表面热透镜技术测量光学薄膜样品表面热变形

给出了连续调制激励光照射下光学薄膜样品表面热变形场的理论分布,并由此定义了表面热透镜(STL)信号。根据表面热透镜理论实验测量了一个BK7基底高反膜样品的形变,给出了表面热透镜信号随调制频率的变化曲线。实验结果表明:在采用的STL实验构型中,探测了最小1.985 nm的直流形变,对应不调制时的形变为3.97 nm,相应的形变探测灵敏度达到了10 pm量级;直流形变与功率成线性关系;交流表面热透镜信号随着频率增大而减小,在高频端近似成线性减小。     

基底对光学薄膜弱吸收测量的影响

 对表面热透镜技术测量光学薄膜弱吸收低频调制时不同基底对测量的影响进行了理论分析。用Lambda—900分光光度计测量了K9和石英基底的Ti₃O₅单层膜的吸收值,将该组样品作为定标片;用表面热透镜装置分别测量了BK7和石英空白基底及HfO₂,ZnO两组不同基底不同厚度单层膜样品的吸收。通过分析比较同一工艺条件下镀制的不同基底薄膜样品用与其同种和不同种基底定标片定标测量的结果,表明在低频测量时需要用与测量样品同种基底的定标片定标;不同厚度样品的测量结果表明,在不能严格满足热薄条件时,测量结果需引入修正值。     

光学薄膜测量时平顶光束激励的表面热透镜理论模型

推导了调制的平顶光束激励下基于Fresnel衍射积分的表面热透镜理论，通过数值模拟，比较了平顶光束和高斯光束激励下样品内部温度场、表面形变场和探测光衍射信号的径向分布，分析了影响表面热透镜信号的实验参数.结果表明，在最佳探测位置，平顶光束激励下的表面热透镜系统比相同情况下高斯光束激励下的灵敏度高，最高时约2倍，更有利于薄膜吸收测量. 关键词： 表面热透镜 光学薄膜 平顶光束     

热透镜技术的单柱面聚焦透镜差分测量构型北大核心CSCD

提出了一种基于单柱面聚焦透镜的热透镜技术差分测量构型,并采用相移理论和高斯光束ABCD传输定律建立了热透镜信号理论模型,导出了最优构型条件及测量灵敏度理论极限,结果表明该测量构型能够获得与双柱面聚焦透镜测量构型相同的测量灵敏度。采用理论计算及有限元分析相结合的方法分析了构型参数对探测平面光强分布及热透镜信号幅值的影响,理论结果和有限元结果的一致性证明了单柱面聚焦透镜差分测量构型的可行性及理论模型的正确性。     

表面热透镜薄膜吸收测量灵敏度提高方法

为提高表面热透镜薄膜吸收测量仪的灵敏度，在表面热透镜衍射理论基础上，通过数值模拟给出了探测激光腰斑半径、探测激光腰斑到样品表面距离、样品到探测光纤端面距离等仪器参数的优化方法. 经优化调整后该仪器能达到优于0.1ppm量级的薄膜吸收率测量灵敏度. 关键词： 吸收测量 表面热透镜 光热形变 薄膜     

利用太赫兹反射式时域光谱系统测量有机溶剂的光学参数

采用太赫兹反射式时域光谱系统,测量了包括正己烷、液状石蜡、无水酒精和水在内的四种有机溶剂的反射式时域光谱,并根据实验模型设计了两种计算方法提取液体样品的光学参数.此外,还将反射算法得到的样品光学参数与透射算法的结果进行比较,验证了反射式系统对应算法结果的正确性,解决了透射系统无法准确测量和提取对太赫兹吸收很强的样品的光...     

10.6μm激光辐照下光学薄膜的微弱吸收测量

 建立了表面热透镜技术测量光学薄膜微弱吸收的实验装置，对10.6μm CO₂激光辐照下镀制在Ge基底上的不同厚度的单层ZnS，YbF₃薄膜，以及镀制在Ge基底上不同膜系的（YbF₃/ZnSe）多层分光膜的弱吸收进行了测量，并对实验结果作了分析和讨论。实验结果表明，利用本实验系统已测得的待测样品的最低吸收为2.87×10^-4，测量系统的灵敏度为10^-5。     

10.6μm激光辐照下光学薄膜的微弱吸收测量

O484.5 2004064370 10.6μm激光辐照下光学薄膜的微弱吸收测量=Measurement of weak absorption of thin film coatings irradiated by 10.6μm laser[刊,中]/杨富(四川大学电子信息学院.四川,成都(610064)),黄伟…∥强激光与粒子束.—2004,16(3).—277-280 建立了表面热透镜技术测量光学薄膜微弱吸收的实验装置,对10.6μmCO_2激光辐照下镀制在Ge基底上的不同厚度的单层ZnS,YbF_3薄膜。以及镀制在Ge基底上不同膜系的(YbF_3/ZnSe)多层分光膜的弱吸收进行了测量,并对实验结果作了分析和讨论。实验结果表明,利用本实验系统已测得的待测样品的最低吸收为2.87×10~(-4),测量系统的灵敏度为10~(-5)。图3表2参6(于晓光)     

聚焦误差热透镜技术单透镜测量构型理论分析

构型优化条件要求柱面聚焦透镜与待测样品位置重合,造成实验实现的困难,因此通过数值计算分析了柱面聚焦透镜位置对其余构型参数优化值、聚焦误差信号幅值及其非线性误差的影响。提出了聚焦误差热透镜技术的单柱面聚焦透镜测量构型,并建立了基于热透镜光学相移理论的热透镜聚焦误差信号理论模型,获得了构型优化条件。计算结果表明：当柱面聚焦透镜与待测样品间距小于0.7倍的柱面聚焦透镜焦距时,探测和激励光斑半径优化值与理论优化值基本一致,探测器与聚焦透镜间距略有增大,聚焦误差信号大于0.85倍的理论极值,探测光最大光学相移小于0.2 rad时非线性误差小于1%。证明了聚焦误差热透镜技术的单柱面聚焦透镜测量构型的可行性。     

反射式热透镜时变信号测量固体热扩散率的研究

介绍了采用反射式热透镜时变信号测量固体热扩散率的一种简便方法,该方法结合表面热透镜技术原理,采用表面透镜的动态变化和反射的探测光发散的幅度来确定固体的热扩散率,相对于传统的热扩散率测量方法要快捷简单。对较大范围的一系列物质的热学特性进行了实验研究,证明了其实用性。     

Heater optimization for polymer in silica optical switch

An optimization process of specialized heater electrode design for a Multimode Interference (MMI) based polymer in silica thermo-optical switch is described. The switch is designed based on the waveguide structure of photodefinable BenzoCyclobutene (BCB 4024-40) polymer core, sandwiched by a 6 μm thickness of silica (SiO₂) upper clad layer and BK7 glass as a substrate. The upper clad thickness has been chosen such that to avoid any attenuation due to lossy behavior of the metal electrode. The light path is controlled by embedded thermal heater on top of the waveguide at specified location. Starting from a straight rectangular heater at pre-designed location, a migration technique and optimization toward a trapezoidal heater structure has been proposed which utterly claimed a significant improvement in terms of tuning power by more than 15%.     

Surface modification on a glass surface with a combination technique of sol-gel and air brushing processes

This study fabricated the large area and optically transparent superhydrophobic silica based films on glass surface with optimized hardness. A silane coupling agent, tetraethoxysilane (TEOS), effectively bonds silica particles onto the glass substrate. Desired surface roughness was obtained by adjusting nano silica particles concentration of the precursors prepared by the sol-gel process. Silica suspension was coated onto the glass substrate by the air brushing methods. This method can deposit a uniform, transparent coating on the glass substrate efficiently. Diluting the precursor by adding ethanol or a mixture of D.I. water and ethanol further improved the transmittance and superhydrophobicity efficiency. The results showed that as the silica particle concentration and the thickness of the coating were increased, the surface roughness was enhanced. Rougher surface displayed a higher superhydrophobicity and lower transmittance. Therefore, the concentration of silica particle, volume of coatings, and the ratio of ethanol and D.I. water are of great importance to deposit a transparent, superhydrophobic coating on glass.     

ALD氧化铝单层膜1 064 nm激光损伤特性研究

 采用原子层沉积技术(atomic layer deposition,ALD)在熔石英和BK7玻璃基底上镀制Al2O3单层膜。利用小口径损伤在线测试平台对膜层的1 064 nm激光损伤特性进行了实验测量,获得膜层损伤阈值约为10.3 J/cm2,对比了其与BK7基底损伤阈值之间的差异;利用Nomarski显微镜和原子力显微镜分析讨论了损伤形态的特点,结果表明损伤主要表现为膜层脱落和基片小孔烧蚀,其中小孔深度集中在70 nm～95 nm范围;讨论了损伤发生的诱因,得出膜基界面可能存在吸收源先驱的推断。     

紫外激光SiO2减反膜的制备

介绍溶胶－凝胶制备ＳｉＯ２减反膜的溶液配制，基片清洗和膜层制备过程，利用正硅酸乙酯的碱性催化水解，通过浸入移液法在石英透镜的表面涂敷一层多孔ＳｉＯ２减反膜，涂膜后石英透镜的透过率在３５０ｎｍ波长处达到９８．０％以上。     

Research on the UV Dielectric Coatings with High Damage Threshold

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ZrO2／SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响

ZrO₂／SiO₂多层膜由相同沉积条件下的电子束蒸发方法制备而成， 通过改变多层膜中高(ZrO₂)、低(SiO₂)折射率材料膜厚组合周期数的方法，研究了沉积 在熔石英和BK7玻璃 基底上多层膜中残余应力的变化. 用ZYGO光学干涉仪测量了基底镀膜前后曲率半径的变化， 并确定了薄膜中的残余应力. 结果发现，该多层膜中的残余应力为压应力，随着薄膜中膜厚 组合周期数的增加，压应力值逐渐减小. 而且在相同条件下，石英基底上所沉积多层膜中的 压应力值要小于BK7玻璃基底上所沉积多层膜中的压应力值. 用x射线衍射技术测量分析了膜 厚组合周期数不同的ZrO₂／SiO₂多层膜微结构，发现随着周期数增 加，多层膜的结晶程 度增强. 同时多层膜的微结构应变表现出了与所测应力不一致的变化趋势，这主要是由多层 膜中，膜层界面之间复杂的相互作用引起的. 关键词： 2／SiO₂多层膜')" href="#">ZrO₂／SiO₂多层膜 残余应力 膜厚组合周期数     

Thermal lens spectrometry under excitation of a divergent pump beam

Thermal lens spectrometry (TLS) under excitation of a divergent pump beam is discussed in both conventional and microscopic TLS instruments. A refined thermal lens (TL) model was proposed for calculating the TL signal of a “finite TL element.” Experiments as well as comparison with numerical simulations demonstrated that the effective sample length for a certain pump beam profile was about six times the confocal distance of the pump beam for laser-excited case and 1.5 mm for incoherent light source-excited case. For laser-excited conventional TLS instrument or thermal lens microscope (TLM), an empirical formula of the optimum pump beam waist radius for maximum detection sensitivity was obtained at a given sample length. At larger pump beam waist radius of 7 μm, the TL signal was found 2.5 times lower compared to the diffraction limit; however, the resulting two orders of magnitude lower power density in the sample could be quite desirable for the detection of photolabile analytes. By investigating the influence of a finite TL element on the TL signal, we found that an optimal distance between the probe beam waist and the sample was needed to assure the maximum detection sensitivity and good response linearity. Under the optimal detection scheme, limit of detection of the laser-excited TLM at 4 mW power was evaluated to be 8.6 × 10^?9 M for 100-μm-thick ferroin solution, corresponding to an absorbance of 9.5 × 10^?7 absorbance units.     

Fresnel diffraction model for mode-mismatched thermal lens with top-hat beam excitation

A theoretical model, based on the Fresnel diffraction integral, is developed to describe the thermal lens (TL) signal in a mode-mismatched collinear configuration, which is optimized for a near field detection scheme and excitation by a cw modulated laser beam with a top-hat profile. The TL amplitudes obtained with both top-hat and Gaussian beam excitations are numerically computed and compared, and the dependence of the TL amplitude on the experimental parameters is discussed. Numerical results show that the top-hat beam TL instrument is more sensitive than the Gaussian beam TL instrument, with a potential doubling of the sensitivity. The use of the top-hat beam excitation with TL detection is a significant improvement because a top-hat beam can be easily obtained with a low-cost, wide-spectral emission white-light source. The use of incoherent light sources as the excitation sources would substantially expand the applicability of the TL technique to the general area of chemical analysis.This revised version was published online in March 2005. In the previous version, the published online date was missing     

Formation of Au nano-patterns on various substrates using simplified nano-transfer printing method

For future device applications, fabrication of the metal nano-patterns on various substrates, such as Si wafer, non-planar glass lens and flexible plastic films become important. Among various nano-patterning technologies, nano-transfer print method is one of the simplest techniques to fabricate metal nano-patterns. In nano-transfer printing process, thin Au layer is deposited on flexible PDMS mold, containing surface protrusion patterns, and the Au layer is transferred from PDMS mold to various substrates due to the difference of bonding strength of Au layer to PDMS mold and to the substrate. For effective transfer of Au layer, self-assembled monolayer, which has strong bonding to Au, is deposited on the substrate as a glue layer.In this study, complicated SAM layer coating process was replaced to simple UV/ozone treatment, which can activates the surface and form the -OH radicals. Using simple UV/ozone treatments on both Au and substrate, Au nano-pattern can be successfully transferred to as large as 6 in. diameter Si wafer, without SAM coating process. High fidelity transfer of Au nano-patterns to non-planar glass lens and flexible PET film was also demonstrated.