Enhanced lithium-ion intercalation and conduction of transparent tantalum oxide films by lithium addition with an atmospheric pressure plasma jet

An investigation is conducted on enhancing lithium-ion intercalation and conduction performance of transparent organo tantalum oxide (TaO _y C _z ) films, by addition of lithium via a fast co-synthesis onto 40 Ω/□ flexible polyethylene terephthalate/indium tin oxide substrates at the short exposed durations of 33–34 s, using an atmospheric pressure plasma jet (APPJ) at various mixed concentrations of tantalum ethoxide [Ta(OC₂H₅)₅] and lithium tert-butoxide [(CH₃)₃COLi] precursors. Transparent organo-lithiated tantalum oxide (Li _x TaO _y C _z ) films expose noteworthy Li⁺ ion intercalation and conduction performance for 200 cycles of reversible Li⁺ ion intercalation and deintercalation in a 1 M LiClO₄-propylene carbonate electrolyte, by switching measurements with a potential sweep from ?1.25 to 1.25 V at a scan rate of 50 mV/s and a potential step at ?1.25 and 1.25 V, even after being bent 360° around a 2.5-cm diameter rod for 1000 cycles. The Li⁺ ionic diffusion coefficient and conductivity of 6.2?×?10^?10 cm²/s and 6.0?×?10^?11 S/cm for TaO _y C _z films are greatly progressed of up to 9.6?×?10^?10 cm²/s and 7.8?×?10^?9 S/cm for Li _x TaO _y C _z films by co-synthesis with an APPJ.     

Enhanced lithium ionic intercalation and conduction performance of flexible iron oxide films using an atmospheric pressure plasma jet

Journal of Solid State Electrochemistry - Enhancement on lithium ionic intercalation and conduction performance of flexible-organo-iron oxide (FeO y C z ) films, via a rapid co-synthesis with...     

Deposition of thin films and coatings by atmospheric pressure vapor plasma jet

An atmospheric pressure plasma jet generated by inductively coupled RF discharge and containing vapors of silicon compounds in argon-carrier gas was used to deposit a-Si∶H, a-Si∶(H, O), and a-SiC film. Rapid deposition up to 10 μm/min results from efficient material transport and is limited mainly by rates of surface reactions. Morphology, structure, and composition of deposits were studied.     

Nitriding of niobium and tantalum with a plasma jet under reduced pressure

The nitriding of niobium and tantalum with argon-nitrogen and argon-nitrogen-hydrogen plasma jets at pressures of 190 and 240 Torr was studied. The reaction kinetics obeyed a parabolic law. Cubic -NbN and cubic -TaN, which were stable phases at high temperature, were easily obtained at higher nitriding rates than those of thermal nitriding at the same temperature. Results obtained are discussed with plasma diagnostics such as emission spectroscopy and electrical double probe techniques.     

Lithium electrochromism of atmospheric pressure plasma jet-synthesized NiO x C y thin films

Reversible lithium intercalation and deintercalation behavior of atmospheric pressure plasma jet (APPJ)-synthesized organonickel oxide (NiO _x C _y ) thin films under various substrate distances is testified in an electrolyte (1?M LiClO₄–propylene carbonate solution) at low driving voltages from ?0.5 to 1.5?V. Fast responses of 2?s bleaching at ?0.5?V and 6?s coloration at +1.5?V are accomplished for the nano-porous NiO _x C _y thin films. This study reveals that a rapid synthesis of electrochromic NiO _x C _y thin films in a single process via APPJ by 21?s is investigated. This study presents a noteworthy electrochromic performance in a light modulation with up to 43% of transmittance variation and a coloration efficiency of 36.3?cm²/C at a wavelength of 830?nm after 200?cycles of cyclic voltammetry measurements.     

Lithium intercalation in thin amorphous-silicon films

Electrochemical intercalation of lithium in thin films of amorphous hydrogenated silicon (a-Si:H), deposited at temperatures of 100 and 250°C on stainless-steel substrates, is studied. It is shown that the discharge capacity of films of identical thicknesses manufactured at a temperature of 250°C is greater than that for films produced at of 100°C. Dependence of the discharge capacity of the films manufactured at 250°C on their thickness is examined. It is established that an increase in the film thickness leads to acceleration of the decrease in the discharge capacity in the course of cycling. At a current density of 0.175 mA cm^?2, the discharge capacity of films 0.25 and 1.35 μm thick equals nearly 2 Ah g^?1 in a third cycle, whereas in a hundredth cycle it amounts to 1.10 and 0.37 Ah g^?1, respectively. The diffusion coefficient for lithium in the films is equal to ～10^-13 cm²s^?1.     

Enhanced lithium electrochromic performance of tungsten oxide films by rapid co-synthesis of iron and tantalum oxides using cold atmospheric pressure plasma polymerization

Journal of Solid State Electrochemistry - Lithium electrochromic performance of organo-tungsten oxynitride (WOz1Cz2Nz3) films enhanced by additions of organo-iron oxynitride (FeOz1Cz2Nz3) or...     

Surface characterization of the SiOx films prepared by a remote atmospheric pressure plasma jet

The deposition rate and surface properties of SiO_x films were prepared and investigated using remote atmospheric pressure plasma (APP) jet. The APP, generated with low frequency power at 16 kHz, was fed with tetraethoxysilane (TEOS)/air gas mixture. After deposition, the SiO_x films were analyzed for chemical characteristics, elemental composition, surface morphology, and hardness. It was found that the deposition substrate temperature is the key factor to affect the deposition rate of remote APP chemical vapor deposition process. Fourier transform infrared (FTIR) spectra indicated that APP deposited SiO_x films are an inorganic feature. XPS examination revealed that the SiO_x films contained approximately 30% silicon, 58% oxygen and 12% carbon. Atomic forced microscopy (AFM) analysis results indicated a smooth surface of SiO_x films in deposition under higher substrate temperature. Also, pencil hardness tests indicated that the hardness of APP deposited SiO_x films was greatly improved with increasing substrate temperatures. Copyright © 2008 John Wiley & Sons, Ltd.     

Fast functionalization of multi-walled carbon nanotubes by an atmospheric pressure plasma jet

The afterglow of an atmospheric pressure plasma has been used for the fast oxidative functionalization of multi-walled carbon nanotubes (MWCNTs). Scanning electron microscopy and Raman spectroscopy demonstrate that the MWCNT morphology is mostly preserved when the MWCNTs are dispersed in a solvent and injected as a spray into the plasma. Contact angle measurements show that this approach enhances the wettability of MWCNTs and reduces their sedimentation in an aqueous dispersion. X-ray photoelectron spectroscopy, IR spectroscopy, and electrokinetic measurements show that oxygen plasma incorporates about 6.6 at.% of oxygen and creates mainly hydroxyl and carboxyl functional groups on the MWCNT surface. The typical effective treatment time is estimated to be in the range of milliseconds. The approach is ideally suited for combination with the industrial gas phase CVD synthesis of MWCNTs.     

Plasma conductivity as a probe for ambient air admixture in an atmospheric pressure plasma jet

By utilizing a fully floating double electrical probe system, the conductivity of a linear atmospheric pressure plasma jet, utilizing nitrogen as process gas, was measured. The floating probe makes it possible to measure currents in the nanoamp range, in an environment where capacitive coupling of the probes to the powered electrodes is on the order of several kilovolts. Using a chemical kinetic model, the production of reactive nitrogen oxide and hydrogen-containing species through admixture of ambient humid air is determined and compared to the measured gas conductivity. The chemical kinetic model predicts an enhanced diffusion coefficient for admixture of O₂ and H₂O from ambient air of 2.7 cm² s^?1, compared to a literature value of 0.21 cm² s^?1, which is attributed to rapid mixing between the plasma jets and the surrounding air. The dominant charge carriers contributing to the conductivity, aside from electrons, are NO⁺, NO₂ ^? and NO₃ ^?. Upon admixture of O₂ and H₂O, the dominant neutral products formed in the N₂ plasma jet are O, NO and N₂O, while O₂(¹Δ_g) singlet oxygen is the only dominant excited species.     

大气压等离子体射流重整CH4-CO2制合成气

采用大气压等离子体射流,以CH₄和CO^₂直接作为放电气体进行常压下重整制合成气的实验研究,考察了等离子体射流的放电特征及放电距离、放电功率、原料气配比和流量对反应的影响。结果表明,该等离子体具有放电稳定、均匀的特征。重整反应的主要产物为合成气,只有少量的H₂O和积炭生成。优化的反应条件为放电距离为9mm,CH₄和CO₂的摩尔比为4/6。当原料气流量为1000mL/min,放电功率为88.4W时,CH4和CO₂的最高转化率为分别为94.99%和87.23%。甲烷和二氧化碳的转化率随放电功率的增加而增加,随流量的增加而减少。     

大气压等离子体射流重整CH_4-CO_2制合成气

采用大气压等离子体射流,以CH4和CO2直接作为放电气体进行常压下重整制合成气的实验研究,考察了等离子体射流的放电特征及放电距离、放电功率、原料气配比和流量对反应的影响。结果表明,该等离子体具有放电稳定、均匀的特征。重整反应的主要产物为合成气,只有少量的H2O和积炭生成。优化的反应条件为放电距离为9 mm,CH4和CO2的摩尔比为4/6。当原料气流量为1 000 mL/min,放电功率为88.4 W时,CH4和CO2的最高转化率为分别为94.99%和87.23%。甲烷和二氧化碳的转化率随放电功率的增加而增加,随流量的增加而减少。     

Enhanced lithium electrochromism of atmospheric pressure plasma jet-synthesized tungsten/molybdenum oxide films for flexible electrochromic devices

Enhanced lithium electrochromic performances of mixed organo-tungsten oxide (W _x O _y C _z )/organo-molybdenum oxide (Mo _x O _y C _z ) films by a rapid codeposition onto 40 Ω/□ flexible polyethylene terephthalate/indium tin oxide substrates at a short exposed duration of 23 s using an atmospheric pressure plasma jet (APPJ) at various mixed concentrations of hexacarbonyl precursors [W(CO)₆ and Mo(CO)₆] are investigated. The flexible organo-tungsten–molybdenum oxide (WMo _x O _y C _z ) films demonstrated noteworthy electrochromic performance for 200 cycles of reversible Li⁺ ion intercalation and deintercalation in a 1 M LiClO₄–propylene carbonate electrolyte by the switching measurements of potential sweep from ?1 to 1 V at a scan rate of 50 mV/s and the potential step at ?1 and 1 V, even after being bent 360^o around a 2.5-cm diameter rod for 1,000 cycles. The optical modulation (ΔT) of 61.3 % for MoO _y C _z films at a wavelength of 795.6 nm was significantly improved up to 72.5 % for WMo _x O _y C _z films cosynthesized with an APPJ.     

Electronic current and breakdown characteristics of tantalum oxide films

Steady electronic current data through extremely thick films in contact with aqueous electrolytes have been obtained. The effects of field strength, temperature of the bath, composition, concentration and resistivity of the contacting electrolyte have been studied. The data show that the same relation between electronic current and field holds irrespective of the film thickness. The data also indicate a direct relation between electronic current and breakdown voltage. The effect of electrolyte concentration on breakdown voltage can be explained in terms of Ikonopisov's electron injecting avalanche model. The major factor contributing to a decrease of breakdown voltage with an increase in the concentration of the electrolyte has been found to be due to the increase in primary electronic current.     

Optical emission spectroscopy diagnostics of an atmospheric pressure direct current microplasma jet

This paper is about the use of optical emission spectroscopy as a diagnostic tool to determine the gas discharge parameters of a direct current (98% Ar–2% H₂) non-thermal microplasma jet, operated at atmospheric pressure. The electrical and optical behaviors were studied to characterize this glow discharge. The microplasma jet was investigated in the normal and abnormal glow regimes, for current ranging from 10 to 130 mA, at ~ 220 V of applied voltage for copper cathode. OH (A ²∑⁺, ν = 0 → X ²Π, ν′ = 0) rotational bands at 306.357 nm and also the 603.213 nm Ar I line, which is sensitive to van der Waals broadening, were used to determine the gas temperature, which ranges from 550 to 800 K. The electron number densities, ranging from 6.0 × 10¹⁴ to 1.4 × 10¹⁵ cm^? 3, were determined through a careful analysis of the main broadening mechanisms of the H_β line. From both 603.213 nm and 565.070 nm Ar I line broadenings, it was possible to obtain simultaneously electron number density and temperature (~ 8000 K). Excitation temperatures were also measured from two methods: from two Cu I lines and from Boltzmann-plot of 4p–4s and 5p–4s Ar I transitions. By employing H_α line, the hydrogen atoms' H temperature was estimated (~ 18,000 K) and found to be surprisingly hotter than the excitation temperature.     

Surface modification of PET films by atmospheric pressure plasma exposure with three reactive gas sources

The surface modification of poly (ethylene terephthalate) (PET) film was carried out using an atmospheric pressure plasma (APP) jet device with three reactive gases: air, N₂, and Ar. The water contact angles on the PET film were found to decrease considerably after the APP exposure. The changes in the advancing and receding contact angles of water on the APP-exposed PET film with aging time were examined by the wetting force measurements employing the Wilhelmy method. The hydrophobic recovery due to the rinsing with water as well as the aging in air was observed only for the advancing angle, which was probably caused by the dissolution of low molecular weight oxidized materials into water, the loss of volatile oxidized species to the atmosphere and the reorientation and the migration of polymer chains. The wettability and the surface free energy of the APP-exposed PET film after diminishing hydrophobic recovery was sufficiently large compared with the untreated film. X-ray photoelectron spectroscopy confirmed that the PET film surface was oxidized due to the APP exposure. When N₂ gas was used for the APP exposure, the surface nitrogen concentration was found to increase with decreasing D. The surface oxygen concentration on the APP-exposed PET film was reduced by rinsing with water, in accordance with the hydrophobic recovery behavior. From atomic force microscopy, surface topographical change due to the APP exposure was observed. The changes in the PET surface properties due to the APP exposure as mentioned above were remarkable for using N₂ gas.     

Lithium ion conduction in an organoborate zwitterion-LiTFSI mixture

An organoborate zwitterion-lithium salt mixture, prepared via selective borate formation of N-ethylimidazolium salt, exhibited ionic conductivity of 3.0 x 10(-5) S cm(-1) at 50 degrees C and a lithium transference number of 0.69.     

Nitriding of titanium with plasma jet under reduced pressure

The nitriding of titanium with argon-nitrogen (3%) and argon-nitrogen (3%)-hydrogen (2%) plasma jets at pressures of 190 torr was studied. The reaction kinetics obeyed mainly a parabolic law. The parabolic kinetic constants were 10^–10–10^–8 g² cm^–4 s^–1, which were 2–3 orders of magnitude larger than those in R.F. discharges. From emission spectroscopy, nitrogen atoms in the excited states were observed. The nitrogen atoms can promote the nitriding reaction. The effect of the addition of hydrogen to nitrogen is also briefly discussed.