Improvement of photoluminescence and electroluminescence characteristics of MBE-grown In0.53Ga0.47As/In0.53(Ga0.6Al0.4)0.47As quantum well laser structure with InGaAlAs digital alloys by thermal annealing

We investigated the effect of rapid thermal annealing (RTA) on the photoluminescence (PL) and electroluminescence of the In_0.53Ga_0.47As/In_0.53(Ga_0.6Al_0.4)_0.47As multiple quantum well (MQW) laser structure with InGaAlAs barrier layers provided by the digital-alloy technique. The SiO₂- (Si₃N₄-) capped samples followed by the RTA exhibited a significant improvement of PL intensity without any appreciable shifts in PL peak energy for settings of up to 750 °C (800 °C) for 45 s. This improvement is attributed to the annealing of nonradiative defects in InAlAs layers of digital-alloy InGaAlAs and partially those near the heterointerfaces of the digital-alloy layers. The InGaAs/InGaAlAs MQW laser diodes fabricated on the samples annealed at 850 °C show a hugely improved lasing performance. Received: 2 September 2002 / Accepted: 3 September 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +82-62/970-2204, E-mail: ytlee@kjist.ac.kr     

Metamorphic growth of InAlAs/InGaAs MQW and InAs HEMT structures on GaAs

The large electron mobility at room temperature and the absence of Schottky barrier to metals make InAs two-dimensional electron gas (2DEG) a good candidate for SPIN-FET (FET—field-effect-transistor) applications. So far the growth was done either on the InAlAs epilayers compositionally matched to InP substrates, or on Sb-based compound semiconductors. Here we aim to grow InAs 2DEG on GaAs substrates by using a strain-relaxing buffer layer. We introduce In_0.4Al_0.6As glue layer to the metamorphic structure and investigate the physical properties of InAlAs/InGaAs multi-quantum-well (MQW) structures via X-ray diffraction, transmission electron microscopy, and photoluminescence. We find that the use of As dimer instead of tetramer and the choice of proper growth temperature are essential for successful growth. InAs-inserted-channel InAlAs/InGaAs inverted high-electron-mobility transistor (HEMT) structures show promising results for SPIN-FET application.     

Residual strain and alloying effects on the vibrational properties of step-graded InxAl1−xAs layers grown on GaAs

Lattice-relaxed In_xAl_1−xAs-graded buffer layers grown by MBE on GaAs substrate have been studied by micro-Raman scattering and photoluminescence (PL). In these heterostructures, the indium composition was gradually increased in six or four intermediate layers each of 100 nm thickness. The alloying effect in the In_xAl_1−xAs layers has been interpreted using the modified random element isodisplacement (MREI) formalism. The dependence in the MREI model of the longitudinal optical (LO) phonon energy and the In composition in the InAlAs alloy with PL measurements and Raman analysis allow the evaluation of disorder degree and give the In composition in the InAlAs active layers. The obtained InAs- and AlAs-like phonon frequencies from the fitting of Raman spectra are in reasonable agreement with those calculated according to the MREI model. Raman spectra show that InAs-like phonon frequencies are not strongly dependent either on the buffer structure or on the residual strain in the active layers. Using the AlAs-like LO phonon frequency shifts, we have calculated the residual strain in the In_xAl_1−xAs active layer. Raman results show that the slope of the grade is an important parameter that allows the growth of samples with good quality. The lower residual strain value was obtained by thick buffer with a smaller grading rate. PL measurements show that In compositions of active layers of the different studied samples are slightly higher than those measured during growth.     

Crystallinity and interdiffusion in InP/InGaAs quantum wells grown by Hydride VPE

This paper reports the results of a study on interfacial quality and thermal interdiffusion for InP/InGaAs Quantum Wells (QW) grown by hydride VPE. By controlling well layer as thin as 25 Å, it was estimated that island and valley, whose height was one monolayer and whose lateral size was one third of exciton radius, existed at the interface. For the first time, interdiffusion coefficients for InP/InGaAs QW were obtained from 77K PL peak energy shift. Typical values were 2.5×10⁻¹⁹ cm²/sec and 1.5×10⁻¹⁸ cm²/sec for the annealing temperature of 700°C and 750°C, respectively. These values are over 10² times larger than that in AlGaAs/GaAs QW, and less 10⁻² times smaller than that in InAlAs/InGaAs QW.     

Raman study of V/III flux ratio effect in InP/InAlAs/InP heterostructures grown by MOCVD

Micro‐Raman measurements have been carried out in order to study the V/III flux ratio effect in InP/InAlAs/InP heterostructures grown by metal‐organic chemical vapor deposition (MOCVD). Photoluminescence (PL) studies in InP/InAlAs/InP heterostructures [1] , [2] show a strong dependence of the PL band linewidth on V/III molar ratio. In addition to the observation of the two‐mode behavior and the disorder activated modes in InAlAs alloy, an analysis of Raman spectra shows a line shape broadening and wavenumber shift of Raman peaks for various V/III molar ratios, with minimum linewidth and lattice mismatch occurring at V/III = 50. Also, a strong dependence on the composition modulation of the AlAs‐like longitudinal optic (LO_AlAs−like) phonon was observed due to clustering. Calculation of the in‐plane strain shows that the lattice mismatch between the epilayer and the substrate is relatively insensitive to flux ratio variation within the range investigated. Therefore, the high arsenic overpressures used have an insignificant adverse effect on the quality of the hetero‐interfaces. Copyright © 2009 John Wiley & Sons, Ltd.     

Photoluminescence characteristics of Se-doped ZnGa2O4:Mn2+ thin-film phosphors grown by pulsed laser deposition on Al2O3(0001) substrates

Se-doped ZnGa₂O₄:Mn²⁺ thin-film phosphors have been grown using a pulsed laser deposition technique at various growth conditions. Structural characterization was carried out on a series of Se-doped ZnGa₂O₄:Mn²⁺ films grown on Al₂O₃(0001) substrates using Zn-rich ceramic targets. The results of X-ray diffraction patterns showed that the lattice constants of the films decrease with the substitution of Se for the oxygen in the ZnGa₂O₄. Photoluminescence (PL) of Se-doped ZnGa₂O₄:Mn²⁺ thin films has indicated that Al₂O₃(0001) is a promising substrate for the growth of high-quality Se-doped ZnGa₂O₄:Mn²⁺ films. The emission spectra of Se-doped ZnGa₂O₄:Mn²⁺ films show a broad band extending from 479 to 550 nm and peaking at 508 nm. In particular, the incorporation of Se into the ZnGa₂O₄ lattice could induce an increase in the PL. The PL peak intensity of the Se-doped ZnGa₂O₄:Mn²⁺ films is a factor of 2.8 larger than that of the ZnGa₂O₄:Mn²⁺ films. This phosphor is promising for applications in flat-panel displays. PACS 78.20.-e; 78.55.-m; 78.66.-w     

Infrared magneto-photoluminescence spectra and electron–hole g-factor of an InAs-inserted channel InGaAs/InAlAs heterostructure

We performed infrared magneto-photoluminescence (PL) spectroscopy on an InAs-inserted-channel InGaAs/InAlAs heterostructure. Series of Landau levels were clearly observed in the infrared PL spectra. From the energy separation between σ+ and σ− components of PL, the electron–hole g-factor in each Landau level were determined. We discuss the obtained Landau fan-diagram from the points that nonparabolicity of conduction band structure and penetration of electron wavefunction into InGaAs layer.     

InP-based InGaAs/InAlGaAs digital alloy quantum well laser structure at 2 μm

The structural and optical characteristics of InP-based compressively strained InGaAs quantum wells have been significantly improved by using gas source molecular beam epitaxy grown InAs/In 0.53 Ga 0.47 As digital alloy triangular well layers and tensile In 0.53 Ga 0.47 As/InAlGaAs digital alloy barrier layers.The x-ray diffraction and transmission electron microscope characterisations indicate that the digital alloy structures present favourable lattice quality.Photoluminescence (PL) and electroluminescence (EL) measurements show that the use of digital alloy barriers offers better optical characteristics than that of conventional random alloy barriers.A significantly improved PL signal of around 2.1 μm at 300 K and an EL signal of around 1.95 μm at 100 K have been obtained.     

RF-plasma assisted pulsed laser deposition of nitrogen-doped SrTiO3 thin films

Perovskite-type nitrogen substituted SrTiO₃ thin films were deposited with a one-step process by RF-plasma assisted pulsed laser deposition from a SrTiO₃ target using a N₂ plasma, while deposition with a NH₃ plasma yields films with almost no incorporated nitrogen. The deposited films exhibit a cubic perovskite-type crystal structure and reveal oriented growth on MgO(100) substrates. The unit cell parameters of the studied N-doped SrTiO₃ films range within 3.905<a<3.918 Å, which is slightly larger than for SrTiO₃ (a=3.905 Å). The nitrogen content in the deposited films varies from 0.2 to 0.7 atom%. The amount of incorporated nitrogen in the films decreases with increasing RF-power, while the N₂ flow rate does not have any pronounced influence on the N content. Nitrogen incorporation results in an increased optical absorption at 400–600 nm, which is associated with N(2p) energy states that have a higher energy level than the valence band in strontium titanate. The optical band gap energies in the studied N-doped SrTiO₃ films are at 3.2–3.3 eV, which is very similar to that of pure strontium titanate (～3.2 eV). Films deposited with NH₃ for the RF-plasma exhibit a lower degree of crystallinity and reveal almost no nitrogen incorporation into the crystal lattice.     

Improved quantitative analysis of Cu(In,Ga)Se2 thin films using MCs+-SIMS depth profiling

The chalcopyrite semiconductor, Cu(InGa)Se₂ (CIGS), is popular as an absorber material for incorporation in high-efficiency photovoltaic devices because it has an appropriate band gap and a high absorption coefficient. To improve the efficiency of solar cells, many research groups have studied the quantitative characterization of the CIGS absorber layers. In this study, a compositional analysis of a CIGS thin film was performed by depth profiling in secondary ion mass spectrometry (SIMS) with MCs⁺ (where M denotes an element from the CIGS sample) cluster ion detection, and the relative sensitivity factor of the cluster ion was calculated. The emission of MCs⁺ ions from CIGS absorber elements, such as Cu, In, Ga, and Se, under Cs⁺ ion bombardment was investigated using time-of-flight SIMS (TOF-SIMS) and magnetic sector SIMS. The detection of MCs⁺ ions suppressed the matrix effects of varying concentrations of constituent elements of the CIGS thin films. The atomic concentrations of the CIGS absorber layers from the MCs⁺-SIMS exhibited more accurate quantification compared to those of elemental SIMS and agreed with those of inductively coupled plasma atomic emission spectrometry. Both TOF-SIMS and magnetic sector SIMS depth profiles showed a similar MCs⁺ distribution for the CIGS thin films.     

RHEED study on continuously repeated step flow and layer-by-layer growth modes in SrRuO3/SrMnO3 superlattice

Nanolayered superlattices composed of ferromagnetic SrRuO₃ and antiferromagnetic SrMnO₃ layers were grown on SrTiO₃ (100) substrates by pulsed laser deposition. Multilayers were grown under predetermined synthesis conditions resulting in growth of SrRuO₃ and SrMnO₃ by step flow and layer-by-layer modes, respectively. The growth of SrMnO₃ was observed to occur through the layer-by-layer during the entire deposition process despite the expected increase in surface roughness because of the incorporation of SrRuO₃ upper layers. Monitoring by reflection high-energy electron diffraction (RHEED) revealed that the growth of every SrMnO₃ layer consisted of a pre-stage during which the gaps on the relatively rough SrRuO₃ surface were filled before the actual growth of the SrMnO₃ layer, which resulted in incomplete half oscillation and change from spot patterns to streaky patterns. The in-plane lattice constant did not show any considerable change in the case of SrRuO₃ and SrMnO₃ layers, despite the considerable lattice mismatch between the two materials (SrRuO₃, SrMnO₃) and SrTiO₃. On the other hand, the RHEED patterns showed the existence of lattice mismatch effects in the out-of-plane lattice constant, which showed significant strains of opposite signs in the different layers, indicating a strong dependence on the composition of the layers and superlattice periodicity. In this paper, the growth characteristics of a SrRuO₃/SrMnO₃ multilayer along with its magnetic properties will be discussed.     

SIMS study of annealing effect on element distribution in free-standing Al/Si and Zr/ZrSi<Subscript>2</Subscript> multilayer films

The results of secondary ion mass spectrometry (SIMS) depth profile analysis of free-standing Al/Si and Zr/ZrSi₂ multilayer films by a TOF.SIMS-5 instrument are reported for the first time. A prestudy of elemental composition in Zr and ZrSi₂ single layers and Zr/ZrSi₂ multilayer films deposited on Si substrates with sublayers revealed enhanced diffusion of carbon in Zr layers. Ion sputtering and charge neutralization conditions were determined to provide fixed position of free-standing thin films during analysis. An elemental composition of 100-nm-thick Zr/ZrSi₂ multilayer structures with Mo and B₄C protective layers was measured prior and after laser annealing.     

Enhanced luminescence in ZnGa<Subscript>2</Subscript>O<Subscript>4-x</Subscript>S<Subscript>x</Subscript>:Mn<Superscript>2+</Superscript> thin-film phosphors grown on MgO(100) substrate

Mn-doped ZnGa₂O_4-xS_x thin-film phosphors have been grown using a pulsed laser deposition technique at varying growth conditions. Structural characterization was carried out on a series of ZnGa₂O_4-xS_x:Mn²⁺ films grown on MgO(100) substrates using Zn-rich ceramic targets. Oxygen pressure was fixed at 100 mTorr and substrate temperatures were varied from 500 to 700 °C. The results of X-ray-diffraction patterns showed that the lattice constants of the ZnGa₂O_3.95S_0.05:Mn²⁺ thin films decrease with the substitution of sulfur for the oxygen in ZnGa₂O₄. Measurements of photoluminescence (PL) properties of ZnGa₂O_4-xS_x:Mn²⁺ thin films have indicated that MgO(100) is one of the most promising substrates for the growth of high-quality ZnGa₂O_4-xS_x:Mn²⁺ thin films. In particular, the incorporation of sulfur into the ZnGa₂O₄ lattice could induce a remarkable increase of PL. The highest green-emission intensity was observed with ZnGa₂O_3.95S_0.05:Mn²⁺ films, whose brightness was increased by a factor of 3.5 in comparison with that of ZnGa₂O₄:Mn²⁺ films. This phosphor may be promising for application to flat-panel displays. PACS 78.20.-e; 78.55.-m; 78.66.-w     

低温缓冲层对氧化锌薄膜质量的影响

利用金属有机化学气相沉积(MOCVD)法,在Si衬底上外延生长ZnO薄膜。为了改善氧化锌薄膜的质量,首先在Si衬底上生长低温ZnO缓冲层,然后再生长高质量的ZnO薄膜。通过XRD、SEM、光致发光(PL)光谱的实验研究,发现低温ZnO缓冲层可有效降低ZnO薄膜和Si衬底之间的晶格失配以及因热膨胀系数不同引起的晶格畸变。利用低温缓冲层生长的ZnO薄膜的(002)面衍射峰的强度要比直接在Si上生长的ZnO薄膜样品的高,并且衍射峰的半高宽也由0.21°减小到0.18°,同时有低温缓冲层的样品室温下的光致发光峰也有了明显的增高。这说明利用低温缓冲层生长的ZnO薄膜的结晶质量和光学性质都得到了明显改善。     

Combined SIMS,AES, and XPS investigations of tantalum oxide layers

Thick layers of tantalum oxide prepared by thermal and anodic oxidation have been studied by combined SIMS, AES, and XPS during depth profiling by 3keV Ar⁺ ion sputtering. The chemical composition of these films is revealed by the OKLL and O 1s signals and by the “lattice valence” parameter determined from the TaO _n ^± intensities. Thus the anodic film consists of a contamination layer, an oxygen-rich reactive interface and a thick homogeneous oxide layer followed by an interface to the Ta metal. The thermal oxide shows an oxygen concentration decreasing with depth and a broad oxide-metal interface. In both cases, carbon contamination (carbide) prevents the application of the valence model to the clean Ta substrate. The sputtering yield of the oxides was found to be 0.6 Ta₂O₅/ion.     

Coupling between Ge-nanocrystals and defects in SiO2

Room temperature photoluminescence (PL) at around 600 nm from magnetron-sputtered SiO₂ films co-doped with Ge is reported. The PL signal is observed in pure SiO₂, however, its intensity increases significantly in the presence of Ge-nanocrystals (Ge-nc). The PL intensity has been optimized by varying the temperature of heat treatment, type of gas during heat treatment, concentration of Ge in the SiO₂ films, and gas pressure during deposition. Maximum intensity occurs when Ge-nc of around 3.5 nm are present in large concentration in SiO₂ layers deposited at fairly high gas pressure. Based on time resolved PL, and PL measurements after α-particle irradiation or H passivation, we attribute the origin of the PL to a defect in SiO₂ (probably an O deficiency) that is excited through an energy transfer from Ge-nc. There is no direct PL from the Ge-nc; however, there is a strong coupling between excitons created in the Ge-nc and the SiO₂ defect.     

Sputter depth profiling by secondary ion mass spectrometry coupled with sample current measurements

Ion-induced secondary electron emission determined via sample current measurements (SCM) was employed as a useful adjunct to conventional secondary ion mass spectrometry (SIMS). This paper reports on the results of 3-6 keV O₂⁺ SIMS-SCM sputter depth profiling through CrN/AlN multilayer coatings on nickel alloy, titanium dioxide films deposited on stainless steel, and corrosion layers formed onto surface of magnesium alloy after long-term interaction with an ionic liquid. For Au/AlNO/Ta films on silicon, in addition to SIMS-SCM profiles, the signal of mass-energy separated backscattered Ne⁺ ions was monitored as a function of the depth sputtered as well. The results presented here indicate that secondary electron yields are less affected by “matrix effect” than secondary ion yields, and at the same time, more sensitive to work function variations and surface charging effects. SCM depth profiling, with suppression of “the crater effect” by electronic gating of the registration system is capable of monitoring interfaces in the multilayer structure, particularly, metal-dielectric boundaries. In contrast to SIMS, SCM data are not influenced by the angle and energy windows of an analyser. However, the sample current measurements provide lower dynamic range of the signal registration than SIMS, and SCM is applicable only to the structures with different secondary electron emission properties and/or different conductivity of the layers. To increase the efficiency, SCM should be accompanied by SIMS measurements or predetermined by proper calibration using other elemental-sensitive techniques.     

A SIMS study on Mg diffusion in Zn0.94Mg0.06O/ZnO heterostructures grown by metal organic chemical vapor deposition

Zn_0.94Mg_0.06O/ZnO heterostructures have been grown on 2 in. sapphire wafer using metal organic chemical vapor deposition (MOCVD). Photoluminescence (PL) mapping demonstrates that Mg distribution on the entire wafer is very uniform (standard deviation of Mg concentration/mean Mg concentration = 1.38%) with average concentration of ∼6%. The effect of annealing on the Mg diffusion in Zn_0.94Mg_0.06O/ZnO heterostructures has been investigated in detail by using secondary ion mass spectrometry (SIMS). All the Mg SIMS depth profiles have been fitted by three Gaussian distribution functions. The Mg diffusion coefficient in the as-grown Zn_0.94Mg_0.06O layer deposited at 700 °C is two orders of magnitude lower than that of annealed samples, which clearly indicates that the deposition temperature of 700 °C is much more beneficial to grow ZnMgO/ZnO heterostructures and quantum wells.     

Improvement of the optical property and uniformity of self-assembled InAs/InGaAs quantum dots by layer-by-layer temperature and substrate rotation

The influence of layer-by-layer temperature and substrate rotation on the optical property and uniformity of self-assembled InAs/In_0.2Ga_0.8As/GaAs quantum dots (QDs) gown with an As₂ source was investigated. An improvement in the optical property of QDs was obtained by the precise control and optimization of growth temperature utilized for each layer, i.e., InAs QDs, InGaAs quantum wells, GaAs barriers and AlGaAs layers, respectively. By using a substrate rotation, the QD density increased from ∼1.4×10¹⁰ to ∼3.2×10¹⁰ cm⁻² and its size also slightly increased, indicating a good quality of QDs. It is found that the use of an appropriate substrate rotation during growth improves the room-temperature (RT) optical property and uniformity of QDs across the wafer. For the QD sample with a substrate rotation of 6 rpm, the RT photoluminescence (PL) intensity is much higher and the standard deviation of RT-PL full-width at half-maximum is decreased by 35% compared to that grown without substrate rotation.     

Improved photoluminescence of pulsed-laser-ablated Y<Subscript>1-x</Subscript>Gd<Subscript>x</Subscript>VO<Subscript>4</Subscript>:Eu<Superscript>3+</Superscript> thin film phosphors by Gd substitution

Gd-substituted Y_1-xGd_xVO₄:Eu³⁺ luminescent thin films have been grown on Al₂O₃(0001) substrates using pulsed-laser deposition. The films grown under different deposition conditions have been characterized using microstructural and luminescent measurements. The crystallinity, surface morphology, and photoluminescence (PL) of the films are highly dependent on the amount of Gd. The photoluminescence (PL) brightness data obtained from Y_1-xGd_xVO₄:Eu³⁺ films grown under optimized conditions have indicated that the PL brightness is more dependent on the surface roughness than the crystallinity of the films. In particular, the incorporation of Gd into the YVO₄ lattice could induce a remarkable increase of PL. The highest emission intensity was observed with Y_0.57Gd_0.40Eu_0.03VO₄ thin film whose brightness was increased by a factor of 2.5 and 1.9 in comparison with that of YVO₄:Eu³⁺ and GdVO₄:Eu³⁺ films, respectively. This phosphor have application to flat panel displays. PACS 78.20.-e; 78.55.-m; 78.66.-w