Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition

Nickel oxide (NiO) thin films were prepared by reactive pulsed laser deposition on thermally oxidized Si substrates in 10 Pa oxygen pressure. The substrate temperature during deposition was varied and its influence on the structural, electrical and nanomechanical properties was studied. It was proved that the structural properties were affected by the increase of substrate temperature improving the crystalline structure. Furthermore, a higher substrate temperature resulted in a thicker NiO film, which was attributed to an increased grain size. This effect influenced the electrical properties, too. Resistivity measurements showed that it increased with the increase of substrate temperature. For the first time, the nanomechanical properties of NiO films were studied. The formation and improvement of crystalline structure affected the nanomechanical properties. Nanoindentation testing of NiO thin films revealed an increase of hardness (H) and elastic modulus (E) and a decrease of surface roughness when increasing the substrate temperature.     

Characterization of DC reactive magnetron sputtered NiO films using spectroscopic ellipsometry

Thin NiO films were deposited at 500 °C on n-type Si(1 1 1) by a DC reactive magnetron sputtering in a gas mixture of oxygen and argon. The ratio between the flow rates of oxygen and argon was respectively set at 1:4, 1:2, and 1:1. The dependence of structures and optical properties of NiO films were investigated using grazing incidence X-ray diffraction and spectroscopic ellipsometry in the spectral region of 1.5-5.0 eV. Ni-rich NiO films were obtained when the ratio between the flow rates of oxygen and argon was 1:4 and 1:2 in sputtering process. And when the ratio was 1:1, a relatively pure NiO film was formed. The partial pressure of oxygen could significantly influence the thickness and roughness of films. Refractive index n, extinction coefficient k, and direct gap energy and indirect gap energy of the NiO films were also subject to the influence of the partial pressure of oxygen.     

Effects of post-thermal treatments on morphological and optical properties of NiO/Ni(OH)2 thin films synthesized by solution growth

Room temperature deposition of PVP capped nanostructured NiO/Ni(OH)₂ thin film, the morphological and optical characterizations by solution growth technique are reported. The nanostructured thin films which were deposited on optical glass substrates were annealed at different temperatures and then subjected to structural, morphological and optical characterizations. X-ray diffraction measurements of the films revealed that higher temperatures during the thermal treatment enhanced the crystallinity of the thin films. The SEM surface micrographs show non-interconnected uniformly deposited fibre-like structures with approximate lengths between 400 and 1200 nm. The optical band gap energy roughly decreased from about 2.7 eV to about 2.2 eV with thermal treatment. The absorbance of the thin films annealed at 300 and 400 °C was as high as 90% in the visible region of the electromagnetic spectrum. These materials could be useful in solar thermal conversion processes.     

Facilely fabricated Sr@NiO/FTO films and their characterizations for opto-nonlinear applications

Nickel oxide (NiO) is found to have several fascinating applications in optoelectronics and spintronic devices. Hence, herein we facilely fabricated the NiO thin films with 0.0, 1.0, 2.5 and 5.0 wt.% Sr doping by low-cost spin coater at RT. The single-phase confirmation of Sr@NiO films was done by X-ray diffraction and FT-Raman analyses. The crystallite size was estimated through Scherrer rule and noted to lie between 13 to 31 nm. The broad Raman peaks indicate low dimension nanostructured films formation. Sr doping in NiO was detected by EDX spectra and its homogeneity in final film by SEM e-mapping. AFM analysis revealed nano-spherical grains in all films. The grown films were tested for optical transparency and noticed that the films are transparent viz. ~ 45 to 65% over 500 to 1400 nm wavelength region. The direct energy gap and refractive index was determined and lies between 3.74 to 3.84 eV and 1.6 and 2.2 in the visible, correspondingly. The values of dielectric constant were calculated in range from 2 to 60. The linear, third order nonlinear and nonlinear refractive index values are noted to be enhanced by Sr content in energy range from 1 to 4 eV. The enhanced energy gap and nonlinear activities signify the importance of the grown Sr@NiO films for optoelectronics.     

Ultra smooth NiO thin films on flexible plastic (PET) substrate at room temperature by RF magnetron sputtering and effect of oxygen partial pressure on their properties

Transparent p-type nickel oxide thin films were grown on polyethylene terephthalate (PET) and glass substrates by RF magnetron sputtering technique in argon + oxygen atmosphere with different oxygen partial pressures at room temperature. The morphology of the NiO thin films grown on PET and glass substrates was studied by atomic force microscope. The rms surface roughnesses of the films were in the range 0.63-0.65 nm. These ultra smooth nanocrystalline NiO thin films are useful for many applications. High resolution transmission electron microscopic studies revealed that the grains of NiO films on the highly flexible PET substrate were purely crystalline and spherical in shape with diameters 8-10 nm. XRD analysis also supported these results. NiO films grown on the PET substrates were found to have better crystalline quality with fewer defects than those on the glass substrates. The sheet resistances of the NiO films deposited on PET and glass substrates were not much different; having values 5.1 and 5.3 kΩ/□ and decreased to 3.05, 3.1 kΩ/□ respectively with increasing oxygen partial pressure. The thicknesses of the films on both substrates were ∼700 nm. It was also noted that further increase in oxygen partial pressure caused increase in resistivity due to formation of defects in NiO.     

Preparation of composition-controlled silicon oxynitride films by sputtering; deposition mechanism,and optical and surface properties

Silicon oxynitride films have been grown on silicon by current-controlled reactive sputtering. The content of oxygen in the films could be well controlled by regulating the sputtering current under the reactive gas of Ar+ N₂ with an oxygen content of around 3%. The atomic ratio of oxygen to nitrogen in the silicon oxynitride film became larger with increasing sputtering current. It has been found that electron irradiation of the silicon substrate induces adsorption of oxygen and nitrogen. The degree of oxygen adsorption was about ten times larger than that of nitrogen. This phenomenon is a key mechanism in controlling the film composition. The adsorptive mechanism might be explained by the phenomenon of surface activation by the electron bombardment. Utilizing this technique, wettability by germanium of silicon oxynitride films could be controlled by varying their oxygen and nitrogen contents. A better wetting condition was obtained from films with large atomic ratio of nitrogen to oxygen in the silicon oxynitride film.     

NiO透明导电薄膜的制备及在聚合物太阳能电池中的应用

采用磁控溅射法制备出透明导电氧化物NiO薄膜.椭偏(SE)测试表明NiO薄膜在可见光区域透光性良好,通过调节生长、退火温度可调控NiO的折射率.采用X射线衍射(XRD)、扫描电子显微镜(SEM)手段研究表明,通过退火、改变衬底温度等,可有效改变NiO薄膜的晶体结构以及表面形貌,实现对NiO导电性的调控. 采用优化后的NiO材料为阳极阻挡层制备出的聚合物太阳能电池器件的效率为2.26%,是同等条件下采用 PEDOT:PSS阻挡层的电池器件的3倍以上.     

不同氧气流量对直流磁控溅射TiO2薄膜的影响

采用直流反应磁控溅射法,以高纯Ti为靶材,高纯O2为反应气体,制备了TiO2薄膜.研究了氧气流量对薄膜结晶取向、表面形貌和光学性能的影响.研究发现,TiO2薄膜主要呈锐钛矿TiO2(101)择优取向,当氧气流量较小时,薄膜中还含有金属Ti(100),氧气流量较大时,薄膜含TiO2(101)和TiO2(004),成多晶态;薄膜的粗糙度和颗粒大小都随氧气流量的增大而增大;薄膜在400～1 100nm可见-近红外波段有较高的透射率并且其吸收峰随着氧气流量的增大而红移,当氧气流量为5sccm时,平均透射率最高.     

Optical CO gas sensing using nanostructured NiO and NiO/SiO2 nanocomposites fabricated by PLD and sol–gel methods

Several kinds of NiO-based nanostructured films were prepared by pulsed-laser deposition (PLD) and sol–gel method, and CO sensing properties (1%, balanced by N₂) of these films were studied. The sensitivity, defined as a difference of optical transmittance by gas atmospheric change (T=T(CO)-T(air)), increased with increasing NiO content for the sol–gel prepared films, and increased with the film thickness for the laser deposited NiO films. Sol–gel films exhibited shorter response time than NiO films prepared by PLD under low Ar pressure of 6.7×10^-2 Pa indicating a better gas permeability. A shorter response time was also obtained upon raising argon pressure from 6.7×10^-2 Pa to 8.0 Pa during laser ablation due to the morphological change. Covering a NiO film even with a very thin (0.8 nm) layer of SiO₂ by sputtering drastically reduced the CO sensitivity. The multilayered NiO/SiO₂ films were substantially less sensitive to the CO gas than NiO films due to the same reason. Sensing mechanism of the NiO films is due to catalytic CO oxidation that reduces the concentration of adsorbed O₂ species and results in optical transmittance increase upon change in the environment from air to CO. PACS 81.15.Fg; 81.20.Fw; 83.85.Gk     

Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers - preparation of oxynitride films

Five hundred nanometers of niobium films have been deposited on silicon(1 0 0) wafers with 100 or 300 nm thermally grown oxide by electron beam evaporation and DC magnetron sputtering. SEM and AFM investigations revealed smaller crystallites and rougher surfaces for the evaporated films. The differences in film morphology resulted in lower reflection intensities in XRD for the as-deposited evaporated films. In order to investigate the influence of the structural properties on their chemical reactivities, in a first set of experiments the films were nitrided with molecular nitrogen by rapid thermal processing (RTP) at varying temperatures. In another set of experiments after nitridation in nitrogen at 1000 °C an oxidation step in molecular oxygen at varying temperatures followed. The films showed different reactivities, leading to different rates of nitridation and oxidation. Sputtered films were less reactive than the evaporated films, deduced from the sequence of reaction products dependent on reaction temperature. XRD data indicated that oxynitrides have formed. Elemental depth profiles were measured by secondary ion mass spectrometry (SIMS).     

Vacuum ultraviolet smoothing of nanometer-scale asperities of Poly(methyl methacrylate) surface

Smoothing of the nanometer-scale asperities of a poly(methyl methacrylate) (PMMA) film using vacuum ultraviolet (VUV) with the wavelength λ = 123.6 nm was studied. The exposure time and the residual air pressure in an working chamber were varied during the process of VUV treatment. A nanostructured surface of PMMA film is used as a sample to be exposed. The nanostructured surface of the PMMA film was obtained by treating the initially smooth spin-coated film in oxygen radio-frequency plasma. The degree of VUV exposure is estimated using changes in the morphology and roughness of the nanostructured surface, which were determined by atomic-force microscopy (AFM). Recognition of morphological surface features on the AFM-images and determination of main geometrical characteristics of these features are performed by using virtual feature-oriented scanning method. It is discovered by morphology and Fourier spectra that the nanostructured surface of the PMMA film is partially ordered. The developed VUV smoothing procedure can be used to treat the electron-beam, UV, and X-ray sensitive PMMA resists, PMMA elements of microelectromechanical systems, biomedical PMMA implants, as well as to certify nanotechnological equipment incorporating UV radiation sources.     

Nanostructured ZnO thin films by chemical bath deposition in basic aqueous ammonia solutions for photovoltaic applications

This paper presents further insights and observations of the chemical bath deposition (CBD) of ZnS thin films using an aqueous medium involving Zn-salt, ammonium sulfate, aqueous ammonia, and thioure. Results on physical and chemical properties of the grown layers as a function of ammonia concentration are reported. Physical and chemical properties were analyzed using scanning electron microscopy (SEM), X-ray energy dispersive (EDX), and X-ray diffraction (XRD). Rapid growth of nanostructured ZnO films on fluorine-doped SnO₂ (FTO) glass substrates was developed. ZnO films crystallized in a wurtzite hexagonal structure and with a very small quantity of Zn(OH)₂ and ZnS phases were obtained for the ammonia concentration ranging from 0.75 to 2.0 M. Flower-like and columnar nanostrucured ZnO films were deposited in two ammonia concentration ranges, respectively: one between 0.75 and 1.0 M and the other between 1.4 and 2.0 M. ZnS films were formed with a high ammonia concentration of 3.0 M. The formation mechanisms of ZnO, Zn(OH)₂, and ZnS phases were discussed in the CBD process. The developed technique can be used to directly and rapidly grow nanostructured ZnO film photoanodes. Annealed ZnO nanoflower and columnar nanoparticle films on FTO substrates were used as electrodes to fabricate the dye sensitized solar cells (DSSCs). The DSSC based on ZnO-nanoflower film showed an energy conversion efficiency of 0.84%, which is higher compared to that (0.45%) of the cell being constructed using a photoanode of columnar nanoparticle ZnO film. The results have demonstrated the potential applications of CBD nanostructured ZnO films for photovoltaic cells.     

Nanoporous nickel oxide thin films and its improved electrochromic performance: Effect of thickness

Electrochromic properties of chemically bath deposited nanoporous NiO thin films were investigated as a function of film thickness using Ni sulphate precursor, aqueous ammonia and potassium persulphate as complexing and oxidizing agents respectively. The films were characterized for their structural, morphological, optical and electrochromic properties using X-ray diffraction, scanning electron microscopy, FT-IR spectroscopy, cyclic voltammetry, chronoamperometry and optical transmittance studies. X-ray diffraction patterns show that the films are polycrystalline, consisting of NiO cubic phase. Infrared spectroscopy results show the presence of free hydroxyl ion and water in NiO thin films. SEM micrographs revealed nanoporous nature composed of interconnected nanoporous network, forming well defined 3D nano envelopes. The optical band gap energy was found to be decreased from 3.22 to 2.80 eV with increasing film thickness. The electrochromic properties of all the films were investigated in aqueous (KOH) and non aqueous (LiClO₄-PC) electrolyte by means of cyclic voltammetry (CV), chronocoulometry (CC) and optical studies. The transmittance modulations or optical density differences during the coloring/bleaching process were found to be increased with the film thickness. This increment in optical differences led to an increase in coloration efficiency (CE) to about 95 cm²/C, which is two times more than that observed in KOH and response time of 2.9 s for bleaching (reduction) and 3.5 s for coloration (oxidation) observed for the film deposited at 60 min with excellent electrochemical stability up to 3000 c/b cycles in LiClO₄-PC electrolyte.     

Synthesis of CdS nanostructures using template-assisted ammonia-free chemical bath deposition

CdS micro- and nano-structures (micro/nanotubes and nanostructured films) were obtained by ammonia-free chemical bath deposition using polymer templates (ion track-etched polycarbonate membranes and poly(styrene-hydroxyethyl methacrylate) nanosphere arrays). The semiconductor structures were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), optical absorption, photoluminescence and electrical measurements. The diameters of CdS tubes are between 300 nm and few microns and the lengths are up to tens of micrometers. The SEM images prove that the CdS films are nanostructured due to the deposition on the polymer nanosphere arrays. For both CdS structures (tubes and films) the XRD patterns show a hexagonal phase. The optical studies reveal a band gap value of about 2.5?2.6 eV and a red luminescence at ～1.77 eV. A higher increase of conductivity is observed for illuminating the CdS nanostructured film when compared to the simple semiconductor film. This is a consequence of the periodic patterning induced by the polymer nanosphere array.     

不同氧气流量对直流磁控溅射TiO2薄膜的影响

采用直流反应磁控溅射法,以高纯Ti为靶材,高纯O₂为反应气体,制备了TiO₂薄膜.研究了氧气流量对薄膜结晶取向、表面形貌和光学性能的影响.研究发现,TiO₂薄膜主要呈锐钛矿TiO₂(101)择优取向,当氧气流量较小时,薄膜中还含有金属Ti(100),氧气流量较大时,薄膜含TiO₂(101)和TiO₂(004),成多晶态;薄膜的粗糙度和颗粒大小都随氧气流量的增大而增大;薄膜在400~1100nm可见-近红外波段有较高的透射率并且其吸收峰随着氧气流量的增大而红移,当氧气流量为5sccm时,平均透射率最高.     

Comparison of the optical responses of O-poor and O-rich thermochromic VOX films during semiconductor-to-metal transition

O-poor and O-rich thermochromic vanadium oxide (VO_X) nanostructured thin films were prepared by applying reactive direct current magnetron sputtering and post-annealing in oxygen ambient. UV–visible spectrophotometer and spectroscopic ellipsometry were used to investigate the optical properties of films. It was found that, when the O-poor VO_X thin film underwent semiconductor-to-metal transition, the values of optical conductivity and extinction coefficient in the visible region increased due to the existence of occupied band-gap states. This noticeable feature, however, was not observed for the O-rich film, which showed a similar optical behavior with the stoichiometric crystalline VO₂ films reported in the literatures. Moreover, the O-poor VO_X film exhibits consistent variations of transmission values in the visible/near-infrared region when it undergoes semiconductor-to-metal transition.     

Preparation and characterization of NiFe2O4/NiO composite film via a single-source precursor route

NiFe₂O₄/NiO nanocomposite thin films have been successfully prepared through a facile route using nickel iron layered double hydroxide (NiFe-LDH) as a single-source precursor. This synthetic approach mainly involves the formation of NiFe-LDH film by casting the slurry of NiFe-LDH precursor on the α-Al₂O₃ substrate, followed by high-temperature calcination. The composition, microstructure and properties of the films were characterized in detail by X-ray diffraction (XRD), Fourier transform infrared (FT-IR), scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDX) and vibrating sample magnetometer (VSM). The results indicate that NiFe₂O₄/NiO composite film was composed of granules with diameter less than 100 nm, and the thickness of the film was in the range 1-2 μm. The magnetization of the film can be tuned by alternating the Ni/Fe molar ratio of LDH precursor. In addition, the method developed should be easily extended to fabricate other MFe₂O₄/MO composite film systems with specific applications just by an appropriate combination of divalent/trivalent composition in the precursor of LDHs.     

Growth and characterization of β-SiC films obtained by fs laser ablation

We achieved the growth of cubic silicon carbide (SiC) films on (1 0 0)Si substrates by pulsed laser deposition (PLD) at moderate temperatures such as 750 °C, from a SiC target in vacuum. The as-deposited films are morphologically and structurally characterized by scanning electron microscopy (SEM), conventional and high-resolution transmission electron microscopy (TEM/HRTEM). The morphology of deposited films is dominated by columns nucleated from a thin nanostructured beta silicon carbide (β-SiC) interface layer. The combined effects of columnar growth, tilted facets of the emerging columns and the presence of particulates on the film surface, lead to a rather rough surface of the films.     

Structural evolution and epitaxial stabilisation of pulsed laser deposited Sm0.55Nd0.45NiO3 solid solution nanostructured films on undoped Si (1 0 0) and NdGaO3 substrates

We report on the effects of substrate, ambient oxygen pressure and deposition time on the crystal structure, and morphology of Sm_0.55Nd_0.45NiO₃ solid solution nanostructured films synthesized by pulsed-laser deposition. In each film the structure was found to be consistent with a perovskite structure with preferential planes growth and reveals a strong orientation along the orthorhombic (2 1 0) plane of the perovskite subcell for the film deposited on NdGaO₃ where highly crystalline films were obtained within 15 min deposition time with a low surface roughness of 8.79 nm. Similar structure is observed on Si (1 0 0) substrate only at O₂ pressure of 0.4 mbar. The surface morphology of the different samples shows a net dense film structure with several droplets population. The nano-scaled droplets are in general spherical in shape; a detailed analysis indicates that the laser ablation of this nickelate family is governed to a certain extent by a heat transfer phenomenon.     

Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

Amorphous and polycrystalline zirconium oxide thin films have been deposited by reactive rf magnetron sputtering in a mixed argon/oxygen or pure oxygen atmosphere with no intentional heating of the substrate. The films were characterized by high-resolution transmission electron microscopy (HR-TEM), atomic force microscopy (AFM), spectroscopic ellipsometry (SE), and capacitance versus voltage (C-V) measurements to investigate the variation of structure, surface morphology, thickness of SiO₂-like interfacial layer as well as dielectric characteristics with different oxygen partial pressures. The films deposited at low oxygen partial pressures (less than 15%) are amorphous and dense with a smooth surface. In contrast, the films prepared at an oxygen partial pressure higher than 73% are crystallized with the microstructure changing from the mixture of monoclinic and tetragonal phases to a single monoclinic structure. The film structural transition is believed to be consequences of decrease in the oxygen vacancy concentration in the film and of increase of the energetically neutral particles in the plasma due to an increased oxygen partial pressure. SE measurements showed that significant interfacial SiO₂ growth has taken place above approximately 51%. The best C-V results in terms of relative dielectric constant values are obtained for thin films prepared at an oxygen partial pressure of 15%.