单电子晶体管电流解析模型及数值分析

本文首先建立单电子晶体管的电流解析模型, 然后将蒙特卡罗法与主方程法结合进行数值分析, 研究了栅极偏压、漏极偏压、温度与隧道结电阻等参数对器件特性的影响. 结果表明: 对于对称结, 库仑台阶随栅极偏压增大而漂移; 漏极电压增大, 库仑振荡振幅增强, 库仑阻塞则衰减; 温度升高将导致库仑台阶和库仑振荡现象消失. 对于非对称结, 源漏隧道结电阻比率增大, 库仑阻塞现象越明显. 关键词： 单电子晶体管 解析模型 蒙特卡罗法 主方程法     

Quantum-interference-controlled three-terminal molecular transistors based on a single ring-shaped molecule connected to graphene nanoribbon electrodes

We study molecular transistors where graphene nanoribbons act as three metallic electrodes connected to a ring-shaped 18-annulene molecule. Using the nonequilibrium Green function formalism combined with density functional theory, recently extended to multiterminal devices, we show that these nanostructures exhibit exponentially small transmission when the source and drain electrodes are attached in a configuration with destructive interference of electron paths around the ring. The third electrode, functioning either as an attached infinite-impedance voltage probe or as an "air-bridge" top gate covering half of molecular ring, introduces dephasing that brings the transistor into the "on" state with its transmission in the latter case approaching the maximum limit for a single conducting channel device. The current through the latter device can also be controlled in the far-from-equilibrium regime by applying a gate voltage.     

基于垂直结构的有机光发射晶体管制备与性能研究

制备了一种有机垂直光发射晶体管, 兼具有机发光二极管的发光和晶体管的开关调节两个功能.其结构为一个有机发光单元垂直堆叠在一个电容单元上,两单元通过一个共有的源电极连在一起.当电容单元被充电时,积累在源电极的电荷能有效地调节源极与有机层之间的载流子注入势垒,从而达到控制源漏输出电流的大小,最终控制发光单元发光的强度.实验结果表明,器件可提供02 mA的输出电流,其大小可驱动发光单元发光,工作电压（开启电压）为6 V.这种垂直集成方案,实现了器件多功能化,为有机发光二极管有源矩阵驱动的实际应用提供了一种新的解决方法. 关键词： 有机光发射晶体管 垂直 电容     

Exploring the warped bulk

In this study, a gallium nitride (GaN) high electron mobility transistor (HEMT) with recessed insulator and barrier is reported. In the proposed structure, insulator is recessed into the barrier at the drain side and barrier is recessed into the buffer layer at the source side. We study important device characteristics such as electric field, breakdown voltage, drain current, maximum output power density, gate-drain capacitance, short channel effects and DC transconductance using two-dimensional and two-carrier device simulator. Recessed insulator in the drain side of the proposed structure reduces maximum electric field in the channel and therefore increases the breakdown voltage and maximum output power density compared to the conventional counterpart. Also, gate-drain capacitance value in the proposed structure is less than that of the conventional structure. Overall, the proposed structure reduces short channel effects. Because of the recessed regions at both the source and the drain sides, the average barrier thickness of the proposed structure is not changed. Thus, the drain current of the proposed structure is almost equivalent to that of the conventional transistor. In this work, length (L _r) and thickness (T _r) of the recessed region of the barrier at the source side are the same as those of the insulator at the drain side.     

纳米体硅鳍形场效应晶体管单粒子瞬态中的源漏导通现象

体硅鳍形场效应晶体管(FinFET)是晶体管尺寸缩小到30 nm以下应用最多的结构,其单粒子瞬态产生机理值得关注.利用脉冲激光单粒子效应模拟平台开展了栅长为30, 40, 60, 100 nm Fin FET器件的单粒子瞬态实验,研究FinFET器件单粒子瞬态电流脉冲波形随栅长变化情况;利用计算机辅助设计(technology computer-aided design, TCAD)软件仿真比较电流脉冲产生过程中器件内部电子浓度和电势变化,研究漏电流脉冲波形产生的物理机理.研究表明,不同栅长Fin FET器件瞬态电流脉冲尾部都存在明显的平台区,且平台区电流值随着栅长变短而增大;入射激光在器件沟道区下方体区产生高浓度电子将源漏导通产生导通电流,而源漏导通升高了体区电势,抑制体区高浓度电子扩散,使得导通状态维持时间长,形成平台区电流;尾部平台区由于持续时间长,收集电荷量大,会严重影响器件工作状态和性能.研究结论为纳米Fin FET器件抗辐射加固提供理论支撑.     

Light-emitting field-effect transistor based on a tetracene thin film

We report the first organic light-emitting field-effect transistor. The device structure comprises interdigitated gold source and drain electrodes on a Si/SiO(2) substrate. A polycrystalline tetracene thin film is vacuum sublimated on the substrate forming the active layer of the device. Both holes and electrons are injected from the gold contacts into this layer leading to electroluminescence from the tetracene. The output characteristics, transfer characteristics, and the optical emission properties of the device are reported. A possible mechanism for electron injection is suggested.     

Finite-element study of strain field in strained-Si MOSFET

The strain field in the channel of a p-type metal-oxide-semiconductor field effect transistor fabricated by integrating Ge pre-amorphization implantation for source/drain regions is evaluated using a finite-element method combining with large angle convergent-beam electron diffraction (LACBED). The finite-element calculation shows that there is a very large compressive strain in the top layer of the channel region caused by a low dose of Ge ion implantation in the source and drain extension regions. Moreover, a transition region is formed in the bottom of the channel region and the top of the Si substrate. These calculation results are in good agreement with the LACBED experiments.     

Modelling of contact effects in microcrystalline silicon thin-film transistors

Hydrogenated microcrystalline silicon has recently emerged as a promising material system for large-area electronic applications such as thin-film transistors and solar cells. In this paper, thin-film transistors based on microcrystalline silicon were realized with charge carrier mobilities exceeding 40 cm²/Vs. The electrical characteristics of the microcrystalline silicon thin-film transistors are limited by the influence of contact effects. The influence of the contact effects on the charge carrier mobility was investigated for transistors with different dimensions of the drain and source contacts. The experimental results were compared to an electrical model which describes the influence of the drain and source contact dimension on the transistor parameters. Furthermore, the Transmission Line Method was applied to investigate the contact effects of the thin-film transistors with different drain and source contact dimensions. Finally, optimized device geometries like the channel length of the transistor and dimension of the drain and source contacts were derived for the microcrystalline transistors based on the electrical model.     

Mobile ambipolar domain in carbon-nanotube infrared emitters

We spatially resolve the infrared light emission from ambipolar carbon-nanotube field-effect transistors with long-channel lengths. Electrons and holes are injected from opposite contacts into a single nanotube molecule. The ambipolar domain, where electron and hole currents overlap, forms a microscopic light emitter within the carbon nanotube. We can control its location by varying gate and drain voltages. At high electric fields, additional stationary spots appear due to defect-assisted Zener tunneling or impact ionization. The laterally resolved measurement provides valuable insight into the transistor behavior, complementary to electronic device characteristics.     

Symmetric tunnel field-effect transistor (S-TFET)

A novel heterojunction symmetric tunnel field-effect transistor (S-TFET) has been proposed and investigated, for the first time, in order to address the inborn technical challenges of the conventional p-i-n TFET (i.e., asymmetric TFET). With a band-to-band tunneling process between the germanium source/drain region and the silicon channel region, the theoretical limit of the subthreshold slope (SS) can be overcome (i.e., SS ∼ 45 mV/decade). The bidirectional current flow in the S-TFET is implemented with a p-n-p structure. And better performance in the S-TFET is achieved with a thin silicon-pad layer below the source/drain regions. The effects of source/drain/channel doping concentration and thickness on the performance of the device are investigated in order to create an S-TFET design guideline. In the future, the S-TFET will be one of the promising device structures for ultra-low-power applications, especially in integrated circuits that operate with a half-volt power supply voltage.     

Self-aligned metal-SiO2-InP based MISFETS having modulation doped channels

A novel metal-SiO₂-InP MISFET (metal-insulator-semiconductor field effect transistor) structure is proposed. This device incorporates a modulation doped channel and the self-aligned gate feature of Si MOSFETs. The modulation doping provides very high electron mobility and the self-alignment of gate, source and drain provides high packing density. Analytical results on current-voltage and transconductance characteristics are presented. Significant enhancement in high frequency performance over conventional MISFETs, employing SiO₂ as an insulator, is reported.     

LDC-CNTFET: A carbon nanotube field effect transistor with linear doping profile channel

In this paper, a novel carbon nanotube field effect transistor with linear doping profile channel (LDC-CNTFET) is presented. The channel impurity concentration of the proposed structure is at maximum level at source side and linearly decreases toward zero at drain side. The simulation results show that the leakage current, on-off current ratio, subthreshold swing, drain induced barrier lowering, and voltage gain of the proposed structure improve in comparison with conventional CNTFET. Also, due to spreading the impurity throughout the channel region, the proposed structure has superior performance compared with a single halo CNTFET structure with equal saturation current. Design considerations show that the proposed structure enhances the device performance all over a wide range of channel lengths.     

Optically controlled characteristics of a new heterojunction field effect transistor

A new heterojunction field effect transistor has been proposed and studied analytically to investigate its suitability as a high speed optical detector. The characteristics of the device have been studied in the dark as well as in the illuminated conditions. In the new structure the Schottky gate of a typical high electron mobility transistor (HEMT) has been replaced by a junction gate in order to facilitate the absorption of optical radiation. The performance of the new device has been compared with that of the existing HEMT structure for similar application. It is seen that the absorption of optical radiation of suitable wavelength in the larger bandgap material results into conductivity modulation of the channel giving rise to a considerable change in the saturation drain current in illuminated conditions. This enables the device to respond to an intensity modulated optical signal. It has further been observed that due to an increased optical absorption region the modified structure shows a much better optical sensitivity than the existing one.     

Novel carbon nanotube field effect transistor with graded double halo channel

A novel carbon nanotube field effect transistor with symmetric graded double halo channel (GDH–CNTFET) is presented for suppressing band to band tunneling and improving the device performance. GDH structure includes two symmetric graded haloes which are broadened throughout the channel. The doping concentration of GDH channel is at maximum level at drain/source side and is reduced gradually toward zero at the middle of channel. The doping distribution at source side of channel reduces the drain induced barrier lowering (DIBL) and the drain side suppresses the band to band tunneling effect. In addition, broadening the doping throughout the channel increases the recombination of electrons and holes and acts as an additional factor for improving the band to band tunneling. Simulation results show that applying this structure on CNTFET enhances the device performance. In comparison with double halo structure with equal saturation current, the proposed GDH structure shows better characteristics and short channel parameters. Furthermore, the delay and power delay product (PDP) analysis versus on/off current ratio shows the efficiency of the proposed GDH structure.     

Channel temperature determination of multifinger AlGaN/GaN high electron mobility transistor using micro-Raman technique

Self-heating in multifinger AlGaN/GaN high electron mobility transistor (HEMT) is investigated by micro-Raman spectroscopy. The device temperature is probed on the die as a function of applied bias. The operating temperature of AlGaN/GaN HEMT is estimated from the calibration curve of passively heated AlGaN/GaN structure. A linear increase of junction temperature is observed when direct current dissipated power is increased. When the power dissipation is 12.75 W at a drain voltage of 15 V, a peak temperature of 69.1 ℃ is observed at the gate edge on the drain side of the central finger. The position of the highest temperature corresponds to the high-field region at the gate edge.     

高电子迁移率晶体管放大器高功率微波损伤机理

在TCAD半导体仿真环境中,建立了0.25 m栅长的AlGaAs/InGaAs高电子迁移率晶体管(HEMT)低噪声放大器与微波脉冲作用的仿真模型,基于器件内部的电场强度、电流密度和温度分布的变化,研究了1 GHz的微波从栅极和漏极注入的损伤机理。研究结果表明,从栅极注入约40.1 dBm的微波时,HEMT内部峰值温度随着时间的变化振荡上升,最终使得器件失效,栅下靠源侧电流通道和强电场的同时存在使得该位置最容易损伤;从漏极注入微波时,注入功率的高低会使器件内部出现不同的响应过程,注入功率存在一个临界值,高于该值,器件有可能在第一个周期内损伤,损伤位置均在漏极附近。在1 GHz的微波作用下,漏极注入比栅极注入更难损伤。     

Quantum dot resonant tunneling FET on graphene

At this paper a field effect transistor based on graphene nanoribbon (GNR) is modeled. Like in most GNR-FETs the GNR is chosen to be semiconductor with a gap, through which the current passes at on state of the device. The regions at the two ends of GNR are highly n-type doped and play the role of metallic reservoirs so called source and drain contacts. Two dielectric layers are placed on top and bottom of the GNR and a metallic gate is located on its top above the channel region. At this paper it is assumed that the gate length is less than the channel length so that the two ends of the channel region are un-gated. As a result of this geometry, the two un-gated regions of channel act as quantum barriers between channel and the contacts. By applying gate voltage, discrete energy levels are generated in channel and resonant tunneling transport occurs via these levels. By solving the NEGF and 3D Poisson equations self consistently, we have obtained electron density, potential profile and current. The current variations with the gate voltage give rise to negative transconductance.     

Spin-polarized current generated by magneto-electrical gating

We theoretically study spin-polarized current through a single electron tunneling transistor (SETT), in which a quantum dot (QD) is coupled to non-magnetic source and drain electrodes via tunnel junctions, and gated by a ferromagnetic (FM) electrode. The I–V characteristics of the device are investigated for both spin and charge currents, based on the non-equilibrium Green's function formalism. The FM electrode generates a magnetic field, which causes a Zeeman spin-splitting of the energy levels in the QD. By tuning the size of the Zeeman splitting and the source–drain bias, a fully spin-polarized current is generated. Additionally, by modulating the electrical gate bias, one can effect a complete switch of the polarization of the tunneling current from spin-up to spin-down current, or vice versa.     

Channel temperature determination of a multifinger AlGaN/GaN high electron mobility transistor using a micro-Raman technique

Self-heating in a multifinger AlGaN/GaN high electron mobility transistor (HEMT) is investigated by micro-Raman spectroscopy. The device temperature is probed on the die as a function of applied bias. The operating temperature of the AlGaN/GaN HEMT is estimated from the calibration curve of a passively heated AlGaN/GaN structure. A linear increase of junction temperature is observed when direct current dissipated power is increased. When the power dissipation is 12.75 W at a drain voltage of 15 V, a peak temperature of 69.1°C is observed at the gate edge on the drain side of the central finger. The position of the highest temperature corresponds to the high-field region at the gate edge.     

Electronic transport properties of silicon junctionless nanowire transistors fabricated by femtosecond laser direct writing

Silicon junctionless nanowire transistor(JNT) is fabricated by femtosecond laser direct writing on a heavily n-doped SOI substrate.The performances of the transistor,i.e.,current drive,threshold voltage,subthreshold swing(SS),and electron mobility are evaluated.The device shows good gate control ability and low-temperature instability in a temperature range from 10 K to 300 K.The drain currents increasing by steps with the gate voltage are clearly observed from 10 K to50 K,which is attributed to the electron transport through one-dimensional(1D) subbands formed in the nanowire.Besides,the device exhibits a better low-field electron mobility of 290 cm~2·V~(-1)·s~(-1),implying that the silicon nanowires fabricated by femtosecond laser have good electrical properties.This approach provides a potential application for nanoscale device patterning.