共查询到19条相似文献,搜索用时 187 毫秒
1.
低陡度光刻胶光栅槽形研究 总被引:3,自引:0,他引:3
为控制全息光刻胶光栅槽形,从研究显影时间、显影液温度等对光刻胶特性曲线的影响出发,采用计算机模拟和实验方法,制作出底部占宽比30%左右,陡度65°左右的低陡度光刻胶光栅掩模.研究发现:启动曝光量随显影时间的延长而减小,光刻胶特性曲线线性部分的斜率随着显影时间的增加而增加;显影液温度高的光刻胶启动曝光量大,其特性曲线线性部分的斜率也较大.这决定了制作低陡度光刻胶光栅掩模需要使用非1∶1的干涉曝光,以及必须采用较低温度的显影液进行显影处理.最终选用1∶7的干涉曝光和15℃的显影液. 相似文献
2.
3.
4.
厚胶光刻非线性畸变的校正 总被引:3,自引:0,他引:3
利用厚胶光刻技术制作大深度微结构元件是一种有效的途径,但厚胶光刻过程中的非线性畸变对光刻面形质量的严重影响限制了该技术的应用,基于此,提出了一种对掩模透射率函数进行校正的方法。分析空间像形成及其在光刻胶内传递、曝光、显影等过程中非线性因素的影响,利用模拟退火算法对掩模透射率函数进行校正,以提高光刻面形质量,并以凹面柱透镜为例,给出了校正前后的显影轮廓模拟结果,其校正后浮雕面形的体积偏差仅为2.63%。该方法在有效改善面形质量的同时,并没有引起掩模的设计、制作难度及费用增加,这对于设计、制作高质量的微结构元件有重要意义。 相似文献
5.
6.
7.
8.
负性光刻胶刻蚀工艺研究 总被引:3,自引:2,他引:1
对负性光刻胶的蚀刻特性进行了详尽的数学阐述,推导出了光致抗蚀剂层的刻蚀速度同曝光量以及光刻材料吸收系数之间的微分关系.以该微分方程为理论依据,通过对光刻显影过程进行模拟,得出了蚀刻最佳浮雕面形所需的光刻条件,并以"重铬酸盐-明胶"为光刻材料进行实验,获得了良好的实验结果. 相似文献
9.
10.
文中通过台阶实验的数据结合光刻胶光栅掩模的槽形,得到光刻胶特性参数,利用这些参数可以模拟出任一曝光量,任一显影时间,任一空频下,光栅掩模的槽形.为今后制作符合要求的光栅提供有力依据. 相似文献
11.
12.
K. Venkatakrishnan B.K.A. Ngoi P. Stanley L.E.N. Lim B. Tan N.R. Sivakumar 《Applied Physics A: Materials Science & Processing》2002,75(4):493-496
Photomasks are the backbone of microfabrication industries. Currently they are fabricated by a lithographic process, which
is very expensive and time consuming since it is a multi-step process. These issues can be addressed by fabricating photomasks
by direct femtosecond laser writing, which is a single-step process and comparatively cheaper and faster than lithography.
In this paper we discuss our investigations on the effect of two types of laser writing techniques, namely front- and rear-side
laser writing, with regard to the feature size and the edge quality of a feature. It is proved conclusively that for the patterning
of masks, front-side laser writing is a better technique than rear-side laser writing with regard to smaller feature size
and better edge quality. Moreover the energy required for front-side laser writing is considerably lower than that for rear-side
laser writing.
Received: 22 May 2001 / Accepted: 14 September 2001 / Published online: 17 October 2001 相似文献
13.
Jiubin Tan 《Optics Communications》2008,281(8):2233-2237
A defocusing exposure dose distribution model is established with the integral effect of light intensity on time taken into account for laser direct writing on a thin photoresist with total reflection substrate. Exposure dose distribution curves are established using the established model for different photoresist depths. A side slope angle is established for each defocusing amount in accordance with the exposure dose distribution curves, and so depth of focus can be estimated by simply checking to see if the maximum side slope angle with the horizontal is in the range of 80-100°. Simulation results indicate that when laser direct writing is done on a thin photoresist with total reflection substrate using a laser with wavelength equal to 442 nm and a lens with numerical aperture equal to 0.5, the depth of focus estimated using the proposed method is 1 μm, which is just 1/3 of the depth of focus estimated using the method based on intensity distribution. It is therefore concluded that it is the integral effect of light intensity on time that causes the depth of focus estimation error, and the proposed method can be used to achieve a more accurate depth of focus estimation compared to the intensity distribution based method. 相似文献
14.
The direct laser writing of graduation lines in Cr thin films on glass substrates has been investigated. The Nd-YAG laser and the astigmatic optical system have been used to write rectangular holes in the Cr film. The optimal writing parameters: the laser pulse energy, the Cr layer thickness and the substrate-objective distance were determined using the optoacoustic probe beam deflection method to detect the evaporation of the material. The evaporation is concluded to be the essential process in the laser writing of graduation lines. The rims formed by the surface tension gradient at the hole edges indicate that the laser writing of graduation lines is a typical two-phase removal process. 相似文献
15.
针对目前红外焦平面光敏阵列中存在的占空比小、光能利用率低的实际问题,展开了正方形孔径球面微透镜阵列制作及其与红外焦平面阵列集成应用的研究.本文从红外焦平面光敏阵列特点入手,对比分析了正方形孔径相比于传统圆形孔径微透镜阵列在光能利用上的优势.提出正方形孔径微透镜阵列激光直写变剂量曝光制作技术,建立光刻胶曝光数学模型和正方形球面微透镜面型函数,以此为基础,编制直写设备变剂量曝光控制软件;利用长春理工大的学复合坐标激光直写系统和等离子刻蚀机进行相关工艺实验,制作了阵列256×256、单元尺寸40×40 μm2、球面半径60 μm、单元间距1 μm的红外石英微透镜阵列;并将其与相应阵列的碲-镉-汞红外光敏阵列进行集成.结果表明:微透镜的占空比达到95%,红外焦平面光能利用率从原来的60%提高到90% 以上.由此得出结论:变剂量曝光制作微透镜技术是可行的,正方形孔径球面微透镜阵列代替圆形孔径微透镜阵列,对于提高红外探测器的灵敏度、信噪比、分辨率等性能具备明显优势. 相似文献
16.
用于红外焦平面的正方形孔径球面微透镜阵列研究 总被引:1,自引:0,他引:1
针对目前红外焦平面光敏阵列中存在的占空比小、光能利用率低的实际问题,展开了正方形孔径球面微透镜阵列制作及其与红外焦平面阵列集成应用的研究.本文从红外焦平面光敏阵列特点入手,对比分析了正方形孔径相比于传统圆形孔径微透镜阵列在光能利用上的优势.提出正方形孔径微透镜阵列激光直写变剂量曝光制作技术,建立光刻胶曝光数学模型和正方形球面微透镜面型函数,以此为基础,编制直写设备变剂量曝光控制软件;利用长春理工大的学复合坐标激光直写系统和等离子刻蚀机进行相关工艺实验,制作了阵列256×256、单元尺寸40×40μm2、球面半径60μm、单元间距1μm的红外石英微透镜阵列;并将其与相应阵列的碲-镉-汞红外光敏阵列进行集成.结果表明:微透镜的占空比达到95%,红外焦平面光能利用率从原来的60%提高到90%以上.由此得出结论:变剂量曝光制作微透镜技术是可行的,正方形孔径球面微透镜阵列代替圆形孔径微透镜阵列,对于提高红外探测器的灵敏度、信噪比、分辨率等性能具备明显优势. 相似文献
17.
The proposed model of laser plasma emission spectrum formation enables us to determine the absolute value of the laser pulse
to plasma emitted radiation conversion factor, profile of the emission spectrum, and frequency distribution of the intensity
and energy in the emitted spectra. This is of interest for laser plasma diagnostics and provides a means for direct calculation
of the number of excited nuclei in dependent on the parameters of laser pulse.
This revised version was published online in August 2006 with corrections to the Cover Date. 相似文献
18.
19.
为了提高激光直写加工衍射光学元件时的线条质量,提出一种离焦激光直写的线宽稳定方法.该方法通过同时调节激光功率和离焦量,使光刻胶的曝光阈值处于线宽对曝光量的变化率较小位置,从而可以弱化线宽对实际曝光量或光刻胶阈值等变化的敏感度,提高利用离焦方法进行衍射光学元件制作时的线宽稳定性.推导了稳定线宽后的光功率控制模型和线宽模型,模型中的变量仅为离焦量,降低了光功率控制的复杂性.利用632.8 nm的He-Ne激光和NA-0.1的物镜在CCD上对采用该方法后的离焦线宽模型进行验证,实验结果与理论模型吻合较好.该方法对于线宽稳定度较高的衍射光学元件制作具有重要价值. 相似文献