Electron diffraction on GaAs nanowhiskers grown on Si(100) and Si(111) substrates by molecular-beam epitaxy

The crystal structure of GaAs nanowhiskers grown by molecular-beam epitaxy on Si(111) and Si(100) substrates is investigated using reflection high-energy electron diffraction (RHEED). It is revealed that, in both cases, the electron diffraction images contain a combination (superposition) of systems of reflections characteristic of the hexagonal (wurtzite and/or 4H polytype) and cubic (sphalerite) phases of the GaAs compound. The growth on the Si(111) substrates leads to the formation of nanowhiskers with hexagonal (wurtzite and/or 4H polytype) and cubic (sphalerite) structures with one and two orientations, respectively. In the case of the Si(100) substrates, the grown array contains GaAs nanowhiskers that have a cubic structure with five different orientations and a hexagonal structure with eight orientations in the (110) planes of the substrate. The formation of the two-phase crystal structure in nanowhiskers is explained by the wurtzite—sphalerite phase transitions and/or twinning of crystallites.     

Photoluminescence of Si/Ge nanostructures grown by molecular-beam epitaxy at low temperatures

Multilayer Si/Ge nanostructures grown by molecular-beam epitaxy at low temperatures (250–300°C) of germanium deposition are studied using photoluminescence and atomic-force microscopy (AFM). It is assumed that, upon low-temperature epitaxy, the wetting layer is formed through the intergrowth of two-dimensional (2D) and three-dimensional (3D) nanoislands.     

Study of ultrathin iron silicide films grown by solid phase epitaxy on the Si(001) surface

Ultrathin films of iron silicide have been grown by high-temperature annealing of 0.14-to O.5O-nm-thick Fe films deposited on the Si(001) surface at room temperature. It has been found that annealing leads to the formation of nanoislands of iron silicide on the surface, so that their type depends on the thickness of the Fe film. High-energy electron diffraction and atomic force microscopy measurements have revealed that the deposition of Fe films less than 0.32 nm thick on the Si(001) surface stimulates epitaxial growth of both three-dimensional β-FeSi₂ and two-dimensional γ-FeSi₂ islands. It has been found that, for Fe coverages of more than 0.32 nm thick, a complete transition to solide phase epitaxy is observed only for two-dimensional β-FeSi₂ islands. The effect of prolonged annealing at 850°C on the morphology of the surface of the iron silicide film has been investigated.     

Mechanism of structural changes of Si(111) surfaces subjected to low-energy ion pulses during molecular-beam epitaxy

Reflected high-energy electron diffraction (RHEED) and detection of the intensity oscillations of the specular reflection have been used to investigate morphological changes in Si(111) associated with the two-dimensional layer-by-layer mechanism of silicon growth from a molecular beam under conditions of pulsed (0.25–1 s) bombardment with low-energy (80–150 eV) Kr ions in the interval of small total radiative fluxes (10¹¹–10¹² cm²²), for which the density of radiation-generated defects is small in comparison with the surface density of the atoms. After pulsed ion bombardment an increase in the intensity of the specular reflection is observed if the degree of filling of the monolayer satisfies 0.5<θ<1. No increase in the intensity occurs during the initial stages of filling of the monolayer. The maximum amplitude increment of the oscillations is reached at θ≈0.8. The magnitude of the amplitude increment of the RHEED oscillations increases with temperature up to 400°C and then falls. At temperatures above 500°C amplification of the reflection intensity essentially vanishes. Experiments on multiple ion bombardment of each growing layer showed that the magnitude of the amplitude increment of the oscillations decreased as a function of the number of deposited layers (the order of the RHEED oscillation). A mechanism for the observed phenomena is proposed, based on the concept of surface reconstruction by pulsed ion bombardment accompanied by formation of a (7×7) superstructure, which corresponds to a decrease of the activation energy of surface diffusion of the adatoms. Within the framework of the proposed mechanism the results of Monte Carlo modeling agree with the main experimental data. Zh. éksp. Teor. Fiz. 114, 2055–2064 (December 1998)     

High-temperature photoluminescence of CdHgTe solid solutions grown by molecular-beam epitaxy

The spectra of the high-temperature (up to 300 K) photoluminescence of the heteroepitaxial structures based on the CdHgTe solid solutions that are grown using molecular-beam epitaxy and emit at room temperature in the wavelength interval λ = 1.5–4.3 μm are analyzed. It is demonstrated that the observed photoluminescence of the CdHgTe narrow-gap semiconductor at high temperatures and the specific features of the high-temperature spectra can be interpreted using the disorder of the solid solution as in the case of the solid solutions of the group-III nitrides.     

Thermal stability of CdZnO thin films grown by molecular-beam epitaxy

CdZnO thin films with near-band-edge (NBE) photoluminescence (PL) emission from 2.39 eV to 2.74 eV were grown by plasma-assisted molecular-beam epitaxy on c-plane sapphire substrates with 800 °C in situ annealing. CdZnO thin films evolve from pure wurtzite (wz) structure, to mixture of wz and rock-salt (rs) structures confirmed by X-ray diffraction studies. Rapid-thermo-annealing (RTA) was performed on in situ annealed CdZnO samples. Pure wz CdZnO shows insignificant NBE PL peak shift after RTA, while mixture structure CdZnO shows evident blue shifts due to phase change after annealing, indicating the rs phase CdZnO changes to wz phase CdZnO during RTA process.     

Electronic properties of the single-domain Li/Si(001) surface

Received: 14 October 1996/Accepted: 17 December 1996     

Surfactant-mediated growth of Si1-xSnx layers by molecular-beam epitaxy

1-x Sn_x (0.01≤x≤0.04) layers on Si(001) and relaxed Si-Ge substrates. The Si_1-xSn_x layers were investigated using Rutherford backscattering spectrometry, atomic force microscopy, transmission electron microscopy and preferential-etching experiments. The investigation of surfactant-mediated growth of epitaxial Si_1-xSn_x was motivated by a possible use of relatively higher growth temperatures without relaxation by surface precipitation. It is demonstrated that higher growth temperatures are attainable when Bi is used as surfactant if the surface-segregated Sn layer is relatively small, equivalent to Si_1-xSn_x layers of low strain. The increase in growth temperature leads to a significant improvement in the crystalline quality of these Si_1-xSn_x layers. Received: 4 December 1998/Accepted: 9 December 1998     

Crystal lattice defects and Hall mobility of electrons in Si: Er/Si layers grown by sublimation molecular-beam epitaxy

The density of crystal lattice defects in Si: Er layers grown through sublimation molecular-beam epitaxy at temperatures ranging from 520 to 580°C is investigated by a metallographic method, and the Hall mobility of electrons in these layers is determined. It is found that the introduction of erbium at a concentration of up to ～5 × 10¹⁸ cm^?3 into silicon layers is not accompanied by an increase in the density of crystal lattice defects but leads to a considerable decrease in the electron mobility.     

Photoemission from valence bands of GaAs(001) grown by molecular beam epitaxy

Angle-resolved photoemission measurements for GaAs(001) prepared by MBE have been carried out using synchroton radiation. Observed bulk features in the spectra can be explained by a direct transition model using free-electron-like final states down to energies as low as 16 eV above the top of the valence bands. Spectral bulk valence band features can be distinguished from surface features by an appropriate choice of photon energies and polar angles. This is demonstrated using calculated valence bands.     

Structure and peculiarities of the (8 × n)-type Si(001) surface prepared in a molecular-beam epitaxy chamber: A scanning tunneling microscopy study

A clean Si(001) surface thermally purified in an ultrahigh vacuum molecular-beam epitaxy chamber has been investigated by means of scanning tunneling microscopy. The morphological peculiarities of the Si(001) surface have been explored in detail. The classification of the surface structure elements has been carried out, the dimensions of the elements have been measured, and the relative heights of the surface relief have been determined. A reconstruction of the Si(001) surface prepared in the molecular-beam epitaxy chamber has been found to be (8 × n). A model of the Si(001)-(8 × n) surface structure is proposed. The text was submitted by the authors in English.     

Structural phase transition on Si(001) and Ge(001) surfaces

Among a variety of solid surfaces, Si(001) and Ge(001) have been most extensively studied. Although they seem to be rather simple systems, there have been many conflicting arguments about the atomic structure on these surfaces. We first present experimental evidence indicating that the buckled dimer is the basic building block and that the structural phase transition between the low-temperature c(4x2) structure and the high-temperature (2x1) structure is of the order-disorder type. We then review recent theoretical work on this phase transition. The real system is mapped onto a model Ising-spin system and the interaction parameters are derived from total-energy calculations for different arrangements of buckled dimers. The calculated critical temperature agrees reasonably well with the experimental one. It is pointed out that the nature of the phase transition is crucially affected by a small amount of defects on the real surfaces.