Atomic structure of Cs layer grown on Si(0 0 1)(2 × 1) surface at room temperature

The atomic structure of Cs atoms adsorbed on the Si(0 0 1)(2 × 1) surface has been investigated by coaxial impact collision ion scattering spectroscopy. When 0.5 ML of Cs atoms are adsorbed on Si(0 0 1) at room temperature, it is found that Cs atoms occupy a single absorption site on T3 with a height of 3.18 ± 0.05 Å from the second layer of Si(0 0 1)(2 × 1) surface, and the bond length between Cs and the nearest Si atoms is 3.71 ± 0.05 Å.     

Selenium adsorption on Cs-covered Si(100) 2×1 surfaces

This report involves the study of Se adsorption on caesiated Si(100) 2×1 surfaces in ultra high vacuum (UHV) using low energy electron diffraction, Auger electron spectroscopy, thermal desorption spectroscopy and work function measurements. Selenium atoms on Cs/Si(100) 2×1 surface adsorb initially on uncaesiated portions of Si and subsequently on the Cs overlayer. The presence of Se increases the binding energy of Cs on Si(100). For Cs and Se coverages above 0.5 ml CsSe and Cs_xSe_ySi_z, compound formation was observed. The coadsorption of Se and Cs induces a high degree of surface disorder, while desorption most probably causes surface etching. The presence of Cs on Si(100) 2×1 surfaces prevents the diffusion of Se into the Si substrate and greatly suppresses the formation of SiSe₂ and SiSe₃, detected when Se is adsorbed on clean Si(100) 2×1 surfaces.     

Charge exchange in Li scattering from Si surfaces

Neutral fractions are measured for 4 keV 7Li(+) scattering from clean, hydrogen-covered, and cesiated Si surfaces. The neutral fraction in scattering from clean Si is approximately 26% and it decreases with hydrogen adsorption. When Cs is adsorbed on Si, the neutral fraction does not distinguish the local potential at the Cs sites from the Si sites, unless hydrogen is coadsorbed. These results demonstrate that resonant charge transfer occurs due to coupling of the Li ionization level with the dangling bond surface states, and that the influence of the dangling bonds extends beyond the local scattering sites.     

LEED,Auger and plasmon studies of negative electron affinity on Si produced by the adsorption of Cs and O

We have made LEED, Auger, and Plasmon measurements to study how Cs and O adsorb onto the (100) surface of p-type degenerate Si to produce negative electron affinity (NEA). A key factor to producing NEA was found to be a highly ordered Si surface as reflected by very high quality 2×2 LEED patterns. When NEA is produced, both the adsorbed Cs and O give the same LEED pattern as the original Si surface, but with a general enhancement of the half-order spot intensity. The adsorption of both Cs and O is strongly self-limiting, apparently controlled by the number of available appropriate sites on the surface. If Cs and O adsorb amorphously, NEA is not achieved. The thermal desorption of Cs occurs over a fairly broad temperature range centered at about 550°C. After Cs desorbs, the remaining O reverts spontaneously from an ordered layer to an amorphous layer, and then desorbs at about 800°C with an activation energy of 3.3 eV.Measurements of backscattered electron energy losses due to plasmons have shown that the Si surface plasmon is reduced in energy from 12.5 V to 7.0 V by the Cs-O layer. From this, an effective dielectric constant ε = 5.3 for this layer can be deduced which, in turn, enables us to characterize completely the Cs-O dipole layer.The geometrical model described by Levine for the NEA surface is consistent with our experimental results.     

Structural and electronic model of negative electron affinity on the Si/Cs/O surface

Structural and electronic models are proposed which correlate Goldstein's LEED, Auger, photo-emission, plasmon, and desorption data for negative electron affinity (NEA) on Si(100) surfaces. In the structural model, the surface Si atoms group into adjacent rows of surface “pedestals” and surface “caves”. Their density is 3.4 × 10¹⁴ cm^?2 each, as inferred from the LEED 2 × 2 reconstruction pattern and other data. Adsorbed Cs resides in fourfold coordination with Si atop the pedestals. Adsorbed oxygen is completely submerged in the caves of aperture 2.98Å to give a Cs-O dipole length of 2.9Å. Similar structural arguments show why Cs must be adsorbed before O₂, and why Si(111) does not exhibit NEA. In the electronic model, the surface dielectric constant, 5.3. obtained from the surface plasmon energy, 7 eV, is used to compute the dipole length from the final work function, 0.9 eV. It is 2.8Å in excellent agreement with the dipole length computed from the above structural model. Some properties of the “induced” surface states in the presence of Cs and O are also described.     

Atomic structure of Cs grown on Si(0 0 1)(2×1) surface by coaxial impact collision ion scattering spectroscopy

The atomic structure and the saturation coverage of Cs on the Si(0 0 1)(2×1) surface at room temperature have been studied by coaxial impact collision ion scattering spectroscopy (CAICISS). For the atomic structure of saturated Cs/Si(0 0 1)(2×1) surface, it is found that Cs atoms occupy a single adsorption site at T3 on the Si(0 0 1) surface. The height of Cs atoms adsorbed at T3 site is 3.18±0.05 Å from the second layer of Si(0 0 1)(2×1) surface. The saturation coverage estimated from the measured CAICISS intensity ratio and the proposed atomic structure is found to be 0.46±0.06 ML.     

Electronic structure of ultrathin Cs coatings on a Si(100)2×1 surface

The electronic structure and ionization energy of submonolayer Cs coatings on a Si(100)2×1 surface is investigated by threshold photo-emission spectroscopy. Two surface bands induced by Cs adsorption are observed, and their evolution is studied as a function of coverage. It is found that there are two “adsorption locations” for Cs atoms, where they interact with active dangling bonds at the surface. It has been determined that the Cs/Si(100)2×1 interface is semiconducting all the way down to monolayer coverage. The results show that Cs adsorption is predominantly of a covalent character. Pis’ma Zh. éksp. Teor. Fiz. 65, No. 9, 699–702 (10 May 1997)     

The adsorption of Cs on the Si(100)2 × 1 surface

LEED observations have shown that the existing model for Cs adsorption on Si(100) is incomplete. It has been found that adsorption occurs only onto the raised surface sites and is progressive through 1Cs : 3Si, 2Cs : 3Si and finally 1Cs : 1Si structures. The transition from 2Cs : 3Si to 1Cs : 1Si involves a change in the Cs bonding which has been shown to be responsible for the detailed caesiation behaviour.     

Application of synchrotron radiation to investigation of the mechanism of increase in the yield of alkali metal ions in electron-stimulated desorption

Core-level photoelectron spectroscopy with synchrotron radiation (hv = 140 eV) has been applied to study the variation in the Si⁺ charge state in silicon films deposited on the W(100) surface after thermal annealing of the substrate. The purpose of this study is to check the mechanism responsible for the sharp increase in the yield of Na⁺ ions in electron-stimulated desorption from a sodium layer adsorbed on the Si/W(100) surface after high-temperature annealing. The evolution of the W 4f _7/2 and Si 2p photoelectron spectra and the valence band photoemission spectra is investigated for two silicon coverages (1 and 3 ML) on the W(100) surface in the temperature range 300<T<2200 K. It is shown that annealing of 1 ML Si on the W(100) surface results in the formation of a W-Si covalent bond, which can weaken the Si-Na bond and lead to an increase in the equilibrium distance X ₀ and, hence, to an increase in the yield of Na⁺ ions in electron-stimulated desorption. The variation in the photoelectron spectra under annealing of 3 ML Si differs from that observed after annealing of 1 ML Si in the direction of charge transfer, thus correlating with the opposite effect of annealing of 3 ML Si/W on the Na⁺ yield in electron-stimulated desorption.     

EFFECT OF ATOMIC HYDROGEN ON THE ACETYLENE-ADSORBED Si(100)(2×1) SURFACE AT ROOM TEMPERATURE

High resolution electron energy loss spectroscopy, low energy electron diffraction and quadrupole maas spectrometer (QMS) have been employed to study the effect of atomic hydrogen on the acetylene-saturated pre-adsorbed Si(100)(2×1) surface and the surface phase transition at room temperature. It is evident that the atomic hydrogen has a strong effect on the adsorbed C₂H₂ and the underlying surface structure of Si. The experimental results show that CH and CH₂ radicals co-exist on the Si surface after the dosing of atomic hydrogen; meanwhile, the surface structure changes from Si(100)(2×1) to a dominant of (1×1). These results indicate that the atomic hydrogen can open C=C double bonds and change them into C-C single bonds, transfer the adsorbed C₂H₂ to C₂H_x(x = 3,4) and break the underlying Si-Si dimer, but it cannot break the C-C bond intensively. The QMS results show that some C₄ species axe formed during the dosing of atomic hydrogen. It may be the result of atomic hydrogen abstraction from C₂H_x which leads to carbon catenation between two adjacent C-C directs. The C₄ species formed are stable on Si(100) surfaces up to 1100 K, and can be regarded as the potential host of diamond nucleation.     

Hydrogen-induced surface metallization of beta-SiC(100)-(3x2) revisited by density functional theory calculations

Recent experiments on the silicon terminated (3 x 2)-SiC(100) surface indicated an unexpected metallic character upon hydrogen adsorption. This effect was attributed to the bonding of hydrogen to a row of Si atoms and to the stabilization of a neighboring dangling bond row. Here, on the basis of density-functional calculations, we show that multiple-layer adsorption of H at the reconstructed surface is compatible with a different geometry: in addition to saturating the topmost Si dangling bonds, H atoms are adsorbed at rather unusual sites, i.e., stable bridge positions above third-layer Si dimers. The results thus suggest an alternative interpretation for the electronic structure of the metallic surface.     

Early stages of vanadium deposition on Si(1 1 1)-7 × 7

We investigate the low-coverage regime of vanadium deposition on the Si(1 1 1)-7 × 7 surface using a combination of scanning tunnelling microscopy (STM) and density-functional theory (DFT) adsorption energy calculations. We theoretically identify the most stable structures in this system: (i) substitutional vanadium atoms at silicon adatom positions; (ii) interstitial vanadium atoms between silicon adatoms and rest atoms; and (iii) interstitial vanadium - silicon adatom vacancy complexes. STM images reveal two simple vanadium-related features near the Si adatom positions: bright spots at both polarities (BB) and dark spots for empty and bright spots for filled states (DB). We relate the BB spots to the interstitial structures and the DB spots to substitutional structures.     

Alkali metal adsorption on the gallium arsenide surface: A change in the work function

A change in the work function when Cs atoms are adsorbed on the GaAs(100) surface and K, Rb, and Cs atoms are adsorbed on the GaAs(110) surface is calculated with a simple model. The model includes both dipole-dipole interaction of adatoms and broadening of their quasi-levels due to exchange effects. The results of calculation are in good agreement with experimental data.     

EFFECT OF ATOMIC HYDROGEN ON THE ACETYLENE-ADSORBED Si(100)(2×1) SURFACE AT ROOM TEMPERATURE

High resolution electron energy loss spectroscopy, low energy electron diffraction and quadrupole maas spectrometer (QMS) have been employed to study the effect of atomic hydrogen on the acetylene-saturated pre-adsorbed Si(100)(2×1) surface and the surface phase transition at room temperature. It is evident that the atomic hydrogen has a strong effect on the adsorbed C₂H₂ and the underlying surface structure of Si. The experimental results show that CH and CH₂ radicals co-exist on the Si surface after the dosing of atomic hydrogen; meanwhile, the surface structure changes from Si(100)(2×1) to a dominant of (1×1). These results indicate that the atomic hydrogen can open C=C double bonds and change them into C-C single bonds, transfer the adsorbed C₂H₂ to C₂H_x(x = 3,4) and break the underlying Si-Si dimer, but it cannot break the C-C bond intensively. The QMS results show that some C₄ species axe formed during the dosing of atomic hydrogen. It may be the result of atomic hydrogen abstraction from C₂H_x which leads to carbon catenation between two adjacent C-C directs. The C₄ species formed are stable on Si(100) surfaces up to 1100 K, and can be regarded as the potential host of diamond nucleation.     

Barrier-height imaging of Cs-adsorbed Si(111)

We have carried out STM and barrier-height imaging on the Cs-adsorbed Si(111) 7×7 surface. At small coverages, Cs atoms adsorbed on Si(111) at room temperature tend to form clusters, as previously observed by Hashizume et al. [J. Vac. Sci. Technol. B 9 (1991) 745]. Although they report empty-state images showing anomalous contrast, no such images are observed in our experiment. The measured barrier height decreases locally above Cs sites and exhibits no long-range variation around each adsorption site. The average reduction in the barrier height at Cs sites is found to be Δφ=0.87 eV.     

Scanning tunneling microscopy of N2H4 on silicon surfaces

The chemistry of N₂H₄ on Si(100)2 × 1 and Si(111)7 × 7 has been studied using scanning tunneling microscopy. At low coverages on Si(100)2 × 1 at room temperature the adsorption sites are distributed randomly on the surface and are imaged as dark spots in the dimer row by the STM. Upon annealing the substrate at 600 K, both isolated reaction products, as well as clusters of reaction products are formed on the surface. The STM images show that the majority of the isolated reaction products are adsorbed symmetrically across the dimers. Based on previous HREELS data, these are most likely NH_x groups. However, the clusters are not well resolved. Because of this we speculate that they are not simply symmetrically adsorbed NH_x groups, but likely have a more complicated internal structure. At higher coverages, the STM images show that the predominant pathway for adsorption is with the N---N bond parallel to the surface, in agreement with HREELS studies of this system. On Si(111)7 × 7, the molecule behaves in a manner which is similar to NH₃. That is, at low coverages the molecule adsorbs preferentially at center adatoms due to the greater reactivity of these sites, while at higher coverages it also reacts with the corner adatoms.     

Si衬底上异质外延金刚石的初始阶段原子H的作用及其界面结构

用高分辨率电子能量损失谱方法研究了原子H与被C₂H₂吸附的Si(100)界面的相互作用.结果显示,在Si(100)界面上,Si—Si二聚化键和C₂H₂中的C—C键被H原子打开,它们分别形成Si—H,C—H键.用AM1量子化学方法,计算了C₂H₂和C₂H₄在Si(100)上的吸附结构,指出了C₂H_{2关键词：}     

Dimer elongation on the monohydride-covered Ge/Si(100) surface

Using transmission ion channeling, we have made the first measurement of the Ge dimer geometry for the monohydride-covered Ge/Si(100)-2×1 surface. Comparison of calculated angular scans with experimental angular scans near the 100 and 110 directions has resulted in a measured Ge dimer bond length of 2.8 Å, which is 8% longer than the corresponding dimer bond length reported for Ge on Si(100) in the absence of H. This elongation is similar to that reported for Si dimers on the Si(100) surface. Also, relative to the (100) surface plane, the dimers change from tilted without H to untilted with H.     

Ab initio calculations of surface structure and electronic properties caused by adsorption of Ca atoms on a Si(1 1 0) surface

The adsorption of Ca metals onto a Si(1 1 0) surface has been theoretically investigated by first-principle total-energy calculations. We employed a local density approximation of the density functional theory as well as a pseudopotential theory to study the atomic and electronic properties of the Ca/Si(1 1 0) structure. The (1×1) and (2×1) surface structures were considered for Ca coverages of 0.5 and 0.25 ML, respectively. It is found that the (1×1) phase is not expected to occur even for rich Ca regime. It was found that Ca adatoms are adsorbed on top of the surface and form a bridge with the uppermost Si atoms. The most stable structure of Ca/Si(1 1 0)-(2×1) surface produces a semiconducting surface band structure with a direct band gap that is slightly smaller than that of the clean surface. We have observed one filled and two empty surface states in the gap region. These empty surface states originated from the uppermost Si dangling bond states and the Ca 4s states. Furthermore, the Ca-Si bonds have an ionic nature with almost complete charge transfer from Ca to the surface Si atoms. The structural parameters of the ground state atomic configuration are detailed and compared with the available results of metal-adsorbed Si(1 1 0) surface, Ca/Si(0 0 1), and Ca/Si(1 1 1) structures.     

A molecular beam study of alkali promotion of O2 sticking on Ge(100) and Si(100)

The alkali (Cs) promotion of O₂ sticking on Si(100) and Ge(100) has been studied by a molecular beam scattering method. In the curves of initial sticking probabilities versus alkali coverages, a threshold coverage for the alkali promotion is found around 0.2 ML. It is suggested that the appearance of the threshold coverage is a result of an abrupt change in the electronic state of the adatom from ionic to covalent or metallic bond with the substrates. For Ge(100) the alkali promotion is further increased as the incident energy is decreased, while an opposite trend is observed in Si(100). Alkali promotion effect on the physisorption-migration mediated process is discussed.