Pd掺杂SnP3单层对SF6分解组分吸附的第一性原理研究

利用气敏传感器检测SF₆分解组分信息可评估GIS设备运行状态，及早发现绝缘缺陷。金属掺杂的SnP₃单层有着良好的吸附性能，在气体检测领域具有应用前景。本文基于第一性原理计算并分析了Pd-SnP₃单层吸附SO₂、H₂S、SOF₂和SO₂F₂后体系的吸附能、态密度、能隙与解吸时间等参数，探讨其用于气体传感器的可能性。结果表明：在吸附性能方面，Pd-SnP₃单层仅对SO₂F₂发生了化学吸附，且结合态密度、差分电荷密度与转移电荷分析进一步验证了该材料对SO₂F₂的吸附效果明显优于SO₂、H₂S和SOF₂;在传感特性方面，仅有SO₂F₂的吸附使体系的能隙发生了明显变化，且该气体可在398 K及以上温度下从P...     

4d金属掺杂增强SnO2对丙酮光学传感特性的理论分析

通过检测人体呼出气体中的微量丙酮可以筛查出早期的糖尿病患者,因此寻找能进行微量丙酮气体灵敏探测的材料是一个研究热点。本文计算4d金属杂质Mo、Ru、Rh、Ag掺杂金红石相SnO₂(110)表面吸附丙酮分子后的表面电荷布居(氧化还原性能)、态密度、光学性质以及吸附稳定性,讨论了4d金属杂质掺杂对金红石相SnO₂(110)表面光学气敏传感特性的影响。研究结果发现:各金属杂质对表面的氧化还原性能都有着不同程度的影响;4d电子在费米能级附近形成杂质峰,其中Ru-4d电子引入的杂质峰最大,离费米能级最近,对SnO₂的禁带宽度改善最大;Ru掺杂对于金红石相SnO₂(110)表面在可见光范围内(400~760 nm)的光学性质的改善相对于Mo、Rh、Ag掺杂也有着较大的优势;所有的掺杂表面都能自发吸附丙酮分子,吸附后稳定性为:Ru＞Rh＞Ag＞Mo。结论表明,Ru掺杂的SnO₂作为较为有效的丙酮光学气敏探测材料,有望通过探测人体呼出气体中的丙酮从而达到改善糖尿病的早期发现和诊断的效率。     

SnS2气敏材料研究进展

气体传感器能够有效检测浓度低于人类嗅觉极限的有毒有害及易燃易爆等气体,在军事国防、环境安全、医疗诊断等领域具有重大的研究意义。其中电阻式气体传感器因其成本低廉,普遍适用于民用气体检测而受到广泛应用。气敏材料是气体传感器的核心,设计合成合适的气敏材料对发展高性能气体传感器至关重要。本文在简单介绍气体传感器、电阻式气体传感器以及电阻式气体传感器常用的几种传感材料的基础上,聚焦于n型半导体SnS₂气敏材料,归纳了该材料的结构与性质,重点阐述了提升SnS₂气敏材料传感性能的方法,包括空位工程、热激活工程、光激活工程和异质结工程,并对SnS₂气敏材料的研究趋势进行了展望。     

CsSbSO4F2晶体的光学特性研究

通过溶液法合成了一种非中心结构长条状的CsSbSO₄F₂晶体.其晶体结构属于空间群Pna2₁,结构中[SbO₂F₂]与[SO₄]多面体共顶点连接形成了一维链状结构,Cs⁺填充在长链之间维持电荷平衡.利用Kurtz-Perry方法对晶体进行粉末倍频测试,表明CsSbSO₄F₂属于可相位匹配的物质,其倍频效应约为KH₂PO₄的0.65倍.紫外-可见光-近红外漫反射光谱显示,该物质的截止波长为233 nm.光学性能测试表明,CsSbSO₄F₂在紫外区域有潜在应用.     

Ca(H2PO4)2-H3PO4-K2SO4体系中石膏晶型及形貌调控

为将Ca(H₂PO₄)₂制备KH₂PO₄过程中的石膏资源化利用,以H₃PO₄与CaCO₃反应制备Ca(H₂PO₄)₂溶液,并与K₂SO₄溶液反应,进行Ca(H₂PO₄)₂-H₃PO₄-K₂SO₄体系中石膏晶型和形貌调控研究。结果表明:通过改变反应时间、反应温度、SO^2-₄过量系数和CaO含量等参数可对Ca(H₂PO₄)₂-H₃PO₄-K₂SO₄体系中石膏晶型和形貌进行调控,制得短柱状α-CaSO₄·0.5H₂O。体系在温度高于95 ℃和CaO含量为3.0%~5.0%(质量分数,下同)时形成α-CaSO₄·0.5H₂O,在CaO含量为5.5%主要形成CaSO₄·2H₂O;反应时间长于20 min和SO^2-₄过量系数大于1.4将形成K₂SO₄(CaSO₄)₅·H₂O,导致石膏晶体表面缺陷增加。本实验条件下,适宜反应条件为:反应时间10 min、反应温度95 ℃、SO^2-₄过量系数1.2和CaO含量5.0%,此条件下可制得长度42~70 μm、直径13~24 μm的短柱状α-CaSO₄·0.5H₂O,其抗折和抗压强度分别可达5.61 MPa和33.74 MPa,滤液中钾收率和脱钙率分别可达94.23%和83.80%。     

具有n-n型异质结的复合材料Bi2S3/MIL-125(Ti)光电性能研究

以硫代硫酸钠·五水合物(Na₂S₂O₃·5H₂O)、硝酸铋·五水合物(BiN₃O₉·5H₂O)为硫源和铋源,尿素(CON₂H₄)为结构导向剂,制备了纳米棒状结构的硫化铋(Bi₂S₃),使其原位生长在MIL-125(Ti)的笼状结构表面。PEC性能测试显示,在0.5 mol·L^-1的硫酸钠电解液(pH=6.0)中,Bi₂S₃/MIL-125(Ti)_0.07(MIL-125(Ti)加入量为0.07 g)的复合材料表现出最高的光电性能。光电性能的显著增强主要取决于Bi₂S₃/MIL-125复合材料的带隙重整效应,对紫外光以及可见光的吸收能力显著提高。但由于Bi₂S₃/MIL-125...     

NaCa2Mg2(VO4)3∶Eu3+颜色可调荧光粉的熔盐法合成及其发光性能研究

以廉价的NaCl为熔盐，采用熔盐法合成了NaCa_2-xMg₂(VO₄)₃∶xEu³⁺(0≤x≤0.10)系列颜色可调荧光粉，系统研究了合成条件、Eu³⁺掺杂对样品结构及发光性能的影响。结果表明，反应温度为800℃、反应时间为0.5 h、原料与熔盐的质量比为1∶3是合成NaCa₂Mg₂(VO₄)₃的适宜反应条件，所得样品为NaCa₂Mg₂(VO₄)₃纯相，且结晶度高。样品微观形貌随着反应温度的升高由珊瑚状演变为表面光滑的不规则多面体。Eu³⁺掺杂对NaCa₂Mg₂(VO₄)₃的晶体结构影响较小，但对其发光性能影响较大。随着Eu³⁺浓度(x)的增加，VO     

高温扩散工艺制备带隙可调的β-(AlxGa1-x)2O3薄膜

β-(Al_xGa_1-x)₂O₃因其优异的抗击穿及带隙可调节性在现代功率器件及深紫外光电探测等领域展现出巨大的应用前景,然而传统直接生长工艺的复杂性和难度限制了其进一步的发展。因此,本文采用较为简单的高温扩散工艺在c面蓝宝石衬底上成功制备了β-(Al_xGa_1-x)₂O₃纳米薄膜。利用X射线衍射、原子力显微镜、扫描电子显微镜和紫外-可见分光光度计对其进行了表征。由于高温下蓝宝石衬底中的Al原子向Ga₂O₃层扩散,β-Ga₂O₃薄膜将转变为Al、Ga原子比例不同的β-(Al_xGa_1-x)₂O₃薄膜。实验结果显示：当退火温度从1 010℃增加到1 250℃时,薄膜中Al的平均含量从0.033增加到0.371;当退火温度从950℃增加到1 250℃时...     

射频磁控溅射法制备MoS2薄膜的最佳工艺参数研究(英文)

采用射频(RF)磁控溅射法在石英衬底上制备了MoS₂薄膜。通过正交试验研究了溅射时间、溅射温度、氩气流量和溅射功率对MoS₂薄膜结构的影响。通过XRD、Raman、XPS、EDS和SEM对MoS₂薄膜的结晶度、薄膜厚度和表面形貌进行分析，得到了制备MoS₂薄膜的最佳工艺参数。发现溅射温度较高或较低结晶度都很差，在较低的溅射温度下样品的XRD衍射峰不明显。而当温度为250℃时，样品的XRD衍射峰较多，结晶度较好。根据正交试验法得出溅射温度对MoS₂的结晶效果起着至关重要的作用，其次是氩气流量。当溅射温度为250℃,氩气流量为6 mL/min,溅射时间为30 min,溅射功率为300 W或400 W时，MoS₂膜的结晶度较好。在这个条件下制备的膜较厚，但为以后的实验指明了方向。保持溅射温度、溅射功率和氩气流量不变，通过减少时间成功制备了厚度为58.9 nm的薄膜。     

KLi(HC3N3O3)·2H2O晶体的电光效应和生长研究

本文采用电光系数的粉末测试方法,探索发现了新型电光晶体KLi(HC₃N₃O₃)·2H₂O。根据粉末样品的红外反射光谱和拉曼光谱,计算获得晶格振动对电光系数的贡献值,再加上粉末倍频效应推算的有效非线性光学系数,最终计算出KLi(HC₃N₃O₃)·2H₂O的电光系数为2.37 pm/V,与商用电光晶体β-BBO相当。采用水溶液法进行晶体生长,测试不同原料生长晶体时的过热和过冷曲线,优化生长工艺,获得35 mm×25 mm×10 mm透明晶体。采用X射线定向技术辅以压电系数测量,确定了晶体形貌与各向异性生长速率的对应关系。     

Studies of prereactions during MOVPE growth of wide band-gap II/VI semiconductors: the effect of pyridine upon the gas-phase reactions between H2S and Me2Zn

The effect of pyridine addition upon the gas-phase reactions of hydrogen sulphide (H₂S) with dimethylzinc (Me₂Zn) in the presence of pyridine has been investigated and compared with results from reactions of H₂S with Me₂Cd. The deposits of ZnS which form have been analysed and consist of particles in the nanocrystalline size range of mainly the hexagonal phase. The average particle size within the deposits depends on both the concentration of pyridine in the gas phase and the temperature at which the reactants are mixed. Pyridine may bind through the lone pair of the nitrogen to surface metal atoms of growing particles, inhibiting further growth of the particle.     

Investigation of Ni/Au-contacts on p-GaN annealed in different atmospheres

We investigated the effect of different annealing atmospheres on contact behaviour of Ni/Au contacts on moderately doped p-GaN layers. We used the annealing gases N₂, O₂, Ar, and forming gas (N₂/H₂) at varying annealing temperatures from 350°C to 650°C in steps of 50°C. The p-GaN samples were either metalorganic chemical vapor deposition or molecular beam epitaxy grown. Contact characterization was done after each annealing step by using the circular transmission line model. Specific contact resistances were determined to be in the low 10⁻⁴ Ω cm² range for oxidized contacts. Accompanying chemical analysis using depth resolved Auger electron spectroscopy revealed that NiO was formed and Au diffused towards the interface, whereas annealing in forming gas prevented oxidation and did not lead to Ohmic behaviour.     

基于第一性原理的掺杂单层WS2的光电效应

基于非平衡态格林函数-密度泛函理论,采用第一性原理方法,计算了VA族元素(N、P、As或 Sb) 掺杂单层WS₂的光电效应,并解释了掺杂提高光电效应的微观机理。结果表明:在线性极化光照射下,单层WS₂中可以产生光电流。由于掺杂降低了单层WS₂的空间反演对称性,导致N、P、As或 Sb分别掺杂的单层WS₂的光照中心区产生的光电流明显提升。其中N掺杂的效果最好,掺杂后的单层WS₂在光子能量3.1 eV时获得最大光电流(1.75),并且偏振灵敏度达到最大(18.1),P、As、Sb分别掺杂的单层WS₂在光子能量3.9 eV时取得较大的光电流,并且有较高的偏振灵敏度。研究结果表明通过掺杂能够有效增强光电效应,获得更高的偏振灵敏度,揭示了掺杂单层WS₂在光电子器件领域潜在的应用前景。     

Residence-time dependent kinetics of CVD growth of SiC in the MTS/H2 system

In most chemical vapor deposition (CVD) experiments in flow reactors carried out until now, growth conditions were chosen which yield growth rates independent or linearly dependent on the total gas flow rate, so that the residence time (t) of the gases in the hot zone of the reactor should not play any role in the growth rate. We have performed CVD experiments in the system MTS/H₂, under conditions of low decomposition of MTS. We have found a region, where the growth rate and its derivatives depend strongly on the operating conditions, in particular, where the growth rate of SiC increases strongly with an increase of t. For lower or higher (but yet incomplete) decomposition of MTS, the growth rate becomes again independent of t, and its apparent energy of activation becomes 200 kJ/mol.     

Y掺杂WS2二维材料的第一性原理研究

WS₂由于其优异的物理和光电性质引起了广泛关注。本研究基于第一性原理计算方法,探索了本征单层WS₂及不同浓度W原子替位钇(Y)掺杂WS₂的电子结构和光学特性。结果表明本征单层WS₂为带隙1.814 eV的直接带隙半导体。进行4%浓度(原子数分数)的Y原子掺杂后,带隙减小为1.508 eV,依旧保持着直接带隙的特性,随着Y掺杂浓度的不断增大,掺杂WS₂带隙进一步减小,当浓度达到25%时,能带结构转变为0.658 eV的间接带隙,WS₂表现出磁性。适量浓度的掺杂可以提高材料的导电性能,且掺杂浓度增大时,体系依旧保持着透明性并且在红外光和可见光区对光子的吸收能力、材料的介电性能都有着显著提高。本文为WS₂二维材料相关光电器件的研究提供了理论依据。     

Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum

Thin films of Tantalum nitride (TaN) were deposited from tetra-ethylamido-tantalum (Ta (NEt₂)₄) by low-pressure chemical vapor deposition. Good-quality step coverage is achieved below 400°C, because the deposition rate is determined by the reaction rates on the surface. The film resistivity increases, however, as the substrate temperature decreases. In order to obtain the low resistivity of films deposited at lower temperatures, we have increased the amount of injected H₂ gas during the deposition. The resistivity decreases by the increase in the H₂ gas flow rate, and it is shown that a large amount of H₂ gas injection during the deposition is an effective method for obtaining both low resistivity and high-quality step coverage. The residual carbon concentration in the film is measured to be >10%, on the other hand, the concentration of N less than 1%. The microstructural investigation using transmission electron microscopy (TEM) reveals that crystalline structure of the deposited film has an amorphous phase.     

空位缺陷对单层2H-MoTe2光电效应的第一性原理研究

MoTe₂由于其类石墨烯的堆叠方式和丰富的相结构而引起科研人员的广泛研究,特别是合适的禁带宽度使其在光电器件领域有着光明的应用前景。基于非平衡格林函数-密度泛函理论,通过第一性原理计算方法,研究了不同原子空位缺陷对单层2H-MoTe₂光电效应的影响。结果表明:不同空位缺陷下2H-MoTe₂器件的光电流函数与唯象理论相符合。光子能量在1.0~2.8 eV时,2Te空位缺陷对单层2H-MoTe₂的光电流有显著提升,特别是在光子能量2.6 eV时获得所有器件的最大光电流。利用能带结构发现不同原子空位缺陷都导致单层2H-MoTe₂的价带向高能级处偏移,而导带向低能级处偏移,减小了带隙,在线性偏振光的照射下有利于电子从价带跃迁到导带形成光电流。同时发现1Te空位缺陷和Mo空位缺陷的单层2H-MoTe₂在远离费米能级处具有相似的能带结构,从而导致在光子能量大于1.6 eV时,1Te空位和Mo空位器件的光电流随光子能量的变化拥有相同的变化趋势。这些计算结果可以用于指导MoTe₂光电器件的设计。     

静电纺丝法制备CeO2微纳米纤维及其除氟性能

以聚丙烯腈(PAN)为载体,六水合硝酸铈[Ce(NO₃)₃·6H₂O]为原料,采用静电纺丝法制备了Ce(NO₃)₃/PAN纤维,在空气中热处理得到CeO₂微纳米纤维,通过XRD、BET和SEM对CeO₂微纳米纤维进行表征。采用静态吸附实验探讨了CeO₂微纳米纤维去除水溶液中氟离子的性能,考察了溶液pH值、初始氟离子浓度及共存阴离子等对吸附性能的影响。结果表明,pH=3时,CeO₂微纳米纤维对F^-的吸附性能最佳,CeO₂吸附量随着F^-浓度的增大呈上升趋势。CeO₂微纳米纤维对F^-的吸附等温线遵循Langmuir模型,二级动力学模型能很好地描述CeO₂微纳米纤维对F^-的吸附过程。CeO₂微纳米纤维的除氟性能优良,可为其实际应用提供理论参考。     

Properties of ZnO films grown on (0 0 0 1) sapphire substrate using H2O and N2O as O precursors by atmospheric pressure MOCVD

In this paper, we compare the properties of ZnO thin films (0 0 0 1) sapphire substrate using diethylzinc (DEZn) as the Zn precursor and deionized water (H₂O) and nitrous oxide (N₂O) as the O precursors, respectively in the main ZnO layer growth by atmospheric pressure metal–organic chemical vapor deposition (AP-MOCVD) technique. Surface morphology studied by atomic force microscopy (AFM) showed that the N₂O-grown ZnO film had a hexagonal columnar structure with about 8 μm grain diameter and the relatively rougher surface compared to that of H₂O-grown ZnO film. The full-widths at half-maximum (FWHMs) of the (0 0 0 2) and () ω-rocking curves of the N₂O-grown ZnO film by double-crystal X-ray diffractometry (DCXRD) measurement were 260 and 350 arcsec, respectively, indicating the smaller mosaicity and lower dislocation density of the film compared to H₂O-grown ZnO film. Compared to H₂O-grown ZnO film, the free exciton A (FX_A) and its three phonon replicas could be clearly observed, the donor-bound exciton A⁰X (I₁₀):3.353 eV dominated the 10 K photoluminescence (PL) spectrum of N₂O-grown ZnO film and the hydrogen-related donor-bound exciton D⁰X (I₄):3.363 eV was disappeared. The electron mobility (80 cm²/V s) of N₂O-grown ZnO film has been significantly improved by room temperature Hall measurement compared to that of H₂O-grown ZnO film.