Theoretical Analysis of Super-Resolution Optical Disk Mastering Using a Photoreactive Dye Mask Layer

The super-resolution mastering of read-only optical disks using a photoreactive bleachable dye mask layer was theoretically analyzed. Equations have been derived which describe the photoreactions of the resist layer and mask layer. A numerical simulation based on these equations showed that the transmittance of the mask directly affects the quality of the formed pit shape. A high-quality pit shape is obtained by using a low transmittance mask.     

Theoretical Analysis of Photon-Mode Super-Resolution Optical Memory Using Saturable Absorption Dye

The possibility of a super-resolution optical memory using a saturable absorption dye mask layer is theoretically discussed. An equation which estimates the transmittance change of the mask layer has been derived. The numerical simulation shows that an efficient super-resolution is performed when the initial optical density of the mask layer is high.     

Low-Power Super-resolution Readout with Antimony Bismuth Alloy Film as Mask layer

Sb-Bi alloy flms are proposed as a new kind of super-resolution mask layer with low readout threshold power. Using the Sb-Bi alloy film as a mask layer and SiN as a protective layer in a read-only memory disc, the superresolution pits with diameters of 380 nm are read out by a dynamic setup, the laser wavelength is 780 nm and the numerical aperture of pickup lens is 0.45. The effects of the Sb-Bi thin film thickness, laser readout power and disc rotating velocity on the readout signal are investigated. The results show that the threshold laser power of super-resolution readout of the Sb-Bi mask layer is about 0.5 m W, and the corresponding carrier-to-noise ratio is about 20 dB at the film thickness of 50nm. The super-resolution mechanism of the Sb-Bi alloy mask layer is discussed based on its temperature dependence of reflection.     

Si掺杂Ag基超分辨薄膜读出性能研究

超分辨薄膜是一种能够实现突破光学衍射极限的功能薄膜,它在超分辨近场光存储技术中起到至关重要的作用。采用磁控溅射共溅的方式制备了Ag掺杂一定量Si的超分辨复合薄膜,测试了其作为掩膜层的超分辨光盘读出性能,并获得了最佳的薄膜制备条件,即当Ag溅射功率为55 W,Si为95 W,溅射时间为80s,薄膜厚度为39nm时,超分辨光盘的读出信号载噪比(CNR)最高为28dB。用X射线光电子能谱测量了上述薄膜的组成,用扫描电子显微镜观察了薄膜微区形貌,并用椭圆偏振光谱仪测量了薄膜的光学常数和厚度。超分辨复合薄膜的读出机理可以用Ag的散射型机理解释。光盘在持续读出10万次以后读出信号基本没有下降。     

Super-Resolution with a Photochromic Mask Layer in an Optical Memory

The possibility of a super-resolution optical memory using a photochromic mask layer was theoretically discussed. An equation which estimates the transmittance change of the mask layer was derived. The numerical simulation based on the equation showed that the reflectance increase of the layer by photo-irradiation is nonlinear when the optical density of the layer is high. The nonlinear response decreased the crosstalk in adjacent recording tracks and improved the MTF (modulation transfer function) characteristics, resulting in a higher recording density.     

Super-resolution readout property of bismuth-doped antimony-based thin film as a functional mask for read-only memory

Bismuth-doped antimony-based (Sb_100?x Bi _x , x=2.46) thin films were presented as a functional mask for super-resolution readout of read-only memory (ROM). The pit size of the ROM was 390?nm, and super-resolution readout was realized on a dynamic tester with laser wavelength of 780?nm and the numerical aperture of the focusing objective lens of 0.45. The carrier-to-noise ratio (CNR) of 22?dB, readout threshold power of 0.8?mW and super-resolution readout cycles of 2×10⁴ was achieved. The influence of film thickness and readout power on CNR was investigated. The reflectivity and transmittance of the film with different temperature at wavelength of 780?nm were detected, and the super-resolution mechanism of the bismuth-doped antimony-based thin films as the functional mask layer was discussed.     

A super-resolution Fresnel zone plate and photon sieve

Realizing a smaller or sharper diffractive center spot is a valuable research aim in soft X-ray focus and other related research applications. Fresnel zone plates (FZP) and photon sieves (PS) are often used to focus the X-rays or other wavelength light at present. Here, we show that combination of a super-resolution phase mask (SPM) and an FZP (or PS) as one diffractive optical element can realize a smaller or sharper diffractive center spot without significantly increasing the fabrication difficulty. All these diffractive phase elements can be applied to beam shaping, mask-less lithography, energy congregation in high power lasers, soft X-rays focus, and any other field that requires a smaller or sharper diffractive center spot.     

Read—out of a read—only super—resolution optical disc with a Si mask

A novel read-only super-resolution optical disc structure (substrate/mask layer/dielectric layer) is proposed in this paper. By using a Si thin film as the mask layer, the recording pits with a diameter 380nm and a depth 50nm are read out on the dynamic measuring equipment; the laser wavelength α is 632.8nm and the numerical aperture is 0.40. In the course of reproduction, the laser power is 5mW and the rotation velocity of the disc is 4m·s^-1. The optimum thickness of the Si thin film is 18nm and the signal-to-noise ratio is 32dB.     

Static recording characteristics of new type super-resolution near-field structure

A novel super-resolution near-field optical structure (super-RENS) with bismuth (Bi) mask layer is proposed in this paper. Static optical recording tests with and without super-RENS are carried out using a 650-nm semiconductor laser at recording powers of 14 and 7 mW with pulse duration of 100 ns. The recording marks are observed by high-resolution optical microscopy with a charge-coupled device (CCD)camera. The results show that the Bi mask layer can also concentrate energy into the center of a laser beam at low laser power similar to the traditional Sb mask layer. The results above are further confirmed by another Ar+ laser system. The third-order nonlinear response induced by the plasma oscillation at the Bi/SiN interface during laser irradiation can be used to explain the phenomenon. The calculation results are basically consistent with our experimental results.     

基于多层膜结构的亚波长光栅研究

利用表面等离子体共振效应理论及金属-介质复合膜的特殊纳米光学效应对平面多层膜超分辨光刻技术进行了研究. 在曝光光源为365 nm的情况下,实现周期230 nm,线宽100 nm的超分辨光刻成像. 讨论了均匀金属-介质多层膜的结构参数选择,并通过数值仿真得到有效的光强度和对比度, 然后用等离子体纳米光刻进行试验验证,通过最优化选择,最终得到了亚波长结构多层膜的大区域范围超分辨成像.     

超分辨近场结构光盘读出信号的计算模型

给出了超分辨近场结构光盘(Super RENS)读出信号的计算模型。以时域有限差分法为基础,结合高斯光束矢量模型和衍射方法,通过计算得到了物镜出瞳上的读出信号。计算结果表明,Super RENS具有超衍射极限的空间分辨能力,并且其读出信号的特征完全不同于传统光盘。     

聚合物阵列波导光栅的制作技术

研究了聚合物阵列波导光栅AWG制作的几个关键技术.首先,为了克服反应离子刻蚀过程中单独使用光刻胶作掩膜而导致的光波导形状和尺寸偏离设计的缺点,采用了光刻胶与金属掩膜相结合的双掩膜技术进行器件制作.详细介绍了双掩膜技术制备聚合物AWG的过程,并得出铝膜作为掩膜的最佳厚度为100nm左右.测试给出了使用和没有使用双掩膜的对比结果,该结果表明使用双掩膜技术制作的波导质量明显好于单独使用光刻胶作掩膜制作的结果.其次,采用蒸气回溶技术来减小反应离子刻蚀产生的波导表面和侧壁的起伏,从而降低了波导的散射损耗.结果表明,蒸气回溶技术使所制作的波导表面的均方根粗糙度从41.307nm降低到24.564nm.     

Readout of super-resolution marks with Ti thin film

Using Ti as the super-resolution reflective film to replace the Al reflective layer in conventional read-only optical disk, the recording marks with a diameter of 380 nm and a depth of 50 nm are read out in a dynamic testing device whose laser wavelength is 632.8 nm and numerical aperture of the lens is 0.40. The optimum Ti thin film thickness is 18 nm and the corresponding signal-noise-ratio is 32 dB.     

超分辨近场结构技术及其应用

超分辨近场结构(Super RENS)技术是在传统的超分辨光盘技术和近场光学的基础上发展起来的新技术。介绍了Super RENS技术的基本原理:利用掩膜层的非线性效应或表面等离子体增强效应,在近场区域可以记录、读出超过衍射极限的信号。综述了该技术在纳米光信息存储和光刻方面应用研究的最新进展,提出了存在的问题,展望了它的发展前景。     

线扫描虚拟结构调制共聚焦显微成像

共聚焦显微镜的分辨率受光学衍射极限限制.已经证明结构调制在共聚焦显微镜中可以实现超分辨成像,但是由于图像采集速度有限,导致该方法的实际应用具有局限性.为了提高系统的成像速度,本文介绍了一种将线扫描应用到结构调制共焦显微镜的方法.利用柱面透镜产生线照明,余弦数字掩模用于探测端的解扫描线斑图像调制,与虚拟结构探测方法不同之...     

Superresolution optical disk with a thermoreversible organic thin film

Recording and retrieving small marks far beyond the optical diffraction limit in a high-speed rotating phase-change optical disk have been investigated by use of a thermoreversible organic thin film as a superresolution mask layer. The organic thin film exhibited significant thermoreversibility and rapid response on laser irradiation. Recorded marks as small as 120 nm in length could be detected by a dynamic disk tester with a laser wavelength of 635 nm and a numerical aperture of 0.6.     

磁光盘可靠性及寿命评估方法研究

采用高温和湿热交变加速应力条件对磁光盘可靠性寿命进行研究。通过对磁光盘在加速应力条件下的动态性能分析，提出了以威布尔分布来处理磁光盘失效的理论模型，并得到了较好的拟合，对磁光盘的可靠性寿命进行了评估，得到了磁光盘的可靠性寿命以及威布尔寿命分布函数。     

Optical characterization of antimony-based bismuth-doped thin films with different annealing temperatures

Antimony-based bismuth-doped thin film,a new kind of super-resolution mask layer,is prepared by magnetron sputtering.The structures and optical constants of the thin films before and after annealing are examined in detail.The as-deposited film is mainly in an amorphous state.After annealing at 170-370℃,it is converted to the rhombohedral-type of structure.The extent of crystallization increased with the annealing temperature.When the thin film is annealed,its refractive index decreased in the most visible region,whereas the extinction coefficient and reflectivity are markedly increased.The results indicate that the optical parameters of the film strongly depend on its microstructure and the bonding of the atoms.     

多尺度融合超分辨率算法在无人机探测中的应用

基于光电传感器的低慢小无人机探测系统能够快速准确地发现并识别无人机目标,但远距离非合作无人机目标在图像中像素比重过小,特征退化较明显,使识别率大大降低。图像超分辨技术能够从低分辨率目标图像区域中获得高分辨率图像并恢复更多的细节特征,现有超分辨技术很难在保证推理速度的前提下兼容图像的高低频特征,因此为了满足探测系统的需求,基于FSRCNN（fast super-resolution convolutional neural network）的特征提取与非线性映射网络结构并结合多尺度融合,提出一种包含4分支的轻量级多尺度融合超分辨率网络,能够在超分辨率图形中兼容高低频图像信息,且参数量较低,实时性高。经实验结果表明,该算法能够更加快速高效地重建出高分辨率的无人机轮廓与细节;在YOLOV3检测效果的实验中,该算法能够使无人机检测置信度平均提升6.72%,具备较高的实际应用价值。     

一种新的超分辨记录点的读出技术

提出一种新的超分辨记录点的读出技术—超分辨反射膜技术，详细分析了其原理。用该技术，以Sb为超分辨反射膜，SiN为介电层，在激光波长为632．8nm和光学头的数值也径为0．40的读出光学系统中实现了直径为380nm的超分辨记录点的读出。同时研究了Sb薄膜厚度对读出信噪比的影响规律，发现最佳的Sb薄膜厚度为28～30nm，所得的信噪比为38～40dB。