Improvement in IBC-silicon solar cell performance by insertion of highly doped crystalline layer at heterojunction interfaces

By inserting a thin highly doped crystalline silicon layer between the base region and amorphous silicon layer in an interdigitated back-contact(IBC) silicon solar cell, a new passivation layer is investigated. The passivation layer performance is characterized by numerical simulations. Moreover, the dependence of the output parameters of the solar cell on the additional layer parameters(doping concentration and thickness) is studied. By optimizing the additional passivation layer in terms of doping concentration and thickness, the power conversion efficiency could be improved by a factor of2.5%, open circuit voltage is increased by 30 mV and the fill factor of the solar cell by 7.4%. The performance enhancement is achieved due to the decrease of recombination rate, a decrease in solar cell resistivity and improvement of field effect passivation at heterojunction interface. The above-mentioned results are compared with reported results of the same conventional interdigitated back-contact silicon solar cell structure. Furthermore, the effect of a-Si:H/c-Si interface defect density on IBC silicon solar cell parameters with a new passivation layer is studied. The additional passivation layer also reduces the sensitivity of output parameter of solar cell to interface defect density.     

Research status in thin-film crystalline Si solar cells

Recent research status and future subjects for the development of thin-film crystalline Si solar cells were reviewed. Optimum design of cell configuration and polycrystalline silicon growth by atmospheric pressure chemical vapor deposition (APCVD) were demonstrated. In order to configure high efficiency thin-film poly-Si solar cells, a novel method of quasi-three-dimensional simulation using a cylindrical coordinate system was carried out. Interface recombination velocity at grain boundaries should be less than 10³ cm/s based on the simulation results. Even at a relatively short diffusion length of L_n=50 μm, high efficiency larger than 16% will be expected at a thickness of 5–20 μm. Poly-Si films with columnar structures whose diameter was around 5 μm were successfully deposited on foreign substrates with APCVD at a high growth rate of 0.8 μm/min. Up-to-date status of reported cell performances were discussed in addition to future prospects.     

Reduction of the phosphorus contamination for plasma deposition of p-i-n microcrystalline silicon solar cells in a single chamber

This paper investigates several pretreatment techniques used to reduce the phosphorus contamination between solar cells. They include hydrogen plasma pretreatment, deposition of a p-type doped layer, i-a-Si:H or μc-Si:H covering layer between solar cells. Their effectiveness for the pretreatment is evaluated by means of phosphorus concentration in films, the dark conductivity of p-layer properties and cell performance.     

The p recombination layer in tunnel junctions for micromorph tandem solar cells

A new tunnel recombination junction is fabricated for n–i–p type micromorph tandem solar cells. We insert a thin heavily doped hydrogenated amorphous silicon (a-Si:H) p + recombination layer between the n a-Si:H and the p hydrogenated nanocrystalline silicon (nc-Si:H) layers to improve the performance of the n–i–p tandem solar cells. The effects of the boron doping gas ratio and the deposition time of the p-a-Si:H recombination layer on the tunnel recombination junctions have been investigated. The current-voltage characteristic of the tunnel recombination junction shows a nearly ohmic characteristic, and the resistance of the tunnel recombination junction can be as low as 1.5 ·cm 2 by using the optimized p-a-Si:H recombination layer. We obtain tandem solar cells with open circuit voltage V oc = 1.4 V, which is nearly the sum of the V oc s of the two corresponding single cells, indicating no V oc losses at the tunnel recombination junction.     

Contacting boron emitters on n‐type silicon solar cells with aluminium‐free silver screen‐printing pastes

In the production of n‐type Si solar cells, B diffusion is commonly applied to form the p⁺ emitter. Up to now, Ag screen‐printing pastes, generally used to contact P emitters, had been incapable of reliably contact B emitters. Therefore, a small amount of Al is generally added to Ag pastes to allow for reasonable contact resistances. The addition of Al, however, results in deep metal spikes growing into the Si surface that can penetrate the emitter. Losses in open‐circuit voltage are attributed to these deep metal spikes. In this investigation we demonstrate, that state‐of‐the‐art Al‐free Ag screen‐printing pastes are capable to contact BBr₃‐based B emitters covered with different dielectric layers and reach specific contact resistances <1 mΩ cm². Bifacial n‐type solar cells with Al‐free Ag pastes on both sides show efficiencies of up to 18.3% and series resistances <0.5 Ω cm². (© 2016 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Impact of nongeminate recombination on the performance of pristine and annealed P3HT:PCBM solar cells

Transient photovoltage (TPV) and voltage dependent charge extraction (CE) measurements were applied to poly(3‐hexyl‐thiophene) (P3HT):[6,6]‐phenyl‐C61 butyric acid methyl ester (PCBM) bulk heterojunction solar cells to analyze the limitations of solar cell performance in pristine and annealed devices. From the determined charge carrier decay rate under open circuit conditions and the voltage dependent charge carrier densities n (V), the nongeminate loss current j_loss of the device is accessible. We found that j_loss alone is sufficient to describe the j –V characteristics across the whole operational range, for annealed and, not yet shown before, also for the lower performing pristine solar cells. Even in a temperature range from 300 K to 200 K nongeminate recombination is found to be the dominant and, therefore, performance limiting loss process. Consequently, charge photogeneration is voltage independent in the voltage range studied. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Localization and characterization of annealing‐induced shunts in Ni‐plated monocrystalline silicon solar cells

The adhesion of Ni–Cu‐plated contacts requires annealing, which can lead to an electrical degradation of the solar cell. A combination of optical imaging methods and electron microscopical cross‐section analysis was used to investigate the annealing‐induced shunts on monocrystalline solar cells. The results show that Ni spikes cause the lowering of the pseudo fill factor and reveal that these nonlinear shunts show the same behavior as recombination active breakdown sites on multicrystalline silicon solar cells, including radiation of visible light while breakdown. Using reverse biased electroluminescence set‐up the shunts could be localized in top view with µm size lateral resolution. Subsequently, a cross‐section was prepared on a radiative breakdown spot. Advanced electron microscopic investigations reveal defect structures featuring nickel precipitates on the position of the light source. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Amorphous/crystalline silicon heterojunction solar cells with black silicon texture

Excellent passivation of black silicon surfaces by thin amorphous silicon layers deposited with plasma enhanced chemical vapor deposition is demonstrated. Minority charge carrier lifetimes of 1.3 milliseconds, enabling an implied open‐circuit voltage of 714 mV, were achieved. The influence of amorphous silicon parasitic epitaxial growth and thickness, as well as of the texture depth is investigated. Furthermore, quantum efficiency gains for wavelengths above 600 nm, as compared to random textured solar cells, are demonstrated in 17.2% efficient amorphous–crystalline silicon heterojunction solar cells with black silicon texture. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Improved control of the phosphorous surface concentration during in‐line diffusion of c‐Si solar cells by APCVD

Emitter formation for industrial crystalline silicon (c‐Si) solar cells is demonstrated by the deposition of phosphorous‐doped silicate glasses (PSG) on p‐type monocrystalline silicon wafers via in‐line atmospheric pressure chemical vapor deposition (APCVD) and subsequent thermal diffusion. Processed wafers with and without the PSG layers have been analysed by SIMS measurements to investigate the depth profiles of the resultant phosphorous emitters. Subsequently, complete solar cells were fabricated using the phosphorous emitters formed by doped silicate glasses to determine the impact of this high‐throughput doping method on cell performance. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

载流子复合及能量无序对聚合物太阳电池开路电压的影响

聚合物太阳电池中载流子的复合与能量无序对器件的开路电压有着深刻的影响.本文同时研究了基于传统富勒烯(PC71BM)和非富勒烯(O-IDTBR)电子受体的聚合物太阳电池.通过交流阻抗谱、低温电流密度-电压谱、瞬态光电压以及电致发光光谱等手段重点研究了载流子复合及能量无序对电池器件开路电压的影响.具体地,交流阻抗谱和瞬态光电压测试结果表明,富勒烯体系载流子复合损失较为严重.电致发光光谱研究显示,PC71BM器件的发光峰随着注入电流的增加不断向短波长处移动,而O-IDTBR体系发光峰位置基本不变,该结果证明PC71BM体系中能量无序度更高.载流子复合严重及能量无序度更高共同作用导致了富勒烯器件开路电压的降低.     

Role of a‐Si:H bulk in surface passivation of c‐Si wafers

The low thermal stability of hydrogenated amorphous silicon (a‐Si:H) thin films limits their widespread use for surface passivation of c‐Si wafers on the rear side of solar cells. We show that the thermal stability of a‐Si:H surface passivation is increased significantly by a hydrogen rich a‐Si:H bulk, which acts as a hydrogen reservoir for the a‐Si:H/c‐Si interface. Based on this mechanism, an excellent lifetime of 5.1 ms (at injection level of 10¹⁵ cm^–3) is achieved after annealing at 450 °C for 10 min. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Ion implantation into amorphous Si layers to form carrier‐selective contacts for Si solar cells

This paper reports our findings on the boron and phosphorus doping of very thin amorphous silicon layers by low energy ion implantation. These doped layers are implemented into a so‐called tunnel oxide passivated contact structure for Si solar cells. They act as carrier‐selective contacts and, thereby, lead to a significant reduction of the cell's recombination current. In this paper we address the influence of ion energy and ion dose in conjunction with the obligatory high‐temperature anneal needed for the realization of the passivation quality of the carrier‐selective contacts. The good results on the phosphorus‐doped (implied V_oc = 725 mV) and boron‐doped passivated contacts (iV_oc = 694 mV) open a promising route to a simplified interdigitated back contact (IBC) solar cell featuring passivated contacts. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Degradation of flexible thin-film solar cells due to a mechanical strain

Many variants of thin film technology are nowadays part of the photovoltaic market. The most popular are amorphous silicon, CIS (Copper Indium Selenide)/CIGS (Copper Indium Gallium Selenide)/CIGSS (Copper Indium Gallium Sulphur Selenide), and CdS/CdTe (Cadmium Sulphide/Cadmium-Telluride) cells. All mentioned types allow potentially for a flexible cell structure. Most emitter contacts are currently based on TCOs (Transparent Conductive Oxides), however, wider approach with alternative carbon nanoforms, silver nanolayers and polymer materials, called TCLs (Transparent Conductive Layers) are also in use. Authors decided to investigate influence of mechanical stresses on physical and electrical behaviour of these layers. Consequently, the aim of work is to determine the level and possible mechanisms of flexible a-Si cell parameters degradation due to a deterioration of transparent contact properties.     

On the mechanism of potential‐induced degradation in crystalline silicon solar cells

Multicrystalline standard p‐type silicon solar cells, which undergo a potential induced degradation, are investigated by different methods to reveal the cause of the degradation. Microscopic local ohmic shunts are detected by electron‐beam‐induced current measurements, which correlate with the sodium distribution in the nitride layer close to the Si surface imaged by time‐of‐flight secondary ion mass spectroscopy. The results are compatible with a model of the formation of a charge double layer on or in the nitride, which inverts the emitter. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

The role of stacking faults for the formation of shunts during potential‐induced degradation of crystalline Si solar cells

Mono‐ and multicrystalline solar cells have been stressed by potential‐induced degradation (PID). Cell pieces with PID‐shunts are imaged by SEM using the EBIC technique in plan view as well as after FIB cross‐section preparation. A linear shaped signature is found in plan‐view EBIC images at every potential‐induced shunt position on both mono‐ and multicrystalline solar cells. Cross‐sectional SEM and TEM images reveal stacking faults in a {111} plane. Combined TEM/EDX measurements show that the stacking faults are strongly decorated with sodium. Thus, the electric conductivity of stacking faults is assumed to arise under the influence of sodium ion movement through a high electric field across the SiN_x anti‐reflective layer, resulting in PID. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

A new approach to determine radiative recombination lifetime in quantum well solar cells

In this paper, the authors present and extend on an existing model, which has been developed to determine the radiative recombination lifetimes in quantum well solar cells. Given the fact that recombination reduces cell performance, the main future use of this new model is to aid in optimisation of cell designs and increase cell efficiency. In this work the authors introduce a coefficient defined as the delta factor which is based on material parameters into the existing model. The introduction of this factor into the existing model has shown an improvement in radiative recombination lifetime determination of approximately 11% when comparison is made with the previous model. This has lead to an overall average improvement in lifetime determination of approximately 9% when comparisons are made between the new model and experimental data. This is a significant improvement in lifetime determination, which will benefit cell designers.     

光管理在晶体硅电池中的应用

光管理是提高晶体硅太阳能电池光吸收和短路电流（Jsc）进而提高转换效率的重要因素之一。本文回顾了最常见的光管理方式,包括表面抗反射、散射以及陷光等。为了降低晶体硅电池的表面反射损失,开发了多种表面抗反射结构。例如,仿生蛾眼结构利用渐变折射率实现了宽光谱低反射率,其表面反射率可达1％以下。随着晶体硅电池衬底减薄,光管理要求更加严格,除了在更宽波长范围内达到超低反射率外,还需要在更高的入射角范围内实现低反射率。此外,利用前表面散射以及背表面陷光结构提高红外光的吸收光程对于晶体硅电池特别是薄衬底晶体硅电池的有效光吸收具有重要意义。     

Nongeminate recombination in organic bulk heterojunction solar cells: Contribution of exciton–polaron interaction

A new model to explain nongeminate recombination in organic bulk heterojunction solar cells is presented. We suggest that the annihilation of excitons on charge carriers at the interface between donor and acceptor phases competes with the bimolecular recombination of Coulombically bound electron–hole pairs. The exciton–polaron interaction gives visible contribution to the reduction of Langevin recombination. An analytical formula, which describes the reduction prefactor, has been derived. We demonstrate that exciton–charge carrier interactions cause an increase of the recombination order. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)