发射层厚度对反射式GaAs光电阴极性能的影响

通过求解扩散方程,推导了含有后界面复合速率的反射式GaAs光电阴极量子效率公式,并利用MBE在GaAs (100)衬底上外延生长了发射层厚度分别为1.6 μm、2.0 μm和2.6 μm,掺杂浓度为1×1019cm－3的三个反射式GaAs阴极样品,进行了激活实验.实验结果显示:随着发射层厚度的增加,阴极的长波量子效率和灵敏度都有所提高,而这种提高与阴极电子扩散长度的增长有关.同时,理论仿真研究发现,当后界面复合速率小于或等于105cm/s时,阴极发射层有一个最佳厚度,此时阴极灵敏度最高.后界面复合速率对阴极灵敏度在发射层厚度较小时影响较大,而随着厚度的增大阴极灵敏度最终趋于稳定.     

变组分AlGaAs/GaAs透射式光电阴极分辨力特性分析

建立了变组分AlGaAs/GaAs光电阴极二维载流子输运连续性方程.在一定的边界条件下,利用数值计算方法对此方程进行求解,得到了变组分AlGaAs/GaAs光电阴极调制传递函数(MTF)理论计算模型.利用该模型计算了透射式变组分和均匀组分阴极的理论MTF,分析了分辨力与Al组分变化范围、入射光子波长、AlGaAs和GaAs层厚度的关系.计算结果表明,变组分阴极与均匀组分阴极相比,阴极分辨力显著提高.当空间频率f在100—500 lp·mm-1区间时,分辨力的提高最为明显,如当f=200 lp·mm-1时,一般可提高150%—260%.变组分阴极分辨力的提高是内建电场作用的结果,但内建电场太大时,也会由于Al组分含量过高而影响阴极的长波响应.     

Improvement of photoemission performance of a gradient-doping transmission-mode GaAs photocathode

Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response, one has a gradient-doping structure and the other has a uniform-doping structure. The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one. As a result of the downward graded band-bending structure, the cathode performance parameters, such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves, are greater for the gradient-doping photocathode. The electron diffusion length is within a range of from 2.0 to 5.4 μm for doping concentration varying from 10¹⁹ to 10¹⁸ cm^-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2 μm.     

均匀掺杂GaAs材料光电子的输运性能研究

通过建立原子结构的理论模型和电离杂质散射理论公式,研究了光电子在透射式均匀掺杂GaAs光电阴极体内的输运过程,分析了光电阴极的掺杂浓度、发射层厚度、电子扩散长度等相关因素对阴极出射面的弥散圆斑以及到达阴极出射面的光电子数与激发光电子总数之比的影响.计算结果表明,当透射式均匀掺杂GaAs光电阴极发射层厚度为2 μm、电子扩散长度为3.6 μm、掺杂浓度为1×10¹⁹ cm^-3时,其极限线分辨率为769 mm^-1.此GaAs材料光电子的输运性能 关键词： GaAs 光电阴极 光电子输运 弥散圆斑 分辨率     

Distribution of carriers in gradient-doping transmission-mode GaAs photocathodes grown by molecular beam epitaxy

The gradient-doping structure is first applied to prepare the transmission-mode GaAs photocathode and the integral sensitivity of the sealed image tube achieves 1420~μ A/lm. This paper studies the inner carrier concentration distribution of the gradient-doping transmission-mode GaAs photocathode after molecular beam epitaxy (MBE) growth using the electrochemical capacitance-voltage profiling. The results show that an ideal gradient-doping structure can be obtained by using MBE growth. The total band-bending energy in the gradient-doping GaAs active-layer with doping concentration ranging from 1× 10^19~cm^-3 to 1×10^18~cm^-3 is calculated to be 46.3 meV, which helps to improve the photoexcited electrons movement toward surface for the thin epilayer. In addition, by analysis of the band offsets, it is found that the worse carrier concentration discrepancy between GaAs and GaAlAs causes a lower back interface electron potential barrier which decreases the amount of high-energy photoelectrons and affects the short-wave response.     

利用梯度掺杂获得高量子效率的GaAs光电阴极

获得高量子效率且稳定性良好的阴极一直是近年来发展GaAs光电阴极的重要方向。对晶面为(100),掺杂Be,厚度为1μm分子束外延生长的反射式GaAs发射层,设计了一种从体内到表面掺杂浓度由高到低分布的新型梯度掺杂结构。掺杂浓度的范围从1×1019cm-3到1×1018cm-3,并利用(Cs,O)激活技术制备了GaAs光电阴极。光谱响应测试曲线显示,与传统均匀掺杂的GaAs光电阴极相比,梯度掺杂的GaAs光电阴极的量子效率在整个波段都有提高,积分灵敏度可达1580μA/lm,且具有更好的稳定性。讨论了这种新型GaAs光电阴极获得更高量子效率的内在机理。该设计结构是现实可行的,且具有很大发展潜力,它为国内发展高性能GaAs光电阴极提供了一条重要途径。     

对三代微光管光谱响应的测试分析

利用自行研制的光谱响应测试仪对国产三代微光管进行了光谱响应测试,给出了三代微光管的光谱响应特性,利用曲线拟合方法估算了GaAs光电阴极材料的性能参数。结果显示该三代微光管的积分灵敏度约800μA/lm左右,所选GaAs材料的电子扩散长度为2.0μm,与1.6μm的阴极厚度相当,电子表面逸出几率为0.38,后界面复合速率为106cm/s。发现GaAs材料的扩散长度偏低,以及阴极的后界面复合速率太大是限制三代微光管光电发射性能进一步提高的重要原因。     

分幅变像管动态空间分辨率的标定

为了提高激光惯性约束聚变实验二维成像诊断的精密化程度, 提出了分幅变像管动态空间分辨率的标定方法. 标定原理是以直边函数为物, 经光学系统成像后求解系统的调制传递函数, 从而获得系统的空间分辨率. 在神光Ⅱ装置上利用八路激光打靶产生1-3.5 keV能区的连续X 射线标定源, 照射高Z刀边材料, 并成像到分幅变像管阴极上, 分幅变像管采用脉冲选通工作模式获得动态像. 对分幅变像管采集的动态图像进行处理得到系统的调制传递函数. 根据调制传递函数为0.1时对应的空间截止频率, 得到系统的空间分辨率为20 lp/mm. 根据分幅变像管的动态空间分辨理论, 计算系统的极限空间分辨率为22.8 lp/mm. 标定结果略低于极限空间分辨率, 与理论基本吻合. 根据传统标定方法得到该分幅变像管的静态空间分辨率为22 lp/mm, 比动态空间分辨率略高. 在二维成像诊断时, 分幅变像管工作于动态选通模式, 故动态空间分辨率的标定结果更能真实地反映其成像诊断能力.     

透射式指数掺杂GaAs光电阴极最佳厚度研究

通过研究指数掺杂GaAs光电阴极中光电子扩散漂移长度与均匀掺杂GaAs光电阴极中光电子扩散长度的差异,确定透射式指数掺杂GaAs光电阴极的最佳厚度范围为16—22 μm.利用量子效率公式对透射式指数掺杂GaAs光电阴极最佳厚度进行了仿真分析,发现厚度为20 μm时阴极积分灵敏度最大.外延生长阴极厚度分别为16和20 μm的两种透射式指数掺杂GaAs样品并进行了激活实验,测得样品的积分灵敏度分别为1228和1547 μA/lm,两者的比值为796%. 实验结果与仿真结果符合. 关键词： GaAs光电阴极 透射式 指数掺杂 厚度     

Quantum efficiency conversion from the reflection-mode GaAs photocathode to the transmission-mode one

In the article, the transmission-mode negative electron affinity GaAs photocathode is compared with the reflection-mode one in structure, working principle and the quantum efficiency equation. The key point to establish relation between the two modes is that the active-layer is in full accord and the biggest difference is that the incident direction of photons is inverse. Based on the relation and difference above, we obtain the electron escape probability P and the spectrum absorption coefficient α of the reflection-mode GaAs photocathode by multilayer film matrix theory. The quantum efficiency of the transmission-mode GaAs photocathode can be estimated through the coefficients P and α of the reflection-mode one. Two groups of samples are analyzed, the one group contains uniform doping reflection-mode and transmission-mode GaAs photocathodes and the other contains exponential doping ones. Through the analysis and curve fitting, we find that the conversion difference of the uniform-doping is about 11.22% while that of the exponential-doping is about 5.46%. Another four groups of samples with exponential-doping active layer are experimentalized and the differences of them are all less than 6%. The results prove the suggested method is feasible and effective and it is more suitable for the conversion of GaAs photocathode with exponential-doping active layer.     

小型条纹管数值模拟及实验研究

针对无人机载及星载激光成像雷达系统对条纹管的小型化、高空间分辨率与大探测面积的应用需求,研制了一台具有高边缘空间分辨能力、高亮度增益的小型条纹相机.采用球面光电阴极、球面荧光屏技术提高了条纹相机的边缘空间分辨率和探测面积,有利于增大激光成像雷达的探测视场;采用狭缝型加速电极代替传统栅网电极,有利于提高条纹相机的电耐性和可靠性;设计了加载高达-15 kV工作电压的像缩小型条纹管,增大了条纹管的亮度增益,有助于增大激光雷达系统的探测距离.测试结果显示：在有效工作面积16 mm×2 mm内,条纹管静态空间分辨率高于29.3 lp/mm@MTF=5%（MTF表示调制传递函数）,亮度增益高达39.4.条纹相机光电阴极处静态空间分辨率高于15 lp/mm@CTF=11.64%（CTF表示对比度传递函数）;边缘动态空间分辨率高于9.8 lp/mm@CTF=5.51%;时间分辨率优于54.6 ps@T_screen=4.3 ns（T_screen为全屏时间）且在整个工作面积内具有较高的一致性;动态范围为345：1@54.6 ps.同时,为满足不同的景深及探测精度需求,相机设置六个扫描档位,可以实现不同扫速下的超快速目标诊断.该条纹相机在无人机载及星载激光成像雷达探测中具有潜在的实用价值.     

The optimal thickness of transmission-mode GaN photocathode

A 150-nm-thick GaN photocathode with an Mg doping concentration of 1.6× 10¹⁷cm^-3 is activated by Cs/O in ultrahigh vacuum chamber, and quantum efficiency (QE) curve of negative electron affinity transmission-mode (t-mode) GaN photocathode is obtained. The maximum QE reaches 13.0% at 290 nm. According to the t-mode QE equation solved from the diffusion equation, the QE curve is fitted. From the fitting results, the electron escape probability is 0.32, the back-interface recombination velocity is 5× 10⁴ cm·s^-1, and the electron diffusion length is 116 nm. Based on these parameters, the influence of GaN thickness on t-mode QE is simulated. The simulation shows that the optimal thickness of GaN is 90 nm, which is better than the 150-nm GaN.     

GaAs光电阴极表面电子逸出概率与波长关系的研究

GaAs光电阴极量子效率公式中用到的表面电子逸出概率,在阴极工作波段范围内通常视为与入射光子波长无关的常数。应用该结论对反射式GaAs光电阴极激活实验结果进行了拟合分析。实验采用分子束外延GaAs材料,外延发射层厚度为1.6μm、掺杂浓度为1×1019cm-3,分析结果显示理论曲线与实验曲线存在偏差,而在激活台内阴极灵敏度下降后的光谱响应曲线拟合结果偏差更大。这种偏差是由于表面电子逸出概率对入射光子波长的依赖关系造成的,并非通常认为的与波长无关。经过光谱响应曲线的拟合分析得出,反射式阴极表面电子逸出概率与入射光子波长之间近似满足指数关系,两者通过表面势垒因子相联系。高、低温激活后阴极表面势垒因子分别为3.53和1.36。     

透射式蓝延伸GaAs光电阴极光学结构对比

用金属有机物化学气相沉积法外延制备了一个透射式蓝延伸GaAs光电阴极,积分灵敏度达到1980 μA/lm,同时与美国ITT公司的一条蓝延伸阴极光谱响应曲线对比,分别对两者进行了光学结构拟合. 结果表明,国内阴极在Ga_1-xAl_xAs层厚度、Al组分、电子扩散长度和后界面复合速率上与国外 存在差距,这导致国内阴极的蓝延伸性能不及国外.国内蓝延伸阴极的表面电子逸出几率、发射层厚度与 国外阴极拟合结果一致,这使得两者长波响应性能差别远小于短波部分的差别.另外响应波段全谱的吸收率 小于国外阴极,导致国内透射式蓝延伸GaAs光电阴极光谱响应、积分灵敏度尚不及国外.     

The optimal thickness of a transmission-mode GaN photocathode

A 150-nm-thick GaN photocathode with a Mg doping concentration of 1.6×1017cm-3 is activated by Cs/O in an ultrahigh vacuum chamber,and a quantum efficiency(QE) curve of the negative electron affinity transmission-mode(t-mode) of the GaN photocathode is obtained.The maximum QE reaches 13.0% at 290 nm.According to the t-mode QE equation solved from the diffusion equation,the QE curve is fitted.From the fitting results,the electron escape probability is 0.32,the back-interface recombination velocity is 5×104 cm·s-1,and the electron diffusion length is 116 nm.Based on these parameters,the influence of GaN thickness on t-mode QE is simulated.The simulation shows that the optimal thickness of GaN is 90 nm,which is better than the 150-nm GaN.     

Experimental study of spatial resolution of a semiconductor–gas discharge infrared image converter

Experimental results of spatial resolution measurements for an infrared(IR)-to-visible image converter on the basis of a plane-parallel semiconductor–gas discharge (SGD) device are reported. The photodetector wafer made of Si:Zn transforms an incoming IR image into an electron image which gets visualized by a thin adjacent layer of Ar discharge operating in the Townsend mode. Spatial resolution of the converter is measured by the edge-mask technique with computing the line spread function (LSF) and modulation transfer function (MTF). Obtained dependences prove that the spatial resolution is mainly determined by the gas discharge layer and not by the photodetector. Simple estimates show that diffusion of electrons, ions and excited atoms plays rather a minor role and cannot explain the results. As plausible explanation, the phenomenon of resonance radiation imprisonment is considered. PACS 42.79.Ls; 42.30.Lr; 52.00.00     

大梯度指数掺杂透射式GaAs光电阴极响应特性的理论分析

讨论了一种具有超快时间响应特性的新光电阴极, 即大梯度指数掺杂透射式GaAs 负电子亲和势 (NEA) 光电阴极, 模拟了它的量子效率、时间分辨和空间分辨能力等特性. 理论分析结果表明, 由于大梯度指数掺杂设计方式, 在吸收层内形成较大的内建电场, 因此光生电子在GaAsNEA阴极内的渡越时间大大缩短, 当GaAs吸收层厚度～0.9 μm时, 其响应时间达到～ 10 ps, 说明这种新NEA阴极具有远优于传统均匀掺杂NEA阴极的超快响应特性. 同时在整个光谱响应范围内, 量子效率达到约10%-20%, 空间分辨力显著高于以往的计算结果. 分析结果表明,在保证较高的量子效率条件下, 这种新阴极能够突破常规GaAsNEA阴极的时间分辨率极限, 提高GaAsNEA阴极本身的分辨力, 有望用于超快摄影、电子加速器和自由电子激光器的电子源等领域, 进一步扩展NEA光电阴极的应用范围.     

Influence of varied doping structure on photoemissive property of photocathode

The built-in electric fields within a varied doping GaAs photocathode may promote the transport of electrons from the bulk to the surface,thus the quantum efficiency of the cathode can be enhanced remarkably. But this enhancement,which might be due to the increase in either the number or the energy of electrons reaching the surface,is not clear at present. In this paper,the energy distributions of electrons in a varied doping photocathode and uniform doping photocathode before and after escaping from the cathode surface are analysed,and the number of electrons escaping from the surface in different cases is calculated for the two kinds of photocathodes. The results indicate that the varied doping structure can not only increase the number of electrons reaching the surface but also cause an offset of the electron energy distribution to high energy. That is the root reason for the enhancement of the quantum efficiency of a varied doping GaAs photocathode.     

Equivalent Method of Solving Quantum Efficiency of Reflection-Mode Exponential Doping GaAs Photocathode

The mathematical expression of the electron diffusion and drift length LDE of exponential doping photocathode is deduced. In the quantum efficiency equation of the reflection-mode uniform doping cathode, substituting LDE for LD, the equivalent quantum efficiency equation of the reflection-mode exponential doping cathode is obtained. By using the equivalent equation, theoretical simulation and experimental analysis shows that the equivalent index formula and formula-doped cathode quantum efficiency results in line. The equivalent equation avoids complicated calculation, thereby simplifies the process of solving the quantum efficiency of exponential doping photocathode.     

透射式GaAs光电阴极材料的MOCVD生长

用常压MOCVD装置,制备了透射式GaAs光电阴极材料。发射层P-型GaAs掺杂浓度到10¹⁸-10¹⁹cm^-3,少子扩散长度到4.02μm。AlGaAs层的Al组分含量到0.83,其吸收光谱长波限与设计值基本符合。利用此材料进行了阴极激活实验,制成了透射式GaAs光阴极。