Fabrication of diamond-like carbon thin films by femtosecond laser ablation of frozen acetone

Diamond-like carbon (DLC) thin films were fabricated by the ablation of frozen acetone with a 790 nm, 130 fs Ti:sapphire laser. Compared to a solid carbon target, frozen acetone could significantly reduce the number of fragments mixed into the films. The optical and mechanical properties of the fabricated DLC films were determined when the laser fluence was varied from 3 to 470 J/cm². With the increase in laser fluence, the films tinged with brown and the optical bandgap of the films decreased from 2.0 to 1.2 eV. Also, the refractive index and hardness of the films increased from 1.75 to 1.99 and from 10 to 16 GPa, respectively. The sp³ content was not changed even if the laser fluence was varied. The change in properties resulted from the hydrogen content of the films. PACS 81.05.Uw; 81.15.Fg     

Laser induced mixing in multilayered Ti/Ta thin film structures

The possibility of interlayer mixing in a Ti/Ta multilayer system, induced by laser irradiation, was the main purpose of these experiments. Ti/Ta multilayer system, consisting of ten alternating Ti and Ta thin films and covered by slightly thicker Ti layer, was deposited on Si (100) wafers to a total thickness of 205 nm. Laser irradiation was performed in air by picoseconds Nd:YAG laser pulses in defocused regime with fluences of 0.057 and 0.11 J cm^?2. Laser beam was scanned over the 5?×?5 mm surface area with different steps along y-axes. Structural and compositional characterisation was done by auger electron spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, and scanning electron microscopy. Laser processing at lower fluence caused only oxidation of the top Ti layer, despite of the number of applied laser pulses. Interlayer mixing was not observed. Application of laser pulses at fluence of 0.11 J cm^?2 caused partial and/or complete ablation of deposited layers. In partially ablated regions considerable mixing between Ti and Ta films was registered.     

Sr/Si界面沉积SrTiO3初始生长阶段的扫描遂道显微术研究

本文工作利用脉冲激光沉积术(PLD)和超高真空扫描隧道显微术(UHV-STM),研究了在Sr/Si(001)-(2×1)衬底表面上真空室温沉积几个单层SrTiO₃薄膜的初始生长过程.经660 ℃退火处理后,Sr/Si衬底表面上形成了纳米岛状结构.经分析,这些纳米小岛为C49-TiSi₂和 C54-TiSi₂.实验结果表明,在没有氧气的情况下退火,Sr/Si界面无法有效阻止SrTiO₃薄膜与Si衬底之间的相互作用. 关键词： 脉冲激光沉积术(PLD) 扫描隧道显微镜(STM) 3')" href="#">SrTiO₃ 2')" href="#">C54-TiSi₂     

Femtosecond pulsed laser ablation of 3CSiC thin film on silicon

A femtosecond pulsed Ti:sapphire laser (pulse width=120 fs, wavelength=800 nm, repetition rate=1 kHz) was employed to perform laser ablation of 1-m-thick silicon carbide (3CSiC) films grown on silicon substrates. The threshold fluence and ablation rate, useful for the micromachining of the 3CSiC films, were experimentally determined. The material removal mechanisms vary depending on the applied energy fluence. At high laser fluence, a thermally dominated process such as melting, boiling and vaporizing of single-crystal SiC occurs. At low laser fluence, the ablation is a defect-activation process via incubation, defect accumulation, formation of nanoparticles and final vaporization of boundaries. The defect-activation process reduces the ablation threshold fluence and enhances lateral and vertical precision as compared to the thermally dominated mechanism. Helium, as an assistant gas, plays a major role in improving the processing quality and ablation rate of SiC thin films due to its inertness and high first ionization energy. PACS 79.20.Ds; 42.62.Cf; 42.70.Qs; 61.72; 61.46     

Ablation mechanism study on metallic materials with a 10 ps laser under high fluence

Single shot ablation of metallic materials of aluminium, titanium alloy (Ti6Al4V) and gold has been studied with 10 picoseconds (ps) laser pulses experimentally and theoretically. The ablation rate variation at high fluence was explained by a simplified predictive model based on critical-point phase separation (CPPS) theory. A comparison between experimental and numerical results inferred that CPPS may well be the dominant ablation mechanism for high fluence laser ablation at 10 ps laser duration.     

TiCN thin films grown by reactive crossed beam pulsed laser deposition

In this work, we used a crossed plasma configuration where the ablation of two different targets in a reactive atmosphere was performed to prepare nanocrystalline thin films of ternary compounds. In order to assess this alternative deposition configuration, titanium carbonitride (TiCN) thin films were deposited. Two crossed plasmas were produced by simultaneously ablating titanium and graphite targets in an Ar/N₂ atmosphere. Films were deposited at room temperature onto Si (100) and AISI 4140 steel substrates whilst keeping the ablation conditions of the Ti target constant. By varying the laser fluence on the carbon target it was possible to study the effect of the carbon plasma on the characteristics of the deposited TiCN films. The structure and composition of the films were analyzed by X-ray Diffraction, Raman Spectroscopy and non-Rutherford Backscattering Spectroscopy. The hardness and elastic modulus of the films was also measured by nanoindentation. In general, the experimental results showed that the TiCN thin films were highly oriented in the (111) crystallographic direction with crystallite sizes as small as 6.0 nm. It was found that the hardness increased as the laser fluence was increased, reaching a maximum value of about 33 GPa and an elastic modulus of 244 GPa. With the proposed configuration, the carbon content could be easily varied from 42 to 5 at.% by changing the laser fluence on the carbon target.     

Fixation of bioactive calcium alkali phosphate on Ti6Al4V implant material with femtosecond laser pulses

Bone implants made of metal, often titanium or the titanium alloy Ti6Al4V, need to be surface treated to become bioactive. This enables the formation of a firm and durable connection of the prosthesis with the living bone. We present a new method to uniformly cover Ti6Al4V with a thin layer of ceramics that imitates bone material. These calcium alkali phosphates, called GB14 and Ca10, are applied to the metal by dip coating of metal plates into an aqueous slurry containing the fine ceramic powder. The dried samples are illuminated with the 790 nm radiation of a pulsed femtosecond laser. If the laser fluence is set to a value just below the ablation threshold of the ceramic (ca. 0.4 J/cm²) the 30 fs laser pulses penetrate the partly transparent ceramic layer of 20-40 μm thickness. The remaining laser fluence at the ceramic-metal interface is still high enough to generate a thin metal melt layer leading to the ceramic fixation on the metal. The laser processing step is only possible because Ti6Al4V has a lower ablation threshold (between 0.1 and 0.15 J/cm²) than the ceramic material. After laser treatment in a fluence range between 0.1 and 0.4 J/cm², only the particles in contact with the metal withstand a post-laser treatment (ultrasonic cleaning). The non-irradiated rest of the layer is washed off. In this work, we present results of a successful ceramic fixation extending over larger areas. This is fundamental for future applications of arbitrarily shaped implants.     

Radiation effects and pulsed laser deposition of titanium by Nd:Yag laser

A study of Ti laser irradiation and thin film deposition produced by an Nd:Yag pulsed laser is presented. The laser pulse, 9?ns width, has a power density of the order of 10¹⁰?W/cm². The titanium etching rate is of the order of 1?µg/pulse, it increases with the laser fluence and shows a threshold value at about 30?J/cm² laser fluence. The angular distribution of ejected atoms (neutrals and ions) is peaked along the normal of the target surface. At high fluence, the fractional ionization of the plasma produced by the laser is of the order of 10%. Time-of-flight measurements demonstrate that the titanium ions, at high laser fluence, may reach kinetic energies of about 1?keV. Obtained results can be employed to produce energetic titanium ions, to produce coverage of thin films of titanium and to realize high adherent titanium-substrate interfaces. The obtained results can be employed to produce energetic titanium ions, to produce a coverage of thin titanium films on polymers, and to realize highly adherent titanium–substrate interfaces.     

Effect of Laser Fluence on the Structural and Optical Properties of Tantalum Oxide Films Ablated by Pulsed Laser

The influence of laser fluence on the properties of thin films of tantalum oxide is studied in this paper, varying the laser fluence from 5.7 to 8.3 J/cm². Thin films of tantalum oxide were deposited on glass substrates using pulsed-laser ablation technique. X-ray diffraction studies confirm the amorphous/nanocrystalline nature of all the films irrespective of the laser fluence. The Tauc plot analysis suggests that tantalum oxide is an indirect band gap material, whose band gap decreases with increase in laser fluence. The refractive index of the films is found to decrease with increase in laser fluence but the extinction coefficient of the films increases with increase in laser fluence. Fourier transform infrared studies suggest the use of tantalum oxide thin films as oxygen sensors. Micro-Raman analysis reveals the sensitiveness of Ta-O-Ta and Ta-O vibration modes to laser fluence. Among all the films, the film deposited at a laser fluence of 7 J/cm² is found to be superior in quality.     

Pulsed laser deposition of semiconducting crystalline double-doped barium titanate thin films on nickel substrates

We synthesized by pulsed laser deposition (Ba,Sr,Y)TiO₃ and (Ba,Pb,Y)TiO₃ thin films on mechanically polished nickel substrates.The synthesized thin films were analyzed for: crystalline structure by X-ray diffractometry, morphology and surface topography by atomic force microscopy, optical and scanning electron microscopy, and elemental composition by energy dispersive X-ray spectroscopy and electrical properties by electrical measurements.We have shown that film properties were determined by the dopants, target composition, and deposition parameters (oxygen pressure, substrate temperature and incident laser fluence). All films exhibited a semiconducting behavior, as proved by the decrease of electrical resistance with heating temperature.     

Controlling crystal quality and orientation of pulsed-laser-deposited BaTiO3 thin films by the kinetic energy of the film-forming particles

The deposition of BaTiO₃ thin films by pulsed excimer laser radiation (248 nm) on Pt/Ti/Si(111) and Pt/Ti/Si(100) substrates is investigated as a function of the processing variables laser fluence, processing gas pressure, and target-to-substrate distance under conditions of temporal and spatial properties of the involved vapour and plasma states. The kinetic energy of the species in the laser-generated plasma, as measured by time-of-flight optical emission spectroscopy and time-of-flight quadrupole mass spectrometry, is described as a function of the pressure of the processing gas, the distance from the target, and the laser fluence. The influence of the kinetic energy of the film-forming particles on the crystalline structure, defects, and orientation, and on the resulting electrical properties of the films is investigated. X-ray diffraction measurements and polarisation-dependent micro-Raman measurements reveal a c-axis orientation normal to the substrate surface, in the case of high particle energy (>50 eV), whereas at low kinetic energies (<30 eV) a [111]_pc or [110]_pc orientation is preferred. The ferroelectricity and the dielectric constant of the films, determined by impedance measurements, decrease with increasing kinetic energy of the film-forming particles from )_r=1000-2200 to )_r=200-700. This decrease correlates with the change of the orientation and with an increasing lattice constant of the films, indicating that particles with high kinetic energies produce crystal defects and stress in the growing film.     

Research activities at the PALS research infrastructure

The Prague Asterix Laser System (PALS) Research Infrastructure (RI) in Prague, one of only four kJ-class laser facilities in EU, has been offering its beam time to European researchers for already 14 years, since 2004 in the framework of the LASERLAB-Europe consortium. Till June 2014, the PALS RI has provided 4313 experimental days for a total of 41 projects with 303 international users from 42 different research institutions. Its principal experimental facility is a terawatt sub-ns iodine laser (1315?nm) with an optional plasma-based zinc XUV laser (21.2?nm), and an auxiliary Ti:Sapphire fs laser (1?J, 70?fs) exploited for femtosecond plasma probing and experiments with synchronised femtosecond and sub-nanosecond laser pulses at mean laser intensities of up to 30?PW/cm². The lasers are equipped with several target facilities and rich sets of instruments for both active and passive plasma diagnostics. The PALS main research areas include development and applications of secondary laser sources of high-energy ions and both coherent and non-coherent high-intensity XUV radiation, laboratory astrophysical and inertial fusion-relevant studies. In this paper, the main results having been achieved at PALS in the framework of LASERLAB-EUROPE international access activities during the last four years are highlighted.     

The ALP-PALS project: optimal coupling for laser propulsion

Ablative laser propulsion (ALP) could revolutionize space travel by reducing the 30:1 propellant/payload ratio needed for near-earth orbit 50-fold. Experiments to date have demonstrated the necessary efficiency, coupling coefficient, and specific impulse for application, but were performed at pulse energies and spot sizes much smaller than required and at wavelengths not usable in the atmosphere. Prior experiments have also not simultaneously measured the properties of the ions produced or of the ablated surface, properties that would allow full understanding of the propulsion properties in terms of ion characteristics.

The first realistic measurements of laser propulsion parameters are proposed using PALS (Prague Asterix Laser System), the important parameters of which (pulse energy (～ 1 kJ), pulse length (400 ps), beam diameter (～ 29 cm), and flat beam profile) equal those required for application. The PALS wavelength is a little short (1.3 μ m vs.>1.5 μ m) but is closer than any other laser available and PALS’ 2ω/3ω capability should allow extrapolation to application values. The PALS’ proven infrastructure for measuring laser-driven ion properties means that only a ballistic pendulum for measuring momentum transfer will have to be added.     

Surface ablation by excimer laser irradiation of Ti and Ti6Al4V alloy

This paper presents the surface microstructure of Ti and Ti6Al4V alloy irradiated with a high output energy XeCl ( = 308 nm) excimer laser. The treatments are carried out on both materials at two beam fluences and the effects of single- and multiple-pulse irradiation are compared. The results of the scanning electron microscopy and of the X-ray diffraction techniques suggest the possible influence of both time-behaviour and energy fluence of the laser pulse on the relative weight of the ablation rate and of the reaction product deposition rate at the sample surface.     

Pulsed laser deposition of PbTe films on glass substrates

PbTe thin films were prepared by pulsed laser deposition from a Nd:YAG laser (532 nm). The films were deposited on glass substrates. The influence of deposition temperature (80-160 °C), fluence (5-13 J/cm²) and nominal composition of the target on the chemical composition of the films was studied. It was found that the tellurium content of the film is strongly dependent on both the laser fluence and the deposition temperature. Highly textured stoichiometric films can be obtained with suitable conditions.     

基于局域场加强的近场纳米加工技术

介绍了一种全新的基于飞秒激光局域场加强效应的纳米加工技术,通过使用了微焦级别脉宽为130 fs、波长800 nm的飞秒激光照射于原子力显微镜的探针针尖,利用其局域场加强效应在金薄膜表面加工出各种纳米图形。对加工参数对加工线宽的影响中,我们发现了随着加工能量的减小和加工速度的不断增大将导致加工线宽不断减小,最终达到了极限线宽(～10 nm)。这项技术可以广泛的应用与各种材料的加工中,尤其适合各种金属薄膜的加工,特别是结合了现有的自动化控制系统更是可以加工出任意复杂的二维纳米图形。     

质子辐照空间级硅橡胶的正电子淹没寿命谱研究

 用正电子淹没寿命谱方法（PALS）研究了质子辐照对空间级硅橡胶KH-L-Y微观结构的影响。试验结果表明，PALS谱所揭示的最长寿命成分的t₃, I₃及自由体积分数Vf随辐照剂量的增加开始明显下降；而当辐照剂量大于10¹⁵cm^-2后，随剂量的增加平缓上升。辐照剂量小于10¹⁵cm^-2时，质子辐照使硅橡胶自由体积减小，分子链间堆砌紧密；辐照剂量大于10¹⁵cm^-2时，质子辐照使硅橡胶自由体积增大。交联密度及DMA测试结果同样表明，质子辐照在剂量较小时硅橡胶的交联密度及玻璃化转变温度增加，辐照以交联效应为主；而剂量较大时辐照降解占优势。     

Ablation experiments on polyimide with femtosecond laser pulses

Some applications of polymer films require the microstructuring of partly uneven substrates. This cannot be achieved by conventional photolithography, usually performed with ultraviolet short-pulse lasers (excimer, fourth harmonic Nd:YAG). When processing thermally sensitive or undoped polymers with low optical absorption, the use of femtosecond laser pulses can improve the ablation precision, also reducing the heat-affected zone. Therefore, a Ti:sapphire laser system was employed to perform ablation experiments on polyimide (PI). The irradiated areas were evaluated by means of optical and scanning electron microscopy. Highly oriented ripple structures, which are related to the polarization state of the laser pulses, were observed in the cavities. The relationship between the ablation threshold fluence and the number of laser pulses applied to the same spot is described in accordance with an incubation model.     

Nickel-titanium alloy: Cytotoxicity evaluation on microorganism culture

High purity nickel (Ni) and titanium (Ti) targets have been used to form well-defined thin films of nitinol on Ti substrate by pulsed laser deposition (PLD) technique. Their chemical composition, crystalline structure and surface properties have been investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM).We have shown that by varying the deposition parameters such as laser fluence and number of laser pulses, we are able to control the film thickness as well as film's uniformity and roughness.Cytocompatibility tests have been performed through in vitro assays using microorganisms culture cells such as yeasts (Saccharomyces cerevisiae) and bacteria (Escherichia coli), in order to determine the thin film's toxic potential at the in vitro cellular level. Microorganism's adhesion on the nitinol surface was observed and the biofilm formation has been analyzed and quantified.Our results have shown no reactivity detected in cell culture exposed to NiTi films in comparison with the negative controls and a low adherence of the microorganisms on the nitinol surface that is an important factor for biofilm prevention. We can, therefore, conclude that NiTi is a good candidate material to be used for implants and medical devices.