纳米GaN固体的制备与表征

本研究工作以氯化氨作矿化剂,在350～450℃、15～50MPa的条件下,用氨基钠作为氮的前体,和金属镓反应合成了氮化镓晶体.用X射线衍射、透射电子显微镜、激光拉曼光谱、红外光谱等方法对产物进行表征,结果显示得到的晶体为六方纤锌矿结构,平均粒径为16nm,晶格参数a=0.3215nm,c=0.5223nm.晶体的完整性好、产率高,并探讨了可能的反应机理.     

不同颜色AlN单晶缺陷研究

通过物理气相传输(PVT)法在石墨系统中制备了绿色、无色和琥珀色氮化铝(AlN)单晶,在金属系统中制备了琥珀色AlN单晶.晶体中杂质含量测试结果表明石墨系统中琥珀色的AlN晶体比绿色和无色AlN晶体C、Si杂质含量低1～2个数量级,金属系统中琥珀色AlN晶体杂质含量最低,C、Si、O元素含量均在1018 cm-3级别.AlN晶体的吸收图谱和光致发光图谱的分析结果表明,AlN晶体存在着位于4.7 eV、3.5 eV、2.8 eV、1.85 eV的4个吸收峰,其中4.7 eV和3.5 eV的吸收峰导致了AlN吸收截止边的红移,该吸收峰分别源于碳占氮位(CN)的点缺陷和VAl与O杂质的复合缺陷,2.80 eV的吸收峰导致了AlN晶体的琥珀色,该吸收峰是C元素和O元素共同导致的,1.85 eV的吸收峰导致了AlN晶体的绿色,该吸收峰是Si元素和C元素导致的.     

氯氧化铋晶体的制备及其表征研究

采用铋盐转化水解法制备了四方相氯氧化铋晶体,研究反应温度、水解反应用水量以及反应液滴加顺序对产物粒径、产率及表面形貌的影响.结果表明,最佳反应条件为Bi(NO3)3·5H2O与HCl摩尔比为1∶5,反应温度为25～30℃,反应液滴加顺序为A→B,用水量为35 mL.该条件下制备出片状氯氧化铋晶体颗粒粒径0.5～2 μm,产物分散性良好.利用马尔文激光粒径分析仪、X射线衍射仪(XRD)、热场发射扫描电子显微镜(SEM)对氯氧化铋的粒度分布、晶面结构和微观形貌分析可知,所制备的氯氧化铋粒径分布符合正态分布曲线,且纯度高无任何杂质,反应液滴加顺序对产物形貌影响较大.     

用于GaN薄膜生长的γ-LiAlO2晶体基片制备工艺研究

研究了铝酸锂晶体的化学机械抛光工艺.自制了SiO2悬浮液作为抛光剂,主要研究抛光过程中抛盘转速、抛光时间以及抛光压力等系列抛光工艺参数对抛光晶片表面质量的影响规律.通过优化抛光工艺参数获得了适宜制备氮化镓薄膜的铝酸锂晶体基片,最小的表面粗糙度为2.695 nm.结合氮化镓薄膜的制备条件,对抛光好的铝酸锂晶体基片采用退火的方法去除生长态晶体的热应力和机械应力.利用扫描电子显微镜研究了退火后晶片的表面质量,同时用激光共聚焦技术研究了晶体表面腐蚀坑的三维形貌.退火处理导致了铝酸锂晶体表面腐蚀坑的数目和深度增加.随着退火温度的升高和退火的保温时间的增加,铝酸锂晶体中锂元素挥发,晶体表面质量下降.但是适当的保温时间能够改善铝酸锂晶体的完整性,释放在晶体生长和试样制备过程中存在的热应力和机械应力,改善了晶体质量.     

声化学法制备FeVO4微晶及其光学性能

采用声化学法,以偏钒酸铵(NH4VO3)和九水硝酸铁(Fe(NO3)3 ·9H2O)为原料制备了FeVO4微晶.利用X射线衍射仪(XRD),扫描电子显微镜(SEM),紫外可见吸收光谱(UV-vis)和示差扫描量热分析(DSC)分别对产物的物相、形貌和光学性能等进行了表征.结果表明:所制备的FeVO4微晶为三斜型结构,超声功率由300 W增加到500 W,微晶尺寸逐渐下降,大小更为均匀.UV-vis分析表明所制备的FeVO4微晶具有较强的吸收可见光特性,且随着超声辐射的功率的增加,粒径减小,禁带宽度由2.17 eV减小到2.08 eV.     

低温化学浴制备PbS薄膜和表征及其在太阳能电池中的应用

为得到高质量的PbS薄膜,使用化学浴沉积法在40℃、50℃和60℃的低温下在包覆有TiO2层的FTO衬底上成功制备了PbS薄膜.所制备的PbS薄膜外观光滑、致密,使用X射线衍射、场发射扫描电镜、紫外可见近红外和紫外光电子能谱分析了该薄膜.根据分析结果,运用谢乐公式计算得到以上温度下制备的PbS薄膜的粒径分别为30 nm、36 nm和39 nm,且相应禁带宽度分别估算为1.58 eV、1.38 eV和1.20 eV.通过紫外光电子能谱结果计算出相应功函数分别为-4.90 eV、-4.60 eV和-4.50 eV,结合PbS薄膜的禁带宽度和功函数计算了其导带边和价带边的大小.此外,以spiro-OMeTAD作为空穴传输层,制备了PbS/TiO2太阳能电池,并获得了0.24;的光电转换效率.     

气相反应法制备GaN纳米线

用简单化学反应的方法,采用非空间限制的条件,成功地在LaAlO3衬底上制备了GaN纳米线.分别用X射线粉末衍射、场发射扫描电镜和高分辩电镜等对其成分、形貌及其结构进行了表征.制备的GaN纳米线直径大部分为10～50nm,且多呈平直光滑状态;纳米线的成分为六方晶系氮化镓晶体.     

SiO2双尺寸光子晶体的自组装及稳定性探索

采用St?ber法制备不同尺寸SiO2胶体球,利用多次垂直沉积法制备SiO2双尺寸光子晶体.通过场发射扫描电子显微镜(FE-SEM)对所得双尺寸光子晶体的形貌和排列方式进行表征.对双尺寸光子晶体的生长过程进行探讨,研究界面作用力及胶体球间相互作用力对制备稳定结构的影响.研究结果表明,SiO2双尺寸光子晶体具有更加有序稳定的结构.胶体球间的相互作用力随胶体球粒径增大而增大,大粒径胶体球更有利于形成稳定的结构.     

结构缺陷对HgI2晶体光吸收的影响

为研究HgI2晶体结构缺陷与光吸收的关系,测试了晶体的UV和中红外透过光谱.结果表明,波长约为580 nm时,存在着本征吸收限;波长大于580 nm时,随波长增加,晶体对光的吸收减小,透过率达到45;以上;在1000～2500 nm范围内,UV光谱存在四个明显的光吸收带,对应的入射光能量分别为0.79±0.01 eV,0.72 eV,0.57±0.01 eV 和0.53 eV.中红外透过曲线随波长增加而增大,透过率为39;～68;.通过M/HgI2的I～t曲线,采用简单能级模型进一步确认了生长的HgI2晶体存在0.79±0.01 eV和0.72 eV两个陷阱能级.分析认为,HgI2晶体层间的相对移动形成的结构缺陷造成1572.5 nm(0.79±0.01 eV)和1729.2 nm(0.72 eV)处的吸收,晶体缺碘造成2117.5 nm(0.57±0.01 eV)处的吸收和汞空位造成2305.8 nm(0.53 eV)的吸收.在中红外波段,晶体结构缺陷造成了显著的晶格吸收.严格控制原料的化学计量比有利于减少HgI2晶体的结构缺陷,提高晶体的光学性能.     

BaMgF4晶体电子结构及光学性质的第一性原理研究

运用CASTEP软件计算了完整的BaMgF4晶体的电子结构、介电函数和吸收光谱.采用剪刀算子进行修正,根据实验结果和计算结果比对,确定剪刀算子值为4.77 eV.计算结果显示完整的BaMgF4晶体在14.203～14.475 eV和21.480～21.767 eV两个区间有很明显的吸收峰,吸收边为10.337 eV,对应BaMgF4晶体的本征吸收边125 nm,计算结果与实验结果基本一致.     

Synthesis of GaN nanospindles via a facile solid-state reaction route

Gallium nitride (GaN) nanospindles have been synthesized via a solid-state reaction at a low-temperature condition. X-ray powder diffraction (XRD), Raman spectrum and high-resolution transmission electron microscopy (HRTEM) revealed that the synthesized GaN crystallized in a hexagonal structure and displaying spindly particles morphology has an average diameter of 100 nm and length of 400 nm X-ray photoelectron spectroscopy (XPS) of the sample gave the atomic ratio of Ga and N of 1.04:1. Room-temperature photoluminescence (PL) spectrum showed that the as-prepared product had a peak emission at 372 nm. The possible formation mechanism of the wurtzite GaN is briefly discussed.     

CdS纳米晶的制备及其荧光研究

以醋酸镉、L-半胱氨酸为主要原料,采用水热法制备了尺寸小于10nm、具有强光致荧光的纤锌矿结构CdS半导体纳米晶.水热法可以将晶核形成与晶体生长阶段较好地分开,加之提供的高温熟化条件,可以得到粒度小而均匀、结构良好的纳米晶.用高分辨透射电镜(HRTEM)、XRD对产品的晶体大小、结构进行了详细地表征,分析了影响纳米晶尺寸的因素,用相关性较好的荧光激发与发射光谱研究了硫化镉纳米晶的光致荧光性能.制备的硫化镉(CdS)纳米晶结构良好、粒度均匀、荧光激发专一,最大激发波长在338nm,其发射荧光的波长位于419nm,发射强度大.     

CdS纳米晶的稳定化处理及介质极性对荧光光谱的影响

用硫脲、聚乙烯吡咯烷酮、L-半胱氨酸水溶液对水热法合成的硫化镉纳米晶进行稳定化处理,发现L-半胱氨酸和聚乙烯吡咯烷酮(PVP)能有效地稳定硫化镉纳米晶,荧光发射强度比处理前增强了五十倍以上.以氯仿、氧化三(正)辛基膦(TOPO)氯仿溶液以及3-巯基丙酸为萃取(或处理)剂,对水热法合成的水溶性CdS半导体纳米晶进行处理,经过荧光光谱分析,发现介质水、氯仿、氧化三(正)辛基膦(TOPO)氯仿溶液以及3-巯基丙酸会对CdS纳米晶的最大荧光激发峰与发射峰的位置产生不同影响,极性大的水分子使得荧光峰蓝移,极性小的氯仿、氧化三(正)辛基膦(TOPO)氯仿溶液以及3-巯基丙酸使得荧光峰红移,最大位移为31nm左右.     

Investigation of preparation and properties of epitaxial growth GaN film on Si(1 1 1) substrate

In this paper, a single crystalline GaN grown on Si(1 1 1) is reported using a GaN buffer layer by a simple vacuum reactive evaporation method. Scanning electron microscopy (SEM), X-ray diffraction (XRD), photoluminescence measurement (PL), and Hall measurement results indicate that the single crystalline wurtzite GaN was successfully grown on the Si(1 1 1) substrate. The surface of the GaN films is flat and crack-free. A pronounced GaN(0 0 0 2) peak appears in the XRD pattern. The full-width at half-maximum (FWHM) of the double-crystal X-ray rocking curve (DCXRC) for (0 0 0 2) diffraction from the GaN epilayer is 30 arcmin. The PL spectrum shows that the GaN epilayer emits light at the wavelength of 365 nm with an FWHM of 8 nm (74.6 meV). Unintentionally doped films were n-type with a carrier concentration of 1.76×10¹⁸/cm³ and an electron mobility of 142 cm³/V s. The growth technique described was simple but very powerful for growing single crystalline GaN films on Si substrate.     

纳米ZnO的形态控制及其发光性能

以醋酸锌为原料,以聚合物和表面活性剂为添加剂,水热法合成了两种新型的纳米ZnO结构.并采用X射线衍射(XRD)、透射电镜(TEM)和高分辨透射电镜(HRTEM)以及光致发光光谱(PL)等测试方法对所得产物形貌和光学性能进行了研究,并对对两种纳米形态的形成机理进行了初步的探讨.结果表明:所得产物为六角纤锌矿型氧化锌纳米晶,分散性良好,形貌为枣核状,而这种枣核状的粒子是由众多短棒状粒子取向生长而形成的.升高温度,则得到了直径约100 nm,长约2 μm 的两头尖的纳米棒,棒的表面依附生长了针状颗粒.     

Crystallography and cathodoluminescence of ultra‐long GaN nanowires

Ultra‐long GaN nanowires have been synthesized via a simple thermal evaporation process by heating mixed GaN and Ga₂O₃ powders in a conventional resistance furnace under ammonia gas at 1150 °C. The average length of GaN nanowires is estimated to be more than 100 μm after 30‐min growth, corresponding to a fast growth rate of more than 200 μm/h. Scanning electron microscope (SEM) observation indicated that the diameter of GaN nanowires was rather uniform along the growth direction and in the range of 100–200 nm. X‐ray diffraction (XRD) and transmission electron microscope (TEM) measurements confirmed that the GaN nanowires are crystalline wurtzite‐type hexagonal structure. Room‐temperature cathodoluminescence (CL) measurement indicated that an obvious red‐shift of the near band‐edge emission peak centered at 414 nm of the ultra‐long GaN nanowires and a wide shoulder in the range of 600–700 nm were observed. Possible reasons responsible for the red‐shift of the near band‐edge emission of the ultra‐long GaN nanowires was discussed. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Subtle interplay between polytypism and preferred growth direction alignment in GaN nanorods non-catalytically grown on Si(1 1 1) substrates by using hydride vapor phase epitaxy

GaN nanorods were grown on Si(1 1 1) substrates by using hydride vapor phase epitaxy, and the crystallographic characteristics associated with their preferred growth directions were investigated by utilizing synchrotron X-ray reciprocal space mapping in a grazing incidence geometry and scanning electron microscopy. Crystallographic analysis reveals that the nanorods containing both wurtzite and zinc blende phase tend to have narrower distribution of the preferred growth directions than those containing only wurtzite phase. This tendency is partly attributed to the subtle interplay between polytypism and the preferred growth directions of GaN nanorods.     

Low temperature hydrothermal growth and optical properties of ZnO nanorods

Well‐faceted hexagonal ZnO nanorods have been synthesized by a simple hydrothermal method at relative low temperature (90°C) without any catalysts or templates. Zinc oxide (ZnO) nanorods were grown in an aqueous solution that contained Zinc chloride (ZnCl₂, Aldrich, purity 98%) and ammonia (25%). Most of the ZnO nanorods show the perfect hexagonal cross section and well‐faceted top and side surfaces. The diameter of ZnO nanorods decreased with the reaction time prolonging. The samples have been characterized by X‐ray powder diffraction (XRD) and scanning electron microscopy (SEM) measurement. XRD pattern confirmed that the as‐prepared ZnO was the single‐phase wurtzite structure formation. SEM results showed that the samples were rod textures. The surface‐related optical properties have been investigated by photoluminescence (PL) spectrum and Raman spectrum. Photoluminescence measurements showed each spectrum consists of a weak band ultraviolet (UV) band and a relatively broad visible light emission peak for the samples grown at different time. It has been found that the green emission in Raman measurement may be related to surface states. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Synthesis of gallium nitride by ammonia injection into gallium melt

Gallium nitride (GaN) was synthesized by injecting ammonia gas into molten gallium at 900–980°C under atmospheric pressure. A large amount of GaN powder was reproducibly obtained using a simple apparatus. The synthesized powder was characterized by scanning electron microscopy, X-ray diffraction, photoluminescence and energy dispersive X-ray spectroscopy, and was found to consist of fine crystals of hexagonal GaN of good quality. The total of GaN obtained was far more than the amount calculated from expected saturation solubility in the Ga melt at that temperature. We speculate that the GaN crystals were largely formed by direct reaction between Ga and the gaseous N source at the surface of the NH₃ bubbles in the melt. GaN synthesized by this method may be useful as a starting material for bulk growth.     

Thickness-dependent structural transition in GaAs nanocrystals grown on Si (1 1 1) surface

Structural stabilities in GaAs nanocrystals grown on the Si (1 1 1) substrate have been studied by transmission electron microscopy in order to see the structure and growth mechanism. The GaAs nanocrystals grown epitaxially on the Si (1 1 1) surface kept at 573 K have thin shapes consisting of a flat surface which is parallel to the Si (1 1 1) surface. The crystalline structure of the initial growth layer approximately below 5 nm in thickness is the zincblend structure, but with increasing thickness the structure changes to the wurtzite structure by formation of orderly-arranged stacking faults. The small difference in the driving force between the wurtzite structure and the zincblende structure could bring about a situation, where the kinetic rate of nucleus formation is high for the wurtzite structure than for the zincblende structure. It would highly increase the probability that the wurtzite structure is formed as a non-equilibrium state.