H_2在Ni,Pd与Cu表面的解离吸附

用EAM方法(embeded-atommethod)研究H_2在Ni,Pd与Cu的(100),(110)与(111)面上的解离吸附.首先通过拟合单个H原子在Ni,Pd与Cu不同表面上的吸附能和吸附键长,得到H与这些金属表面相互作用的EAM势,然后计算H_2在这些表面上以不同方式进行解离吸附时的活化势垒E_a,吸附热q_(ad)与吸附键长R.并给出H_2在(110)面上解离吸附的势能曲线.计算结果表明H_2的解离吸附与衬底种类、衬底表面取向及解离方式有关.H_2在Ni表面上解离时活化势垒很低,而在Cu表面解 关键词：     

Ni(111)表面C原子吸附的密度泛函研究

基于密度泛函理论的第一性原理计算,对过渡金属Ni晶体与Ni (111)表面的结构和电子性质进行了研究, 并探讨了单个C原子在过渡金属Ni (111)表面的吸附以及两个C原子在Ni(111)表面的共吸附. 能带和态密度计算表明, Ni晶体及Ni (111)表面在费米面处均存在显著的电子自旋极化. 通过比较Ni (111)表面各位点的吸附能,发现单个C原子在该表面最稳定的吸附位置为第二层Ni原子上方所在的六角密排洞位, 吸附的第二个C原子与它形成碳二聚物时最稳定吸附位为第三层Ni原子上方所在的面心立方洞位. 电荷分析表明,共吸附时从每个C原子上各有1.566e电荷转移至相邻的Ni原子, 与单个C原子吸附时C与Ni原子间的电荷转移量(1.68e)相当. 计算发现两个C原子共吸附时在六角密排洞位和面心立方洞位的磁矩分别为0.059μ_B和 0.060μ_B,其值略大于单个C原子吸附时所具有的磁矩(0.017μ_B).     

Vibrational EELS studies of CO chemisorption on clean and carbided (111), (100) and (110) nickel surfaces

Room temperature adsorption of CO on bare and carbided (111), (100) and (110) nickel surfaces has been studied by vibrational electron energy loss spectroscopy (EELS) and thermal desorption. On the clean (100) and (110) surfaces two configurations of CO adsorbed species, namely “terminal” and bridge bonded CO, are observed simultaneously. On Ni(111), only two-fold sites are involved. The presence of superficial carbon lowers markedly the bond strength of CO on Ni(111)C and Ni(110)C surfaces, while no adsorption has been detected on the Ni(100)C surface. Moreover, on the carbided Ni(110)C surface, the adsorption mode for adsorbed CO is changed with respect to the clean surface; only “terminal” CO is then observed.     

The interplay between geometry,electronic structure,and reactivity of Cu-Ni bimetallic (111) surfaces

The mutual influence of surface geometry (e.g. lattice parameters, morphology) and electronic structure is discussed for Cu-Ni bimetallic (111) surfaces. It is found that on flat surfaces the electronic d-states of the adlayer experience very little influence from the substrate electronic structure which is due to their large separation in binding energies and the close match of Cu and Ni lattice constants. Using carbon monoxide and benzene as probe molecules, it is found that in most cases the reactivity of Cu or Ni adlayers is very similar to the corresponding (111) single crystal surfaces. Exceptions are the adsorption of CO on submonolayers of Cu on Ni(111) and the dissociation of benzene on Ni/Cu(111) which is very different from Ni(111). These differences are related to geometric factors influencing the adsorption on these surfaces. Received: 26 August 2002 / Accepted: 4 September 2002 / Published online: 5 February 2003 RID="*" ID="*"Corresponding author. Fax: +44-1223/76-2829, E-mail: gh10009@cam.ac.uk [+1pt] Present address: University of Cambridge, Lensfield Road, Department of Chemistry, Cambridge CB2 1EW, UK     

C_2H_x(x=4～6)在Ni(111)表面吸附的DFT研究

采用密度泛函理论与周期平板模型相结合的方法,对物种C_2H_x(x=4～6)在Ni(111)表面的top,fcc,hcp和bridge位的吸附模型进行了结构优化、能量计算,得到了各物种较有利的吸附位;并对最佳吸附位进行密立根电荷和总态密度分析.结果表明:C_2H_6和C_2H_4在Ni(111)表面的最稳定吸附位都是top位,吸附能分别是-36.41和-48.62 kJ·mol~(-1),物种与金属表面吸附较弱;而C_2H_5在Ni(111)表面的最稳定吸附位hcp的吸附能是-100.21 kJ·mol~(-1),物种与金属表面较强;三物种与金属表面之间都有电荷转移,属于化学吸附.     

First-principles study of Ar adsorptions on the （111） surfaces of Pd, Pt, Cu, and Rh

In the present paper we give a detailed report on the results of our first-principles investigations of Ar adsorptions at the four high symmetry sites on M （111） （M =Pd, Pt, Cu, and Rh） surfaces. Our studies indicate that the most stable adsorption sites of Ar on Pd （111） and Pt （111） surfaces are found to be the fcc-hollow sites. However, for Ar adsorptions on Cu （111） and Rh （111） surfaces, the most favorable site is the on-top site. The density of states （DOS） is analyzed for Ar adsorption on M （111） surfaces, and it is concluded that the adsorption behavior is dominated by the interaction between 3s, 3p orbits of Ar atoms and the d orbit of the base metal atoms.     

Ar adsorptions on Al (111) and Ir (111) surfaces: a first-principles study

We investigate the adsorptions of Ar on Al (111) and Ir (111) surfaces at the four high symmetry sites, i.e., top, bridge, fcc- and hcp-hollow sites at the coverage of 0.25 monolayer (ML) using the density functional theory within the generalized gradient approximation of Perdew, Burke and Ernzerhof functions. The geometric structures, the binding energies, the electronic properties of argon atoms adsorbed on Al (111) and Ir (111) surfaces, the difference in electron density between on the Al (111) surface and on the Ir (111) surface and the total density of states are calculated. Our studies indicate that the most stable adsorption site of Ar on the Al (111) surface is found to be the fcc-hollow site for the (2 × 2) structure. The corresponding binding energy of an argon atom at this site is 0.538 eV/Ar atom at a coverage of 0.25 ML. For the Ar adsorption on Ir (111) surface at the same coverage, the most favourable site is the hcp-hollow site, with a corresponding binding energy of 0.493 eV. The total density of states (TDOS) is analysed for Ar adsorption on Al (111) surface and it is concluded that the adsorption behaviour is dominated by the interaction between 3s, 3p orbits of Ar atom and the 3p orbit of the base Al metal and the formation of sp hybrid orbital. For Ar adsorption on Ir (111) surface, the conclusion is that the main interaction in the process of Ar adsorption on Ir (111) surface comes from the 3s and 3p orbits of argon atom and 5d orbit of Ir atom.     

NH_x(x=1～3)在金属Ir表面吸附与解离的第一性原理研究

采用密度泛函理论,在slab模型下,研究了NH_x(x=1~3)在Ir(100)、Ir(111)和Ir(110)表面上的最稳定吸附位置、几何构型以及逐步脱氢分解过程,计算了相应的吸附能和活化能.计算结果表明,在Ir(100)、Ir(111)面上,NH_3是以C_3轴垂直吸附在顶位,在Ir(110)上,NH_3是以N-Ir键与表面成68.6°吸附在顶位,且吸附能依赖于表面的结构而不同,相比而言,NH_3更容易吸附在开放表面Ir(100)、Ir(110)面上,说明NH_3在这些表面的吸附具有结构敏感性.NH_(x(x=1~3))的分解,在Ir(100),NH_3的吸附与分解存在竞争,在Ir(110)面NH_3最容易分解,在Ir(111)面NH_3是分子性吸附,不能分解.NH_2、NH在三个表面均能够分解,在Ir(110)面活化能均较高.     

Single atom self-diffusion on nickel surfaces

Results of a field ion microscope study of single atom self-diffusion on Ni(311), (331), (110), (111) and (100) planes are presented, including detailed information on the self-diffusion parameters on (311), (331), and (110) surfaces, and activation energies for diffusion on the (111), and (100) surfaces. Evidence is presented for the existence of two types of adsorption site and surface site geometry for single nickel atoms on the (111) surface. The presence of adsorbed hydrogen on the (110), (311), and (331) surfaces is shown to lower the onset temperature for self-diffusion on these planes.     

The adsorption of hydrogen on iron; A surface orbital modified occupancy — bond energy bond order calculation

A Surface Orbital Modified Occupancy — Bond Energy Bond Order (SOMO-BEBO) model calculation of hydrogen adsorption on iron is presented. This calculation represents a novel approach to the CFSO-BEBO method in that the calculation is correlated in a consistent way with the thermal desorption spectra of the hydrogen-iron system. Heats of molecular adsorption calculated are ?32.88, ?35.68 and ?49.57 kJ/mol for the iron (110), (100), and (111) surfaces, respectively. Heats of dissociative adsorption calculated are ?54.40, ?75.30 and ?87.90 kJ/mol for the three states on the iron (111) surface; ?51.21 and ? 73.62 kJ/mol for the two states on the iron (100) surface; and ?63.78 kJ/mol for the one state on the iron (110) surface. Activation energies for dissociative adsorption were found to be small or zero for the iron (111) surface while non-zero activation energies of 49.27 and 45.05 kJ/mol were calculated for the iron (100) and (110) surfaces, respectively. The FeH single-order bond energy has been calculated to be 298.2 kJ/mol. The radius of the hydrogen surface atom has been estimated to be 1.52 × 10^?10 m consistent with the expected size of an H^? ion. The elimination of certain surface sites for molecular adsorption as a result of the ferromagnetism of iron is suggested by the calculation. The reason for the absence of well defined LEED patterns for hydrogen adsorption on the iron (111) and (100) surfaces [Bozso et al., Appl. Surface Sci. 1 (1977) 103] is explained on the basis of the size of the H^? surface ion. The adsorption of hydrogen on the iron (110) surface is consistent with a relatively stable, small-sized H⁺₂ surface ion giving, therefore, a regular LEED pattern and a positive surface potential upon adsorption of hydrogen on this surface.     

CO adsorption studies on pure and Ni-covered Cu(111) surfaces

The adsorption of CO on pure and Ni-covered Cu(111) surfaces has been studied by means of LEED, TDS, UPS and work function measurements during adsorption and desorption. Different Ni-coverages between 0.1 and 2 monolayers were obtained by Ni-evaporation controlled by a quartz micro balance and by AES. Near room temperature Ni grows in a layer-by-layer mode on Cu(111). The island structure of the surfaces with submonolayer Ni-coverages is clearly demonstrated by TDS und LEED results obtained after CO adsorption. As with surfaces of bulk Cu-Ni alloys CO adsorption on Cu(111) with submonolayer Ni-coverage is dominated by a site effect. Cu-, Ni-, and mixed adsorption sites can be distinguished. The CO induced work function changes for Ni- and Cu-site adsorption show the same sign as observed with the pure metals. Mixed site adsorption has only a minor influence on the work function. A “ligand effect” observed only for the Ni-site adsorption, and only at small Ni-coverages is discussed in detail. Studies on the adsorption kinetics reveal that the Cu-sites may serve as precursor sites for Ni-site adsorption. Detailed UPS studies demonstrate that the CO-induced emission maxima observed on Cu surfaces with submonolayer Ni-coverages can be interpreted as a superposition of the respective adsorption features observed with the pure metals, roughly separated by their work function difference.     

Tailoring confining barriers for surface states by step decoration: CO /vicinal Cu(111)

The influence of CO adsorption on the Shockley type surface state on vicinal Cu(111) surfaces is investigated using angle resolved photoemission. As the steps are decorated with CO the surface state shifts to higher binding energies, which is opposite to the known behavior on flat Cu(111). This is described within a one-dimensional potential model in which clean steps represent repulsive barriers and decorated steps become attractive wells. From the coverage dependence the integrated CO well potential can be quantified. It is U(CO)a = -2.9 eV A on both Cu(332) and Cu(221) surfaces. Density functional calculations reveal that this attractive potential is due to the very local charge transfer from the Cu step atom to the adsorbed molecule.     

甲基和羟基在Ir(111)表面吸附的密度泛函理论研究

在超原胞近似和slab模型基础上,采用周期性密度泛函理论,在0.11覆盖度（ML）下,对甲基与羟基在Ir(111)表面的吸附进行了研究,得到了甲基和羟基在Ir(111)表面不同吸附位置的吸附能和吸附构型,计算了它们的振动频率,同时分析了甲基和羟基共吸附于Ir(111)表面的情况。结果表明,甲基和羟基在Ir(111)表面的最稳定吸附位置都是top位,甲基是碳端向下吸附,羟基是通过氧端向下倾斜吸附。通过频率分析发现吸附后CH3中C-H键的对称伸缩振动、反对称伸缩振动以及剪切振动频率均发生了红移,而羟基中的O-H键的振动频率发生蓝移现象。通过计算对比发现甲醇分解为甲基和羟基过程是一个放热反应,从热力学角度来说该反应是可行的。     

H在Ni表面的扩散性质及表面缺陷的影响-嵌入原子法(EAM)计算研究

本文用原子集团模型和嵌入原子方法,计算研究了H在Ni(100),(110)和(111)表面上的扩散特性,其扩散激活能分别是0.152eV;0.343eV和0.142eV。Ni(100)面上的吸附Ni原子和Ni原子空位,分别是在其表面上扩散的H原子的一种陷阱和位垒;Ni(100)面上的台阶,将使通过此台阶的H原子的扩散势垒增高,激活能增大,且引起扩散的各向异性。     

Study of chemisorption on copper low-index and stepped surfaces

Adsorption of CHCl₃, O₂, and hydrocarbons has been studied on Cu(111) and stepped surfaces using LEED, AES, and UPS at room temperature. We find that ordered Cl overlayers form upon Cu(111), Cu[3(111) × (100)], and Cu[5(111) × (100)] surfaces upon exposure to CHCl₃. Exposure to O₂ results in rearrangement of the Cu[5(111) × (100)] surface to hill-and-valley regions with large (111) areas, whereas Cu[2(111) × (100)] is stable for the same exposure. The photoemission spectra show new energy levels due to C1 above and below the Cu d band region and a small splitting of the halogen p orbitals. Effects consistent with interaction with the Cu d band are observed. Similar effects are observed with oxygen adsorption. The initial rate of Cl or O₂ chemisorption as measured by photoemission is proportional to the density of steps on these surfaces. Apparently, structural effects play an important role in chemisorption on metals (such as copper) with low density of states at the Fermi energy.     

BTA在铜表面吸附的密度泛函理论研究

本文基于密度泛函理论(DFT)的第一性原理研究了苯并三氮唑(BTA)分子吸附于铜表面的反应活性特征及其吸附在三种不同取向晶面时的电荷转移以及成键情况,结果表明：BTA分子的亲电和亲核活性中心为N(1)、N(2)和C(5),在铜表面垂直吸附时为化学吸附,Cu原子的最外层价电子转移到N(2)原子上,两者形成配位键;BTA分子在三种不同取向的铜表面吸附时的吸附能大小为：Cu(110)_x>Cu(100)_x>Cu(111)_x(x=T、B、H),T表示顶位,B表示桥位,H表示空位;BTA吸附在Cu(111)面的转移电荷量：T(顶位)>B(桥位)>H(空位).     

Chemisorption of carbon monoxide on copper-nickel alloy surfaces

The adsorption of CO on Cu-Ni alloy surfaces has been studied at 300 and 120 K using LEED, AES, TDS, and work function measurement. The alloys have been prepared as thin (111) epitaxial films evaporated on mica, and as poly crystalline foils. At 300 K the alloy surfaces show an adsorption behavior similar to that of pure Ni: the work function increases to a saturation value which is higher for Ni-rich surfaces than for Cu-rich. The isosteric heat of adsorption (106 kJ/mole) is nearly as high as with pure Ni. At 120 K the alloys exhibit a more Cu-like adsorption behavior: the work function passes through a minimum which becomes deeper at higher Cu surface concentration. The isosteric heat of adsorption at low temperatures (50 kJ/mole) is nearly as low as for pure Cu. From TDS it can be shown, that the binding energy of the highest (Ni-like) adsorption states increases with increasing Ni surface concentration. At the (111) alloy surfaces no LEED superstructures due to CO adsorption could be observed.     

Calculation of the surface energy of fcc metals with modified embedded-atom method

The surface energies for 38 surfaces of fcc metals Cu, Ag, Au, Ni, Pd, Pt, A1, Pb, Rh and Ir have been calculated by using the modified embedded-atom method. The results show that, for Cu, Ag, Ni, A1, Pb and Ir, the average values of the surface energies are very close to the polycrystalline experimental data. For all fcc metals, as predicted, the close-packed (111) surface has the lowest surface energy. The surface energies for the other surfaces increase linearly with increasing angle between the surfaces (hkl) and (111). This can be used to estimate the relative values of the surface energy.     

A combined XPS/AES study of Cu segregation to the high and low index surfaces of a Cu-Ni alloy

Quantitative information was obtained regarding the equilibrium segregation of Cu to the high index surfaces (cut 5° off the (100) plane in the [001] and [011] directions) and low index surfaces ((100), (111) and (110)) of a Cu: Ni, 5: 95% alloy crystal. Data regarding segregation to the (111) surface of a Cu: Ni, 50: 50% alloy crystal was also obtained. Equilibrium surfaces were obtained by careful annealing in the temperature range 850–920 K to avoid Cu loss by evaporation. The surface composition profile was calculated using data from the combination of the X-ray Photo-electron Spectroscopy and Auger Electron Spectroscopy techniques. Using these techniques, a wide range of electron kinetic energies and associated electron escape depths can be probed, yielding information about the topmost layer concentration and about the concentration profile into the bulk. Extensive Cu segregation was observed for the 5% and 50% Cu alloys. Topmost layer compositions of 85–100% Cu were found for both the high and low index surfaces of the 5% Cu alloy. In the next two or three atomic layers the composition was found to drop swiftly to near bulk Cu levels. For atomic layers deeper than this, some experimental evidence suggested a rise in Cu composition over three or four layers to 8–17% Cu before bulk levels were finally regained. For the 50% Cu alloy sample, a topmost layer composition was found of 95–100% Cu. Bulk levels of Cu were regained in about four atomic layers. These results are discussed in relation to other theoretical and experimental studies of segregation in these Cu-Ni alloys. The significance of the measured composition in relation to an equilibrium surface is also considered.     

Structural Stabilities of Ordered Nb4 Clusters on the Cu（111） and Cu（100） Surfaces

Based on first-principles calculations, we show that very high-density periodic arrays of Nb4 clusters with both the tetrahedron and quadrangle configurations can be stably absorbed on the Cu（111） and Cu（100） surfaces, with the quadrangle configurations more stable than the tetrahedron ones. The strong covalent bonding between atoms within the Nb4 clusters contributes to the stability of Nb4 adsorptions on the Cu surfaces. The energy barriers for the tetrahedron to the quadrangle-Nb4 on Cu（111） and （100） are around 1.21 eV and 0.94 eV/cluster, respectively. The stable adsorption of high-density Nb4 on these surfaces should have important applications.