ZnO 紫外探测器的研究

利用水热法生长的N型优质ZnO晶体材料蒸镀了Au、Ag、Al金属,制备出金属-半导体-金属型(MSM)ZnO紫外探测器,测试了五种接触类型的ZnO紫外探测器(Au-ZnO-Au、Ag-ZnO-Ag、Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al)在365nm紫外光光照前后的I-V特性曲线。实验表明Au-ZnO-Au 型、Ag-ZnO-Ag型的探测器的光电流是暗电流的100 万倍,因此,Au-ZnO-Au型、Ag-ZnO-Ag型的ZnO紫外探测器性能比Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al型的优越。ZnO材料的电阻率对ZnO紫外探测器的光电流有较大的影响。在相同偏压下,电阻率越大,探测器的光电流越小。ZnO ultraviolet(UV) detectors with Metal-Semiconductor-Metal(MSM) structure were fabricated by the vacuum evaporation of Au, Ag, and Al on the n-type ZnO single crystal, which was grown with hydrothermal synthesis method. Five types of MSM ZnO detectors(Au-ZnO-Au, Ag-ZnO-Ag, Au-ZnO-Al, Ag-ZnO-Al,Al-ZnO-Al) were illuminated with 365 nm UV light respectively, and their corresponding I-V(Current-Voltage) characteristics were measured. The UV photocurrent values for Au-ZnO-Au and Ag-ZnO-Ag detectors were 1x106 times than their dark current values, and these facts imply that the Au-ZnO-Au and Ag-ZnO-Ag detectors were rather good UV detectors compared to Au-ZnO-Al, Ag-ZnO-Al, Al-ZnO-Al detectors. The photocurrent of the MSM ZnO detectors was also sensitive to the cubic resistance of the ZnO crystal. And it’s found that the higher resistance rate the ZnO crystal the smaller photocurrent value the detector under the same working voltage.     

Large area InAlAs/InGaAs metal semiconductor metal photodiode with very low dark current and its frequency response

An MBE grown InGaAs metal semiconductor metal (MSM) photodiode (PD) with an InAlAs barrier enhancement layer is reported that has very low dark current and high speed characteristics. The detector using Cr/Au Schottky metal fingers with 4m spacing on a large active area of 300×300m2 shows a low dark current of 38nA at 10V. This corresponds to a dark current density of 0.42pA/m2 and is, to our knowledge, the best dark current ever obtained from a large area InGaAs MSM PD. The device also shows a low capacitance of 0.8pF and a high 3dB bandwidth of 2.4GHz. By fitting the measured frequency response to a model consisting of both RC time and transit time limited responses, we show that the device has an RC time and a transit time limited 3dB bandwidth of 3.0 and 4.9GHz, respectively. This revised version was published online in June 2006 with corrections to the Cover Date.     

GaN基异质结缓冲层漏电分析

通过对GaN基异质结材料C-V特性中耗尽电容的比较,得出AlGaN/GaN异质结缓冲层漏电与成核层的关系.实验结果表明,基于蓝宝石衬底低温GaN成核层和SiC衬底高温AlN成核层的异质结材料比基于蓝宝石衬底低温AlN成核层异质结材料漏电小、背景载流子浓度低.深入分析发现,基于薄成核层的异质结材料在近衬底的GaN缓冲层中具有高浓度的n型GaN导电层,而基于厚成核层的异质结材料的GaN缓冲层则呈高阻特性.GaN缓冲层中的n型导电层是导致器件漏电主要因素之一,适当提高成核层的质量和厚度可有效降低GaN缓冲层的背景载流子浓度,提高GaN缓冲层的高阻特性,抑制缓冲层漏电. 关键词： AlGaN/GaN异质结 GaN缓冲层 漏电 成核层     

InGaAs-MSM光电探测器设计与仿真研究

对基于InGaAs材料体系的金属 半导体 金属（metal semiconductor metal,MSM）光电探测器进行设计,并对其暗电流、光电流、电容以及截止频率等性能参数进行仿真。通过添加InAlAs肖特基势垒增强层,将探测器的暗电流减小到了pA量级。仿真结果表明,探测器在光照下有明显的光响应,通过合理设计器件结构,探测器的工作频率可以达到1.5 THz。制备了探测器样品,并对其暗电流和光响应进行了测试,测试结果与仿真结果基本吻合。     

GaN基p-i-n和肖特基紫外探测器的响应光谱及暗电流特性

研究了p-i-n型和肖特基型Ga N基紫外探测器的响应光谱和暗电流特性。实验发现,随着p-Ga N层厚度的增加,p-i-n型紫外探测器的响应度下降,并且在短波处下降更加明显。肖特基探测器的响应度明显比pi-n结构高,主要是由于p-Ga N层吸收了大量的入射光所致。肖特基型紫外探测器的暗电流远远大于p-i-n型紫外探测器的暗电流,和模拟结果基本一致,主要是肖特基型探测器是多子器件,而p-i-n型探测器是少子器件。要制备响应度大、暗电流小的高性能Ga N紫外探测器,最好采用p-Ga N层较薄的p-i-n结构。     

高性能SOI基GePIN波导光电探测器的制备及特性研究

本文报道了在SOI衬底上外延高质量单晶Ge薄膜并制备高性能不同尺寸Ge PIN波导光电探测器.通过采用原子力显微镜、X射线衍射、拉曼散射光谱表征外延Ge薄膜的表面形貌、晶体质量以及应变参数,结果显示外延Ge薄膜中存在约0.2%左右的张应变,且表面平整,粗糙度为1.12 nm.此外,通过暗电流、光响应度以及3 dB带宽的测试来研究波导探测器的性能,结果表明尺寸为4μm×20μm波导探测器在-1 V的反向偏压下暗电流密度低至75 mA/cm~2,在1.55μm波长处的响应度为0.58 A/W,在-2 V的反向偏压下的3 dB带宽为5.5 GHz.     

Noise characteristics analysis of short wave infrared InGaAs focal plane arrays

The increasing application of InGaAs short wave infrared (SWIR) focal plane arrays (FPAs) in low light level imaging requires ultra-low noise FPAs. This paper presents the theoretical analysis of FPA noise, and point out that both dark current and detector capacitance strongly affect the FPA noise. The impact of dark current and detector capacitance on FPA noise is compared in different situations. In order to obtain low noise performance FPAs, the demand for reducing detector capacitance is higher especially when pixel pitch is smaller, integration time is shorter, and integration capacitance is larger. Several InGaAs FPAs were measured and analyzed, the experiments’ results could be well fitted to the calculated results. The study found that the major contributor of FPA noise is coupled noise with shorter integration time. The influence of detector capacitance on FPA noise is more significant than that of dark current. To investigate the effect of detector performance on FPA noise, two kinds of photodiodes with different concentration of the absorption layer were fabricated. The detectors’ performance and noise characteristics were measured and analyzed, the results are consistent with that of theoretical analysis.     

Study on a novel vertical enhancement-mode Ga2O3 MOSFET with FINFET structure

A novel enhanced mode(E-mode)Ga₂O₃ metal-oxide-semiconductor field-effect transistor(MOSFET)with vertical FINFET structure is proposed and the characteristics of that device are numerically investigated.It is found that the concentration of the source region and the width coupled with the height of the channel mainly effect the on-state characteristics.The metal material of the gate,the oxide material,the oxide thickness,and the epitaxial layer concentration strongly affect the threshold voltage and the output currents.Enabling an E-mode MOSFET device requires a large work function gate metal and an oxide with large dielectric constant.When the output current density of the device increases,the source concentration,the thickness of the epitaxial layer,and the total width of the device need to be expanded.The threshold voltage decreases with the increase of the width of the channel area under the same gate voltage.It is indicated that a set of optimal parameters of a practical vertical enhancement-mode Ga₂O₃ MOSFET requires the epitaxial layer concentration,the channel height of the device,the thickness of the source region,and the oxide thickness of the device should be less than 5×10¹⁶ cm^-3,less than 1.5μm,between 0.1μm-0.3μm and less than 0.08μm,respectively.     

Proton radiation effect on GaAs/AlGaAs core–shell ensemble nanowires photo-detector

We demonstrate that the GaAs/AlGaAs nanowires(NWs) ensemble is fabricated into photo-detectors. Current–voltage(I–V) characteristics are measured on Ga As/Al Ga As core–shell ensemble NW photo-detectors at room-temperature before and after 1-MeV proton irradiation with fluences from 1.0 × 10~(13) cm~(-2) to 5.0 × 10~(14) cm~(-2). The degradation of photocurrent suggests that the point defects induced by proton radiation could cause both carrier lifetime and carrier mobility to decrease synchronously. Comparing with a GaAs quantum well, the degradations of light and dark current for the irradiated NWs photo-detector indicate that NWs material is a preferable potential candidate for space applications.     

Alpha particle detector with planar double Schottky contacts directly fabricated on semi-insulating GaN:Fe template

Alpha particle radiation detectors with planar double Schottky contacts (DSC) are directly fabricated on 5-μm-thick epitaxial semi-insulating (SI) GaN:Fe film with resistivity higher than 1×10⁸Ω·cm. Under 10 V bias, the detector exhibits a low dark current of less than 5.0×10^-11 A at room-temperature, which increases at higher temperatures. Linear behavior in the semi-log reverse current-voltage plot suggests that Poole-Frenkel emission is the dominant carrier leakage mechanism at high bias. Distinct double-peak characteristics are observed in the energy spectrum of alpha particles regardless of bias voltage. The energy resolution of the SI-GaN based detector is determined to be ～ 8.6% at the deposited energy of 1.209 MeV with a charge collection efficiency of ～ 81.7%. At a higher temperature of 90 ℃, the measured full width at half maximum (FWHM) rises to 235 keV with no shift of energy peak position, which proves that the GaN detector has potential to work stably in high temperature environment. This study provides a possible route to fabricate the low cost GaN-based alpha particle detector with reasonable performance.     

PV型HgCdTe线阵探测器的光学串扰

针对MCT红外焦平面阵列器件普遍存在的光串扰问题进行研究,从器件内部结构上,建立了线阵器件理论计算模型,并基于载流子连续性方程,利用Comsol软件对光串扰的大小进行了数值定量计算,研究了不同探测器结构尺寸、温度和材料等参数对光串扰的影响;从器件外部结构上,利用几何光学,研究了外部光学结构对光串扰的影响。研究结果表明,器件内部的衬底外延层厚度与器件外部的真空层对光串扰的影响最大,为今后红外焦平面器件结构的改进提供了一定的理论指导。     

Determination of diffusion length of minority carriers in epitaxial layers by photocurrent spectroscopy

We have determined the minority carrier diffusion length in n-type and p-type GaAs epitaxial layers grown on GaAs substrates as well as on intentionally misoriented Si substrates by photocurrent spectroscopy. It is found that for heteroepitaxial GaAs-on-Si, the minority carrier diffusion length is limited by the amount of dislocation density irrespective of the doping level. The value of dislocation density obtained from diffusion length measurements agrees well with that obtained from the double-crystal x-ray diffraction measurements.     

The mechanism of photocurrent enhancement of ZnO ultraviolet photodetector by reduced graphene oxide

An ultraviolet (UV) photodetector based on ZnO-reduced graphene oxide (ZnO-rGO) composites have been successfully fabricated. A pure ZnO photodetector was also fabricated by similar method. In comparison with the pure ZnO UV photodetector, the ZnO-rGO photodetector exhibits a much larger photocurrent and a better light-to-dark-current-ratio. The mechanism of photocurrent enhancement was investigated using I-V characteristics, photoluminescence (PL) spectra, transmittance spectra and time-dependent photocurrent analysis. Results show that the photocurrent enhancement of the ultraviolet photodetector is due to the improvement of the carrier lifetime, because the carrier recombination of ZnO were reduced by rGO. It provides a potential way to fabricate high-response UV photodetectors.     

新型复合盖层延伸波长InGaAs红外探测器结构优化设计

设计并模拟计算了延伸波长至2.6 μm的复合盖层材料PIN结构In_0.82Ga_0.18As红外探测器,即PNN型盖层、PIN结构的In_0.82Ga_0.18As红外探测器。研究了不同厚度及载流子浓度的PNN盖层对探测器性能的影响。研究结果表明:在In_0.82Al_0.18As厚度为200 nm且载流子浓度为2E18、InAs_0.6P_0.4 厚度为50 nm且载流子浓度为2E17、In_0.82Ga_0.18As厚度为50 nm且载流子浓度为2E16时,探测器表现出最佳的性能。与传统PIN结构探测器相比,其相对光谱响应度仅降低10%,暗电流降低了1个数量级。计算分析了不同工作温度下的暗电流,结果显示:在120~250 K时,暗电流主要为缺陷隧穿电流;在250~300 K时,暗电流主要为带间隧穿电流;当温度大于300 K时,暗电流主要为产生-复合电流和扩散电流。     

Effect of electrically degenerated layer on the carrier transport property of ZnO epitaxial thin films

ZnO films were prepared on (1 1 1) YSZ and (0 0 0 1) sapphire by pulsed laser deposition method. Effect of lattice mismatch on the carrier transport properties of ZnO epitaxial thin films was investigated. The carrier mobility of the ZnO films on YSZ was larger than that of ZnO/sapphire due to smaller lattice mismatch when the thickness was below 150 nm. The effect of electrically degenerated layer on the carrier transport property increased with decreasing the film thickness of ZnO film. The carrier density and electron mobility of 20 nm-thick-ZnO film on either substrate were regardless of the temperature. We concluded that the dominant carrier scattering mechanism in ZnO ultra thin films is double Schottky barriers at the grain boundary and that their height depends on the carrier concentration.     

Metal-semiconductor-metal ultraviolet photodetector based on GaN

A metal-semiconductor-metal (MSM) ultraviolet photodetector has been fabricated using unintentionally doped n-GaN films grown on sapphire substrates. Its dark current, photocurrent under the illumination with λ = 360 nm light, responsivity, and the dependence of responsivity on bias voltage were measured at room temperature. The dark current of the photodetector is 1.03 Na under 5 V bias, and is 15.3 Na under 10 V bias. A maximum responsivity of 0.166 A/W has been achieved under the illumination with λ= 366 nm light and 15 V bias. It exhibits a typical sharp band-edge cutoff at the wavelength of 366 nm, and a high responsivity at the wavelength from 320 nm to 366 nm. Its responsivity under the illumination with λ= 360 nm light increases when the bias voltage increases.     

结构参数对GaN肖特基紫外探测器性能的影响及器件设计

研究了GaN肖特基结构(n^--GaN /n⁺-GaN)紫外探测器的结构参数对器件性能的影响机理。模拟计算结果表明:提高肖特基势垒高度和减小表面复合速率,不仅可以增加器件的量子效率,而且可以极大地减小器件的暗电流;适当地增加n^--GaN层厚度和载流子浓度可以提高器件的量子效率,但减小n^--GaN层的载流子浓度却有利于减小器件的暗电流。我们针对实际应用的需要,提出了一个优化器件结构参数的设计方案,特别是如果实际应用中对器件的量子效率和暗电流都有较高的要求,肖特基势垒高度应该≥0.8 eV,n^--GaN层的厚度≥200 nm,载流子浓度1×10¹⁷ cm^-3 左右,表面复合速率＜1×10⁷ cm/s。     

具有高阻抗本征SnO2过渡层的CdS/CdTe多晶薄膜太阳电池

采用超声喷雾热解法制备了具有高阻抗的本征SnO₂透明导电膜，将其运用在CdS层减薄了的CdS/CdTe多晶薄膜太阳电池中，对减薄后的CdS薄膜进行了XRD,AFM图谱分析，并对电池进行了光、暗I-V，光谱响应和C-V测试.结果表明，在高阻膜上沉积的减薄CdS薄膜(111)取向更明显，但易形成微孔.引入高阻层后，能消除CdS微孔形成的微小漏电通道，有效保护p-n结，改善了电池的并联电阻、填充因子和短波响应，使载流子浓度增加，暗饱和电流密度减小，从而电池性能得到改善，电池转换效率增加了14.4%. 关键词： CdTe电池 过渡层 效率     

Improved 4H-SiC UMOSFET with super-junction shield region

This article investigates an improved 4H-SiC trench gate metal-oxide-semiconductor field-effect transistor (MOSFET) (UMOSFET) fitted with a super-junction (SJ) shielded region. The modified structure is composed of two n-type conductive pillars, three p-type conductive pillars, an oxide trench under the gate, and a light n-type current spreading layer (NCSL) under the p-body. The n-type conductive pillars and the light n-type current spreading layer provide two paths to and promote the diffusion of a transverse current in the epitaxial layer, thus improving the specific on-resistance ($R_{\rm on,sp}$). There are three p-type pillars in the modified structure, with the p-type pillars on both sides playing the same role. The p-type conductive pillars relieve the electric field ($E$-field) in the corner of the trench bottom. Two-dimensional simulation (silvaco TCAD) indicates that $R_{\rm on,sp }$ of the modified structure, and breakdown voltage ($V_{\rm BR}$) are improved by 22.2% and 21.1% respectively, while the maximum figure of merit (${\rm FOM}=V^{2}_{\rm BR}/R_{\rm on,sp}$) is improved by 79.0%. Furthermore, the improved structure achieves a light smaller low gate-to-drain charge ($Q_{\rm gd}$) and when compared with the conventional UMOSFET (conventional-UMOS), it displays great advantages for reducing the switching energy loss. These advantages are due to the fact that the p-type conductive pillars and n-type conductive pillars configured under the gate provide a substantial charge balance, which also enables the charge carriers to be extracted quickly. In the end, under the condition of the same total charge quantity, the simulation comparison of gate charge and OFF-state characteristics between Gauss-doped structure and uniform-doped structure shows that Gauss-doped structure increases the $V_{\rm BR}$ of the device without degradation of dynamic performance.     

Roles of blocking layer and anode bias in processes of impurity-band transition and transport for GaAs-based blocked-impurity-band detectors

Recently, GaAs-based BIB detector has attracted a lot of attention in the area of THz photovoltaic detection due to potential application values in security check and drug inspection. However, the physical mechanisms involving in carrier transition and transport are still unclear due to the poor material quality and immature processing technique. In this paper, the dark current and THz response characteristics have thus been numerically studied for GaAs-based blocked-impurity-band (BIB) detectors. The key parameters and physical models are constructed by simultaneously considering carrier freeze-out and impurity-band broadening effects. Roles of blocking layer and anode bias in processes of impurity-band transition and transport are intensively investigated, and the results can be well explained by numerical models. It is demonstrated that the effective electric field for the detector is only located in the absorbing layer, and can determine to a large extent the magnitude of the dark current and THz response. While the blocking layer not only can suppress dark current but also can attenuate responsivity due to its electric-field modulation effect.