³. Next, an optimization of BSF layers thickness has been conducted. The optimum value of thickness is considered at 40 nm with an enhancement ratio in efficiency of 36.70%, 26.21% and 21.53% for SnS, CZTSSe and CZTSe, respectively. Better performances have been noted for SnS material. The optimized CZTSSe solar cell with SnS as a BSF layer achieves an efficiency of 16.95% with J_SC = 36.34 mA/cm², V_OC = 0.69 V, and FF = 67% under Standard Test Conditions (AM1.5 G and cell temperature of 25 °C).     

Effect of precursor concentration and post-annealing temperature on (040) oriented tin sulfide thin films deposited on SLG/Mo substrates by spin coating

SnS is a layered material that crystallizes in an orthorhombic structure. This hinders the formation of a dense, pinhole-free morphology. The present study demonstrated the deposition of SnS thin films on soda-lime glass (SLG) and SLG/Mo substrates by spin-coating approach. The developed films were subsequently applied for the fabrication of a thin-film solar cell. The effect of the annealing temperature on the structural, optical, and morphological properties of the deposited SnS films was analyzed. The precursor concentrations and the annealing temperature played a critical role in determining the phase composition and morphological characteristics of the SnS thin films. TFSC with SLG/Mo/SnS/CdS/i-ZnO/AZO/Al configuration was fabricated using the optimal precursor ratio, i.e., Sn:S = 1:1.2, and this device showed a photoconversion efficiency of 0.076%. The reasons for the poor performance of the device were addressed in detail, and the scope for future research to optimize the device performance was elucidated.     

I–V characteristics of ZnO/Cu2O thin film n–i–p heterojunction

ZnO/Cu₂O thin film n–i–p heterojunctions were fabricated by magnetron sputtering. The microstructure, optical, and electrical properties of n-type (n‐) ZnO, insulating (i‐) ZnO, and p-type (p‐) Cu₂O films deposited on glass substrates were characterized by X-Ray diffraction (XRD), spectrophotometer, and the van der Pauw method, respectively. XRD results show that the mean grain size of i-ZnO film is much larger than that of n-ZnO film. The optical band gap energies of n-ZnO, i-ZnO, and p-Cu₂O film are 3.27, 3.47, and 2.00 eV, respectively. The carrier concentration of n-ZnO film is two orders of magnitude larger than that of p-Cu₂O film. The current–voltage (I–V) characteristics of ZnO/Cu₂O thin film n–i–p heterojunctions with different i-ZnO film thicknesses were investigated. Results show that ZnO/Cu₂O n–i–p heterojunctions have well-defined rectifying behavior. All ideality factors of these n–i–p heterojunctions are larger than 2.0. The forward bias threshold voltage and ideality factor increase when i-ZnO layer thickness increases from 100 to 200 nm. An energy band diagram was proposed to analyze the I–V characteristics of these n–i–p heterojunctions.     

Overcoming the thickness paradox: Systematical optimization of inverted polymer solar cells

Inverted structure comes out to be a promising alternative for making polymer solar cells (PSC) with high efficiency and long-term stability. Vertically stacked functional layers with planar shapes often suffer contradictions in holding high optical absorption and excellent charge transfer/hindrance capability to construct well performed inverted PSC devices. Here, we give an example of rational control of the thickness of electron transport layer (ETL), hole transport layer (HTL) and organic active layer (OAL) to achieve a synergistic effect on promoting the overall photovoltaic behaviors. With in-depth exploration of the interaction between device performance and layer thickness, we obtain the optimized device ITO/ZnO Ncs (45 nm)/P3HT:PCBM (70 nm)/MoO₃ (1 nm)/Ag (70 nm) exhibiting an V_oc of 0.63 V, J_sc of 12.52 mA/cm², FF of 54% and PCE of 4.26%.     

Optimisation of the CBD CdS deposition parameters for ZnO/CdS/CuGaSe2/Mo solar cells

We present an optimisation of our recipe for the CdS chemical bath deposition process as applied to solar cells based on polycrystalline CuGaSe₂ (CGSe) absorber layers prepared in two stages by physical vapour deposition. We investigate the influence of the ammonia (NH₃) and the thiourea (H₂NCSNH₂) concentration, both being constituents of the chemical bath deposition (CBD) solution, at a deposition temperature of 80 °C on the microstructural and optical properties of CdS layers and on ZnO/CdS/CuGaSe₂/Mo device parameters. The composition of the CdS layers and their thickness were determined using X-ray Fluorescence Analysis. Transmission and reflection measurements performed at 300 K were used for the calculation of absorption and optical band gap energy (E_g). The E_g values of the films varied from 2.41 to 2.46 eV depending on deposition conditions. Cubic phase of the as-grown layers was identified by X-ray diffraction analysis. An improvement in the investigated solar cells efficiency was achieved when the ammonia concentration was increased and the thiourea concentration was reduced, compared to the previously used standard HMI recipe. The influence of the CBD CdS preparation recipe on the ZnO/CdS/CuGaSe₂/Mo electrical and photoelectrical properties is discussed.     

Interface photoluminescence of the SnO2:F/CdS:In/CdTe thin film solar cells prepared partially by the spray pyrolysis technique

CdS/CdTe solar cells were built by depositing a 200 nm layer of SnO₂:F on glass substrates by the spray pyrolysis (SP) technique, a 500 nm CdS:In layer by the same technique and a 1–1.5 μm CdTe layer by vacuum evaporation. The cells were CdCl₂ heat-treated in nitrogen atmosphere for 30 min at 350 °C. The photoluminescence (PL) spectra were measured at the CdS/CdTe interface for two cells with different values of the CdTe layer's thickness at the temperature T=60 K. A deconvolution peak fit was performed from which it is found that the peaks are characteristic of the solid solution CdS_xTe_1?x. The parabolic relation that relates the bandgap energy with the composition was used to estimate x, where x is [S]/([Te]+[S]) and [Te], [S] are the concentrations of Te and S atoms, respectively. The results show that the interface is smooth and the change of the bandgap occurs gradually. The solar cell of the thicker CdTe layer showed more interdiffusion at the CdS/CdTe interface and better photovoltaic characteristics.     

The effect of Ag layer thickness on the properties of WO3/Ag/MoO3 multilayer films as anode in organic light emitting diodes

Transparent conductive WO₃/Ag/MoO₃ (WAM) multilayer electrodes were fabricated by thermal evaporation and the effects of Ag layer thickness on the optoelectronic and structural properties of multilayer electrode as anode in organic light emitting diodes (OLEDs) were investigated using different analytical methods. For Ag layers with thickness varying between 5 and 20 nm, the best WAM performances, high optical transmittance (81.7%, at around 550 nm), and low electrical sheet resistance (9.75 Ω/cm²) were obtained for 15 nm thickness. Also, the WAM structure with 15 nm of Ag layer thickness has a very smooth surface with an RMS roughness of 0.37 nm, which is suitable for use as transparent conductive anode in OLEDs. The current density?voltage?luminance (J?V?L) characteristics measurement shows that the current density of WAM/PEDOT:PSS/TPD/Alq₃/LiF/Al organic diode increases with the increase in thickness of Ag and WO₃/Ag (15 nm)/MoO₃ device exhibits a higher luminance intensity at lower voltage than ITO/PEDOT:PSS/TPD/Alq₃/LiF/Al control device. Furthermore, this device shows the highest power efficiency (0.31 lm/W) and current efficiency (1.2 cd/A) at the current density of 20 mA/cm², which is improved 58% and 41% compared with those of the ITO-based device, respectively. The lifetime of the WO₃/Ag (15 nm)/MoO₃ device was measured to be 50 h at an initial luminance of 50 cd/m², which is five times longer than 10 h for ITO-based device.     

Stabilization of high spin FCC Fe in (Fe/Pd)n multilayers

Polycrystalline (Fe/Pd)_n multilayers are grown onto sapphire substrates at room temperature in a UHV system. The number of periods n=40 and the thickness of Pd layers of t_Pd=4 nm are kept constant, whereas the thickness of the Fe layers is varied from 1.5 to 5 nm. Structural properties are studied by in situ reflection high energy diffraction (RHEED), scanning tunnelling microscopy (STM) and ex situ by X-ray diffraction at small angles and large angles. Analyzing the experimental data using the program SUPREX we obtain interplanar distances of d_Fe=2.03±0.01 Å for an Fe layer thickness larger than about 2.5 nm as expected for (1 1 0) planes of BCC Fe. For Fe layers with thicknesses less than about 2.5 nm the interplanar distance is d_Fe=2.1±0.01 Å, which is close to the distance between (1 1 1) planes of FCC Fe with a lattice parameter of a=3.64 Å. Magnetic susceptibility measurements at temperatures between 1.5 and 300 K for (Fe/Pd)_n multilayers with FCC Fe yield a magnetic moment per Fe atom of μ=2.7±0.1 μ_B, which is about 20% larger compared to μ=2.2 μ_B for BCC Fe. We show that the occurrence of the large magnetic moment originates from FCC Fe being in the high spin (HS) state rather than from polarization effects of Pd at Fe/Pd interfaces.     

Morphology and the magnetic and conducting properties of heterogeneous layered magnetic structures [(Co45Fe45Zr10)35(Al2O3)65/a-Si:H]36

The morphology and the magnetic and conducting properties of an amorphous multilayer nanosystem [(Co₄₅Fe₄₅Zr₁₀)₃₅(Al₂O₃)₆₅/a-Si:H]₃₆ consisting of (Co₄₅Fe₄₅Zr₁₀)₃₅(Al₂O₃)₆₅ magnetic layers and semiconducting hydrogenated amorphous silicon (a-Si:H) layers of various thicknesses have been studied. Using a combination of methods (including polarized neutron reflectometry and grazing incidence small-angle X-ray scattering), it is shown that the magnetic and electrical properties of these multilayer structures are determined by their morphology. It is established that the magnetization and electric resistance of a sample is a nonmonotonic function of the a-Si:H layer thickness. Both characteristics are at a minimum for a structure with a semiconductor layer thickness of 0.4 nm. Samples with silicon layer thicknesses below 0.4 nm represent a three-dimensional structure of Co₄₅Fe₄₅Zr₁₀ grains weakly ordered in space, while in samples with silicon layer thicknesses above 0.4 nm, these grains are packed in layers alternating in the vertical direction. The average lateral distance between nanoparticles in the layer plane has been determined, from which the dimensions of metal grains in each sample have been estimated.     

Growth of Cu2S/CdS nano-layered photovoltaic junctions for solar cell applications

Layered Cu₂S/CdS photovoltaic p-n junctions were fabricated via a simple and reproducible route. CdS inner layer was grown on ITO substrate using chemical bath deposition process for different times. The utilized bath consisted of cadmium sulfate and thiourea with concentrations of 0.05 M and 0.07 M, respectively. CdS layer grown for 600 min was uniform with a thickness of about 500 nm. Moreover, band gap energy of the CdS inner layers was measured as 2.40-2.44 eV depending on the thickness of the layer. Cu₂S outer layer was formed over the CdS via ion exchange chemical route, in a bath consisting of copper chloride aqueous solution. EDS, XRD, and XPS were utilized to characterize the formation of cadmium sulfide, and copper sulfide phases during the fabrication steps of the p-n junctions. Nano-layered cell, each layer 200-250 nm in thickness was fabricated with an apparent band gap of 2.22 eV. SEM imaging of both inner and the outer layers confirmed the uniformity and homogeneity of the CdS and the Cu₂S layers.     

Electrical characteristics and efficiency of organic light-emitting diodes depending on hole-injection layer

In a device structure of ITO/hole-injection layer/N,N′-biphenyl-N,N′-bis-(1-naphenyl)-[1,1′-biphthyl]4,4′-diamine(NPB)/tris(8-hydroxyquinoline)aluminum(Alq₃)/Al, we investigated the effect of the hole-injection layer on the electrical characteristics and external quantum efficiency of organic light-emitting diodes. Thermal evaporation was performed to make a thickness of NPB layer with a rate of 0.5–1.0 Å/s at a base pressure of 5 × 10⁻⁶ Torr. We measured current–voltage characteristics and external quantum efficiency with a thickness variation of the hole-injection layer. CuPc and PVK buffer layers improve the performance of the device in several aspects, such as good mechanical junction, reducing the operating voltage, and energy band adjustment. Compared with devices without a hole-injection layer, we found that the optimal thickness of NPB was 20 nm in the device structure of ITO/NPB/Alq₃/Al. By using a CuPc or PVK buffer layer, the external quantum efficiencies of the devices were improved by 28.9% and 51.3%, respectively.     

Influence of P<Superscript>+</Superscript>-ZnTe back surface contact on photovoltaic performance of ZnTe based solar cells

In order to improve photovoltaic performance of solar cells based on ZnTe thin films two device structures have been proposed and its photovoltaic parameters have been numerically simulated using Solar Cell Capacitance Simulator software. The first one is the ZnO/CdS/ZnTe conventional structure and the second one is the ZnO/CdS/ZnTe/P⁺-ZnTe structure with a P⁺-ZnTe layer inserted at the back surface of ZnTe active layer to produce a back surface field effect which could reduce back carrier recombination and thus increase the photovoltaic conversion efficiency of cells. The effect of ZnO, CdS and ZnTe layer thicknesses and the P⁺-ZnTe added layer and its thickness have been optimized for producing maximum working parameters such as: open-circuit voltage V_oc, short-circuit current density J_sc, fill factor FF, photovoltaic conversion efficiency η. The solar cell with ZnTe/P⁺-ZnTe junction showed remarkably higher conversion efficiency over the conventional solar cell based on ZnTe layer and the conversion efficiency of the ZnO/CdS/ZnTe/P⁺-ZnTe solar cell was found to be dependent on ZnTe and P⁺-ZnTe layer thicknesses. The optimization of ZnTe, CdS and ZnTe layers and the inserting of P⁺-ZnTe back surface layer results in an enhancement of the energy conversion efficiency since its maximum has increased from 10% for ZnO, CdS and ZnTe layer thicknesses of 0.05, 0.08 and 2 µm, respectively to 13.37% when ZnO, CdS, ZnTe and P⁺-ZnTe layer thicknesses are closed to 0.03, 0.03, 0.5 and 0.1 µm, respectively. Furthermore, the highest calculated output parameters have been J_sc?=?9.35 mA/cm², V_oc?=?1.81 V, η?=?13.37% and FF?=?79.05% achieved with ZnO, CdS, ZnTe, and P⁺-ZnTe layer thicknesses about 0.03, 0.03, 0.5 and 0.1 µm, respectively. Finally, the spectral response in the long-wavelength region for ZnO/CdS/ZnTe solar cells has decreased at the increase of back surface recombination velocity. However, it has exhibited a red shift and showed no dependence of back surface recombination velocity for ZnO/CdS/ZnTe/P?+?-ZnTe solar cells.     

Fabrication of CdTe solar cell using an Inx(OOH,S)y/CdS double layer as a heterojunction counterpart

An In_x(OOH,S)_y/CdS double layer was utilized as a heterojunction counterpart in CdTe solar cells to enhance the transmission of light through the window layer. An In_x(OOH,S)_y/CdS double layer was deposited by chemical bath deposition onto an ITO-coated Corning glass substrate in varying thickness combinations. In_x(OOH,S)_y is porous, and the interface between the In_x(OOH,S)_y and CdS layers overlaps to a large extent. The In_x(OOH,S)_y/CdS double layer showed a higher optical transmittance in the 500–600 nm wavelength range compared to the CdS layer. However, the efficiency of In_x(OOH,S)_y/CdS/CdTe solar cells was not improved due to the lower open circuit voltage. It is considered that the In_x(OOH,S)_y/CdS window layer is less n-type, which is most likely due to the mixing of the two layer during CdTe deposition at 575 °C.     

The roles of zinc selenide sandwiched between organic layers and its applications in white light-emitting diodes

In this paper, the roles of zinc selenide (ZnSe) sandwiched between organic layers, i.e. organic/ZnSe/aluminum quinoline (Alq₃), have been studied by varying device structure. A broad band emission was observed from ITO/poly(N-vinylcarbazole)(PVK)(80 nm)/ZnSe(120 nm)/ Alq₃(15 nm)/Al under electric fields and it combined the emissions from the bulk of PVK, ZnSe and Alq₃, however, emission from only Alq₃ was observed from trilayer device ITO/N,N^′-bis-(1-naphthyl)-N,N^′-diphenyl-1, 1^′-biphenyl-4, 4^′-diamine (NPB) (40 nm)/ZnSe(120 nm)/ Alq₃(15 nm)/Al. Consequently the luminescence mechanism in the ZnSe layer is suggested to be charge carrier injection and recombination. By thermal co-evaporating Alq₃ and 4-(dicyanomethylene)-2-t-butyl-6-(1,1,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran (DCJTB), we get white light emission with a Commission Internationale de l’E clairage (C.I.E) co-ordinates of (0.32, 0.38) from device ITO/PVK(80 nm)/ZnSe(120 nm)/ Alq₃:DCJTB(0.5 wt% DCJTB)(15 nm)/Al at 15 V and the device performs stably with increasing applied voltages.     

Effect of thickness variation of hole injection and hole blocking layers on the performance of fluorescent green organic light emitting diodes

In this paper we present the effect of thickness variation of hole injection and hole blocking layers on the performance of fluorescent green organic light emitting diodes (OLEDs). A number of OLED devices have been fabricated with combinations of hole injecting and hole blocking layers of varying thicknesses. Even though hole blocking and hole injection layers have opposite functions, yet there is a particular combination of their thicknesses when they function in conjunction and luminous efficiency and power efficiency are maximized. The optimum thickness of CuPc (Copper(II) phthalocyanine) layer, used as hole injection layer and BCP (2,9 dimethyl-4,7-diphenyl-1,10-phenanthroline) used as hole blocking layer were found to be 18 nm and 10 nm respectively. It is with this delicate adjustment of thicknesses, charge balancing is achieved and luminous efficiency and power efficiency were optimized. The maximum luminous efficiency of 3.82 cd/A at a current density of 24.45 mA/cm² and maximum power efficiency of 2.61 lm/W at a current density of 5.3 mA/cm² were achieved. We obtained luminance of 5993 cd/m² when current density was 140 mA/cm². The EL spectra was obtained for the LEDs and found that it has a peaking at 524 nm of wavelength.     

Influence of growth morphology on the Néel temperature of CrRu thin films and heterostructures

Dimensionality effects on epitaxial and polycrystalline Cr_1?xRu_x alloy thin films and in Cr/Cr–Ru heterostructures are reported. X-ray analysis on Cr_0.9965Ru_0.0035 epitaxial films indicates an increase in the coherence length in growth directions (1 0 0) and (1 1 0) with increasing thickness (d), in the range 20≤d≤300 nm. Atomic force microscopy studies on these films shows pronounced vertical growth for d>50 nm, resulting in the formation of columnar structures. The Néel temperatures (T_N) of the Cr_0.9965Ru_0.0035 films show anomalous behaviour as a function of d at thickness d≈50 nm. It is interesting to note that this thickness corresponds to that for which a change in film morphology occurs. Experiments on epitaxial Cr_1?xRu_x thin films, with 0≤x≤0.013 and d=50 nm, give T_N–x curves that correspond well with that of bulk Cr_1?xRu_x alloys. Studies on Cr/Cr_0.9965Ru_0.0035 superlattices prepared on MgO(1 0 0), with the Cr layer thickness varied between 10 and 50 nm, keeping the Cr_0.9965Ru_0.0035 thickness constant at 10 nm, indicate a sharp decrease in T_N as the Cr separation layers reaches a thickness of 30 nm; ascribed to spin density wave pinning in the Cr layers for d<30 nm by the adjacent CrRu layers.     

Chemical bath deposition of CdS channel layer for fabrication of low temperature-processed thin-film-transistors

～66 nm thick CdS film with a hexagonal structure was uniformly generated via a low temperature-processed chemical bath deposition at 80 °C using a complexing agent of ethylenediaminetetraacetic acid and its crystal structure, surface morphology, optical transmittance, and Raman scattering property were measured. Grown CdS film was used as a channel layer for the fabrication of bottom-gate, top-contact thin-film-transistor (TFT). The TFT device with 60 °C-dried channel layer exhibited a poor electrical performance of on-to-off drain current ratio (I_on/I_off) of 5.1 × 10³ and saturated channel mobility (μ_sat) of 0.10 cm²/Vs. However, upon annealing at 350 °C, substantially improved electrical characteristics resulted, showing I_on/I_off of 5.9 × 10⁷ and μ_sat of 5.07 cm²/Vs. Furthermore, CdS channel layer was chemically deposited in an identical way on a transparent substrate of SiN_x/ITO/glass as part of transparent TFT fabrication, resulting in I_on/I_off of 5.8 × 10⁷ and μ_sat of 2.50 cm²/Vs.     

Thickness dependence on thermal stability of sputtered Ag nanolayer on Ti/Si(1 0 0)

Thermal stability of Ag layer on Ti coated Si substrate for different thicknesses of the Ag layer have been studied. To do this, after sputter-deposition of a 10 nm Ti buffer layer on the Si(1 0 0) substrate, an Ag layer with different thicknesses (150-5 nm) was sputtered on the buffer layer. Post annealing process of the samples was performed in an N₂ ambient at a flow rate of 200 ml/min in a temperature range from 500 to 700 °C for 30 min. The electrical property of the heat-treated multilayer with the different thicknesses of Ag layer was examined by four-point-probe sheet resistance measurement at the room temperature. Phase formation and crystallographic orientation of the silver layers were studied by θ-2θ X-ray diffraction analysis. The surface topography and morphology of the heat-treated films were determined by atomic force microscopy, and also, scanning electron microscopy. Four-point- probe electrical measurement showed no considerable variation of sheet resistance by reducing the thickness of the annealed Ag films down to 25 nm. Surface roughness of the Ag films with (1 1 1) preferred crystallographic orientation was much smaller than the film thickness, which is a necessary condition for nanometric contact layers. Therefore, we have shown that the Ag layers with suitable nano-thicknesses sputtered on 10 nm Ti buffer layer were thermally stable up to 700 °C.     

Junction configurations and their impacts on Cu(In,Ga)Se2 based solar cells performances

One dimension solar cells simulator package (SCAPS) is used to study the possibility of carrying out thin CIGS solar cells with high and stable efficiency. In the first step, we modified the conventional ZnO:B/i-ZnO/CdS/SDL/CIGS/Mo structure by substituting the SDL layer with the P?+?layer, having a wide bandgap from 1 to l.12?eV. Then, we simulated the J-V characteristics of this new structure and showed how the electrical parameters are affected. Conversion efficiency of 18.46% is founded by using 1.1?μm of P?+?layer thickness. Secondly, we analyze the effect of increase thickness and doping density of CIGS, CdS and P?+?layers on the electric parameters of this new structure. We show that only the short-circuit current density (J_SC) and efficiency are improved, reaching respectively 34.68?mA/cm² and 18.85%, with increasing of the acceptors density. Finally, we introduced 10?nm of various electron reflectors at the CIGS/Mo interface in the new structure to reduce the recombination of minority carriers at the back contact. High conversion efficiency of 23.34% and better stability are obtained when wide band-gap BSF is used.     

Effect of channel thickness on electrical performance of amorphous IGZO thin-film transistor with atomic layer deposited alumina oxide dielectric

We have investigated the electrical performance of amorphous indium–gallium–zinc oxide (α-IGZO) thin-film transistors with various channel thicknesses. It is observed that when the α-IGZO thickness increases, the threshold voltage decreases as reported at other researches. The intrinsic field-effect mobility as high as 11.1 cm²/Vs and sub threshold slope as low as ∼0.2 V/decade are independent on the thickness of α-IGZO channel, which indicate the excellent interface between α-IGZO and atomic layer deposited Al₂O₃ dielectric even for the case with α-IGZO thickness as thin as 10 nm. However, the source and drain series resistances increased with increasing of α-IGZO channel thickness, which results in the apparent field-effect mobility decreasing. The threshold voltage shift (ΔV_th) under negative bias stress (NBS) and negative bias illumination stress (NBIS) were investigated, also. The hump-effect in the sub threshold region under NBS and threshold voltage shift to negative position under NBIS were enhanced with decreasing of α-IGZO channel thickness, owing to the enhancement of vertical electrical field in channel.