Laser etching of glass substrates by 1064 nm laser irradiation

TiB₂-based cermets are prepared by combustion synthesis followed by a pressing stage in a granulate medium. Products obtained by combustion synthesis are characterized by a large remaining porosity (typically 50%). To produce dense cermets, a subsequent densification step is performed after the combustion process and when the reacted material is still hot. To design the process, numerical simulations are carried out and compared to experimental results. In addition, physical and electrical properties of the products related to electrical contact applications are evaluated. PACS 81.20.Ka; 81.05.Mh; 72.80.Tm     

Laser irradiation induced disintegration of a bubble in a glass melt

We report on removal of micrometer-sized bubbles from molten glass by a 1064 nm wavelength cw-laser radiation focused using an objective lens of numerical aperture 0.55. The heating of a bubble and surrounding glass by tightly focused laser beam had reduced surface tension and caused disintegration of the bubble. Disintegration occurred at typically 1850±50 °C. Emission of a heated gas inside the bubble was used to determine the local temperature. Temporal evolution of the bubble disintegration was imaged by a CCD camera. Physics of the interaction between a focused laser beam and bubble is discussed. PACS 47.55.Dz; 42.70.Ce; 44.90.+c; 47.27.Te; 47.90.+a     

Laser etching of fused silica using an adsorbed toluene layer

A new method for laser etching of transparent materials with a low etch rate and a very good surface quality is demonstrated. It is based on the pulsed UV-laser backside irradiation of a transparent material that is covered with an adsorbed toluene layer. This layer absorbs the laser radiation causing the etching of the solid. The threshold fluence for etching of fused silica amounts to 0.7 J/cm². The constant etch rate of about 1.3 nm/pulse that has been observed in a fluence interval from 2 to 5 J/cm² is evidence of a saturated process. The limited thickness of the adsorbed layer causes the low etch rates and the rate saturation. The etched surface structures have well defined edges and low surface roughness values of down to 0.4 nm rms. PACS 81.65.Cf; 81.05.Kf; 79.20.Ds; 61.80.Ba; 42.55.Lt     

Electrochemical etching technique for neutron dosimetry

In the present work we have employed allyl diglycol carbonate (CR-39) and cellulose triacetate (CTA) plastic for detection of neutron recoil tracks without radiator. For CR-39, the results reveal that registration efficiency is a function of duration of chemical pre-etching and the best results are obtained with chemical pre-etching of 3 hours. It was also investigated that the ac field strength of 28 kV/cm having 2.5 kHz frequency was optimum for revelation of tracks. Interestingly the sensitivity is fluence dependent and it was constant up to a fluence of about 10⁸ n/cm². The sensitivity abruptly decreased with increased fluence. At optimum experimental conditions the minimum detection limit for CR-39 was found to be 0.47 mSv. For CTA, the tracks have been revealed by electrochemical etching (ECE) only and the minimum detection limit was found to be 0.85 mSv at optimum experimental parameters.      

Fabrication of glass micro-prisms using ultra-fast laser pulses with chemical etching process

In this study, a new process of glass micro-prism structures is investigated by an ultra-fast laser irradiation with chemical etching process. The ultra-fast laser is employed by an all-in-one femtosecond laser (FS-laser) system with the amplifier as an excitation source for patterning the structures. Here, the center wavelength of laser is frequency-doubled to 517 nm. Besides, the repetition rate and pulse width of laser are 100 kHz and 350 fs, respectively. First, the embedded gratings of glass with different pitches can be fabricated using a FS-laser process. Afterwards, the glass samples are placed in the hydrofluoric acid (HF) solution for 15 min to develop structures. Finally, the results of this study demonstrated that the V-cut micro-prisms are successfully formed by controlling etching concentration between intrinsic glass material and modified areas.     

Laser etching of Thoria pellets for microstructural investigations

Metallographic investigation of the microstructure of sintered Thoria pellets necessitates appropriate surface preparation of these pellets. Conventional etching methods involving either chemical or thermal etching techniques being unsuitable for surface etching of irradiated Thoria fuel, laser-based surface treatment was envisaged as a potential alternative technique. Thoria pellets were subjected to laser surface treatment using a pulsed Nd:YAG laser.Our preliminary studies have successfully demonstrated laser etching of sintered Thoria pellets with good reproducibility, clearly revealing grain structures and well-defined grain boundaries. Detailed parametric investigations determining optimum laser parameters for the process, are presented. Our results on ultra-short laser-based etching of sintered Thoria pellets are also discussed.     

Fabrication of micro-structure on glass surface using micro-indentation and wet etching process

In order to improve the new micro-fabrication technology using micro-indentation and wet etching, in which the etching rate drastically decrease at the indented area and consequently micro-structure can be formed on the glass surface, the effect of the applying load on the etching rate change was investigated. The extent of the etching rate change was found to be almost constant irrespective of the amount of the applying load. Therefore, the height of the structure could be controlled simply by the etching depth as far as the densified portion remains beneath the glass surface. And some example micro-patterns were fabricated in this process. Various kinds of indentation methods were employed, including scanning a pointed tool under a load and wet abrasive blast. The patterns can be freely drawn by the use of numerical control (NC) machine. Mold pattern can be also applied, which enables drawing many lines simultaneously. In every method, the heights of the patterns were confirmed to be very uniform. This new type of the micro-fabrication method was referred to as “SMIL (Stress Masked Image Lithography)”.     

Micro-hole fabricated inside FOTURAN glass using femtosecond laser writing and chemical etching

Vertical micro-holes were fabricated inside a photosensitive glass (FOTURAN) by focused femtosecond laser (λ = 775 nm) writing, followed by heat treatment and wet chemical etching in 8% hydrofluoric acid solution for 50 min. The micro-holes were analyzed by optical and scanning electron microscopy, and was found they own circular cross-section and clear edge. At present, micro-holes with aspect ratio of about 7 is achieved. By varying the incident laser fluence in a range of 2.3–36.2 J/cm² and the laser writing velocity in 100–1000 μm/s, the influences of femtosecond laser parameters on the formation of micro-holes are characterized as that: writing velocities hardly affect the micro-hole diameter, while relatively lower laser fluences result in smaller diameter, and the cross-section is more circular in this case. The possible reason for this phenomenon is discussed.     

Hybrid glass substrates for waveguide device manufacture

Hybrid glass substrates were prepared by a novel, low-temperature process joining active (Er-Yb codoped) and passive phosphate glass. The resulting hybrid substrates are chemically and physically robust; they can be cut, ground, and polished by conventional, water-based techniques. The entire substrate can be immersed in a molten-salt bath to produce waveguides simultaneously in the active and passive regions. A low reflectance of -34+/-2 dB was measured at the joint interface with 1531.2-nm light by optical low-coherence reflectometry. Further, a hybrid laser waveguide device exhibited a slope efficiency of 33% at 1540 nm when pumped at 975 nm.     

Physical analysis of normally-off ALD Al2O3/GaN MOSFET with different substrates using self-terminating thermal oxidation-assisted wet etching technique

Based on the self-terminating thermal oxidation-assisted wet etching technique, two kinds of enhancement mode Al$_{2}$O$_{3}$/GaN MOSFETs (metal-oxide-semiconductor field-effect transistors) separately with sapphire substrate and Si substrate are prepared. It is found that the performance of sapphire substrate device is better than that of silicon substrate. Comparing these two devices, the maximum drain current of sapphire substrate device (401 mA/mm) is 1.76 times that of silicon substrate device (228 mA/mm), and the field-effect mobility ($\mu_{\rm FEmax}$) of sapphire substrate device (176 cm$^{2}$/V$\cdot$s) is 1.83 times that of silicon substrate device (96 cm$^{2}$/V$\cdot$s). The conductive resistance of silicon substrate device is 21.2 $\Omega {\cdot }$mm, while that of sapphire substrate device is only 15.2 $\Omega {\cdot }$mm, which is 61% that of silicon substrate device. The significant difference in performance between sapphire substrate and Si substrate is related to the differences in interface and border trap near Al$_{2}$O$_{3}$/GaN interface. Experimental studies show that (i) interface/border trap density in the sapphire substrate device is one order of magnitude lower than in the Si substrate device, (ii) Both the border traps in Al$_{2}$O$_{3}$ dielectric near Al$_{2}$O$_{3}$/GaN and the interface traps in Al$_{2}$O$_{3}$/GaN interface have a significantly effect on device channel mobility, and (iii) the properties of gallium nitride materials on different substrates are different due to wet etching. The research results in this work provide a reference for further optimizing the performances of silicon substrate devices.     

Protein fragment imaging using ink jet printing digestion technique

We have developed a capable tool for visualizing protein distribution at the sub-cell level with TOF-SIMS. This new method of visualizing a protein includes: (1) printing a digestive enzyme with ink jet (IJ) printing technology onto a tissue section, (2) measuring the two-dimensional distributions of decomposed peptide ions derived from digested protein on the tissue section by TOF-SIMS with a bismuth cluster ion (Bi₃⁺) source and using the aqueous ion enhancement method, and (3) analyzing the two-dimensional distributions of proteins using the results of proteome analysis. We have not yet tried this method onto a real tissue section. To show the possibility of this method, TOF-SIMS results of visualizing dot-patterned digested fragment peptide ions using IJ printing digestion technique onto a protein film are presented.     

Integrated optical filter arrays fabricated by using the combinatorial etching technique

A combinatorial etching technique is developed to fabricate integrated narrow bandpass filters on a single substrate. It is highly efficient for fabrication of integrated filter arrays in optical regions. A monolithic filter array has been fabricated by using the technique with a two-step deposition process. The filter contains 32 elements in the near-infrared region. The relative full width at half-maximum (FWHM) sigmalambda/lambda of the filter elements is less than 0.2%. Such a narrow bandpass filter array can be utilized in many optical applications.     

Magneto-optical imaging using a garnet indicator film prepared on glass substrates

We observed the magnetic domains of a magnetic card by using the bismuth-substituted yttrium iron garnet (Bi-YIG; Bi₁Y₂Fe₅O₁₂) thin films as the indicator films. The magnetic domains’ dependence on the preparation conditions of the garnet thin film crystals was visualized by using a magneto-optical microscope. Garnet thin films were fabricated on glass substrates using a metal-organic decomposition method (MOD). We found that bigger Faraday rotation was measured in the better crystallized indicator films. Polycrystalline Bi-YIG thin films were successfully obtained for the annealing temperature of 700 °C and an annealing time of 1 h. The thickness of the film was about 47 nm for a single coating during the MOD process. The Faraday-rotation angle of the films was estimated as −2.47°/μm and the angle was comparable to other synthesis methods, such as the sol-gel and the RF-magnetron sputtering. Using these indicator films, we could image the magnetic domains of magnetic materials.     

Pulsating jet control for manipulating the separation bubble behind the fence

Abstract  

An optimization study of a pulsating jet was performed to manipulate the separation bubble behind the fence. The experiments were carried out in a circulating water channel and the vertical fence was submerged in the turbulent boundary layer. The parameters used for controlling the pulsating jet included the frequency, speed and velocity profile of jet, and the geometries including angle and location of nozzle. In addition, we investigated the effect of upstream boundary layer changed by continuous suction in front of the jet nozzle. Each test case was divided into 20 phases and phase-averaged DPIV method was applied to measure the velocity field. From the results, the main mechanism of reduction of bubble length was the vortex shedding from the recirculating region. The specific jet condition and nozzle geometries which were effective to reduce the separation bubble behind the fence were found.     

Heavy ion range measurements in some glasses using back track etching technique

The samples of soda, quartz and barium phosphate (BP-1) glasses were irradiated by different heavy ions from UNILAC, GSI, Darmstadt. The range of these heavy ions in these glasses were measured by using back track etch technique. The experimental values of heavy ion ranges were compared with the theoretical values computed from Mukherjee and Nayak (1979), TRIM-95 and SRIM-97 computer codes based on the formulations of Ziegler et al. (1985).     

Growth and characterization of thin ZnO films deposited on glass substrates by electrodeposition technique

Electrodeposition technique was used in order to produce nanometric zinc oxide films on glass insulating substrates. The effect of electrolyte concentration and applied current density on the formation and growth of electrodeposited Zn thin films in aqueous solutions of ZnSO₄ were studied. After a thermal oxidation, a characterization of the structural morphology of the films deposited was carried out by optical microscopy (OM), atomic force microscopy (AFM), scanning electron microscopy (SEM) and by grazing incidence X-rays diffraction (GIXD). These characterization techniques show that the grains size of the films after oxidation at temperature 450 °C is between 5 and 15 nm, as well as the structure is polycrystalline nature with several orientations. UV/vis spectrophotometry confirms that it is possible to obtain transparent good ZnO films with an average transmittance of approximately 80% within the visible wavelength region, as well as the optical gap of obtained ZnO films is 3.17 eV.     

Fabrication of microstructures in Foturan glass using infrared femtosecond laser pulses and chemical etching

In this study, a method for the fabrication of microstructures on the surface and inside Foturan glass by femtosecond laser-induced modification was developed. This technique was followed by heat treatment to crystallize the modified area, and the specimen was then placed in an 8% HF acid solution for chemical etching. The fabricated microstructures were observed using scanning electron microscopy (SEM). The results demonstrated that the etching time is an important parameter in the fabrication of microstructures on Foturan glass. An example of a tapered U-shaped microchannel with a minimized neck diameter of about 5 μm at the central point for cell detection is presented.     

Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching

We use the combination of femtosecond laser dielectric modification and selective chemical etching to fabricate high-quality microchannels in glass. The photoinduced modification morphology has been studied in fused silica and in borosilicate glass BK7, using ultra-high spatial resolution techniques of selective chemical etching followed by atomic force or scanning electron microscopy. The analysis shows that the high differential etch rate inside the modified regions, is determined by the presence of polarization-dependent self-ordered periodic nanocracks or nanoporous structures. We also investigate the optimum irradiation conditions needed to produce high-aspect ratio microchannels with small symmetric cross-sections and smooth walls. PACS 42.62.-b; 42.65.Re; 81.05.Kf; 87.80.Mj     

Crack-free micromachining on glass substrates by visible LIBWE using liquid metallic absorbers

Laser induced backside wet etching (LIBWE) is a promising laser direct-write technique for etching transparent materials and for producing high precision and near-optical quality surfaces. In this study, visible LIBWE using gallium and eutectic indium/gallium as absorbers was used for crack-free microfabrication of sodalime and quartz. Eutectic indium/gallium (In/Ga) has a melting temperature lower than metallic gallium does and the etching rate by using In/Ga was found to be similar to that by gallium for visible LIBWE. When using the gallium absorber, the etching threshold of quartz by visible LIBWE was about one-third of that by UV LIBWE. The heat-affected zone of the quartz etching was negligible at the trench rim in the visible LIBWE process. The wettability of the metallic absorbers on the substrates affects aspect ratio and is a new important factor for LIBWE. In addition, etching rate decreased when repetition rate was increased.     

New jet stream technique for dye lasers

We report on a novel technique for generating large area flowing sheets of viscous fluids for use in dye lasers. The proposed technique allows one to control the shape, size and thickness of the fluid sheets of excellent optical quality. Rhodamine 6G/ethylene glycol jet streams have been investigated. Application to other dye/solvents, to saturable absorbers or to other fluids is straightforward.