Fully automated measurement of the modulation transfer function of charge-coupled devices above the Nyquist frequency

The charge-coupled devices used in electron microscopy are coated with a scintillating crystal that gives rise to a severe modulation transfer function (MTF). Exact knowledge of the MTF is imperative for a good correspondence between image simulation and experiment. We present a practical method to measure the MTF above the Nyquist frequency from the beam blocker's shadow image. The image processing has been fully automated and the program is made public. The method is successfully tested on three cameras with various beam blocker shapes.     

Direct Measurement of Electron Beam Scattering in the Low Vacuum SEM

The beam-gas interactions in the low-vacuum SEM is investigated through experimental and simulation approaches. An original experimental way to characterise the skirting is proposed. We obtained directly image distribution of the primary electron beam and the scattered electrons in the low-vacuum SEM. The experimental results are compared to the electron beam profile obtained with Monte-Carlo simulation.     

Poly(ethylene glycol) as a biointeractive electron‐beam resist

Poly(ethylene glycol) (PEG) can serve as an electron‐beam (e‐beam) resist to modulate protein adsorption on and cell adhesion to surfaces. PEG preferentially crosslinks under e‐beam irradiation to create microgels with controllable properties. Here, atomic‐force, scanning electron, and confocal microscopies are used to study discrete microgels formed from solvent‐cast PEG thin films by focused e‐beams with energies between 2 and 30 keV and point doses between 10 and 1000 fC. Consistent with experimental findings, Monte Carlo simulation of electron energy deposition identifies three structures within each microgel: a highly crosslinked core near the point of electron incidence; a lightly crosslinked near corona surrounding the core; and a far corona at the PEG–Si interface. The nature and relative sizes of these three regions and, hence, the microgel–protein interactions depend on the incident electron energy and dose. The far corona creates protein‐repulsive surface hundreds of nanometers or more from the microgel core. The highly crosslinked core is largely shielded by the near corona. These findings can help guide the choice of irradiation conditions to most effectively modulate protein–surface interactions via PEG microgels patterned by e‐beam lithography. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013 , 51, 1543–1554     

Thin dielectric film thickness determination by advanced transmission electron microscopy.

High-resolution transmission electron microscopy (HR-TEM) has been used as the ultimate method of thickness measurement for thin films. The appearance of phase contrast interference patterns in HR-TEM images has long been confused as the appearance of a crystal lattice by nonspecialists. Relatively easy to interpret crystal lattice images are now directly observed with the introduction of annular dark-field detectors for scanning TEM (STEM). With the recent development of reliable lattice image processing software that creates crystal structure images from phase contrast data, HR-TEM can also provide crystal lattice images. The resolution of both methods has been steadily improved reaching now into the sub-Angstrom region. Improvements in electron lens and image analysis software are increasing the spatial resolution of both methods. Optimum resolution for STEM requires that the probe beam be highly localized. In STEM, beam localization is enhanced by selection of the correct aperture. When STEM measurement is done using a highly localized probe beam, HR-TEM and STEM measurement of the thickness of silicon oxynitride films agree within experimental error. In this article, the optimum conditions for HR-TEM and STEM measurement are discussed along with a method for repeatable film thickness determination. The impact of sample thickness is also discussed. The key result in this article is the proposal of a reproducible method for film thickness determination.     

Electron‐Beam Irradiation in TEM of Hard‐Segment Homopolymers and Polyurethanes with Different Hard‐Segment Content

Summary: A hard‐segment homopolymer (HSH) and segmented poly(ester urethanes) (PESU) were studied by TEM to estimate their stability against electron‐beam irradiation. The bright‐field image and electron‐diffraction modes in TEM and optical polarised microscopy were used. It is shown that both soft and hard segments are sensitive to the electron beam. None of the films was stable enough to register an electron‐diffraction pattern without damage.

Electron‐diffraction pattern taken from the film of hard‐segment homopolymer crystallised at 100 °C from DMF: (a) the pattern registered immediately; (b) the pattern registered after 5 s of exposure in the TEM at the same place.     

Milestones in electron crystallography

Electron crystallography determines the structure of membrane embedded proteins in the two-dimensionally crystallized state by cryo-transmission electron microscopy imaging and computer structure reconstruction. Milestones on the path to the structure are high-level expression, purification of functional protein, reconstitution into two-dimensional lipid membrane crystals, high-resolution imaging, and structure determination by computer image processing. Here we review the current state of these methods. We also created an Internet information exchange platform for electron crystallography, where guidelines for imaging and data processing method are maintained. The server (http://2dx.org) provides the electron crystallography community with a central information exchange platform, which is structured in blog and Wiki form, allowing visitors to add comments or discussions. It currently offers a detailed step-by-step introduction to image processing with the MRC software program. The server is also a repository for the 2dx software package, a user-friendly image processing system for 2D membrane protein crystals.     

碳膜的制备及其在纳米颗粒观察中的应用

阐述了透射电镜中碳膜的制备方法，并讨论了影响碳膜质量的因素，用这种碳膜支持纳米颗粒在透射电镜下观察，碳膜在电子束的长时间照射下，不姓变形和起皱图象清晰衬底均匀。     

High fidelity functional patterns of an extracellular matrix protein by electron beam-based inactivation

Controlling the organization of proteins on surfaces provides a powerful biochemical tool for determining how cells interpret the spatial distribution of local signaling molecules. Here, we describe a general high fidelity approach based on electron beam writing to pattern the functional properties of protein-coated surfaces at length scales ranging from tens of nanometers to millimeters. A silicon substrate is first coated with the extracellular matrix protein fibronectin, which is then locally inactivated by exposure to a highly focused electron beam. Biochemical inactivation of the protein is established by the loss of antibody binding to the fibronectin. Functional inactivation is determined by the inability of cells to spread or form focal adhesions on the inactivated substrate, resulting in cell shapes constrained to the pattern, while they do both (and are unconstrained) on the remaining fibronectin. These protein patterns have very high fidelity, and typical patterns agree with the input dimensions of the pattern to within 2%. Further, the feature edges are well defined and approach molecular dimensions in roughness. Inactivation is shown to be dose dependent with observable suppression of the specific binding at 2 microC cm(-2) and complete removal of biochemical activity at approximately 50 microC cm(-2) for 5 keV electrons. The critical dose for inactivation also depends on accelerating voltage, and complete loss of antibody binding was achieved at approximately 4-7 microC cm(-2) for 1 keV electrons, which corresponds to approximately 50-90 electrons per cross-sectional area of a whole fibronectin dimer and ~2-4 electrons per type III fibronectin domain. AFM analysis of the pattern surfaces revealed that electron beam exposure does not remove appreciable amounts of material from the surface, suggesting that the patterning mechanism involves local inactivation rather than the ablation that has been observed in several organic thin film systems.     

基于透射电子显微镜的沸石分子筛结构研究进展

透射电子显微镜是解析沸石分子筛新结构、 分析结构缺陷和研究活性位点等的有力工具. 应用于分子筛研究的透射电子显微术总体上可以分为图像法和衍射法, 包括透射电子显微镜和扫描透射电子显微图像、 选区电子衍射和三维电子衍射, 通常结合其中的几种方法进行分析. 近年来, 随着电子显微镜硬件性能的不断提升, 特别是球差矫正器的广泛应用及各种适用于分子筛等电子束敏感材料的探测器和图像处理技术的不断革新, 在原子尺度观察分子筛的结构已成为可能. 此外, 利用原位电子显微镜技术研究分子筛的生长和催化反应机理也在逐步展开. 本文按电子显微镜方法分类, 综述了近些年基于电子显微镜的分子筛研究, 包括新结构解析、 手性确认和金属负载等的最新进展.     

Orientation Imaging Microscopy for the Transmission Electron Microscope

The resolution limit of Orientation Imaging Microscopy in the Scanning Electron Microscope is between 20 nA and 80 nA depending on the basic resolution/beam current performance of the SEM, the sample atomic number and the level of residual strain within it. The newer technique of orientation imaging in the transmission electron microscope, TEM, improves on this resolution limit by a factor of five to ten. The new technique is based on a novel procedure for determining the crystallography of separate small volumes in the sample by examination of a large series of dark field images. Each image is recorded for a different diffraction condition. This is achieved by using a computer to direct the electron beam onto the same area of the sample so that it covers all directions within a cone of semi-apex angle 3 degrees. Analysis of the intensity of the same point in each of the dark field images permits reconstruction of a diffraction pattern for that point providing the data to calculate its crystal orientation. The process is repeated for each point in the image. The Orientation Image Micrograph is constructed from the orientations so determined. The technique is shown to be capable of producing orientation micrographs of high spatial resolution for unstrained samples. For highly strained samples difficulties are encountered in accurately indexing the complicated diffraction patterns that are observed. Methods to improve the indexing procedures involve determining the sub-cell structure first from a comparison of patterns from adjacent pixels and then summing all patterns belonging to a single sub-cell. The resultant improvement in pattern quality permits more reliable determination of orientation. Examples of this procedure are taken from studies of deformed aluminum.     

Analytical Electron Microscopy Study of a ZnO-NiO Solid Solution

 Results of an analytical electron microscopy study of a binary ZnO-NiO system are reported and discussed. Emphasis was placed on the determination of Ni concentration (solubility) in the ZnO grains using quantitative TEM-EDXS. The influence on the results of beam diameter, foil thickness and corrections used are described and discussed. During the study small precipitates, presumably NiO, were found in the ZnO grains of the ZnO-NiO samples with different ZnO/NiO ratios. In TEM, the precipitates exhibited image contrast only at certain orientations and were normally invisible during the EDXS analysis. The presence of the precipitates too small to be seen using scanning electron microscopy could explain erroneous results for the Ni concentration in a ZnO solid-solution phase obtained previously using SEM-EDXS. Quantitative EDXS analyses were performed on ZnO grains using different electron beam diameters. In each sample, the spread of the results was correlated to the beam diameter (analysed volume). It was found that when the average number of precipitates was less than one per analysed volume the measured points that included precipitates could easily be identified on the basis of their deviation from the mean value of the Ni content.     

Diagnosis of the profile of the heavy-ion microbeam and estimation of the aiming accuracy of the single-ion-hit with using CR-39

The aiming accuracy of the single-ion-hit method has been studied by the measurement of etch-pit patterns on a CR-39 film irradiated with a heavy-ion microbeam. It becomes clear that the aiming accuracy is determined to be the size of the core-part of the microbeam, which is almost twice as large as the full width at half maximum (FWHM) beam size measured by the conventional secondary electron image method.     

Moiré patterns in the electron image of solution-grown polymer crystals

Relative tilt between two similar thin crystals may result in the formation of a moiré pattern in the electron image. Patterns hitherto interpreted as being parallel moirés or rotation moiré obtained from overlapping solution-grown polymer crystals are reconsidered, and it is shown that in some cases a tilt model is more acceptable. The general features of tilt moiré patterns predicted for crystals of this kind are discussed and compared with micrographs appearing in the literature. Methods of distinguishing tilt moiré patterns are indicated, though it is admitted that such experiments would be difficult to complete in the time limited by destruction of the crystal structure under the action of the electron beam. Extinction contours may also sometimes be confused with long-period tilt moiré patterns, and again careful experimentation is required for accurate identification. The model of the structure of solution-grown polyethylene crystals inferred from a tilt moiré interpretation of many of the electron image fringe patterns found in the literature is consistent with that derived from other sources.     

Application of positron annihilation induced Auger Electron Spectroscopy to the study of surface chemistry

Positron annihilation induced Auger Electron Spectroscopy (PAES), makes use a beam of low energy positrons to excite Auger transitions by annihilating core electrons. This novel mechanism provides PAES with a number of unique features which distinguishes it from other methods of surface analysis. In PAES the very large collisionally induced secondary electron background which is present under the low energy Auger peaks using conventional tecniques can be eliminated by using a positron beam whose energy is below the range of Auger electron energies. In addition, PAES is more surface selective than conventional Auger Spectroscopy because the PAES signal originates almost exclusively from the topmost atomic layer due to the fact that the positrons annihilating with the core electrons are trapped in an image correlation well just outside the surface. In this paper, recent applications of Positron Annihilation Induced Auger Electron Spectroscopy (PAES) to the study of surface structure and surface chemistry will be discussed including studies of the growth, alloying and inter-diffusion of ultrathin layers of metals, metals on semiconductors, and semiconductors on semiconductors. In addition, the possibilities for future application of PAES to the study of catalysis and surface chemistry will be outlined.     

化合物半导体异质外延层中的缺陷

本文报道了用MBE方法在Si(100)上生成GaAs和用MOCVD方法在GaAs(100)上生成CdTe的异质外延层中的某些缺陷。用JEM-4000EX和JEM-200CX电镜观察,电子束沿晶体的[011]方向入射,观察到的晶体缺陷运用高分辨像和选区衍射技术进行研究和分析。结果表明CdTe/GaAs中主要缺陷是失配位错及微孪晶,而在GaAs/Si中还含有反相无序。     

Evaluation and optimization of electron capture dissociation efficiency in fourier transform ion cyclotron resonance mass spectrometry

Electron capture dissociation (ECD) efficiency has typically been lower than for other dissociation techniques. Here we characterize experimental factors that limit ECD and seek to improve its efficiency. Efficiency of precursor to product ion conversion was measured for a range of peptide (∼15% efficiency) and protein (∼33% efficiency) ions of differing sizes and charge states. Conversion of precursor ions to products depends on electron irradiation period and maximizes at ∼5–30 ms. The optimal irradiation period scales inversely with charge state. We demonstrate that reflection of electrons through the ICR cell is more efficient and robust than a single pass, because electrons can cool to the optimal energy for capture, which allows for a wide range of initial electron energy. Further, efficient ECD with reflected electrons requires only a short (∼500 μs) irradiation period followed by an appropriate delay for cooling and interaction. Reflection of the electron beam results in electrons trapped in or near the ICR cell and thus requires a brief (∼50 μs) purge for successful mass spectral acquisition. Further electron irradiation of refractory precursor ions did not result in further dissociation. Possibly the ion cloud and electron beam are misaligned radially, or the electron beam diameter may be smaller than that of the ion cloud such that remaining precursor ions do not overlap with the electron beam. Several ion manipulation techniques and use of a large, movable dispenser cathode reduce the possibility that misalignment of the ion and electron beams limits ECD efficiency.     

Electron beam potential depression as an ion trap in Fourier transform ion cyclotron resonance mass spectrometry

Trapping of ions in the electron beam of a FTICR mass spectrometer is investigated and a simple model describing the confinement process is presented. Detection of resistive-wall destabilization of the magnetron motion of ions in the trapped-ion cell is used to determine conditions for ion trapping within and escape from the electron beam. The model predicts a potential well that is dependent on electron beam current, energy, and dimension in defining its capacity for low energy ions. Plots of ion retention time versus ion number are consistent with a model in which ions are initially trapped in the electron beam but with increasing ion formation will eventually overcome the potential depression in the electron beam and escape into magnetron orbits. Based upon this model, expressions are derived for ion retention time which are then fit to the experimental data. The model is used to estimate ion number, initial magnetron radius and ion cloud shape and density. One example in which electron trapping is important in the FTICR experiment is in the efficient transfer of ions between dual trapped-ion cells. Ion transfer within the potential depression of the electron beam environment is shown to be virtually 100% efficient over a 10 ms interval whereas all ions are lost to collisions with the conductance limit after 2 ms when transferring without the confining aid of the electron beam. Several analytical applications of electron traps in the ICR cell are now being investigated.     

A coded support for use in analysis of aerosols by different spectroscopic methods

A device used for localization of solid atmospheric microparticles on silicon wafers is described. Dimensions of the device are 5.04 mm × 5.0809 mm. This support facilitates the analysis by other instruments of particles previously located by scanning electron microscopy (SEM). The area of the wafer is divided into tables and cells identified by microlithographic alphanumeric characters. These characters are made of an alloy of aluminium, silicon and copper which can be visualized by imaging secondary-ion mass spectrometry (SIMS). The quality of the image produced by SIMS is worse than that obtained with SEM, mainly because of the bigger diameter of the SIMS ion beam, but the symbols and patterns used are still easily legible. Examples are given of images obtained from SEM, SIMS and secondary electron ion-induced microscopy (SEIIM).     

Three-dimensional characterization of pigment dispersion in dried paint films using focused ion beam-scanning electron microscopy

The combination of integrated focused ion beam-scanning electron microscope (FIB-SEM) serial sectioning and imaging techniques with image analysis provided quantitative characterization of three-dimensional (3D) pigment dispersion in dried paint films. The focused ion beam in a FIB-SEM dual beam system enables great control in slicing paints, and the sectioning process can be synchronized with SEM imaging providing high quality serial cross-section images for 3D reconstruction. Application of Euclidean distance map and ultimate eroded points image analysis methods can provide quantitative characterization of 3D particle distribution. It is concluded that 3D measurement of binder distribution in paints is effective to characterize the order of pigment dispersion in dried paint films.     

MALDI-MS imaging of features smaller than the size of the laser beam

The feasibility of matrix-assisted laser desorption/ionization mass spectrometry (MALDI-MS) imaging of features smaller than the laser beam size has been demonstrated. The method involves the complete ablation of the MALDI matrix coating the sample at each sample position and moving the sample target a distance less than the diameter of the laser beam before repeating the process. In the limit of complete sample ablation, acquiring signal from adjacent positions spaced by distances smaller than the sample probe enhances image resolution as the measured analyte signal only arises from the overlap of the laser beam size and the non-ablated sample surface. Image acquisition of features smaller than the laser beam size has been demonstrated with peptide standards deposited on electron microscopy calibration grids and with neuropeptides originating from single cells. The presented MS imaging technique enables approximately 25 microm imaging spatial resolution using commercial MALDI mass spectrometers having irregular laser beam sizes of several hundred micron diameters. With appropriate sampling, the size of the laser beam is not a strict barrier to the attainable MALDI-MS imaging resolution.