氩气对MPCVD制备纳米金刚石薄膜的影响

纳米金刚石(NCD)在精密机械、光学真空窗口等领域具有广泛的应用.利用微波等离子体化学气相沉积法(MPCVD)以乙醇、氩气和氢气为气源,通过改变氩气浓度探究氩气对NCD膜光学性质的影响,利用扫描电子显微镜(SEM)、Raman光谱、X射线衍射仪(XRD)和红外光谱对不同氩气浓度沉积的薄膜的结构、成分和性质进行表征.结果表明,随着氩气浓度升高,NCD膜表面粗糙度降低,同时金刚石的纯度下降,在此作用下,NCD膜的透光性随氩气浓度先升高后降.     

整体硬质合金铣刀上制备CVD金刚石涂层的系统三维流场研究

本文通过建立整体硬质合金立铣刀上制备CVD金刚石涂层时CVD沉积系统流场的三维模型,研究了进气口分布对该系统流场均匀性的影响,优化了进气口的分布;在仿真的基础上开展了整体硬质合金立铣刀上制备CVD金刚石涂层的验证实验,采用SEM和Raman对制备的CVD金刚石涂层进行了分析测试.结果表明:优化后的流场可以用于制备高质量的CVD金刚石涂层,且批量制备出的在衬底不同位置上的铣刀表面CVD金刚石涂层的质量均匀一致.     

直流辉光放电CVD法均匀生长纳米金刚石薄膜的研究

采用直流辉光放电化学气相沉积设备,以H2/CH4/Ar混合气体为工作气体,在2英寸硅片沉积出了晶粒尺寸为20～ 40 nm的纳米金刚石薄膜.采用SEM、Raman、微摩擦试验机等分析了不同CH4浓度、Ar浓度对NCD薄膜生长特性的影响.研究结果表明:金刚石薄膜的晶粒尺寸随着CH4浓度的增加而减小,但是过高的CH4浓度会导致石墨相大量生成;随着Ar浓度的增加,金刚石薄膜的晶粒尺寸逐渐细化,但过量Ar的掺入会降低金刚石薄膜的质量;在合适的工艺参数下,薄膜摩擦系数最低可以降低到0.12,NCD薄膜的最大沉积直径为140 mm.     

微波外场强化电石渣制备硫酸钙晶须及其机理分析

本文以电石渣为原料,在稀硫酸溶液中制备硫酸钙晶须.在常规水热法最佳制备条件的基础上,不添加表面活性剂,利用微波反应器强化硫酸钙晶须结晶过程.分析了微波反应时间,微波辐射能量对结晶产物的影响.利用X射线衍射仪和扫描电子显微镜对制备的产物进行表征.结果 表明,电石渣与稀硫酸溶液在微波强化的条件下反应10 min,微波辐射能量400 W时,制备的硫酸钙晶须形貌尺寸均一,晶须平均直径为2.2 μm,平均长径比70.在此基础上,进一步分析了微波效应与硫酸钙晶须的生长机理.     

高温铜氧化物超导体制备技术的研究进展

对各种高温铜氧化物超导体如RE-214相、RE-123相、Bi系超导铜氧化物等的制备方法进行了总结,并对各种制备方法的制备原理、制备过程、采用的相关技术参数及获得的晶体类型和晶体质量进行客观分析,比较了各种高温铜氧化物超导体相关制备方法的优缺点以及各种方法的适用情况.在上述分析的基础上,针对不同类型的高温铜氧化物超导体,针对性地提出获得大尺寸、高质量高温超导铜氧化物品体的最佳制备方式.     

碳化硅陶瓷密封材料上沉积复合金刚石薄膜

利用直流辉光等离子体化学气相沉积(DC-GD CVD)设备在碳化硅(SiC)密封材料上沉积复合金刚石薄膜(ICD).实验通过两步工艺,先在SiC上沉积一层微米金刚石薄膜(MCD),然后再沉积一层纳米金刚石薄膜(NCD)形成复合金刚石薄膜(ICD).通过场发射扫面电镜和拉曼测试,研究了MCD、NCD和ICD薄膜的表面形貌和材料结构.各种金刚石薄膜利用轮廓仪、划痕测试和摩擦磨损测试其力学性能.结果显示ICD薄膜既有较强的结合力,其摩擦系数也较低.ICD薄膜涂层的SiC密封环的摩擦系数为0.08 ～0.1.     

Al2O3基片/Al层状陶瓷的力学行为机理

本文在Al2O3基片上通过丝网印刷方法涂覆Al浆料夹层材料,然后在750 ℃进行热处理后制备多层陶瓷.观察了用Al浆料制备的条状试样在25～800 ℃热处理过程中的变化,分析了Al浆料的性质,并对25 ℃风干的Al浆料及650 ℃、750 ℃热处理后的Al浆料进行了XRD分析.此外,专门设计试验,测试了Al浆料的粘结强度,和AB胶、502胶粘结强度进行了对比.在先前的工作的基础上,对层状陶瓷材料的横切面进行了SEM分析,并对层状陶瓷的断裂裂纹扩展方式进行了观察研究.     

碳纳米管的物性与应用

本文在概括碳纳米管的制备及结构的基础上,着重对其物理性质做出了阐述,并对它的应用前景进行了介绍.     

对TiB2合成反应体系的优势区相图叠加分析

通过对碳热还原法合成TiB2反应体系的热力学分析,绘制了Ti-C-O系统、B-C-O系统的优势区相图.并在此基础上,通过对Ti-C-O系统、B-C-O系统的优势区相图叠加,得到了TiO2-B2-O3-C系统的优势区相图叠加图.优势区相图叠加分析表明,在碳热还原法合成TiB2粉末的过程中,降低反应体系中CO分压,有利于TiB2合成反应的进行.在以上分析的基础上,确定了碳热还原法合成TiB2粉末的合成工艺,并合成了纯度较高、晶形发育完整的TiB2粉末.     

溶胶-凝胶模板法制备磷酸铁锂纳米线阵列

以多孔阳极氧化铝(AAO)为模板,采用溶胶-凝胶法和模板法结合的方法制备了LiFePO4纳米线阵列,实验考察了煅烧温度、气氛等主要工艺参数对纳米线阵列形貌晶型的影响,并用SEM、XRD对纳米线的结构、成分和形貌进行了表征.结果表明:制备的LiFePO4纳米线阵列的直径约为200nm,长度为60μm,长径比达到300,纳米线阵列的直径主要取决于模板的孔径,长度接近于模板的厚度.采用不同结构尺寸的AAO模板,可实现纳米线阵列的可控制备.最后在实验基础上,对纳米线阵列的形成机理进行了分析.     

纳米金刚石薄膜的掺杂、表/界面调控及性能研究

本文综述了近年来国内外研究者在纳米金刚石薄膜的掺杂、导电性能、场发射性能和电化学性能等方面的工作,涉及化学气相沉积法制备n型纳米金刚石薄膜,离子注入掺杂纳米金刚石晶粒提高薄膜的n型导电性能,金属离子注入制备场发射性能良好的纳米金刚石薄膜,低剂量离子注入和晶粒表面氧终止态获得高迁移率n型电导,纳米金刚石/石墨烯复合结构的调控对其电学及电化学性能的影响,以及硼掺杂金刚石薄膜电极的微结构和电化学性能研究等。综合分析发现,晶粒掺杂和表界面协同调控可以提升薄膜的电学性能、场发射性能及电化学性能,为纳米金刚石薄膜在纳米电子器件、电化学电极等领域的应用提供了理论基础。     

Diffusion Control during Vapour Crystal Growth

The crystal growth rate under diffusion control is considered. Together with nutrient diffusion, the physi-sorption of an inert gas, which impedes the surface kinetics during vapour growth, is taken into consideration. In this way the size of the diffusion field surrounding vapour grown crystals was estimated. The relations obtained are checked with data for the growth of zinc single crystals in argon atmosphere. The appearance of shallow cavities on their basal faces is used as a morphological mark for growth under diffusion control. Besides, the microstructure of the inner edge of the macroscopically flat periphery, surrounding the shallow cavities is investigated experimentally, by means of SEM.     

Effect of laser fluence on c‐axis orientation of LiNbO3 piezoelectric films on nanocrystalline diamond by pulsed laser deposition

Completely c‐axis oriented LiNbO₃ piezoelectric films have been deposited on nanocrystalline diamond (NCD)/Si substrates with SiO₂ buffer layer by pulsed laser deposition. The amorphous SiO₂ buffer layer was formed on NCD/Si substrates by sol‐gel method. The c‐axis orientation and crystallinity of LiNbO₃ films are strongly dependent on the laser fluence, and the laser fluence 3.6 J/cm² is found to be the optimal value for the growth of oriented LiNbO₃ film, which has a smooth surface with composed of a large mount of uniform grains. The average surface roughness of LiNbO₃ films is about 6.7 nm.     

Effects of a Magnetic Field on the Dielectric Constant and Conductivity of 2D Metals

An exact formula for the RPA dielectric function of a 2D electron gas in a strong magnetic field is given explicitly as a function of the field strength, frequency and momentum. Based on this result, important many body effects in 2D conductors are discussed. The magnetic susceptibility is obtained explicitly. It shows characteristic oscillations, cyclotron resonance, and an interesting temperature variation. The carrier and field dependences of the effective mass and scattering time of the 2D electrons are evaluated in terms of the memory function formalism. Our theoretical results are found generally in very good agreement with recent data on Si inversion layers.     

Y2O3/ZrO2复合泡沫陶瓷烧结的初步研究

本文采用有机泡沫浸渍法制备了Y2O3/ZrO2双层复合、Y2O3/Y2O3-ZrO2/ZrO2三层复合及Y2O3和ZrO2单相泡沫陶瓷,分析了两种复合泡沫陶瓷层间的结合及各层显微结构随烧结温度的变化,并与单相氧化物陶瓷进行了对比。结果表明:双层复合陶瓷层间有较大缝隙,这是因为两种氧化物陶瓷烧结不同步造成的。三层复合陶瓷中Y2O3-ZrO2混合中间层的存在减弱了Y2O3、ZrO2烧结不同步引起的层间应力,层间结合明显改善,并大大减少了泡沫陶瓷表面宏观裂纹。两种复合陶瓷的ZrO2内层的烧结程度都低于单相ZrO2,这主要是因为先于ZrO2烧结的Y2O3外层阻碍了内部气体的排出从而阻碍ZrO2的烧结所致。     

空位缺陷对锯齿型硅纳米带电子结构和磁性的影响

基于密度泛函理论,采用广义梯度近似下的第一性原理投影缀加波赝势方法,系统的研究了单空位(双空位)缺陷对锯齿型硅纳米带电子结构和磁性的影响.结果表明:不同位置的单原子空位(双原子空位)锯齿型硅纳米带,结构弛豫后,都能得到一个九边环(八边环),同类缺陷更容易在锯齿型硅纳米带的边缘区域形成;与完整的锯齿型硅纳米带相比,中心位置含空位缺陷(单原子或双原子空位)的锯齿型硅纳米带由原有的反铁磁半导体转变为反铁磁金属;非中心位置含空位缺陷(单原子或双原子空位)的锯齿型硅纳米带则具有铁磁态金属性, 在远离缺陷的纳米带边缘硅原子上局域的分布着差分电荷密度,这使得锯齿型硅纳米带在自旋电子学领域拥有可观的应用前景.     

An experimental and CFD study on gas flow field distribution in the growth process of multi‐walled carbon nanotube arrays by thermal chemical vapor deposition

Multi‐walled carbon nanotube arrays (MWCNTAs) were grown by thermal chemical vapor deposition (TCVD) in a horizontal furnace reactor. The scanning electron microscopy (SEM) results show that MWCNTAs grown on the bottom and the central of the quartz tube are different in one experiment. Moreover, the MWCNTAs grown on the central position are more aligned and longer than those on the bottom. A computational fluid dynamics (CFD) model was employed to investigate the gas flow field impact on the MWCNTAs growth. The results show that gas circulations appear after carrier gas and carbon source are injected into the quartz tube. Because of the existence of gas circulations, the gas flow field at the central of the quartz tube is more stable, which is conducive to the growth of MWCNTAs. The CFD simulation results match well with the experimental data.     

Zum Wachstum von AIII-BV-Halbleitern aus nichtstöchiometrischen Schmelzen (I) Wachstum von GaAs auf GaAs bei konstanter Temperatur

A method for the preparation of GaAs layers of different thickness on GaAs from solutions of Ga at constant temperatures is described using inner cooling of the substrate holder by a gas flow. The dependence of the growth rate on the intensity of inner cooling, movement of the substrate holder, and on growth temperature is given and explained. Furtheron is shown that constitutional supercoolung can be avoided by means of a suitable temperature profile and absence of periodic temperature fluctuations.