Broadband dielectric film transflector for variable transmission optical filters

A broadband multilayer dielectric film transflector for applications in variable transmission optical filters is proposed. The dielectric film is composed of alternating TiO₂ and SiO₂ layers deposited on a substrate. The transmittance of the dielectric film transflector can be varied from 0 to 100% by adjusting the individual dielectric layer thickness and the number of layers. The conjugate gradient method is used to optimize the design of the transflectors. The obtained transflectors have good transmittance and reflectance within the whole visible range and the incident angle range 0-20°. The manufacturing tolerances on film thickness and refractive index are reasonably large.     

Design of near-unity transmittance dielectric/Ag/ITO electrodes for GaN-based light-emitting diodes

We designed a near-unity transmittance dielectric/Ag/ITO electrode for high-efficiency GaN-based light-emitting diodes by using the scattering matrix method. The transmittance of an ultrathin metal layer, sandwiched between a dielectric layer and an ITO layer, was investigated as a function of the thickness and the optical constant of each constituent layer. Three different metals (Ag, Au, and Al) were examined as the metal layer. The analytical simulation indicated that the transmittance of a dielectric/metal/ITO multilayer film is maximized with an approximately 10-nm-thick Ag layer. Additionally, the transmittance also tends to increase as the refractive index of the upper dielectric layer increases. By tailoring the thickness of the dielectric layer and the ITO layer, the dielectric/Ag/ITO structure yielded a transmittance of 0.97, which surpasses the maximum transmittance (0.91) of a single ITO film. Furthermore, this extraordinary transmittance was present for other visible wavelengths of light, including violet and green colors. A complex phasor diagram model confirmed that the transmittance of the dielectric/metal/ITO multilayer film is influenced by the interference of reflected partial waves. These numerical findings underpin a rational design principle for metal-based multilayer films that are utilized as transparent electrodes for the development of efficient light-emitting diodes and solar cell devices.     

Technique to Estimate the Reflectance of a High-Reflectance Dielectric Multilayer Coating Mirror Using Incident Beam Angular Dependence of Its Transmittance

The reflectance of a high-reflectance dielectric multilayer coating mirror tuned to a monochromatic laser wavelength was estimated from its transmittance which was measured with 0.4 ppm accuracy. The transmittance was calculated from its theoretical formula including three parameters (refractive indexes of low and high refractive films (n_L, n_H) and a number of layer units composed of a pair of one low and one high refractive film (N)) which were estimated from the incident beam angular dependence curve of the transmittance. This calculated transmittance agreed with that measured as a ratio of the laser beam power before and after the mirror with 6 ppm difference.     

Modeling and recording characteristics of a dye-doped polymer bilayer film

The optical, thermal, and structural behavior of a laser-irradiated dye-in-polymer bilayer film consisting of an elastic and a plastic layer was investigated by a computer modeling and recording experiment. The results of numerical calculations describe absorption of optical energy in the recording layers, the heat flow, and the resultant bump formation throughout the multilayer. Recording performance of the material is strongly affected by the dye concentration and the thickness of the plastic layer. The calculated and measured properties of the media are compared, and the relationship between the dye concentration, thickness of plastic layer, and thermal, structural, and recording performance are described. Received: 9 March 1999 / Revised version: 10 May 1999 / Published online: 29 July 1999     

Effect of anomalous transmittance in EUV multilayer optics

In this paper the effect of anomalous transmittance in the EUV spectral region is considered theoretically. The effect consists in a resonant enhancement of the transmittance of a periodic multilayer structure compared with that of a uniform film. The physical reason of the effect lies in the fact that the minima of the wave field intensity of a certain wavelength are placed just in the center of thin absorbing layers resulting in a resonant decrease of wave absorption. The condition of this appearance is analyzed: it is necessary the absorption coefficient (imaginary part of the dielectric constant) of two materials composing a multilayer structure to differ by a factor of 10, at least. A possibility of the use of a multilayer filter in metrology of broadband EUV sources is discussed.     

激光入射角度对薄膜热场分布影响的数值分析

在多层介质薄膜中，激光的入射方式是影响薄膜抗损伤能力的关键因素之一.提出了一种模拟锥角高斯光入射多层介质薄膜后电场和热场分布的方法.该方法能够分析薄膜中高斯光各个角谱分量叠加形成的电场分布，进而得到由于薄膜本征吸收产生的热量沉积以及薄膜内部的温度场分布.针对中心波长为4.3 μm的中红外高反膜进行了分析，给出了高反膜系的温升峰值随激光入射角度和偏振态的变化.结果表明：对于s偏振光，斜入射时膜系的最高温升峰值高于垂直入射峰值，而p光的结果则相反.此种模拟方法克服了原有方法对激光入射角度的限制，较好地反映出斜入射情况下激光偏振态对薄膜损伤的影响. 关键词： 多层介质薄膜 高斯光 热过程 数值分析     

磁控溅射制备铬薄膜的结构和光电学性质(英文)

用直流磁控溅射技术在石英基片上制备不同厚度(5nm～114nm之间)的铬膜.使用X射线衍射仪和分光光度计分别检测薄膜的结构和光学性质,利用德鲁特模型和薄膜的透射、反射光谱计算铬膜的厚度和光学常量,并采用Van der Pauw方法测量薄膜电学性质.结果表明:制备的铬薄膜为体心立方的多晶态,随着膜厚的增加,薄膜的结晶性能提高,晶粒尺寸增大;在可见光区域,当膜厚小于32nm时,随着膜厚的增加,折射率快速减小,消光系数快速增大,当膜厚大于32nm时,折射率和消光系数均缓慢减小并逐渐趋于稳定;薄膜电阻率随膜厚的增加为一次指数衰减.     

磁控溅射制备铬薄膜的结构和光电学性质

用直流磁控溅射技术在石英基片上制备不同厚度(5 nm~114 nm之间)的铬膜.使用X射线衍射仪和分光光度计分别检测薄膜的结构和光学性质,利用德鲁特模型和薄膜的透射、反射光谱计算铬膜的厚度和光学常量,并采用Van der Pauw方法测量薄膜电学性质.结果表明:制备的铬薄膜为体心立方的多晶态,随着膜厚的增加,薄膜的结晶性能提高,晶粒尺寸增大;在可见光区域,当膜厚小于32 nm时,随着膜厚的增加,折射率快速减小,消光系数快速增大,当膜厚大于32 nm时,折射率和消光系数均缓慢减小并逐渐趋于稳定;薄膜电阻率随膜厚的增加为一次指数衰减.     

Analysis of the spatial filter of a dielectric multilayer film reflective cutoff filter-combination device

The experiment setup of a reflecting combination device, which has more advantages than a transmitting combination device, is designed in this study. To achieve angular spectrum selectivity, only one type of reflective component is needed,so difficulties of design and preparation are reduced. A dielectric multilayer film is applied to the reflective component, and the long wave-pass coating stacks of the structure are designed. To achieve high stopband transmittance and reduce electric field intensity at a wavelength of 1053 nm, an objective function is proposed for designing an optimized coating. The final optimized coating has good spectral characteristics and a high laser-induced damage threshold. A dielectric multilayer film with high reflectance plays an important role in preparing and applying a dielectric multilayer film reflecting cutoff filter-combination device.     

Dynamical dielectric susceptibility of ferroelectric thin films and multilayers

The thickness dependence of the real and imaginary parts of the dynamical dielectric susceptibility is investigated phenomenologically for a multilayer structure consisting of alternating ferroelectric and paraelectric layers. It is shown that the frequency dependence of the linear dielectric response can be closely approximated by that of a damped harmonic oscillator, with the static susceptibility, relaxation time, and soft-mode frequency depending on the layer thickness and temperature. When the layer thickness and temperature are equal to their critical values corresponding to the onset of a size-driven ferroelectric phase transition, the static susceptibility and the relaxation time become anomalously large and then decrease with further increasing layer thickness. A spectrum of natural polarization oscillations is predicted to exist with thickness-dependent frequencies. This spectrum includes a soft-mode frequency which vanishes at the critical thickness and at the critical temperature. The frequency spectrum lies below the soft-mode frequency of a thick film (in which the gradient of polarization is negligible). The calculations are compared with experimentally measured dispersion of the dielectric response of a PbTiO₃-Pb_0.72La_0.28TiO₃ multilayer structure. The agreement between the theory and experiment is found to be good.     

Optical properties of melamine based materials

The melamine based crystalline materials are synthesized. To determine the optical properties the transmittance and reflectance spectra are recorded. The absorption coefficient of the materials is calculated using the recorded transmittance values. From the absorption coefficient values the insulating behavior of all our studied materials is identified. In addition the direct bandgap transition nature of the materials is recognized from the absorption coefficient value. Tauc relation is used to determine the bandgap energy. The bandgap energy values suggest the dielectric nature of the materials and interpretation is given for high dielectric constant values.     

1维微波光子晶体频率选择性反射面

研究了一种由多层介质交替排列的1维微波光子晶体,应用传输矩阵法计算和分析了该结构周期数、波的入射角、介质的相对介电常数以及介质层厚度等对其频率选择特性的影响,并具体给出了一个可行的设计方案。所设计的频率选择表面在3.2~4.0 GHz频率范围内,反射系数大于0.99,在9.5~9.7 GHz频率范围内透射系数大于0.98。     

Effects of Ag layer and ZnO top layer thicknesses on the physical properties of ZnO/Ag/Zno multilayer system

Two groups of transparent conductive ZnO/Ag/ZnO, ZAZ, multilayer coatings were successively deposited by direct current (DC) magnetron sputtering. Sputtering was carried out from zinc (Zn) and silver (Ag) metallic targets. The effects of Ag layer thickness and ZnO top layer thickness on the properties of the ZAZ multilayer system were examined using different analytical methods. The influences of the Ag layer thickness and ZnO top layer thickness on structural properties were studied using X-ray diffraction. The thicknesses of ZAZ multilayer system were determined using X-ray reflectometry. A sheet resistance of 2.3 Ω/sq at an Ag layer thickness of 17.7 nm was obtained. The sheet resistance changes slightly with ZnO top layer thickness. The optical properties of the films were analyzed. Both Ag layer thickness and ZnO top layer thickness affect transmittance. The optical constants of the ZAZ multilayer system were calculated from transmittance and reflectance measurements. The figure of merit was applied on the ZAZ coatings and the most suitable films for the application as transparent conductive electrodes were determined.     

Transparent conductive ITO/Ag/ITO multilayer electrodes deposited by sputtering at room temperature

ITO/Ag/ITO multilayers have been prepared onto conventional soda lime glass substrates by sputtering at room temperature. The optical and electrical characteristics of single layer and multilayer structures have been investigated as a function of the Ag and ITO film thicknesses. Transmittance and sheet resistance values are found mainly dependent on the Ag film thickness; whereas the wavelength range at which the maximum transmittance is achieved can be changed by adjusting the ITO films thickness. ITO/Ag/ITO electrodes with sheet resistance below 6 Ω/sq have been obtained for Ag film thickness above 10 nm and ITO layers thickness in the 30-50 nm range. These multilayers also show high transmittance in the visible spectral region, above 90% by discounting the glass substrate, with a maximum that is located at higher wavelengths for thicker ITO.     

50~110 nm波段高反射率多层膜的设计与制备

阐述了50~110 nm强吸收波段亚四分之一波长多层膜的设计方法.这种膜系是由强吸收材料叠加而成，每层膜光学厚度小于四分之一个波长.与常规周期多层膜相比，这种膜系更适用于提高强吸收波段的反射率.利用该方法设计了50 nm处高反射多层膜，并以此为初始条件通过Levenberg-Marquart优化方法完成了50~110 nm强吸收波段宽带高反射率Si/W/Co多层膜的设计，其平均反射率达到45%.采用直流磁控溅射方法制备了Si/W/Co多层膜,用X射线衍射仪(XRD)对膜层结构进行了测试，测试结果表明制作出的多层膜结构与设计结构基本相符.     

Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature

Cu-based Al-doped ZnO multilayer films were deposited on glass substrates by DC magnetron sputtering at room temperature. Three kinds of multilayer structures (AZO/Cu, AZO/Cu/AZO, and Cu/AZO) were designed for comparison, and the effects of the Cu layer thickness on photoelectrical properties of the multilayer films were investigated. The results revealed that the transparent-conductive property and near-infrared reflectance of the films are closely correlated with the Cu layer thickness, and among the three structures, AZO/Cu bi-layer films exhibited preferable photoelectrical properties. The AZO/Cu bi-layer film with a Cu layer thickness of 7 nm displayed the highest figure of merit of 4.82 × 10⁻³ Ω⁻¹, with a low sheet resistance of 21.7 Ω/sq and an acceptable visible transmittance of 80%. The near infrared reflectance above 50% can be simultaneously obtained. The good performance of the coatings indicates that they are promising for coated glasses, thin film solar cells and heat-reflectors.     

Design and Numerical Simulation of a Bandpass Filter Nano-film

A bandpass filtering nano-film based on high refractive index materials is designed in this paper, it shows high transmittance for red light and high reflectance for visible light. The structure of the nano-filtration membrane is simple, which is composed of three nano-films with the overall thickness no more than 100 nm. At normal incidence, the red light (620-760nm) transmittance of the filter film is above 0.6, and the reflectance is below 0.05. At oblique incidence from 0 to 45 degree, the red light transmittance of the filter film under both TM and TE wave mode are all above 0.5, which achieve the transmission of red light in a wide range of incident angles. The light transmittance of the nano-filtration membrane was calculated by transfer matrix method (TMM), it is verified by finite-difference frequency-domain (FDFD) method, and the field distribution of the typical wavelength in the film was calculated. The thickness variation of each layer effects the transmittance of light wave in nano-film was studied. The passband of this filter is easy to be modulated, the bandwidth and waveband of the transmitted light can be modulated as long as changing the thickness of the film, which can be applied to medical or scientific research fields that requires specific light waveband.     

Theoretical study of optical characteristics of multilayer coatings ZnO/CdS/CdTe using first-principles calculations

A new method for predicting optical characteristics of multilayer coatings based on calculated material properties is presented. This method combines the use of the full potential linear-augmented plane wave method (FP-LAPW) within the framework of the Density Functional Theory (DFT) and the optical matrix approach for modeling the multilayer assembly. The simulation process is applied to thin films of the II–VI semiconductors compounds. The optical constants of each thin film are determined by using the first principle calculations. Each layer is represented by the square Abeles matrix, including all necessary data in the calculation of the optical characteristics (as transmittance, reflectance and absorbance). The simulation of multilayer optical response includes the effect of thickness, light polarization and incident angle. The obtained results are helpful in the design of the multilayer systems with required properties.     

Optical diagnostics of nanoscale dielectric layers on interference films by polarization-dependent differential reflectivity

The small change in the reflectance (differential reflectance) of s- or p-polarized light from an interference film as a result of the deposition of a nanoscale insulating layer on it is investigated theoretically. Analytical relations describing the contribution of nanoscale layers to the reflectance from an interference film as function of film thickness are obtained in the long-wavelength approximation. It is shown that the utilization of interference films in reflection diagnostics through differential measurements allows a significant enhancement of the sensitivity of these techniques and also opens up new possibilities for resolving the inverse problem of determining simultaneously the optical constant and thickness of nanoscale dielectric layers.     

Influence of layer thickness on the structure and the magnetic properties of Co/Pd epitaxial multilayer films

Co/Pd epitaxial multilayer films were prepared on Pd(111)_fcc underlayers hetero-epitaxially grown on MgO(111)_B1 single-crystal substrates at room temperature by ultra-high vacuum RF magnetron sputtering. In-situ reflection high energy electron diffraction shows that the in-plane lattice spacing of Co on Pd layer gradually decreases with increasing the Co layer thickness, whereas that of Pd on Co layer remains unchanged during the Pd layer formation. The CoPd alloy phase formation is observed around the Co/Pd interface. The atomic mixing is enhanced for thinner Co and Pd layers in multilayer structure. With decreasing the Co and the Pd layer thicknesses and increasing the repetition number of Co/Pd multilayer film, stronger perpendicular magnetic anisotropy is observed. The relationships between the film structure and the magnetic properties are discussed.