感应耦合等离子体的1维流体力学模拟

采用双极扩散近似的流体力学模型,通过数值模拟方法研究了射频感应耦合等离子体(ICP)中等离子体密度和电子温度等物理量的空间分布,其中射频源的功率沉积由动力学理论给出。分析了不同的射频线圈的驱动电流和放电气压对等离子体密度和电子温度空间分布的影响。在低气压下,等离子体密度基本上保持空间均匀分布。随着放电压强的增加,等离子体密度的分布呈现出明显的空间不均匀性。当线圈电流增大时,等离子体密度和电子温度都随着增大。     

感应耦合等离子体中和枪的电子引出特性研究

给出了一种感应耦合等离子体源的设计,用于等离子体中和枪装置.通过实验方法研究等离子体源的电子引出特性,并结合理论分析了等离子体密度随射频功率的变化关系.研究结果表明等离子体源的电子引出特性与放电腔内气压有关联性,E?H模式转换中电子密度的变化与负载的电感值相关.研究成果对等离子体中和枪的发展有重要的参考价值.     

氩气感应耦合等离子体速度与温度数值模拟

为了获得用于研究再入飞行器热防护系统的感应耦合等离子体风洞流场数据,基于流场、电磁场和化学场的多场耦合建立了非平衡态感应耦合等离子体数值模型。利用该模型对不同入口质量流率和不同工作压力下的感应耦合等离子体进行了数值模拟,得到了相应工作参数下感应耦合等离子体温度与速度的分布特性。计算结果表明:等离子体中心线上的速度随着入口质量流率的增大而增大,而随着工作压力的增大而减小;同时,等离子体中心线上的温度随着入口质量流率的增大而减小,而随着压力的增大先减小后增大。这些结果可为感应耦合等离子体风洞优化设计及其工业应用提供理论指导。     

大功率热平衡感应耦合等离子体数值模拟及实验研究

感应耦合等离子体发生器是临近空间高速目标等离子体电磁科学实验研究装置的核心部件之一,常用于模拟高焓高速等离子体鞘套环境,为了研究大功率射频中压下感应耦合等离子体发生器的放电特性,采用数值模拟和实验相结合的方法研究其内部的传热与流动特性.本文基于局域热力学平衡条件,通过湍流场-电磁场-温度场的多场耦合开展了功率为10...     

多源感应耦合等离子体的产生及等离子体诊断

基于单组多匝线圈的小腔体感应耦合等离子体，研究了线圈配置与耦合效率等之间的关联，并将实验结果应用到多组并联螺旋天线感应耦合等离子体放电体系中.采用了改进的朗谬尔探针方法对单源和多源感应耦合等离子体的电参量分别进行了表征.结果表明，使用多螺旋天线并联方式可以产生低气压高密度的感应耦合等离子体放电，通过调整工艺参量，可以将等离子体密度和光刻胶的刻蚀均匀性控制在80％以上. 关键词： 多源感应耦合等离子体 朗谬尔探针 等离子体灰化     

射频感应耦合低压等离子体特性分析

采用光谱诊断法和Langmuir单探针法对射频感应耦合Ar气等离子体特性进行分析。通过光栅光谱仪研究了低气压下Ar气等离子体的光谱强度的变化特性,采用Langmuir单探针法测量不同条件下电子密度和电子温度。等离子体发射光谱的光谱强度随着气压和功率的增加而增强,射频功率对光谱强度的影响较明显。当功率从120W增加到180W时,光谱强度将会迅速增加,等离子体发生E模向H模的模式转换。Langmuir单探针法测量的电子密度和电子温度在的变化规律符合E模向H模转换的变化规律。     

平板型感应耦合等离子体源的线圈配置对功率耦合效率的影响

基于感应耦合等离子体的变压器模型，分析了感应耦合等离子体的功率耦合效率与线圈配置(几何尺寸、电学参量)及等离子体基本参量(等离子体电子密度、电子-中性粒子有效碰撞频率)之间的关系；然后，改变平板型线圈的匝数从而改变了线圈的几何尺寸、电学参量，并且测量出了不同的线圈所对应的功率耦合效率.实验结果表明，线圈的电感量是能否实现放电的决定性因素；而功率耦合效率则与感应线圈的Q值、放电参量(气压、功率)等密切相关，射频输入功率的增加、放电气压的上升都会导致感应耦合等离子体耦合效率的提高，这与感应耦合等离子体的变压器模型预测结果是符合的. 然而，变压器模型给出的提高线圈Q值可导致耦合效率增强的预测结果仅适用于同等电感量的线圈条件. 本文对于单线圈的感应耦合等离子体源的研究为线圈的优化设计甚至大面积的多线圈感应耦合等离子体源研制提供了理论依据. 关键词： 感应耦合等离子体 功率耦合效率 变压器模型     

感应耦合等离子体增强射频磁控溅射沉积ZrN薄膜及其性能研究

利用感应耦合等离子体(ICP)增强射频磁控溅射技术在Si(111)片和M2钢表面制备了ZrN薄膜,研究了基片的温度和ICP功率对ZrN薄膜的结构以及性能影响.研究发现：在基片温度≤300℃沉积的ZrN薄膜择优取向为(111);基片温度达到450℃时薄膜出现ZrN(200)衍射峰,ZrN(111)晶面的织构系数明显降低.传统磁控溅射沉积薄膜为柱状结构,当ICP为200 W,基片温度为300℃时沉积薄膜中柱状晶体消失;随着基片温度的升高,N/Zr元素比例降低,并且薄膜的电阻率下降;相对于传统溅射,ICP增强射 关键词： 感应耦合等离子体 磁控溅射 ZrN 微结构     

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将等离子体作为磁流体,考虑其流体属性和电磁属性,介绍了利用FLUENT软件包并将其进行二次开发,解算电磁场方程、质量连续性方程、动量守恒方程、以及能量守恒方程的数值模拟方法,得到了以磁矢势为表达形式的电磁场分布、温度分布和速度分布.数值模拟了粉末球化所用的感应耦合等离子体炬电磁场分布、温度分布、速度分布.分析了温度分布、速度分布产生的物理原因,为感应耦合等离子体炬球化粉末颗粒提供理论性指导.     

基于COMSOL 的感应耦合等离子体炬多物理场研究

为了优化锂微粉等离子体球化的工艺,对感应耦合等离子体炬进行二维建模,将电磁场计算域扩展到等离子体放电区域之外的空气区域,利用COMSOL 软件进行多物理场模拟。得到了等离子体的电磁场、温度和速度分布,并对分布形成的物理机制进行分析。模拟发现等离子体区域线圈段存在上下两组对称的回流涡,线圈段中部靠近约束管处等离子体速度分布杂乱,有激烈的径向打壁现象,乱流预计会对约束管壁相应位置造成一条环状的破裂效果。基于模拟结果,提出在采用感应耦合等离子体球化锂微粉的工艺工程中,可以将注粉口下移,绕开上回流涡。     

Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVD

Silicon nitride films have been deposited at a low temperature (70 °C) by inductively coupled plasma chemical vapor deposition (ICP-CVD) technique and their physical and chemical properties were studied. For a deposited SiN sample, β-phase was observed and refractive index of 2.1 at 13.18 nm/min deposition rate was obtained. The attained stress of 0.08 GPa is lower as compared to the reported value of 1.1 GPa for SiN thin films. To study the deposited film, characterization was performed using X-ray photoelectron spectra (XPS), X-ray diffraction (XRD), micro Raman spectroscopy, Fourier transfer infrared spectroscopy (FTIR), cross-section scanning electron microscopy (SEM) and atomic force microscopy (AFM).     

The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD

Hydrogenated amorphous and microcrystalline silicon films were deposited by inductively coupled plasma chemical vapor deposition (ICP-CVD) at low substrate temperatures using H₂-diluted SiH₄ as a source gas. High-density plasma generated by inductively coupled excitation facilitates the crystallization of silicon films at low temperatures, and microcrystalline silicon films were obtained at the substrate temperature as low as 180 °C. The columnar structure of the films becomes more and more compact with an increase of their crystallinity. The reduction of hydrogen content in the films causes a narrowing of the optical bandgap and an enhancement of the absorption with increasing the substrate temperature. The microcrystalline silicon films show two electronic transport mechanisms: one is related to the density of state distribution in the temperature region near room temperature and the other is the variable range hopping between localized electronic states close to the Fermi level below 170 K. A reasonable explanation is presented for the dependence of the optoelectronic properties on the microstructure of the silicon films. The films prepared at a substrate temperature of 300 °C have highly crystalline and compact columnar structure, high optical absorption coefficient and electrical conductivity, and a low hydrogen content of 3.8%.     

Influence of helium metastable states on the E-H mode transition in an inductively coupled plasma

A helium (He) inductively coupled plasma (ICP) source combined with two diode laser systems with the wavelengths of 396.5 nm (2¹S–4¹P) and 1082.9 nm (2³S–2³P) was configured to investigate the influence of He metastable states on the E-H mode transition. The population densities of 2¹S and 2³S states were measured by laser absorption spectroscopy as the functions of RF power, He pressure, and the distance from RF antenna. Correlations between the E-H mode transition and the population density ratio of the 2³S metastable state to the 2¹S metastable state as well as the line intensity ratio (LIR) of the 3³D-2³S transition to the 3¹P–2¹S transition were investigated. The E-H mode transition of He ICP was analyzed by the electron impact ionization rate and it was confirmed that the 2³S metastable state plays a key role in the E-H mode transition.     

Etching and oxidation of InAs in planar inductively coupled plasma

The surface of InAs (1 1 1)A was investigated under plasmachemical etching in the gas mixture CH₄/H₂/Ar. Etching was performed using the RF (13.56 MHz) and ICP plasma with the power 30–150 and 50–300 W, respectively; gas pressure in the reactor was 3–10 mTorr. It was demonstrated that the composition of the subsurface layer less than 5 nm thick changes during plasmachemical etching.A method of deep etching of InAs involving ICP plasma and hydrocarbon based chemistry providing the conservation of the surface relief is proposed. Optimal conditions and the composition of the gas phase for plasmachemical etching ensuring acceptable etch rates were selected.     

Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics

A high-density RF ion source is an essential part of a neutral beam injector. In this study, the authors attempt to retrofit an original regular RF ion source reactor by inserting a thin dielectric tube through the symmetric axis of the discharge chamber. With the aid of this inner tube, the reactor is capable of generating a radial magnetic field instead of the original transverse magnetic field, which solves the E × B drift problem in the current RF ion source structure. To study the disturbance of the dielectric tube, a fluid model is introduced to study the plasma parameters with or without the internal dielectric tube, based on the inductively coupled plasma(ICP) reactor. The simulation results show that while introducing the internal dielectric tube into the ICP reactor, both the plasma density and plasma potential have minor influence during the discharge process, and there is good uniformity at the extraction region. The influence of the control parameters reveals that the plasma densities at the extraction region decrease first and subsequently slow down while enhancing the diffusion region.     

射频电感性耦合等离子体调谐基片自偏压特性

采用调节射频电感性耦合等离子体中基片电极与地之间的外部电路阻抗的方法,控制基片电极的射频自偏压。研究了调谐基片自偏压随外部调谐电容值的变化特征,得到了调谐基片射频自偏压随射频放电功率、气压的变化曲线。在一定放电参数区域内,调谐基片射频自偏压随调谐电容的变化曲线呈现跳变、双稳、迟滞现象。