PIN型和NIP型硅薄膜太阳电池中绒面陷光结构和陷光性能研究

对于硅薄膜太阳电池来说, 无论是PIN型还是NIP型太阳电池, 采用绒面陷光结构来提高入射光的有效利用率是提高太阳电池效率的重要方法之一.本文采用标度相干理论对PIN和NIP型电池的绒面结构的陷光性能进行了数值模拟. 结果表明: PIN电池中前电极和NIP电池中背电极衬底粗糙度分别为160和40 nm时可获得理想的陷光效果; 在不同粗糙度背电极衬底上制备a-SiGe:H电池发现, 使用40和61.5 nm 背电极可获得相当的短路电流密度, 理论分析和实验得到了一致的结果. 关键词： 陷光结构 光散射能力 标量相干理论 硅基薄膜太阳电池     

提高微晶硅薄膜太阳电池效率的研究

采用甚高频等离子体增强化学气相沉积技术制备了系列微晶硅薄膜太阳电池，指出了气体总流量和背反射电极的类型对电池性能参数的影响.电池的I-V测试结果表明：随反应气体总流量的增加，对应电池的短路电流密度、开路电压和填充因子都有很大程度的提高，结果使得电池的光电转换效率得以提高.另外，ZnO/Ag/Al背反射电极能明显提高电池的短路电流密度，进而也提高了电池的光电转换效率.对气体总流量和背反射电极类型影响电池效率的原因进行了分析. 关键词： 微晶硅薄膜太阳电池 气体流量 ZnO/Ag/Al背反射电极     

Study of detached back reflector designs for thin‐film silicon solar cells

We present a precise and flexible method to investigate the impact of diverse detached reflector designs on the optical response of p–i–n thin‐film silicon solar cells. In this study, the term detached reflectors refers to back reflectors that are separated from the silicon layers by an intermediate rear dielectric of several micrometers. Based on the utilization of a highly conductive n‐doped layer and a local electrical contact scheme, the method allows the use of non‐conductive rear dielectrics such as air or transparent liquids. With this approach, diverse combinations of back reflector and rear dielectric can be placed behind the same solar cell, providing a direct evaluation of their impact on the device performance. We demonstrate the positive effect of a rear dielectric of low refractive index on the light trapping and compare the performance of solar cells with an air/Ag and a standard ZnO/Ag back reflector design. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Very thin,highly‐conductive ZnO:Al front electrode on textured glass as substrate for thin‐film silicon solar cells

A very thin (250 nm), highly conductive (annealed), non‐texturized DC‐sputtered aluminum‐doped zinc oxide layer (ZnO:Al) deposited on a textured glass is used as substrate for thin‐film silicon solar cells. Compared to the classical approach, where wet‐chemically texturized ZnO:Al on planar glass is used, this approach allows a reduction in the as‐deposited ZnO:Al thickness of almost 70% while at the same time, thanks to the good light trapping capability of the glass texture the efficiency of the cells was maintained at the high level of 10.9%.

     

Optimized emitter contacting on multicrystalline silicon thin film solar cells

We present an optimized contacting scheme for multicrystalline silicon thin film solar cells on glass based on epitaxially crystallized emitters with a thin Al₂O₃ layer and a silver back reflector. In a first step a 6.5 µm thick amorphous silicon absorber layer is crystallized by a diode laser. In a second step a thin silicon emitter layer is epitaxially crystallized by an excimer laser. The emitter is covered by an Al₂O₃ layer with a thickness ranging from 1.0 nm to 2.5 nm, which passivates the surface and acts as a tunnel barrier. On top of the Al₂O₃ layer a 90–100 nm thick silver back reflector is deposited. The Al₂O₃ layer was found to have an optimal thickness of 1.5 nm resulting in solar cells with back reflector that achieve a maximum open‐circuit voltage of 567 mV, a short‐circuit current density of 27.9 mA/cm², and an efficiency of 10.9%. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

超薄高速率单结微晶硅薄膜电池及其叠层电池

采用甚高频等离子体增强化学气相沉积技术, 基于优化表面形貌及光电特性的溅射后腐蚀ZnO:Al衬底, 将通过调控工艺参数获得的器件质量级高速微晶硅(μupc-Si:H )材料(沉积速率达10.57 Å/s)应用到微晶硅单结电池中, 获得了初始效率达7.49%的高速率超薄微晶硅单结太阳电池(本征层厚度为1.1 μm). 并提出插入n型微晶硅和p型微晶硅的隧穿复合结, 实现了非晶硅顶电池和微晶硅底电池之间的低损电连接, 由此获得了初始效率高达12.03% (V_oc=1.48 eV, J_sc=11.67 mA/cm², FF=69.59%)的非晶硅/微晶硅超薄双结叠层电池(总厚度为1.48 μm), 为实现低成本生产太阳电池奠定了基础.     

前后光栅周期对于双光栅结构薄膜太阳能电池光俘获效应的影响

本文用时域有限差分法对硅层等效厚度为100 nm的具有不同前后光栅周期的介质/金属双光栅结构薄膜太阳能电池进行了模拟分析,比较了三角形最佳相同与不同周期光栅结构的吸收光谱特性,分析了光栅高度、填充比、硅吸收层厚度对最佳相同和不同周期光栅结构光吸收特性的影响,以及相应结构中导致光吸收增强的共振模式.结果表明前后光栅周期为1:1的共形双光栅结构中存在光泄漏现象,偏离1:1后的光栅结构可有效地抑制低级次衍射光的泄漏,前光栅周期小于后光栅周期的结构光吸收性能的提高来自于平面波导模式在吸收层中的有效激发和传播,而前光栅周期大于后光栅周期的结构光吸收性能的提高则来自于后光栅界面上所激发的等离子体极化模式.在较厚的硅吸收层厚度,前后光栅周期比为1:2和1:3的电池结构也会出现光泄漏现象,从而使具有最大光吸收效率的结构偏离这些周期比结构的位置.     

Research on the optimum hydrogenated silicon thin films for application in solar cells

Hydrogenated silicon (Si:H) thin films for application in solar cells were deposited by using very high frequency plasma enhanced chemical vapour deposition (VHF PECVD) at a substrate temperature of about 170℃. The electrical, structural, and optical properties of the films were investigated. The deposited films were then applied as i-layers for p-i-n single junction solar cells. The current--voltage (I-V) characteristics of the cells were measured before and after the light soaking. The results suggest that the films deposited near the transition region have an optimum properties for application in solar cells. The cell with an i-layer prepared near the transition region shows the best stable performance.     

Characteraction of Ag-doped ZnO thin film synthesized by sol–gel method and its using in thin film solar cells

Pure 2% and 4% Ag-doped ZnO thin films have been synthesized on glass substrates by sol–gel method. The structure, morphology and optical properties of the samples have been studied by X-ray diffractometer (XRD), scanning probe microscope, UV–vis spectrophotometer, respectively. The XRD result shows that the pure ZnO has a wurtzite hexagonal structure, no phase segregation is observed. The surface morphology of pure ZnO thin film shows that the grains are growing preferentially along the c-axis orientation perpendicular to the substrates. The transmittance spectra reveal that all samples have high transmittance above 90% in visible region. With Ag doping content increase, a red shift is observed. The performance of Ag-doped ZnO films using in thin film solar cells are simulated. The results show that 4% Ag-doped ZnO thin film can greatly improve the absorption of the cells. Compare to pure ZnO, solar cell's energy conversion efficiency improvement of 2.47% is obtained with 4% Ag doped ZnO thin film.     

Enhanced optical absorption by Ag nanoparticles in a thin film Si solar cell

Thin film solar cells have the potential to significantly reduce the cost of photovoltaics. Light trapping is crucial to such a thin film silicon solar cell because of a low absorption coefficient due to its indirect band gap. In this paper, we investigate the suitability of surface plasmon resonance Ag nanoparticles for enhancing optical absorption in the thin film solar cell. For evaluating the transmittance capability of Ag nanoparticles and the conventional antireflection film, an enhanced transmittance factor is introduced. We find that under the solar spectrum AM1.5, the transmittance of Ag nanoparticles with radius over 160 nm is equivalent to that of conventional textured antireflection film, and its effect is better than that of the planar antireflection film. The influence of the surrounding medium is also discussed.     

Improving light trapping and conversion efficiency of amorphous silicon solar cell by modified and randomly distributed ZnO nanorods

Three-dimensional （3D） nanostructures in thin film solar cells have attracted significant attention due to their appli- cations in enhancing light trapping. Enhanced light trapping can result in more effective absorption in solar cells, thus leading to higher short-circuit current density and conversion efficiency. We develop randomly distributed and modified ZnO nanorods, which are designed and fabricated by the following processes： the deposition of a ZnO seed layer on sub- strate with sputtering, the wet chemical etching of the seed layer to form isolated islands for nanorod growth, the chemical bath deposition of the ZnO nanorods, and the sputtering deposition of a thin Al-doped ZnO （ZnO：Al） layer to improve the ZnO/Si interface. Solar cells employing the modified ZnO nanorod substrate show a considerable increase in solar energy conversion efficiency.     

A glass thinning and texturing method for light incoupling in thin‐film polycrystalline silicon solar cells application

For polycrystalline silicon (poly‐Si) thin‐film solar cells on ～3 mm borosilicate glass, glass thinning reduces the glass absorption and light leaking to neighbouring cells; the glass texturing of the sun‐facing side suppresses reflection. In this Letter, a labour‐free wet etching method is developed to texture and thin the glass at the same time in contrast to conventionally separated labour‐intensive glass thinning and texturing processes. For 2 cm² size poly‐Si thin‐film solar cells on glass superstrate, this wet etching successfully thins down the glass from 3 mm to 0.5 mm to check the ultimate benefit of the process and introduces a large micron texture on the sun‐facing glass surface. The process enhances J_sc by 6.3% on average, with the optimal J_sc enhancement of 8%, better than the value of 4.6% found in the literature. This process also reduces the loss in external quantum efficiency (EQE loss), which is due to light leaking to neighbouring cells, dramatically. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

基于阳极氧化铝纳米光栅的薄膜硅太阳能电池双重陷光结构设计与仿真

本文提出了表面和底部均带有阳极氧化铝(AAO)纳米光栅的薄膜硅太阳能电池双重陷光结构,利用FDTD软件仿真研究了AAO纳米光栅的周期、厚度和占空比对薄膜硅太阳能电池短路电流密度的影响,并对AAO结构参数进行了优化.仿真结果表明,表面AAO最佳结构参数是周期440 nm,厚度75 nm,占空比0.5,底部AAO最佳结构参数是周期380 nm,厚度90 nm,占空比为0.75.双重AAO组合陷光结构可有效增加薄膜硅太阳能电池在280—1100 nm范围内的光吸收,吸收相对增强可以达到74.44%.     

微晶硅锗薄膜作为近红外光吸收层在硅基薄膜太阳电池中的应用

采用射频等离子体增强化学气相沉积技术,制备了具有一定晶化率不同Ge含量的氢化微晶硅锗(μcSi1-xGex:H)薄膜.通过Ⅹ射线荧光谱、拉曼光谱、X射线衍射谱、傅里叶红外谱、吸收系数谱和电导率的测试,表征了μc-Si_(1-x)Ge_x:H的材料微结构随Ge含量的演变.研究表明:提高Ge含量可以增强μc-Si_(1-x)Ge_x:H薄膜的吸收系数.将其应用到硅基薄膜太阳电池的本征层中可以有效提高电池的短路电流密度(J_(sc)).特别是在电池厚度较薄或陷光不充分的情况下,长波响应的提高会更为显著.应用ZnO衬底后,在Ge含量分别为9%和27%时,μc-Si_(1-x)Ge_x:H太阳电池的转换效率均超过了7%.最后,将μc-Si_(1-x)Ge_x:H太阳电池应用在双结叠层太阳电池的底电池中,发现μc-Si_(0.73)Ge_(0.27):H底电池在厚度为800 nm时即可得到比1700 nm厚微晶硅(μc-Si:H)底电池更高的长波响应.以上结果体现μc-Si_(1-x)Ge_x:H太阳电池作为高效近红外光吸收层,在硅基薄膜太阳电池中应用的前景.     

锥形二维光子晶体太阳电池数值模拟

采用时域有限差分方法,模拟研究在本征吸收层引入锥形二维光子晶体(2D PC)后,其结构参数变化对单结微晶硅电池各膜层吸收的影响规律.研究表明,2D PC的纵横比(高度与周期之比)对电池本征吸收具有决定性影响.周期小于1μm时,本征吸收随着纵横比的增大先上升后下降,纵横比为1时达到最大值;周期大于1μm时,本征吸收达到最大值的纵横比小于1,且周期越大,实现本征吸收最大化的纵横比越小.当周期为0.5μm,纵横比为1时,锥形2D PC电池的本征吸收达到峰值,短路电流密度为27.8 mA/cm2;与平面结构相比,短路电流密度提升5.8 mA/cm~2,相对增加27%.该研究突破了以往认为绒面陷光效果主要取决于绒面形貌横向特征尺寸的观点,对实验获取最佳的周期或随机绒面陷光结构具有指导意义.     

碲化镉薄膜太阳电池中的关键科学问题研究

文章对CdTe薄膜太阳电池中的4个关键科学问题进行了讨论,并对电池器件的性能进行了研究,其中包括高质量硫化镉薄膜、背接触层、CdS/CdTe界面和CdCl2热处理性能的研究。文章作者研究了背电极接触层中Cu掺杂含量对电池性能的影响,通过改变背接触层中Cu的含量,可以改变Cu与Te反应产生的物相成分,从而发现以Cu1.4Te为主导的背接触缓冲层能有效地减少电池I—V 曲线中的“翻转”(roll-over)现象,同时能有效地降低背接触势垒。此外,还研究了CdS/CdTe界面的CdCl2热处理反应,发现当热处理温度高于350℃时,CdS与CdTe之间的互扩散开始发生,此温度对应于CdS由立方相转变为六方相;而在550℃热处理后,S 和Te 互扩散形成的CdSxTe1-x 化合物,其x 值高达11%。通过优化电池制备工艺,获得了在AM1.5标准光源下高达14.6%的CdTe电池转换效率。     

高绒度掺硼氧化锌透明导电薄膜用作非晶硅太阳电池前电极的研究

将自行研制的具有优异陷光能力的掺硼氧化锌用作p-i-n型非晶硅太阳电池的前电极,并且将传统商业用U型掺氟二氧化锡作为对比电极.相比表面较为平滑的掺氟二氧化锡,掺硼氧化锌表面大类金字塔的绒面结构会在本征层生长过程中触发阴影效应,形成大量的高缺陷材料区和漏电沟道,进而恶化电池的开路电压和填充因子.在不修饰掺硼氧化锌表面形貌的情况下,通过调节非晶硅本征层的沉积温度来消弱高绒度表面形貌引起的这种不利影响,对应的电池开路电压和填充因子均出现提升.在仅有铝背电极的情况下,在本征层厚度为200 nm的情况下,以掺硼氧化锌为前电极的非晶硅太阳电池转换效率达7.34%(开路电压为0.9 V,填充因子为70.1%,短路电流密度11.7 mA/cm2).     

薄膜太阳电池用纳米上转换材料制备及其特性研究

以应用于薄膜太阳电池为目的,采用水热法制备了掺杂稀土离子的纳米氟化钇钠上转换荧光材料.研究了稀土离子Yb³⁺/Er³⁺单独和共同掺杂对材料的晶体结构和光学性质的影响.制备的Yb^3＋/Er^3＋共掺材料兼顾了两种稀土离子的光吸收谱,吸收980nm和1530nm附近的红外光,并发出能够被薄膜太阳电池有效吸收利用的红光(653nm)和绿光(520,540nm).优化出较为合适的18％Yb³⁺,2％Er³⁺的掺杂比例,获得了具有较好上转换效果的纳米荧光颗粒材料.     

Nanoimprint texturing of transparent flexible substrates for improved light management in thin‐film solar cells

We present a nanoimprint based approach to achieve efficient light management for solar cells on low temperature transparent polymer films. These films are particularly low‐priced, though sensitive to temperature, and therefore limiting the range of deposition temperatures of subsequent solar cell layers. By using nanoimprint technology, we successfully replicated optimized light trapping textures of etched high temperature ZnO:Al on a low temperature PET film without deterioration of optical properties of the substrate. The imprint‐textured PET substrates show excellent light scattering properties and lead to significantly improved incoupling and trapping of light in the solar cell, resulting in a current density of 12.9 mA/cm², similar to that on a glass substrate. An overall efficiency of 6.9% was achieved for a flexible thin‐film silicon solar cell on low cost PET substrate. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

外加磁场对磁控溅射制备氮化硅陷光薄膜的影响

在基底与靶材之间放置磁性强弱不同的永久磁铁来研究外加磁 场对磁控溅射制备氮化硅陷光薄膜的影响. 通过X射线衍射、原子力显微镜 (AFM) 以及紫外分光光度计分别测试了外加磁场前后所制备薄膜的组织结构、表面形貌和光学性能. 结果表明, 外加磁场后, 氮化硅薄膜依然呈现非晶结构; 但是表面形貌发生明显改变, 中心磁场1.50 T下, 薄膜表面为特殊锥状尖峰结构"类金字塔"的突起, 而且这些突起颗粒垂直于基底表面; 在 可见光及近红外范围内, 中心磁场1.50 T 下的薄膜样品平均透射率最大, 平均透射率达到90% 以上, 比未加磁场的样品提高了近1 倍, 具有很好的陷光特性. 关键词： 外加磁场 磁控溅射 氮化硅薄膜 陷光效应