Al_2O_3:Ce薄膜的制备及其光致发光特性

应用回流浸渍法对非晶的纳米多孔Al_2O_3薄膜进行掺杂,制备了非晶的Al_2O_3:Ce薄膜。用场发射扫描电子显微镜观察了样品掺杂前后的形貌,且从EDS结果可以看出薄膜中铈的含量是随着掺杂液浓度的增加而增加的。X射线光电子能谱(XPS)表明Al_2O_3:Ce薄膜中有三价的铈离子形成。Al_2O_3:Ce薄膜的光致发光谱和激发谱与掺杂前相比明显发生了变化,且发射谱中出现了双峰结构,峰位分别位于380nm和400nm,本文分析讨论了掺杂前后光谱发生变化的原因和发光机制。另外,比较了不同浓度下掺杂的Al_2O_3:Ce薄膜的光致发光谱,得出随掺杂液浓度的增加光致发光强度呈先增加后减小的趋势,且最佳掺杂浓度为0.2mol。     

基于中频溅射的掺铒Al2O3薄膜的光致发光特性

利用中频磁控溅射方法沉积制备了掺铒Al2O3薄膜,室温下测量了薄膜在1535nm波长处的光致发光光谱和抽运功率、掺铒浓度、退火温度对光致发光光谱强度的影响。结果表明,在真空气压为2×10-1Pa,氩气流量为70cm3/s,氧气流量为25～45cm3/s的条件下,最佳掺铒浓度为1.0at%,最佳退火温度为850℃。     

MPD掺杂的共聚合物薄膜的发光特性

研究了由噻吩乙烯发色团单元和惰性寡甲撑单元组成的交替嵌段合物与小分子量染料[2-methyl-6[(2,3,6,7-tetrahydro-1H,5H-benxo[ij]quinolixin-q-yl)ethenyl]-4H－pylidenes]－丙烷二腈（MPD）共混物薄膜的光致发光。这种共混物在645nm处产生增强的红光发射。发射增强的部分原因是来源于晶化共聚合物与染料之间有效的能量传递。     

RF溅射钕掺杂ZnO薄膜的结构与发光特性

通过射频磁控溅射技术在Si(111)衬底上制备了未掺杂ZnO薄膜和Nd掺杂ZnO薄膜。应用XRD分析了ZnO:Nd薄膜的晶格结构,通过AFM观察了ZnO:Nd薄膜的表面形貌。结果表明,Nd掺入了ZnO晶格中,由于Nd原子半径大于Zn原子半径,Nd以替位原子的形式存在于ZnO晶格中。ZnO:Nd薄膜为纳米多晶薄膜,表面形貌粗糙。ZnO:Nd薄膜的室温光致发光谱表明,相同条件下制备的未掺杂ZnO薄膜和Nd掺杂ZnO薄膜都出现了395nm的强紫光带和495nm的弱绿光带。我们认为,紫光发射峰窄而锐且强度远大于绿光峰,源于薄膜中激子复合;绿光峰强度较弱,源于薄膜中的氧空位(VO)及氧反位锌缺陷(OZn)。Nd掺杂没有影响ZnO:Nd薄膜的PL谱的发射峰的峰位。由于Nd3 离子电荷数与Zn2 离子电荷数不相等,为了保持ZnO薄膜的电中性,间隙锌(VZn)可以作为Nd替位补偿性的受主杂质而存在,影响ZnO薄膜的激子浓度。同时,Nd掺入使ZnO的晶格畸变缺陷浓度改变增强,因而发射峰的强度随Nd掺杂浓度不同而变化。     

乙醇对纳米多孔氧化铝薄膜热释光的影响

以乙醇-草酸混合溶液为电解液,用二次阳极氧化法制备纳米多孔Al_2O_3∶C薄膜。在制备过程中,碳的掺杂浓度可控。实验结果表明,随着碳浓度的增加,热释光强度逐渐增大;随着退火温度的升高,320℃左右的主热释光峰的强度先升高后降低。在退火温度为500℃时,主热释光峰的强度达到最大。纯草酸溶液制备的Al_2O_3薄膜的热释光剂量响应曲线在10~50 Gy是线性的,在50~100 Gy呈超线性;而乙醇-草酸混合溶液制备的Al_2O_3∶C薄膜在10~100 Gy基本呈线性。     

SiO2薄膜中咔唑的发光特性

利用溶胶-凝胶工艺制备了含咔唑的SiO2薄膜,实验测量了薄膜样品的光致发光特性.结果发现：样品不仅能发射红光,并且当激发波长从610 nm连续减小到400 nm时,其发射谱峰位又能从760 nm连续蓝移到550 nm左右.薄膜样品的荧光特性随激发波长而改变的现象可归因于咔唑分子被紧缩在凝胶内部的微孔中受到挤压而导致共轭尺寸发生变化.     

镱铒共掺Al2O3薄膜光致发光特性优化

用中频磁控溅射方法在SiO2/Si基底上制备了五组固定掺铒浓度不同镱铒浓度比率的镱铒共掺Al2O3薄膜样品.室温下测量了薄膜在1.430 μm~1.630 μm波段范围内光致发光光谱.研究发现,镱的掺入有效地提高了三价铒离子的光致发光强度,最优的镱铒掺杂为：掺铒0.33 mol%,Yb3+∶Er3+=10∶1,比相同掺铒浓度单掺铒样品光致发光峰值强度增强40倍;确定的掺铒浓度,有着固定的最佳镱铒浓度比率,主要是镱铒离子间的正向和反向能量传递相互作用的结果,但最佳镱铒浓度比率随着掺铒浓度的增加呈现下降趋势;单掺铒薄膜的光致发光峰值强度随掺铒浓度呈现近Gauss形状变化,而最佳镱铒共掺样品的光致发光峰值强度随掺铒浓度呈现了倒Gauss形状变化.     

湿化学法合成Co掺杂ZnO薄膜的微结构及发光特性

采用湿化学法在ITO玻璃衬底上制备了纳米棒结构的Co掺杂ZnO薄膜.XRD结果表明Co掺杂的ZnO没有出现杂相.SEM结果表明掺杂样品是由ZnO纳米棒团簇结构组成,且团簇的密度随着Co掺杂浓度的增大而增大.光致发光光谱表明Co掺杂导致薄膜的带隙发生红移.     

钇和镧掺杂氧化铝陶瓷的热导及其介电弛豫特性研究

采用氧化物固相反应法,制备出纯氧化铝陶瓷及其分别掺杂稀土元素钇和镧的陶瓷样品.测量了样品的结构、介电特性和热导性能;研究了烧结温度对掺杂不同稀土元素的陶瓷样品的性能的影响.X射线衍射结果表明1500℃烧结后陶瓷样品形成了单一的固溶体.而氧化铝的热导率达到8.60W/（m·K）,样品的介电性能稳定.我们发现掺杂Y³⁺和La³⁺的氧化铝陶瓷存在介电弛豫现象,并对该现象进行了机理分析.     

ZnO薄膜的制备和发光特性的研究

用射频磁控溅射的方法在石英衬底上沉积了氧化锌薄膜，在室温下测量了样品的XRD曲线、吸收光谱以及光致发光光谱。探讨了气氛中氧气与氩气比对制备薄膜的影响，从XRD谱中可以看出，样品具有较好的结晶状态。另外，样品在紫外有较强的吸收，而其光致发光也是较强的紫外发射，这表明带间跃迁占了主导地位，以上结果说明：用溅射方法制备的ZnO薄膜结晶质量较好，富锌状态有所改善。     

Intense blue luminescence of anodic aluminum oxide

The luminescence spectra of aluminum oxide with an ordered system of through pores have been studied. The diameter and density of pores were ≈ 50 nm and 1.2 × 10¹⁰ cm^?2, respectively. Amorphous aluminum oxide formed by anodization of aluminum foil in an oxalic acid electrolyte shows intense luminescence in the blue spectral region. Processing of spectra with the use of an oxalic acid approximation by Gaussian curves gives three bands peaking at ～ 382 (3.2 eV), 461 (2.7 eV), and 500 nm (2.5 eV), which correspond to different types of defects. The bands at 382 and 461 nm can be assigned to optical transitions involving F⁺ and F centers (vacancies of oxygen with one or two electrons), respectively. The lower-energy band near 500 nm can be presumably assigned to luminescence from F⁺⁺ centers (vacancy of oxygen without an electron). Analysis of the luminescence excitation spectra has revealed an inhomogeneous character of the distribution of the corresponding luminescence centers in the Al₂O₃ matrix.     

Passivation of black silicon boron emitters with atomic layer deposited aluminum oxide

The nanostructured surface – also called black silicon (b‐Si) – is a promising texture for solar cells because of its extremely low reflectance combined with low surface recombination obtained with atomic layer deposited (ALD) thin films. However, the challenges in keeping the excellent optical properties and passivation in further processing have not been addressed before. Here we study especially the applicability of the ALD passivation on highly boron doped emitters that is present in crystalline silicon solar cells. The results show that the nanostructured boron emitters can be passivated efficiently using ALD Al₂O₃ reaching emitter saturation current densities as low as 51 fA/cm². Furthermore, reflectance values less than 0.5% after processing show that the different process steps are not detrimental for the low reflectance of b‐Si. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optimized emitter contacting on multicrystalline silicon thin film solar cells

We present an optimized contacting scheme for multicrystalline silicon thin film solar cells on glass based on epitaxially crystallized emitters with a thin Al₂O₃ layer and a silver back reflector. In a first step a 6.5 µm thick amorphous silicon absorber layer is crystallized by a diode laser. In a second step a thin silicon emitter layer is epitaxially crystallized by an excimer laser. The emitter is covered by an Al₂O₃ layer with a thickness ranging from 1.0 nm to 2.5 nm, which passivates the surface and acts as a tunnel barrier. On top of the Al₂O₃ layer a 90–100 nm thick silver back reflector is deposited. The Al₂O₃ layer was found to have an optimal thickness of 1.5 nm resulting in solar cells with back reflector that achieve a maximum open‐circuit voltage of 567 mV, a short‐circuit current density of 27.9 mA/cm², and an efficiency of 10.9%. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Crystalline silicon surface passivation investigated by thermal atomic-layer-deposited aluminum oxide

Atomic-layer-deposited(ALD) aluminum oxide(Al_2O_3) has demonstrated an excellent surface passivation for crystalline silicon(c-Si) surfaces, as well as for highly boron-doped c-Si surfaces. In this paper, water-based thermal atomic layer deposition of Al_2O_3 films are fabricated for c-Si surface passivation. The influence of deposition conditions on the passivation quality is investigated. The results show that the excellent passivation on n-type c-Si can be achieved at a low thermal budget of 250℃ given a gas pressure of 0.15 Torr. The thickness-dependence of surface passivation indicates that the effective minority carrier lifetime increases drastically when the thickness of Al_2O_3 is larger than 10 nm. The influence of thermal post annealing treatments is also studied. Comparable carrier lifetime is achieved when Al_2O_3 sample is annealed for 15 min in forming gas in a temperature range from 400℃ to 450℃. In addition, the passivation quality can be further improved when a thin PECVD-SiN_x cap layer is prepared on Al_2O_3, and an effective minority carrier lifetime of2.8 ms and implied Voc of 721 mV are obtained. In addition, several novel methods are proposed to restrain blistering.     

氢化氧化铝的同位素效应研究

在B3LYP/6-311++G(d,p)水平上预测了Al2O3H3分子的较低能量构型.其基态构型具有C s对称性,电子态为1A′.通过研究Al2O3M3和M2(M=H,D,T)的能量E、定容热容C V和熵S,用电子振动近似讨论了Al2O3+3/2M2→Al2O3M3反应的氢同位素效应,得到了Al2O3氢化的热力学函数?H0,?S0,?G0,及平衡压力与温度的关系.研究表明,氧化物Al2O3吸附氢(氘,氚)反应的同位素排代效应顺序为氚排代氘,氘排代氢,与钛等金属的同位素排代顺序相反.但排代效应都非常弱,且随着温度的增加趋于消失.     

关于MgB2/Al2O3超导薄膜电阻转变和各向异性的研究

利用电子束蒸发方法将MgB2超导薄膜沉积到Al2O3(001)衬底上.采用标准的四引线法研究了磁场平行和垂直超导薄膜ab平面下的电阻转变.一个激活能模型 U(T,H)= U0(1-T/(Tc+δ))n (1-H/Hc2(0))m被建立用来分析超导薄膜磁通线的激活能和电阻转变,结果表明该模型能够在整个转变温度范围描述超导体磁通线的激活能和电阻转变.另外,利用多项式Hc2(t)=Hc2(0)+At+Bt2分析了MgB2/Al2O3超导薄膜的上临界磁场,获得了该超导薄膜的各向异性参数γ=Hc2ab(0)/Hc2c(0)= 2.26.     

基于透射光谱确定溅射Al2O3薄膜的光学（已撤稿）

基于反应磁控溅射Al₂O₃薄膜的紫外—可见—近红外透射实验光谱,采用Swanepoel方法结合Wemple-DiDomenico色散模型,方便地导出了Al₂O₃薄膜在200—1100 nm波长范围内的光学常数,包括折射率、色散常数、膜层厚度、吸收系数及能量带隙.研究发现反应磁控溅射Al₂O₃薄膜具有高折射率(1.556— 1.76,测试波长为550 nm)、低吸收和直接能量带隙(3.91—4.20 eV)等光学特性,而且其光学常数对薄膜制备过程中的重要工艺参数——膜层后处理温度表现出强烈的依赖性.此外,在膜层的弱吸收和中等吸收光谱区域内,计算得到的折射率色散曲线与分光光度法的测试结果基本符合,说明本实验中所建立的计算方法在确定反应磁控溅射Al₂O₃薄膜光学常数方面的可靠性. 关键词： 光学常数 Swanepoel方法 2O₃薄膜')" href="#">Al₂O₃薄膜 热处理     

Concentration dependent fluorescent characteristics of Ti~（3＋） ion doped sapphire crystal

ＣｏｎｃｅｎｔｒａｔｉｏｎｄｅｐｅｎｄｅｎｔｆｌｕｏｒｅｓｃｅｎｔｃｈａｒａｃｔｅｒｉｓｔｉｃｓｏｆＴｉ￣（３＋）ｉｏｎｄｏｐｅｄｓａｐｐｈｉｒｅｃｒｙｓｔａｌＬＩＵＪｉａｎｈｕａ；ＤＥＮＧＰｅｉｚｈｅｎ；ＧＡＮＦｕｘｉ（ＳｈａｎｇｈａｉＩｎｓｔｉｔ...     

Emerging blue‐UV luminescence in cerium doped YAG nanocrystals

Time‐resolved luminescence properties of Ce³⁺ doped Y₃Al₅O₁₂ (YAG) nanocrystals have been studied by means of vacuum‐ultraviolet excitation spectroscopy. It was discovered that additionally to the regular Ce³⁺ yellow‐green emission which is well‐known luminescence in YAG, new emission covering a broad spectral range from 2.7 eV to 3.5 eV was revealed in the luminescence spectra for all YAG:Ce nanocrystals studied. This blue‐UV emission has fast decay time about 7 ns as well as intensive well‐resolved excitation band peaking at 5.9 eV and, in contrast to green Ce³⁺ emission, practically is not excited at higher energies. The origin of the blue‐UV emission is tentatively suggested and discussed. (© 2016 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Surface guided modes in an aluminum oxide thin film

Energy losses due to the excitation of surface guided waves have been observed in inelastic electron scattering from thin films of aluminum oxide.