最小二乘拟合计算有机薄膜晶体管迁移率的研究

本文通过制备了一个基于并五笨为有源层的顶栅底接触OTFT器件获取电流电压实验数据,并运用电流电压特性曲线理论拟合计算方法计算其场效应迁移率.研究发现,采用不同的拟合方法得到的场效应迁移率值有较大的差异.若选取转移特性曲线线性区距中心1/2范围内测试点进行最小二乘拟合计算出的场效应迁移率能减少采用其他拟合方法的固有不准确性,而且与其他方法得到的场效应迁移率最接近. 关键词： 最小二乘拟合 场效应迁移率 有机薄膜晶体管     

氧化锌锡薄膜晶体管的研究

在ITO玻璃基底上用射频磁控溅射技术生长氧化锌锡(ZnSnO)沟道有源层、用PECVD生长SiO₂薄膜作为薄膜晶体管的栅绝缘层研制了薄膜晶体管(TFT), 器件的场效应迁移率最高达到μ_n=9.1 cm²/(V ·s),阈值电压-2 V,电流开关比为10⁴. 关键词： 氧化锌锡 薄膜晶体管 场效应迁移率     

低栅极电压控制下带有phenyltrimethoxysilane单分子自组装层的有机薄膜晶体管场效应特性研究

制作了底栅极顶接触有机薄膜晶体管器件,60 nm的pentacene被用作有源层,120 nm热生长的SiO₂作为栅极绝缘层.通过采用不同自组装修饰材料对器件的有源层与栅极绝缘层之间的界面进行修饰,如octadecyltrichlorosilane （OTS）,phenyltrimethoxysilane （PhTMS）,来比较界面修饰层对器件性能的影响.同时对带有PhTMS修饰层的OTFTs器件低栅极电压调制下的场效应行为及其载流子的传输机理进行研究.结果得到,当|V 关键词： 有机薄膜晶体管 自组装单分子层 场效应迁移率 低栅极调制电压     

利用混合有机空穴传输材料提升有机薄膜晶体管场效应迁移率

通过采用在并五苯薄膜与源漏电极之间插入10 nm并五苯掺杂的N,N'-二苯基-N,N'-二(3-甲基苯基)-1,1'-联苯-4,4'-二胺薄膜的方法研究了基于并五苯有源层的底栅错面型有机薄膜晶体管的电学特性。研究发现:N,N'-二苯基-N,N'-二(3-甲基苯基)-1,1'-联苯-4,4'-二胺的引入可以有效改善有源层和源漏电极接触界面的表面形貌,利于形成欧姆接触,从而改善器件性能,最终使优化器件的迁移率由(0.1±0.01)cm2/(V·s)提升至(0.31±0.02)cm2/(V·s),阈值电压由(-34.6±1.3)V降至(-30.1±1.2)V。     

利用混合有机空穴传输材料提升有机薄膜晶体管场效应迁移率

通过采用在并五苯薄膜与源漏电极之间插入10 nm 并五苯掺杂的N,N’-二苯基-N,N’-二（3-甲基苯基）-1,1’-联苯-4,4’-二胺薄膜的方法研究了基于并五苯有源层的底栅错面型有机薄膜晶体管的电学特性。研究发现：N,N’-二苯基-N,N’-二（3-甲基苯基）-1,1’-联苯-4,4’-二胺的引入可以有效改善有源层和源漏电极接触界面的表面形貌,利于形成欧姆接触,从而改善器件性能,最终使优化器件的迁移率由（0.1±0.01）cm²/（V·s）提升至（0.31±0.02）cm²/（V·s）,阈值电压由（－34.6±1.3）V 降至（－30.1±1.2）V。     

喷雾工艺制备的高性能有机光敏薄膜晶体管

以聚3-己基噻吩(P3HT)为有机层、价格低廉的聚甲基丙烯酸甲酯(PMMA)为绝缘层制备了底栅顶接触型结构的有机薄膜晶体管(OTFT)。采用一种新型喷雾工艺来制备器件的有机薄膜层,通过测量有机薄膜晶体管的电学特性,可得出应用喷雾制备的器件有较好的性能。在100 mW/cm2标准模拟太阳光照下,测量基于P3HT的有机薄膜晶体管器源漏电流随时间的变化特性,结果表明基于P3HT的有机光敏薄膜晶体管,不仅具有明显的响应特性,而且具有很好的恢复特性。同时,对比黑暗和光照1,2,4 min下的OTFT特性转移曲线,得到器件的阈值电压随时间的变化曲线。     

喷雾工艺制备的高性能有机光敏薄膜晶体管

以聚3-己基噻吩(P3HT)为有机层、价格低廉的聚甲基丙烯酸甲酯(PMMA)为绝缘层制备了底栅顶接触型结构的有机薄膜晶体管(OTFT)。采用一种新型喷雾工艺来制备器件的有机薄膜层,通过测量有机薄膜晶体管的电学特性,可得出应用喷雾制备的器件有较好的性能。在100 mW/cm2标准模拟太阳光照下,测量基于P3HT的有机薄膜晶体管器源漏电流随时间的变化特性,结果表明基于P3HT的有机光敏薄膜晶体管,不仅具有明显的响应特性,而且具有很好的恢复特性。同时,对比黑暗和光照1,2,4 min下的OTFT特性转移曲线,得到器件的阈值电压随时间的变化曲线。     

对以并五苯和酞菁铜为不同有源层的有机薄膜晶体管特性研究

通过扫描电镜和X射线衍射对SiO₂衬底上生长并五苯和酞菁铜薄膜的表面形貌进行表征,并得到在SiO₂衬底上生长的并五苯薄膜是以岛状结构生长,其大小约为100nm,且薄膜有较好的结晶取向,呈多晶态存在. 酞菁铜薄膜则没有表现出明显的生长机理,其呈非晶态存在. 还对通过掩膜的方法制作得以酞菁铜和并五苯为有源层的顶栅极有机薄膜晶体管的特性进行了研究. 有源层的厚度为40nm,绝缘层SiO₂的厚度为250nm,器件的沟道宽长比(W/关键词： 有机薄膜晶体管 并五苯薄膜 酞菁铜薄膜 μ_EF)')" href="#">场效应迁移率(μ_EF)     

双异质结结构的双极型有机薄膜晶体管的研制

制备了基于F₁₆CuPc和CuPc的双异质结结构的双极型有机薄膜晶体管。该器件的载流子迁移率是相同工艺制备的F₁₆CuPc和CuPc双层单异质结有机薄膜晶体管器件的4~5倍。同时,该双异质结结构还能调整载流子的阈值电压,减少双层结构对薄膜厚度等工艺条件的苛刻要求。这种双异质结结构为提升双极型有机薄膜晶体管器件的性能提供了一种有效方法。     

射频磁控溅射低温制备非晶铟镓锌氧薄膜晶体管

利用射频磁控溅射技术室温制备了铟镓锌氧(IGZO)薄膜,采用X射线衍射(XRD)表征薄膜的晶体结构,原子力显微镜(AFM)观察其表面形貌,分光光度计测量其透光率。结果表明:室温制备的IGZO薄膜为非晶态且薄膜表面均匀平整,可见光透射率大于80%。将室温制备的IGZO薄膜作为有源层,在低温(<200℃)条件下成功地制备了铟镓锌氧薄膜晶体管(a-IGZO TFT),获得的a-IGZO-TFT器件的场效应迁移率大于6.0 cm2.V-1.s-1,开关比约为107,阈值电压为1.2 V,亚阈值摆幅(S)约为0.9 V/dec,偏压应力测试a-IGZO TFT阈值电压随时间向右漂移。     

Performance improvement in pentacene organic thin film transistors by inserting a C60 ultrathin layer

The contact effect on the performances of organic thin film transistors is studied here. A C₆₀ ultrathin layer is inserted between Al source--drain electrode and pentacene to reduce the contact resistance. By a 3 nm C₆₀ modification, the injection barrier is lowered and the contact resistance is reduced. Thus, the field-effect mobility increases from 0.12 to 0.52 cm²/(V·s). It means that inserting a C₆₀ ultra thin layer is a good method to improve the organic thin film transistor (OTFT) performance. The output curve is simulated by using a charge drift model. Considering the contact effect, the field effect mobility is improved to 1.15 cm²/(V·s). It indicates that further reducing the contact resistance of OTFTs should be carried out.     

Comparative study of field-effect mobility with different expressions in organic thin film transistors

In organic thin film transistors (OTFTs), mobility generally exhibits field-effect dependence, and is strongly related to the disorder property of organic semiconductors used in OTFTs. Here, we compared three typical field-effect mobility models and used them to simulate the output characteristics of pentacene-based OTFTs. From the comparison of the theory and experiment, an analytic expression for the field-effect mobility to exactly describe the electrical characteristics of OTFTs was obtained. The better fit to the output characteristics of poly(9,9-dioctyl-fluorene-co-N-(4-butylphenyl)-diphenylamine) (TFB)-based OTFT and copper phthalocyanine (CuPc)-based OTFT by using the obtained analytic expression of the field-effect mobility further extended its applicability in OTFTs. This supplies a valuable manner to derive the field-effect mobility of carriers and understand the transport characteristics of carriers in OTFTs.     

Nonideal double-slope effect in organic field-effect transistors

With the development of device engineering and molecular design,organic field effect transistors(OFETs)with high mobility over 10 cm2 V-1-s-1 have been reported.However,the nonideal doubleslope effect has been frequently observed in some of these OFETs,which makes it difficult to extract the intrinsic mobility OFETs accurately,impeding the further application of them.In this review,the origin of the nonideal double-slope effect has been discussed thoroughly,with affecting factors such as contact resistance,charge trapping,disorder effects and coulombic interactions considered.According to these discussions and the understanding of the mechanism behind double-slope effect,several strategies have been proposed to realize ideal OFETs,such as doping,molecular engineering,charge trapping reduction,and contact engineering.After that,some novel devices based on the nonideal double-slope behaviors have been also introduced.     

Stabilization of organic thin film transistors by ion implantation

We report on the effects of low energy ion implantation (N and Ne) in the reduction and control of the degradation of pentacene organic thin film transistors (OTFTs) due to the exposure to atmosphere (i.e. oxygen and water). We have observed that a controlled damage depth distribution preserves the functionality of the devices, even if ion implantation induces significant molecular structure modifications, in particular a combination of dehydrogenation and carbonification effects. No relevant changes in the pentacene thin film thickness have been observed. The two major transport parameters that characterize OTFT performance are the carrier mobility and the threshold voltage. We have monitored the effectiveness of this process in stabilizing the device by monitoring the carrier mobility and the threshold voltage over a long time (over 2000 h). Finally, we have assessed by depth resolved X-ray Photoemission Spectroscopy analyses that, by selectively implanting with ions that can react with the hydrocarbon matrix (e.g. N⁺), it is possible to locally modify the charge distribution within the organic layer.     

非晶硅薄膜晶体管沟道中阈值电压及温度的分布

基于氢化非晶硅薄膜晶体管(a-Si:H TFT)沟道中陷阱态的双指数分布, 区分了带尾陷阱态和深能级陷阱态的特征温度.利用源端、漏端串联电阻及沟道电阻, 将源端和漏端特征长度与有源层接触长度、SiO₂/氢化非晶硅 (a-Si:H)界面陷阱态及a-Si:H薄膜内陷阱态联系起来. 由串联电阻上电流密度相等解出沟道势. 通过泊松方程和高斯定理 得出a-Si:H TFT沟道各点的阈值电压表达式, 结果表明 沟道中某一点的阈值电压随着该点与源端距离的增大而减小. 在此基础上, 研究了自加热效应引起沟道各点温度的变化, 结果显示a-Si:H TFT在自加热效应下, 从源端到漏端各点温度变化先增大后减小, 沟道中心的温度变化最大.     

微晶硅薄膜晶体管稳定性研究

对有源区处于结构过渡区的微晶硅底栅薄膜晶体管，测试其偏压衰退特性时，观察到一种“自恢复”的衰退现象.当栅和源漏同时施加10 V的偏压时，测试其源-漏电流随时间的变化，发现源-漏电流先衰减、而后又开始恢复上升的反常现象.而当采用栅压为10 V、源-漏之间施加零偏压的模式时，源-漏电流随时间呈先是几乎指数式下降、随之是衰退速度减缓的正常衰退趋势.就此现象进行了初步探讨. 关键词： 过渡区硅材料 微晶硅薄膜晶体管 稳定性 自恢复衰退     

非晶铟锌氧化物薄膜晶体管的低频噪声特性与分析

本文针对底栅结构非晶铟锌氧化物薄膜晶体管的低频噪声特性开展实验与理论研究.由实验结果可知:受铟锌氧化物与二氧化硅界面处缺陷态俘获与释放载流子效应的影响,器件沟道电流噪声功率谱密度随频率的变化遵循1/fγ(γ≈0.75)的变化规律;此外,器件沟道电流归一化噪声功率谱密度随沟道长度与沟道宽度的增加而减小,证明器件低频噪声来源于沟道的闪烁噪声,可忽略源漏结接触及寄生电阻对器件低频噪声的影响.最后,基于载流子数涨落及迁移率涨落模型,提取γ因子与平均Hooge因子,为评价材料及器件特性奠定基础.     

Substrate bias effects on collector resistance in SiGe heterojunction bipolar transistors on thin film silicon-on-insulator

An analytical expression for the collector resistance of a novel vertical SiGe heterojunction bipolar transistor(HBT) on thin film silicon-on-insulator(SOI) is obtained with the substrate bias effects being considered.The resistance is found to decrease slowly and then quickly and to have kinks with the increase of the substrate-collector bias,which is quite different from that of a conventional bulk HBT.The model is consistent with the simulation result and the reported data and is useful to the frequency characteristic design of 0.13 μm millimeter-wave SiGe SOI BiCMOS devices.