Voids in hydrogenated amorphous silicon materials

Effusion measurements of hydrogen and of implanted helium are used to characterize the presence of voids in hydrogenated amorphous silicon (a-Si:H) materials as a function of substrate temperature, hydrogen content, etc. For undoped plasma-grown a-Si:H, interconnected voids are found to prevail at hydrogen concentrations exceeding 15–20 at.%, while isolated voids which act as helium traps appear at hydrogen concentrations ≤ 15 at.%. The concentration of such isolated voids is estimated to some 10¹⁸/cm³ for device-grade undoped a-Si:H deposited at a substrate temperature near 200 °C. Higher values are found for, e.g., doped material, hot wire grown a-Si:H and hydrogen-implanted crystalline Si. The results do not support recent suggestions of predominant incorporation of hydrogen in a-Si:H in (crystalline silicon type) divacancies, since such models predict a concentration of voids (which act as helium traps) in the range of 10²¹/cm³ and a correlation between void and hydrogen concentrations which is not observed.     

Structural characterization of silicon nanocrystals from amorphous silicon oxide materials

Silicon nanocrystals have been produced by disproportionation reaction of bulk silicon monoxide at temperatures higher than 1073 K. More specific, samples annealed at 1123, 1173, 1223 and 1323 K as well as the starting material SiO have been examined. X-ray diffraction, high-resolution transmission electron microscopy and infrared spectroscopy have been employed in order to investigate the structure of the produced silicon nanocrystals. Photoluminescence measurements reveal a three band emission with maxima positioned at 1.33, 1.52 and 1.67 eV. The intensity of the photoluminescence emission increases with the annealing temperature exponentially. This fact can be directly correlated with the disproportionation reaction which results in bigger amounts of silicon nanocrystals by increasing the annealing temperature and is discussed here. Also a possible explanation is given for the origin of each emission band.     

Improvement of amorphous silicon n-i-p solar cells by incorporating double-layer hydrogenated nanocrystalline silicon structure

We develop a double-layer p-type hydrogenated nanocrystalline silicon (p-nc-Si:H) structure consisting of a low hydrogen diluted i/p buffer layer and a high hydrogen diluted p-layer to improve the hydrogenated amorphous silicon (a-Si:H) n-i-p solar cells. The electrical, optical and structural properties of p-nc-Si:H films with different hydrogen dilution ratio (R_H) are investigated. High conductivity, low activation energy and wide band gap are achieved for the thin films. Raman spectroscopy and high-resolution transmission electron microscopy (HRTEM) analyses indicate that the thin films contain nanocrystallites with grain size around 3-5 nm embedded in the amorphous silicon matrix. By inserting a p-nc-Si:H buffer layer at the i/p interface, the overall performance of the solar cell is improved significantly compared to the bufferless cell. The improvement is correlated with the reduction of the density of defect states at the i/p interface.     

Study of the oxygen role in the photoluminescence of erbium doped nanocrystalline silicon embedded in a silicon amorphous matrix

We have produced and studied erbium doped nanocrystalline silicon thin films with different oxygen and hydrogen content in order to evaluate the influence of the matrix on the Er³⁺ emission and on the 0.89 eV and 1.17 eV bands. Films were grown by reactive magnetron sputtering on glass substrates under several different conditions (RF power, Er content and gas mixture composition) in order to obtain different microstructures. The structural parameters and the chemical composition of the samples were obtained by X-ray in the grazing incidence geometry, Raman spectroscopy and Rutherford back scattering analysis. Using X-ray technique combined with Raman spectroscopy information on the crystalline fraction and the average crystallite size of Si nanocrystals was obtained. Dependence of the 0.89 eV and 1.17 eV peaks in Si heterogeneous matrixes on the films crystallinity and O/H ratio has been analyzed.     

Effect of P incorporation on aggregation of nanocrystallites in amorphous and nanocrystalline mixed-phase silicon thin films

We report the effects of P incorporation on the nanometer-scale structural and electrical properties of amorphous and nanocrystalline mixed-phase Si:H films. In the intrinsic and weakly P-doped (3 × 10¹⁸ at/cm³) films, the nanocrystallites aggregate to cone-shaped structures. Conductive atomic force microscopy images showed high current flows through the nanocrystalline cones and a distinct two-phase structure in the micrometer range. Adding PH₃ into the processing gas moved the amorphous/nanocrystalline transition to a higher hydrogen dilution ratio required for achieving a similar Raman crystallinity. In a heavily P-doped (2 × 10²¹ at/cm³) film, the nanocrystalline aggregation disappeared, where isolated grains of nanometer sizes were distributed throughout the amorphous matrix. The heavily doped mixed-phase film with 5–10% crystal volume fraction showed a dramatic increase in conductivity. We offer an explanation for the nanocrystalline cone formation based on atomic hydrogen enhanced surface diffusion model, and propose that the coverage of P-related radicals on the existing nanocrystalline surface during film growth and the P segregation in grain boundaries are responsible for preventing new nucleation on the surface of the existing nanocrystallites, resulting in nanocrystallites dispersed throughout the amorphous matrix.     

The effects of ZnO coating on the photoluminescence properties of porous silicon for the advanced optoelectronic devices

In the present work we investigate, the role of zinc oxide (ZnO) thin films passivating layer deposited by rf magnetron sputtering at room temperature on low (18%) and high (80%) porosity porous silicon (PS). The micro-Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM) analysis have been carried out to understand the effect of ZnO films coating on PS. A systematic investigation from Raman spectroscopy suggests the formation of a good quality ZnO wurtzite structure on PS. The photoluminescence (PL) measurements on PS and ZnO coated PS shows a red, blue and UV emission bands at around ～1.8, ～2.78 and ～3.2 eV. An enhancement of all PL emission bands have been achieved after ZnO films deposition on high porosity PS.     

Charge collection in amorphous silicon solar cells: Cell analysis and simulation of high-efficiency pin devices

The drift length L_drift = μτE within the i layer of a-Si:H solar cells is a crucial parameter for charge collection and efficiency. It is strongly reduced not only by light-induced reduction of μτ, but also by electric field deformation ΔE by charges near the p–i and i–n interfaces. Here, a simple model is presented to estimate contributions of free carriers, charges trapped in band tails and charged dangling bonds to ΔE. It is shown that the model reproduces correctly trends observed experimentally and by ASA simulations: charged dangling bonds contribute most to ΔE of meta-stable cells. Electrons trapped in the conduction band tail near the i–n interface lead to the strongest field deformation in the initial state, while positively charged dangling bonds near the p–i interface get more important with degradation under AM1.5g spectrum. The measurable parameter V_coll is proposed as an indirect parameter to estimate the electric field, and an experimental technique is presented that could enable the distinction of defects near the p–i and the i–n interfaces.     

Disorder and optical absorption in amorphous silicon and amorphous germanium

The role that disorder plays in shaping the functional form of the optical absorption spectra of both amorphous silicon and amorphous germanium is investigated. Disorder leads to a redistribution of states, which both reduces the empirical optical energy gap and broadens the optical absorption tail. The relationship between the optical gap and the breadth of the absorption tail observed in amorphous semiconductors is thus explained.     

Luminescence decay in hydrogenated amorphous silicon and silicon nanostructures

The stretched exponential luminescence decay observed at temperatures lower than 20 K transits to the power law decay due to the electron-hopping at localized band tail states near 60 K in the hydrogenated amorphous silicon (a-Si:H). The luminescence decay at 4.2 K in a-Si:H is quite similar to that of Si-nanoparticles in the porous Si (p-Si). It is explained from the comparison with p-Si that the slow luminescence of the life time of ~ 1 ms is due to the recombination of excitonic electron–hole pairs at the spin triplet state quantum-confined in the hydrogen-free Si nanostructure in a-Si:H. The fast luminescence of the life time of ~ 1 μs is due to the recombination of the pairs at the spin-singlet state and the life time is explained as due to the indirect optical transition.     

Photoluminescence of hydrogenated amorphous silicon

Photoluminescence has beeb proven to be a powerful technique in the characterization of a-Si:H. In particular, it has contributed to the elucidation of some aspects of the electronic structure. However, there is a set of controversial topics still under discussion including the idenntity of the luminescent transition and the origin of broadening of the emission spectrum. In this paper we study these problems and show that the specified width has its origin in both disorder and electron-phonon interaction.Luminescent decay at low temperature has been studied and lifetimes from 10^?8 to 10^?2 s have been confirmed.Photoconductivity and photoluminescence are shown to behave in a complementary way and activation energies for both processes are obtained. Also, the photoluminescence quenching and photoconductivity enhanced under an applied electric field have been measured an interpreted.     

Confocal spectromicroscopy of amorphous and nanocrystalline tungsten oxide films

A Raman confocal spectromicroscopic system was used to study in situ phase composition and surface morphology in amorphous and nanocrystalline tungsten oxide and tungstate thin films, prepared on silicon and glass substrates by dc magnetron co-sputtering technique. The possible use of these films for the phase-change optical recording was demonstrated using 442 nm He–Cd laser with a variable power of up to 50 mW. The formation of nanocrystalline tungsten trioxide or tungstate phases was observed under the laser irradiation. These nanocrystalline phases show relatively strong Raman activity, which can be used for information reading purposes. A multilayer structure composed of several tungstate films with different chemical composition is proposed as potential write-once optical recording media.     

Growth chemistry of nanocrystalline silicon and germanium films

We report on the growth of nanocrystalline Si:H and Ge:H films. The films were grown using plasma deposition and hot wire chemical growth techniques. Conditions such as pressure, temperature and hydrogen dilution were systematically varied. It is shown that excessive hydrogen dilution during growth leads to smaller grains in nanocrystalline Si and Ge. Films with very large grains (56 nm) could be obtained using hot wire growth techniques under appropriate conditions of growth. From the data, it is concluded that the natural growth direction for the films is 〈2 2 0〉, and that excessive bonded hydrogen leads to smaller grains.     

Trapping phenomena in intrinsic hydrogenated amorphous silicon like materials studied using current transient spectroscopies

Transient spectroscopies such as time analyzed transients spectroscopy (TATS) provide powerful means of comparing density of states in new forms of amorphous like materials. These spectroscopies were utilized to study hydrogenated amorphous silicon (a-Si:H) and hydrogenated polymorphous silicon (pm-Si:H) grown at different pressures using PECVD. The results reveal marked differences between the two materials. In case of a-Si:H, as expected characteristic emission from a broad density of states in the form of stretched exponentials is observed. The corresponding spectra for pm-Si:H, on the other hand are dominated by nearly exponential fast current decay processes with discrete energies between 0.25 eV and 0.36 eV. The spectra of pm-Si:H grown at different pressures show contributions from crystallite inclusions and the medium in varying degree.     

Crystalline and amorphous nanostructures in porous silicon

We report ab initio molecular dynamic simulations of several supercells of crystalline porous silicon, that are first relaxed and then analyzed by their radial distribution functions (RDF). The porosities vary from 10% to 80% of the total volume of the supercell. The interatomic distance is determined by the position of the first peak of the RDF. We manipulated a maximum of 500 atoms of silicon and a minimum of 32. The interatomic distance of the model with a porosity of 10% was 2.35 Å, for those models with porosity from 11% to 50% was 2.45 Å and finally, 2.55 Å for those with a porosity greater than 50%. If the supercell backbone structure is small compared with the void of the supercell, then the interatomic distance between the silicon atoms run out of the crystalline value. Our results agree with experiment.     

Topological and topological-electronic correlations in amorphous silicon

In this paper, we study several structural models of amorphous silicon, and discuss structural and electronic features common to all. We note spatial correlations between short bonds, and similar correlations between long bonds. Such effects persist under a first principles relaxation of the system and at finite temperature. Next we explore the nature of the band tail states and find the states to possess a filamentary structure. We detail correlations between local geometry and the band tails.     

Network structure and dynamics of hydrogenated amorphous silicon

In this paper we discuss the application of current ab initio computer simulation techniques to hydrogenated amorphous silicon (a-Si:H). We begin by discussing thermal fluctuation in the number of coordination defects in the material, and its temperature dependence. We connect this to the ‘fluctuating bond-center detachment’ mechanism for liberating H bonded to Si atoms. Next, from extended thermal MD simulation, we illustrate various mechanisms of H motion. The dynamics of the lattice is then linked to the electrons, and we point out that the squared electron-lattice coupling (and the thermally-induced mean square variation in electron energy eigenvalues) is robustly proportional to the localization of the conjugate state, if localization is measured with inverse participation ratio. Finally we discuss the Staebler–Wronski effect using these methods, and argue that a sophisticated local heating picture (based upon reasonable calculations of the electron-lattice coupling and molecular dynamic simulation) explains significant aspects of the phenomenon.     

On the structure of amorphous germanium and silicon

The simple microcrystallite model is used to calculate the diffraction and radial distribution functions for a variety of tetrahedrally coordinated crystal structures: diamond, wurtzite, Ge III and Si III — two high-pressure polytypes of Ge and Si — and two clathrate structures based on pentagonal dodecahedral units. Comparison with data for sputtered amorphous Ge suggests that the simple microcrystallite model is inadequate to fit diffraction data. A statistical or combination microcrystallite model may be more promising. Recent electron microscopic investigations of Rudee and Howie are also discussed.