Improvement of photoemission performance of a gradient-doping transmission-mode GaAs photocathode

Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response, one has a gradient-doping structure and the other has a uniform-doping structure. The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one. As a result of the downward graded band-bending structure, the cathode performance parameters, such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves, are greater for the gradient-doping photocathode. The electron diffusion length is within a range of from 2.0 to 5.4 μm for doping concentration varying from 10¹⁹ to 10¹⁸ cm^-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2 μm.     

透射式变掺杂GaAs光电阴极研究

为了将变掺杂GaAs材料应用于微光像增强器,开展了透射式变掺杂GaAs光电阴极实验研究,制备了2种反转结构透射式变掺杂GaAs光电阴极。测试了玻璃粘接前后GaAs光电阴极载流子浓度变化,发现高温粘接后载流子浓度增加现象。通过测试高温激活的透射式变掺杂GaAs光电阴极发现,在450 nm～550 nm波段内,变掺杂GaAs光电阴极仍然具有较高的光谱响应。     

梯度掺杂与均匀掺杂GaN光电阴极的对比研究

为了提高负电子亲和势(NEA)GaN光电阴极的量子效率,利用金属有机化合物化学气相淀积(MOCVD)外延生长了梯度掺杂反射式GaN光电阴极,其掺杂浓度由体内到表面依次为1×10¹⁸ cm^-3,4×10¹⁷ cm^-3,2×10¹⁷ cm^-3和6×10¹⁶ cm^-3,每个掺杂浓度区域的厚度约为45 nm,总的厚度为180 nm.在超高真 关键词： NEA GaN光电阴极 梯度掺杂 量子效率 能带结构     

GaSb/AlSb/GaAs应变层结构的分子束外延生长

本文以反射式高能电子衍射(RHEED)和其强度振荡为监测手段,在半绝缘GaAs衬底上成功地生长GaSb/AlSb/GaAs应变层结构,RHEED图样表明,GaSb正常生长时为Sb稳定的C(2×6)结构,AlSb为稳定的(1×3)结构,作者观察并记录GaSb,AlSb生长时的RHEED强度振荡,并利用它成功地生长10个周期的GaSb/AlSb超晶格,透射电子显微镜照片显示界面平整、清晰,采用较厚的AlSb过渡层及适当的生长条件,可在半绝缘GaAs衬底上生长出质量好的GaSb外延层,其X射线双晶衍射半峰宽小于 关键词：     

The optimal thickness of transmission-mode GaN photocathode

A 150-nm-thick GaN photocathode with an Mg doping concentration of 1.6× 10¹⁷cm^-3 is activated by Cs/O in ultrahigh vacuum chamber, and quantum efficiency (QE) curve of negative electron affinity transmission-mode (t-mode) GaN photocathode is obtained. The maximum QE reaches 13.0% at 290 nm. According to the t-mode QE equation solved from the diffusion equation, the QE curve is fitted. From the fitting results, the electron escape probability is 0.32, the back-interface recombination velocity is 5× 10⁴ cm·s^-1, and the electron diffusion length is 116 nm. Based on these parameters, the influence of GaN thickness on t-mode QE is simulated. The simulation shows that the optimal thickness of GaN is 90 nm, which is better than the 150-nm GaN.     

Spectral transmittance and module structure fitting for transmission-mode GaAs photocathodes

A transmission-mode GaAs photocathode includes four layers of glass,Si 3 N 4 ,Ga 1x Al x As and GaAs. A gradient-doping photocathode sample was obtained by molecular beam epitaxy and its transmittance was measured by spec-trophotometer from 600 nm to 1100 nm. The theoretical transmittance is derived and simulated based on the matrix formula for thin film optics. The simulation results indicate the influence of the transition layers and the three thin-film layers except glass on the transmittance spectra. In addition,a fitting coefficient needed for error modification enters into the fitted formula. The fitting results show that the relative error in the full spectrum reduces from 19.51% to 4.35% after the formula is modified. The coefficient and the thicknesses are gained corresponding to the minimum relative error,meanwhile each layer and total thin-film thickness deviation in the module can be controlled within 7%. The presence of glass layer roughness,layer interface effects and surface oxides is interpreted on the modification.     

Comparative research for transmission-mode GaAs photocathodes of different doping structures on surface photovoltage

In order to well study the internal body performance for transmission-mode GaAs photocathode of different varied doping structures, two GaAs photocathodes of exponential doping structure and gradient doping structure were designed respectively. Because surface photovoltage spectrum has close relation with the internal properties of GaAs photocathodes, the connection between surface photovoltage and internal electronic field was well discussed through deduction and calculation. The difference of two structures and the value of internal electronic energy were exactly calculated and verified by experiments. The internal band bending energy could form an internal electronic field with the same direction, which could help the photo-excited electrons to move toward surface barrier layer. This research shows a better method to well study the varied doping structures for GaAs photocathode materials and will help to improve the growth structure for transmission-mode GaAs photocathode module in the future.     

透射式GaAs光电阴极组件在真空烘烤后表面氧化的XPS分析

介绍了GaAs光电阴极在高温烘烤后不同深度上Ga原子和As原子氧化的XPS分析结果,并对GaAs中的Ga原子比As原子更容易氧化以及GaAs光电阴极在经过高温烘烤后,其激活所能达到的阴极灵敏度偏低的现象进行了分析.     

Quantum efficiency conversion from the reflection-mode GaAs photocathode to the transmission-mode one

In the article, the transmission-mode negative electron affinity GaAs photocathode is compared with the reflection-mode one in structure, working principle and the quantum efficiency equation. The key point to establish relation between the two modes is that the active-layer is in full accord and the biggest difference is that the incident direction of photons is inverse. Based on the relation and difference above, we obtain the electron escape probability P and the spectrum absorption coefficient α of the reflection-mode GaAs photocathode by multilayer film matrix theory. The quantum efficiency of the transmission-mode GaAs photocathode can be estimated through the coefficients P and α of the reflection-mode one. Two groups of samples are analyzed, the one group contains uniform doping reflection-mode and transmission-mode GaAs photocathodes and the other contains exponential doping ones. Through the analysis and curve fitting, we find that the conversion difference of the uniform-doping is about 11.22% while that of the exponential-doping is about 5.46%. Another four groups of samples with exponential-doping active layer are experimentalized and the differences of them are all less than 6%. The results prove the suggested method is feasible and effective and it is more suitable for the conversion of GaAs photocathode with exponential-doping active layer.     

高性能透射式GaAs光电阴极量子效率拟合与结构研究

为了探索高性能透射式GaAs光电阴极的特征结构,对光电阴极量子效率公式进行了光谱反射率与短波截止限的修正,并利用修正后的公式对ITT透射式GaAs光电阴极量子效率(≈43%)曲线进行了拟合,得到拟合相对误差小于5%时的结构参数为:窗口层Ga_1-xAl_xAs的厚度介于0.3-0.5 μm,Al组分x值为0.7,发射层GaAs的厚度介于1.1-1.4 μm.另外,根据拟合结果讨论了均匀掺杂透射式GaAs光电阴极的优化结构参数,如果光电阴极具有0.4 μm厚的Ga_1-xAl_xAs(x=0.7)窗口层和1.1-1.5 μm厚的GaAs发射层,则积分灵敏度可以达到2350 μA/lm以上. 关键词： 透射式GaAs光电阴极 量子效率 积分灵敏度 光学性能     

Modulation transfer function characteristic of uniform-doping transmission-mode GaAs/GaAlAs photocathode

The resolution characteristic can be obtained by the modulation transfer function (MTF) of a GaAs/GaAlAs photocathode.After establishing the theoretical model of GaAs(100)-oriented atomic configuration and the formula for the ionized impurity scattering of the non-equilibrium carriers,this paper calculates the trajectories of photoelectrons in a photocathode.Thus the distribution of photoelectron spots on the emit-face is obtained,which is namely the point spread function.The MTF is obtained by Fourier transfer of the line spread function obtained from the point spread function.The MTF obtained from these calculations is shown to depend heavily on the electron diffusion length,and enhanced considerably by decreasing the electron diffusion length and increasing the doping concentration.Furthermore,the resolution is enhanced considerably by increasing the active-layer thickness,especially at high spatial frequencies.The best spatial resolution is 860 lp/mm,for the GaAs photocathode of doping concentration 1 × 10 19 cm 3,electron diffusion length 3.6 μm and the active-layer thickness 2 μm,under the 633-nm light irradiated.This research will contribute to the future improvement of the cathode’s resolution for preparing a high performance GaAs photocathode,and improve the resolution of a low light level image intensifier.     

透射式蓝延伸GaAs光电阴极光学结构对比

用金属有机物化学气相沉积法外延制备了一个透射式蓝延伸GaAs光电阴极,积分灵敏度达到1980 μA/lm,同时与美国ITT公司的一条蓝延伸阴极光谱响应曲线对比,分别对两者进行了光学结构拟合. 结果表明,国内阴极在Ga_1-xAl_xAs层厚度、Al组分、电子扩散长度和后界面复合速率上与国外 存在差距,这导致国内阴极的蓝延伸性能不及国外.国内蓝延伸阴极的表面电子逸出几率、发射层厚度与 国外阴极拟合结果一致,这使得两者长波响应性能差别远小于短波部分的差别.另外响应波段全谱的吸收率 小于国外阴极,导致国内透射式蓝延伸GaAs光电阴极光谱响应、积分灵敏度尚不及国外.     

指数掺杂结构对透射式GaAs光电阴极量子效率的影响研究

通过在一维连续性方程光电子产生函数项中加入短波约束因子,修正了指数掺杂和均匀掺杂透射式GaAs光电阴极量子效率公式.利用修正的透射式阴极量子效率公式分别拟合制备的指数掺杂和均匀掺杂透射式阴极量子效率实验曲线,符合得很好.另外拟合得到的阴极性能参数表明,由于内建电场的作用,指数掺杂阴极的性能要好于均匀掺杂阴极,指数掺杂结构能够明显提高透射式阴极的量子效率. 关键词： 透射式光电阴极 指数掺杂 量子效率 内建电场     

均匀掺杂GaAs材料光电子的输运性能研究

通过建立原子结构的理论模型和电离杂质散射理论公式,研究了光电子在透射式均匀掺杂GaAs光电阴极体内的输运过程,分析了光电阴极的掺杂浓度、发射层厚度、电子扩散长度等相关因素对阴极出射面的弥散圆斑以及到达阴极出射面的光电子数与激发光电子总数之比的影响.计算结果表明,当透射式均匀掺杂GaAs光电阴极发射层厚度为2 μm、电子扩散长度为3.6 μm、掺杂浓度为1×10¹⁹ cm^-3时,其极限线分辨率为769 mm^-1.此GaAs材料光电子的输运性能 关键词： GaAs 光电阴极 光电子输运 弥散圆斑 分辨率     

The optical conductivity of free carriers in GaAs

The optical conductivity of free electrons in polar semiconducting compounds has recently been calculated by use of a generalized Boltzmann equation derived from the equation of motion of the quantum density matrix. This reduces to the quasi-classical Boltzmann transport equation in the low frequency limit: the optical conductivity thus obtained spans a spectral range from around 30cm^?1 to 1.2 × 10⁴cm^?1 in GaAs. In this paper, the optical conductivity is calculated for GaAs as a function of carrier concentration in terms of a frequency dependent relaxation time which reduces to the usual relaxation time in the limit of low frequencies and an elastic scattering mechanism. The low frequency limit of the relaxation time is used to estimate the mobility as a function of carrier concentration. The frequency dependent relaxation time is given for GaAs at 298 K over the spectral region from 45 cm^?1 to 2.3 × 10³cm^?1 for carrier concentrations from 3.4 × 10¹⁵cm^?3 to 8.7 × 10¹⁸cm^?3.     

透射式指数掺杂GaAs光电阴极最佳厚度研究

通过研究指数掺杂GaAs光电阴极中光电子扩散漂移长度与均匀掺杂GaAs光电阴极中光电子扩散长度的差异,确定透射式指数掺杂GaAs光电阴极的最佳厚度范围为16—22 μm.利用量子效率公式对透射式指数掺杂GaAs光电阴极最佳厚度进行了仿真分析,发现厚度为20 μm时阴极积分灵敏度最大.外延生长阴极厚度分别为16和20 μm的两种透射式指数掺杂GaAs样品并进行了激活实验,测得样品的积分灵敏度分别为1228和1547 μA/lm,两者的比值为796%. 实验结果与仿真结果符合. 关键词： GaAs光电阴极 透射式 指数掺杂 厚度     

均匀掺杂和梯度掺杂结构GaN光电阴极性能对比研究

高温退火与Cs/O激活是形成负电子亲和势GaN光电阴极的外来诱因,GaN材料本身性能是影响阴极形成的内在因素.针对均匀掺杂和梯度掺杂GaN光电阴极在结构上的不同,结合阴极在激活过程中光电流的变化规律和激活后的量子产额,分析了均匀掺杂和梯度掺杂负电子亲和势GaN光电阴极性能的异同.实验表明,与均匀掺杂结构阴极相比,梯度掺...     

Investigation of X-ray diffraction limitations upon the analysis of tellurium-atom injection into GaAs epitaxial layers

GaAs lattice “superdilation” caused by an introduced tellurium impurity, which is well known in publications, is experimentally studied. This phenomenon consists in the fact that the GaAs-lattice dilation can be more than 10 times greater than expansion that would appear upon the replacement of arsenic atoms with tellurium atoms if calculations are performed using the current-carrier concentration and Vegard’s law. The given phenomenon has already been observed at n _Te > 3 × 10¹⁸ cm^–3. A series of GaAs epitaxial layers heavily doped with tellurium and grown via metal-organic chemical vapor deposition are investigated using high-resolution X-ray diffractometry (HRXRD), secondary-ion mass spectrometry (SIMS), and the Hall effect. It is demonstrated that, despite a high Te concentration (10²⁰?10²¹ cm^–3) in the layer and variations in the growth conditions, the concentration estimates based on HRXRD data depend linearly on the results of elemental analysis performed by means of SIMS. The GaAs lattice expands even somewhat slighter as compared to the case where arsenic atoms are replaced with all Te atoms injected into the layer. At the same time, the Hall carrier concentration decreases sharply beginning at 2 × 10²⁰ cm^–3. In accordance with the obtained results, the examined phenomenon can be interpreted as the strong compensation of donor and acceptor carriers rather than as superdilation.     

变组分AlGaAs/GaAs透射式光电阴极分辨力特性分析

建立了变组分AlGaAs/GaAs光电阴极二维载流子输运连续性方程.在一定的边界条件下,利用数值计算方法对此方程进行求解,得到了变组分AlGaAs/GaAs光电阴极调制传递函数(MTF)理论计算模型.利用该模型计算了透射式变组分和均匀组分阴极的理论MTF,分析了分辨力与Al组分变化范围、入射光子波长、AlGaAs和GaAs层厚度的关系.计算结果表明,变组分阴极与均匀组分阴极相比,阴极分辨力显著提高.当空间频率f在100—500 lp·mm-1区间时,分辨力的提高最为明显,如当f=200 lp·mm-1时,一般可提高150%—260%.变组分阴极分辨力的提高是内建电场作用的结果,但内建电场太大时,也会由于Al组分含量过高而影响阴极的长波响应.     

分子束外延生长Si/GaP(111)异质结的界面特性

本文研究了分子束外延(MBE)生长的n-N型Si/GaP(111)异质结的界面特性。采用C-V法测量Si/GaP(111)异质结的表观载流子浓度分布n(x),从中导出了异质界面的导带失配值和界面电荷密度。实验结果表明,n-N型Si/GaP(111)是一种弱整流结构。导带失配△E_c=0.10eV,界面电荷密度σ_i=8.8×10¹⁰cm^-2。通过表现载流子浓度n(x)的理论计算曲线与实验曲线符合较好,说明了实验结果的可靠性 关键词：