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1.
离子束溅射自组装Ge/Si量子点生长的演变 总被引:2,自引:0,他引:2
采用离子束溅射技术,通过改变Ge的沉积量,在n型Si(100)衬底上自组装生长了一系列Ge量子点样品. 利用AFM和Raman光谱对样品表面形貌和结构进行表征,系统地研究了Ge量子点形貌、密度、尺寸大小以及Ge的结晶性和量子点中组分等随Ge沉积量的演变规律. 结果表明:Ge层从二维薄层向三维岛过渡过程中,没有观察到传统的由金字塔形向圆顶形量子点过渡,而是直接呈圆顶形生长;且随着Ge沉积量的增加,量子点密度先增大后减小,Ge的结晶性增强同时Ge/Si互混加剧,量子点中Si的组分增加.关键词:离子束溅射量子点表面形貌Raman光谱 相似文献
2.
采用离子束溅射技术制备了单层和双层Ge量子点, 通过原子力显微镜对比了不同Si隔离层厚度和不同掩埋量子点密度情况下表层量子点的尺寸和形貌差异, 系统研究了掩埋Ge量子点产生的应变对表层量子点的浸润层及形核的影响, 并用埋置应变模型对其进行解释. 实验结果表明, 覆盖Ge量子点的Si隔离层中分布着的应变场, 导致表层量子点浸润层厚度的降低, 从而增大点的体积; 应变强度随隔离层厚度的减小而增加, 造成表层量子点形状和尺寸的变化; 此外, 应变还调控了表层量子点的空间分布.关键词:Ge量子点埋层应变离子束溅射 相似文献
3.
用离子束溅射方法制备的钛薄膜表面形貌分析 总被引:7,自引:4,他引:7
用离子束溅工艺在K9玻璃基片上沉积Ti薄膜,并用原子力显微镜对其表面形貌进行测量,通过数值相关运算,发现在此工艺条件下薄膜生长界面为各向同性的自仿射分形表面,并用粗糙指数、横向相关长度和标准偏差粗糙度对薄膜样品表面进行定量描述。利用自仿射分形表面的相关函数对数值运算的结果进行拟合,得出Ti薄膜生长界面的粗糙度指数α=0.72,相应的分形维数Df=2.28,并由此得到在离子束溅射工艺下Ti薄膜屑于守恒生长的结论,其生长动力学过程可用Kuramoto—Sivashinsky方程来描述。 相似文献
4.
为了观测大气层中的水汽含量以及CH4和CO2的浓度,在蓝宝石(Al2O3)基片上制备了两种窄带通滤光片,其中心波长分别为1375 nm和1610 nm,带宽分别为15 nm和60 nm,透过率均达到了95%。基于法布里-珀罗腔结构设计了带通滤光膜系,并对其进行了优化。与电子束蒸镀薄膜相比,采用双离子束溅射沉积方法制备的Nb2O5/SiO2滤光片薄膜,其表面质量明显改善,缺陷减少,表面粗糙度均方根降低到1 nm以下,显著改善了与光电探测器光耦合时的不均匀性。 相似文献
5.
采用离子束溅射沉积的方法在Si衬底上生长Ge量子点,观察到量子点的生长随Ge原子层沉积厚度θ的增加经历了两个不同的阶段.当θ在6—10.5个单原子层(ML)范围内时,量子点的平均底宽和平均高度随θ增加同时增大,生长得到高宽比较小的圆顶形Ge量子点,伴随着量子点的生长,二维浸润层的厚度同时增大,量子点的分布密度缓慢增加;当θ在11.5一17 ML范围内时,获得高宽比较大的圆顶形Ge量子点,量子点以纵向生长为主导,二维浸润层的离解促进量子点的成核和长大,量子点的分布密度随θ的增加快速增大;量子点在θ由10.5 ML增加到11.5 ML时由一个生长阶段转变到另一个生长阶段,其分布密度同时发生6.4倍的增加.离子束溅射沉积Ge量子点的生长演变与在热平衡状态下生长的量子点不同,在量子点的不同生长阶段,其表面形貌和分布密度的变化特点是在热力学条件限制下表面原子动态演变的结果,θ的变化是引起系统自由能改变的主要因素.携带一定动能的溅射原子对生长表面的轰击促进表面原子的扩散迁移,同时压制量子点的成核,在浸润层中形成超应变状态,因而,改变体系的能量和表面原子的动力学行为,对量子点的生长起重要作用. 相似文献
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8.
用离子束技术探讨了Si表面纳米Ti薄膜制备的可行性以及Ti薄膜组织结构与离子束工艺之间的关系。实验进行试样表面预处理、轰击离子能量、离子密度、温度、沉积时间等离子束工艺参数对单晶Si(111)表面沉积的Ti薄膜结构的影响。采用原子力显微镜(AFM)和扫描电子显微镜(SEM)分析了Ti膜表面晶粒形貌,并用X射线衍射仪(XRD)和俄歇电子谱仪(AES)分析了Ti膜的结构和成分。由于残余气体的影响,Ti膜发生了不同程度的氧化,随温度升高和轰击离子强度增加氧化愈加明显。 相似文献
9.
离子束溅射沉积Ti-Ni薄膜及其电化学性能的研究 总被引:1,自引:0,他引:1
利用离子束溅射沉积的方法在不同基片温度条件下制备了不同成分的Ti-Ni贮氢薄膜,研究了其电化学贮氢性能。结果表明:用离子束溅射沉积制备的Ti-Ni薄膜的结构为非晶状,薄膜对基片的附着力较强,在冲放电循环50次后仍为非晶态;在基片温度为350℃时制备的薄膜的结构为晶态,在多次放电循环后呈现非晶化趋势;Ti-Ni薄膜具有较高的电化学活性,晶化薄膜比晶态薄膜的最大放电容量高,但晶化薄膜的循环稳定性差。 相似文献
10.
采用离子束溅射沉积法,在单晶Si基片上制备了不同厚度(1—100nm)的Co纳米薄膜.利用原子力显微镜、X射线光电子能谱(XPS)仪和X射线衍射仪对不同厚度的Co纳米薄膜进行了分析和研究.结果表明:当薄膜厚度为1—10nm时,沉积颗粒形态随薄膜厚度增加将由二维生长的细长胞状过渡到多个颗粒聚集成的球状.当膜厚大于10nm时,小颗粒球聚集成大颗粒球,颗粒球呈现三维生长状态.表面粗糙度随膜厚的增加呈现先增加后减小的趋势,在膜厚为3nm时出现极值.XPS全程宽扫描和窄扫描显示:薄膜表面的元素成分为Co,化学态分别关键词:离子束沉积纳米薄膜X射线光电子能谱X射线衍射 相似文献
11.
Hiroya Nakao 《Contemporary Physics》2016,57(2):188-214
Systems of dynamical elements exhibiting spontaneous rhythms are found in various fields of science and engineering, including physics, chemistry, biology, physiology, and mechanical and electrical engineering. Such dynamical elements are often modelled as nonlinear limit-cycle oscillators. In this article, we briefly review phase reduction theory, which is a simple and powerful method for analysing the synchronisation properties of limit-cycle oscillators exhibiting rhythmic dynamics. Through phase reduction theory, we can systematically simplify the nonlinear multi-dimensional differential equations describing a limit-cycle oscillator to a one-dimensional phase equation, which is much easier to analyse. Classical applications of this theory, i.e. the phase locking of an oscillator to a periodic external forcing and the mutual synchronisation of interacting oscillators, are explained. Further, more recent applications of this theory to the synchronisation of non-interacting oscillators induced by common noise and the dynamics of coupled oscillators on complex networks are discussed. We also comment on some recent advances in phase reduction theory for noise-driven oscillators and rhythmic spatiotemporal patterns. 相似文献
12.
Ethan Long Augustinas Galeckas Andrej Yu. Kuznetsov 《physica status solidi (a)》2012,209(10):1934-1939
In order to evaluate the role of Ge as a catalyst or inhibitor for the oxidation process in SiGe, oxidation rates for sub‐100‐nm films of SiGe are examined and compared to previous reports and established models for Si oxidation. Values for the Ge concentration in the pile‐up layer at the oxidation interface are considered as well as the more traditional approach of considering the Ge content in the as‐grown SiGe film. The experimental results presented here indicate that oxidation rates for SiGe closely match those of Si and provide evidence that the presence of Ge in very thin films of SiGe does not lead to enhanced or retarded oxidation rates as compared to Si. This comparative analysis is performed with a focus on oxidation of epitaxial thin films of Si1−xGex in dry O2 at 1 atm at 800, 850, 900, 950, and 1000 °C. 相似文献
13.
为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径70 mm的RB-SiC基片上沉积了厚约100 μm的Si改性涂层,对改性层进行超光滑加工,并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明,抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm;X射线衍射仪测试显示,制备Si改性涂层为多晶结构;使用拉力机做附着力测试,结果表明膜基附着力大于10.7 MPa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好,能够满足RB-SiC材料表面改性要求。 相似文献
14.
表面等离子激元非线性表面增强拉曼散射效应 总被引:1,自引:0,他引:1
本文采用热蒸发法制备得到纳米Ag颗粒作为增强拉曼衬底, 利用入射光子与纳米颗粒表面价电子的相互作用机理, 激发出高能表面等离子激元, 其表面等离子形成的高能\"热点\"起到表面增强拉曼散射效果. 通过比较不同入射光强下的拉曼峰强, 指出纳米Ag颗粒的增强拉曼散射效果可以实现低探测光强下的高散射强度, 即纳米Ag颗粒的表面等离子激元具有非线性的表面增强拉曼散射效果, 可降低对样品的光、热损伤, 以利于拓展拉曼散射光谱的应用范围. 同时比较不同纳米Ag颗粒衬底的表面增强拉曼散射效果表明, 采用的热蒸发工艺具有较大的工艺域度, 具有较强的工艺兼容性. 相似文献
15.
为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径70 mm的RB-SiC基片上沉积了厚约100 μm的Si改性涂层,对改性层进行超光滑加工,并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明,抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm;X射线衍射仪测试显示,制备Si改性涂层为多晶结构;使用拉力机做附着力测试,结果表明膜基附着力大于10.7 MPa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好,能够满足RB-SiC材料表面改性要求。 相似文献
16.
This letter shows that intrinsic hydrogenated amorphous silicon (a‐Si:H) films deposited by RF magnetron sputtering can provide outstanding passivation of crystalline silicon surfaces, similar to that achieved by plasma enhanced chemical vapour deposition (PECVD). By using a 2% hydrogen and 98% argon gas mixture as the plasma source, 1.5 Ω cm n‐type FZ silicon wafers coated with sputtered a‐Si:H films achieved an effective lifetime of 3.5 ms, comparable to the 3 ms achieved by PECVD (RF and microwave dual‐mode). This is despite the fact that Fourier transform infrared spectroscopy measurements show that sputtering and PECVD deposited films have very different chemical bonding configurations. We have found that film thickness and deposition temperature have a significant impact on the passivation results. Self‐annealing and hydrogen plasma treatment during deposition are likely driving forces for the observed changes in surface passivation. These experimental results open the way for the application of sputtered a‐Si:H to silicon heterojunction solar cells. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
17.
P. M. Ossi 《Il Nuovo Cimento D》1988,10(4):395-406
Summary A model for glass formation and crystal structure retainment in binary alloys undergoing irradiation by energetic ion beams
is presented. The major physical features provided by experimental conditions, namely spike formation and evolution of bombardment-induced
surface compositional variations, are taken into account. At spike-lattice interface interatomic interactions with charge
transfer occur, which induce formation of amorphization, or crystallization nuclei. Qualitative differences are found between
glass forming and crystalline systems.
To speed up publication, the author of this paper has agreed to not receive the proofs for correction. 相似文献
18.
M. Cini 《Il Nuovo Cimento D》1986,8(3):333-361
Summary The Knotek-Feibelman mechanism of desorption is analysed in the context of a microscopic dynamical theory that has been proposed
recently for closed-band systems. To understand the physical contents of the general equations, the probabilityP of ionic desorption is derived analytically in several selected model situations as a function of the characteristic desorption
timet
o. Although typicallyt
o is quite long compared to the inverse level widthW
B
−1, the results show very significant deviations from the limit of small velocities. This is due to the fact thatP is not primarly determined by the level width, but by the structures, like peaks and singularities, that are contained in
the two-hole continuum. Such features, that are completely missed in the traditional approach that represents the continuum
by a Lorentzian, are naturally enbodied in the present theory. They may originate from the position of the adatom energy level
ɛ relative to the substrate band and/or by hole-hole correlation. When split-off localized states arise,P may become comparable with unity even in the limit of small velocities, giving raise to the Knoteck-Feibelman reneutralization
bottleneck; however, this is not the case when the localized states are readsorbed by the continuum in the course of desorption.
An explicit example of this behaviour is given. On the other hand, when ions desorb from ionic crystals with a large Madelung
energy, the bond-breaking process may approach the sudden limit. A strongly nonadiabatic behaviour is then predicted, including
a correlation-induced enhancement ofP by several orders of magnitude, even in bandlike situations. This rapid variation leads to suggestions for a new experiment
that should enable us to see the effects of a fine tuning of the electronic parameters.
Riassunto Il meccanismo di Knotek e Feibelman di desorbimento è studiato nel contesto di una teoria quantistica dinamica che è stata recentemente proposta ed è applicabile al caso di sistemi con bande chiuse. Al fine di mettere in luce il contenuto fisico delle equazioni generali, si sono scelte alcune situazioni modello per le quali si è ottenuta analiticamente la dipendenza della probabilitàP di desorbimento ionico dal tempo caratteristico di desorbimentot o. Benchè tipicamentet o risulti molto piú lungo della larghezza inversaW B −1 del livello, i risultati dimostrano cheP può deviare in modo molto significativo dal limite di velocità basse. Infatti,P è determinato principalmente non dalla larghezza del livello, ma dalle strutture (picchi e singolarità) che sono contenute nel continuo. Questi aspetti sono ignorati completamente nell'approccio consueto, che rappresenta il continuo con una lorentziana, ma sono inclusi in questa teoria in modo naturale. Una possibile origine di strutture nel continuo è rappresentata da una posizione del livello eccentrica rispetto alla banda del substrato; un'altra, dalla correlazione buca-buca. Se ne risultano stati disereti isolati dal continuo,P può essere dell'ordine dell'unità anche nel limite di velocità basse, e questo è appunto il ≪collo di bottiglia≫ che impedisce la rineutralizzazione secondo Knotek e Feibelman; questo non avviene, però, se lo stato discreto è riassorbito dal continuo nel corso del desorbimento. Di tale fenomeno è fornito un esempio esplicito. D'altra parte, quando gli ioni desorbono da cristalli ionici con un'elevata energia di Madelung, il processo di rottura del legame può avvicinarsi al limite repentino. La teoria allora predice un comportamento fortemente non adiabatico, in cuiP è accresciuta di ordini di grandezza dagli effetti di correlazione, anche in situazioni in cui lo spettro è di tipo banda. Questa rapida variabilità diP porta a suggerimenti utili per verificare, con un nuovo esperimento, gli effetti di piccoli aggiustamenti dei parametri elettronici.相似文献
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20.
Summary The mechanism wherenism whereby heavy solids are sputtered by lowenergy light ions can be explained by a linear-transport
theory, by assuming only primary recoils as candidate for sputtering. It is shown that, from a theoretical point of view,
scaling properties of the sputtering yield can be introduced if the appropriate dimensionless energy variable is assumed.
In fact, the yield expression can be reduced to a formulation in which an energy function common to all the target-ion combinations
is multiplied by a constant factor different for each combination. This expression, free from any kind of fitting parameter,
gives a good approximation to the experimental data. Further developments are discussed in relation to the spreading of experimental
points which do not exibit strict scaling properties.
Riassunto Il meccanismo di erosione di solidi durante il bombardamento di ioni leggeri di bassa energia può essere spiegato nell'ambito della teoria del transporto assumendo che solo i rinculanti primari contribuiscono all'erosione. L'approccio teorico mostra che il coefficiente di erosione può esprimersi in termini di una funzione universale assumendo un'opportuna variabile energetica adimensionale. Infatti il coefficiente di erosione può essere ricondotto ad un' espressione in cui una funzione della sola energia, comune a tutte le combinazioni ione-bersaglio, è moltiplicata per una fattore costante differente per ogni combinazione. Questa espressione, priva di parametri aggiustabili, fornisco una buona approssimazione per i dati sperimentali. Ulteriori sviluppi sono discussi in relazione al fatto ai dati sperimentali non sono strettamente riconducibili ad una fuzione universale.相似文献