硅单晶中硅氢键的存在及其影响

通过红外吸收光谱的测定,证实了氢气氛浮区硅单晶中存在硅氢键,三个特征吸收峰在4.51,4.68和5.13μm波长处。根据有关的理论计算报道分析,认为氢原子在硅晶格中处于几种间隙位置。研究表明这种在晶体生长中形成的硅氢键对晶体完整性隐含着影响,并发现硅单晶中氢致缺陷的形成与硅氢键在高温下的断裂有密切关系。 关键词：     

氢气氛区熔硅单晶热处理缺陷形成机理

本文用X射线衍射形貌法、红外吸收光谱法和金相腐蚀坑法,探讨了氢气氛区熔硅单晶热处理缺陷的形成机理。在生长态晶体中存在着三种Si-H键,对应的红外吸收峰波长分别为4.55微米、4.75微米和5.13微米。随着加热过程的进行,Si—H键逐渐分解而消失。5.13微米吸收峰的消失温度是450℃,4.55微米吸收峰的消失温度是600℃,4.75微米吸收峰的消失温度是700℃。晶体中的热处理缺陷是由于氢沉淀造成的,沉淀过程首先是Si—H键分解,然后是氢的扩散和聚集。沉淀过程的激活能是2.4电子伏特(56000卡/克分 关键词：     

氢气区熔硅单晶氢致缺陷的研究

本文应用X射线透射截面形貌技术研究了氢气区熔硅单晶中氢致缺陷与热处理温度的关系。根据早期氢致缺陷的X射线形貌图衍衬分析,指出氢沉淀周围晶格受到压缩性应变,并简单阐述了硅氢键断裂与氢致缺陷形成过程。 关键词：     

不缀饰直拉硅单晶原生微缺陷X射线形貌观察

一、前 言 无位错硅单晶中的微缺陷严重地影响着大规模集成电路的性能,已引起许多学者的关注和兴趣[1-3],由于微缺陷的应力场很小,目前对直拉硅单晶中微缺陷的观察,主要采用择尤化学腐蚀法、缀饰X射线形貌术、EBIC模式扫描电子显微术、透射电子显微术等.但上述方法的共同缺点是要对样品进行处理.近年来,一些学者采用特殊的X射线双晶形貌方法,对硅单晶原生微缺陷进行观察[4,5],但其设备复杂,实验周期长.我们首次用X射线投影和截面形貌术对不经缀饰的硅单晶原生微缺陷进行了观察,并获得了相应的微缺陷图. 二、实 验 实验用的样品是沿 [100]…     

硅中退火多边化

用化学侵蚀法对硅单晶中的退火多边化进行了实验研究。研究了多边化过程及其与退火温度的关系。根据实验数据求出硅中位错攀移激活能,发现形变时产生双滑移系退火而不形成多边化墙的主要原因,并非由于形成Lomer-Cottrell位错。     

直拉硅单晶原生微缺陷的观察

对沿<100>方向生长的p型和沿<111>方向生长的n型宏观无位错直拉硅单晶,用铜缀饰X射线形貌术和腐蚀法观察到两种不同类型的微缺陷,对n型硅单晶还观察到一种特殊组态的微缺陷。对观察到的微缺陷的分布、组态进行了初步的分析。本文首次采用X射线透射投影和截面形貌术对硅单晶原生微缺陷进行直接观察,获得了相应的微缺陷图。所观察到的微缺陷的组态、尺度、分布等与铜缀饰X射线透射形貌图所示结果一致。 关键词：     

使用定向偏角籽晶拉制无位错[111]硅单晶

半导体材料是制造半导体器件的基础,材料的质量直接影响器件的质量和可靠性.器件工艺要求提供超纯无缺陷的晶体.硅单晶中常见的并对器件性能影响较大的缺陷就是位错.因而硅单晶的拉制中很根本的一条,就是要求无位错. 拉制无位错或低位错[111]硅单晶,现时普遍采用达什(W.C.Dash)早年阐明的正[111]晶向籽晶缩颈技术[1]. 我们研究和应用了向特定方向偏离一定角度的[111]定向偏角籽晶,配合适宜的温场和拉晶参数,在国产TDK-36AZ单晶炉上稳定地拉制出无位错[111]硅单晶,并已确定了工艺,投人了批量生产.投料800克,无位错单晶成品率一股在 65—7…     

中子辐照氢气氛生长硅的红外吸收

用傅里叶变换红外吸收光谱技术测量了中子辐照氢气氛生长区熔硅在1800—2300cm^-1和400—1200cm^-1频段的吸收光谱。给出了较强谱带的退火曲线。与质子注入硅的红外光谱及中子辐照氢气氛生长硅的深能级瞬态谱结果相比较,讨论了相应于一些谱带的硅氢中心的可能结构。 关键词：     

硅单晶氢致缺陷分布的实验研究

利用X射线形貌术方法研究了含氢硅单晶中氢致缺陷的分布。将原生晶棒从内部切开,观察到在切口暴露表面附近,热处理后产生的氢致缺陷的密度与尺寸与内部未暴露部分相同,而不同于薄片退火的情况,对此结果作了简要的讨论。 关键词：     

低剂量磷离子注入快速退火硅中的缺陷研究

本文对低剂量磷离子注入硅经快速热退火后的缺陷特性进行研究。600℃退火就能基本激活注入离子。800℃以下退火样品中的缺陷主要是离子注入形成的辐射损伤缺陷。800℃以上退火样品中存在位错缺陷。位错的形成与离子注入引进的损伤和淬火过程中的热应力有关。1100℃退火样品中的缺陷浓度迅速增大,热应力在硅内部产生大量的滑移位错。 关键词：     

Structure,impurity composition,and photoluminescence of mechanically polished layers of single-crystal silicon

The introduction of optically active defects (such as atomic clusters, dislocations, precipitates) into a silicon single crystal using irradiation, plastic deformation, or heat treatment has been considered a possible approach to the design of silicon-based light-emitting structures in the near infrared region. Defects were introduced into silicon plates by traditional mechanical polishing. The changes in the defect structure and the impurity composition of damaged silicon layers during thermal annealing (TA) of a crystal were examined using transmission electronic microscopy and x-ray fluorescence. Optical properties of the defects were studied at 77 K using photoluminescence (PL) in the near infrared region. It has been shown that the defects generated by mechanical polishing transform into dislocations and dislocation loops and that SiO₂ precipitates also form as a result of annealing at temperatures of 850 to 1000°C. Depending on the annealing temperature, either oxide precipitates or dislocations decorated by copper atoms, which are gettered from the crystal bulk, make the predominant contribution to PL spectra.     

高温电子辐照硅中缺陷的研究

本文对高温电子辐照硅中产生的缺陷进行了研究,发现缺陷的引进率随电子辐照温度的增加而增加,在达到极值温度T_m后,缺陷的引进率将随之而下降,T_m值与缺陷的退火激活能有关。E₃缺陷(E_c—0.36eV)浓度在高温电子辐照中显著增加,在330℃高温电子辐照时,E₃缺陷浓度为室温电子辐照的6倍。研究结果表明,E₃缺陷的可能结构为与多空位和氧有关的复合体。 关键词：     

氢对铁中缺陷行为的影响

本文研究了铁中氢与辐照缺陷的相互作用。氢与这些缺陷结合,形成不同类型的氢与缺陷的复合体,在从低温到高温的时效过程中,可以清楚地观察到间隙型位错环(>300℃)、空位型位错环(>450℃)和空洞(520℃)的形成。研究表明,这三种缺陷分别是氢与间隙原子、氢与单个空位、氢与复数个空位等三种复合体聚集而成。 关键词：     

Hydrogen-related donor in silicon crystals grown in a hydrogen atmosphere

Neutron transmutation doped (NTD) silicon crystals grown in a hydrogen atmosphere have been investigated by infrared absorption spectroscopy at a low temperature (10 K). An effective-mass-like donor state HD^0/+ has been found at 110.8 meV below the conduction band bottom after rapid thermal annealing (RTA). The HD^0/+ formation mechanism after NTD and RTA is briefly discussed, and tentatively attributed to H atoms present in the vicinity of some residual irradiation defects, like a complex of a H atom and a H-saturated vacancy.     

X-ray diffraction study of the effect of neutron irradiation on the defect formation in silicon crystals grown by the Czochralski method and annealed at high temperatures

The effect of x-ray scattering by neutron-irradiated and reference (unirradiated) silicon crystals grown by the Czochralski method and annealed at temperatures of 850–1050°C on the defect formation is comparatively investigated using triple-crystal x-ray diffractometry. The sizes and concentrations of clusters composed of point defects and dislocation loops formed during decomposition of an oxygen-containing solid solution and subsequent clusterization of the point defects are calculated.     

Formation and growth of dislocation loops in ZnTe under irradiation of low energy Ar+-Ions

Abstract

Defects produced in ZnTe single crystals by Ar⁺ bombardment during ion milling for transmission electron microscopy studies are investigated in detail. The defects have been identified to be interstitial type Frank loops. Influences of ion energy and specimen temperature during the irradiation on the defect geometry are investigated. A model is proposed to describe the growing up of the loops.     

Formation and nature of swirl defects in silicon

Point defect agglomerates in dislocation-free silicon crystals, usually called “swirls”, have been investigated by means of high-voltage electron microscopy. It was found that a single swirl defect consists of a dislocation loop or a cluster of dislocation loops. By contrast experiments it could be shown that these loops are formed by agglomeration of self-interstitial atoms. Generally the loops have a/2〈110〉 Burgers vectors, but in specimens with high concentrations of carbon (～10¹⁷ cm^?3) and oxygen (～10¹⁶ cm^?3) also dislocation loops including a stacking fault were observed. In crystals grown at growth rates higher thanv=4 mm/min no swirls are observed; lower growth rates do not markedly affect the size and shape of the dislocation loops. With decreasing impurity content (particulary of oxygen and carbon) the swirl density decreases, whereas the dislocation loop clusters become larger and more complex. A model is presented which describes the formation of swirls in terms of agglomeration of silicon self-interstitials and impurity atoms.     

Cd1-xZnxTe晶体退火条件的选择及Zn压对退火晶体质量的影响

采用传统Bridgman方法和加入accelerated crucible rotation technique的Bridgman(缩写为ACRT-B)方法生长的Cd_1-xZn_xTe(x=0.04)晶体中存在有点缺陷、位错、杂质和Te沉淀等缺陷.为了减少甚至消除这些缺陷,必须将生长后的CdZnTe晶片在Cd气氛下退火.从Cd-Te和Cd_0.96Zn_0.04Te的PT相图出发,详细讨论了CdZnTe晶体的气固平衡条件,并 关键词： 1-xZn_xTe')" href="#">Cd_1-xZn_xTe 退火 气-固平衡     

Electrical properties of LiNbO3 crystals reduced in a hydrogen atmosphere

The temperature dependence of the electrical conductivity and pyroelectric coefficient of lithium niobate crystals reduced in a hydrogen atmosphere has been studied. It has been established that the activation energy of dark electrical conduction in these crystals in the temperature range 288?C350 K differs from the corresponding values for crystals reduced in vacuum and is equal to 0.68 ± 0.02 eV. It has been shown that the annealing of LiNbO₃ crystals in a hydrogen atmosphere hardly affects their pyroelectric properties. The mechanism of electrical conduction of LiNbO₃ crystals reduced in a hydrogen-containing atmosphere has been discussed.