绿色单峰发光聚(9,9-二烯丙基芴)的合成及其发光机制

为了得到绿色单峰发光的聚合物材料, 我们设计并合成了9位取代的二烯丙基芴单体, 在NiCl₂的催化下, 合成了可溶的聚芴衍生物, 聚(9,9-二烯丙基芴)(PAF). 较短的烯丙基链既可以增加聚芴的溶解度, 双键的存在又有利于聚芴发生分子间聚集而得到绿光发射的有机电致发光器件(OLED). PAF在溶液和薄膜状态下的荧光峰分别位于403和456 nm的蓝光区域, 而其器件ITO/PEDOT:PSS/PAF/LiF/Al(其中, ITO为氧化铟锡, PEDOT为聚(3,4-乙撑二氧噻吩), PSS为聚苯乙烯磺酸盐)的电致发光峰却红移至绿光区域(532 nm), 得到绿色单峰发光. 紫外吸收光谱、荧光发射光谱、红外光谱以及原子力显微镜(AFM)图像的结果证明, 造成PAF电致发绿光的机制为聚合物分子间聚集.     

寡聚表面活性剂的合成及其聚集行为的研究

寡聚表面活性剂是由2个或2个以上单头单链的表面活性剂在头基处或靠近头基处由连接基团通过化学键连接而成的二聚、三聚、四聚乃至更高寡聚度的分子.Gemini表面活性剂(二聚表面活性剂)是最简单,也是最早被发现的寡聚表面活性剂,已经被大量报道.已有综述很好地总结了Gemini表面活性剂的物理化学性质.本文主要综述三聚及三聚以上寡聚表面活性剂的研究进展,包括寡聚表面活性剂的合成和结构、表/界面性质以及溶液中的聚集行为等,以期使研究者比较全面地认识寡聚表面活性剂领域的研究进展.     

基于三苯胺和螺(芴-9,9'-氧杂蒽)的星射形蓝光寡聚材料的合成与光电性质

通过Sonogashira 反应合成了基于三苯胺、螺(芴-9,9'-氧杂蒽)及芴的星射形寡聚物. 三种寡聚物(TPA-F、TPA-SFX和TPA-SFXCz)都具有很高的热分解温度, 分别为417、439和425 °C. 差示扫描量热(DSC)分析研究表明, 它们也具有高的玻璃化转变温度(T_g), 都在100 °C以上, 其中两种螺芴取代的寡聚物(TPA-SFX和TPA-SFXCz)的T_g分别达到141和127 °C. 光物理的研究发现, 在薄膜中, TPA-F具有很宽的双发射峰, 峰值为424 和455 nm; 而TPA-SFX 和TPA-SFXCz 仍保持单一蓝光发射, 发射峰分别为434 和442 nm. 这表明将三苯胺非平面结构和螺形取代基团相结合, 能有效抑制在薄膜中聚集和激基缔合物的产生. 电化学的研究表明, 由于引入富电子的三苯胺核心结构, 三者都具有-5.4 eV左右的较高的HOMO能级. 通过旋涂法制备了结构为ITO(氧化铟锡)/PEDOT:PSS(聚3,4-乙撑二氧噻吩:聚苯乙烯磺酸盐)/寡聚物/TPBI(1,3,5-三(1-苯基-1H-苯并咪唑-2-基)苯)/LiF/Al 电致发光器件. 器件测试结果表明, TPA-SFX的器件具有最好的光电性能. 以它为发光层, 获得最大亮度为2680 cd·m^-2、最大电流效率为0.35 cd·A^-1、色坐标为(0.17, 0.13)的蓝光器件.     

芘分子共价修饰的硅纳米线制备及其发光性能表征

将功能分子共价链接于硅纳米线表面,是发展硅纳米线性能,获得新的硅纳米线器件材料的重要手段.但是对硅纳米线表面的修饰却存在产生不可控制的表面氧化层的缺点,因此有必要发展一种温和的新方法.本文通过羟基(—OH)与硅纳米线表面Si—H键反应生成Si—O—C键,从而在硅纳米线表面引入功能分子.并通过芘醇分子在硅纳米线表面的固定化,证明了这一方法能够温和地实现对硅纳米线表面的共价键修饰.     

含噻吩单元的硅芴共聚物的合成及其蓝色电致发光性能

将少量(摩尔分数为1%—3％)含噻吩的窄带隙单体和宽带隙硅芴单体进行共聚, 合成了聚{9,9-二己基-3,6-硅芴-co-[2,5-二(2-甲基苯撑-4-基)-噻吩]}和聚{9,9-二己基-3,6-硅芴-co-[2,5-二(2-苯撑-4-基)-噻吩]}两类硅芴共聚物, 通过紫外-可见吸收光谱、光致发光光谱, 并制作聚合物发光二极管器件测试电致发光光谱等手段, 系统表征了两类硅芴共聚物材料的性能. 实验结果表明, 噻吩的加入形成了新的蓝色发光中心, 并且实现了从硅芴链段到含噻吩发光中心的有效能量转移. 通过增加发光中心结构的空间位阻来减小其共轭程度, 可以使聚合物的PL和EL光谱发生较大蓝移. 最终得到了效率为0.46%和色坐标(CIE)为(0.19, 0.16)的蓝光LED器件.     

寡聚核苷酸/单链阳离子表面活性剂囊泡与沉淀共存(英文)

DNA(包括寡聚核苷酸)和阳离子表面活性剂可形成难溶复合物.本文通过浊度测试和透射电子显微镜观察,发现单链阳离子表面活性剂可以诱使寡聚核苷酸/单链阳离子表面活性剂沉淀转变成为寡聚核苷酸/单链阳离子表面活性剂囊泡,且寡聚核苷酸/单链阳离子表面活性剂囊泡可以与寡聚核苷酸/单链阳离子表面活性剂沉淀共存.在寡聚核苷酸/单链阳离子表面活性剂沉淀向囊泡的转变过程中,表面活性剂和沉淀之间的疏水作用力发挥了重要作用.此外,当体系温度达到寡聚核苷酸开始融解的温度后,寡聚核苷酸/单链阳离子表面活性剂体系更容易形成囊泡.因此,寡聚核苷酸的链越伸展,越易于寡聚核苷酸/单链阳离子表面活性剂囊泡的生成.据我们所知,有关寡聚核苷酸/阳离子表面活性剂囊泡的报道尚不多见.因此,考虑到DNA(包括寡聚核苷酸)/两亲分子体系在医学、生物学、药学和化学中的重要性,该研究应该有助于我们进一步了解该体系并对其进行更合理有效的应用.     

硅芴类化合物的合成及应用研究进展

近年来,芴类结构9-位为硅桥联的硅芴类化合物以其独特的电子结构和光电性能受到研究者们越来越多的关注,这类化合物在有机发光二极管(OLED)、聚合物太阳能电池(PSC)、有机场效应管(OFET)等光电功能材料领域有广泛的应用前景。本文主要对硅芴类化合物的合成方法、结构修饰、性能及应用研究的最新进展进行了综述。     

改性氧化硅-氧化铝和丝光沸石催化剂上的二甲苯异构化

非晶质的氧化硅-氧化铝和晶质的丝光沸石催化剂的表面上都有表面OH。可用硅烷偶联剂进行表面改性。由于催比剂的孔径不同以及硅烷偶联剂分子尺寸差异,对氧化硅-氧化铝的改性是在整个内、外表面上进行;而对丝光沸石,由于偶联剂分子不能进入沸石的内孔道中,所以这种改性只能在沸石窗口及外表面上进行。另外,沸石催化剂上酸量适中,酸中心分布较为理想,所以改性的沸石催化剂的选择性,总是比硅铝催化剂有较大增高。改性用的硅烷偶联剂以二甲基二乙氧基硅烷较为适宜。改性后的非晶质硅铝催化剂的对二甲苯选择性由14.6增到34.0%,晶质丝光沸石催化剂改性后由33.3增到43.7%。增加催化剂用量可提高对二甲苯的摩尔百分数到23%,接近它的理论值。     

微接触印刷技术在ITO基底上快速转移Au纳米粒子图案

采用无氰化学镀金法在聚二甲基硅氧烷(PDMS)印章表面镀金, 通过微接触印刷技术将PDMS印章上的Au 纳米粒子(AuNPs)分别转移到氧化铟锡(ITO)透明导电膜玻璃, 修饰了(3-巯基丙基)三甲氧基硅烷(MPTMS)的ITO基底(MPTMS/ITO)和表面电镀了铜膜的ITO(Cu/ITO)表面上, 同时形成有序的结构或者图案.通过场发射扫描电镜(FE-SEM), 原子力显微镜(AFM)和显微共聚焦激光拉曼光谱仪等对实验结果进行表征.结果表明, 该转移AuNPs的方法对基底表面特性并无特殊要求, 是一种简单、快速、无污染、低成本的AuNPs转移技术, 而且转移了AuNPs的ITO基底具有表面增强拉曼光谱(SERS)活性, 有望在SERS中有所应用.     

DNA在氨基功能化偶氮苯自组装膜表面的固定

采用简单快速的方法制备出将DNA固定在其表面的单分子层敏感膜.首先采用表面自组装技术将硅氧烷基偶氮苯衍生物H2NAzoCONHC3Si(OCH3)3(APDA-N-TMSPBA)组装在硅表面,在详细考察单分子层薄膜的化学结构、表面浸润性和分子表面形貌之后,又通过紫外吸收光谱(UV)在位考察了硅氧烷基偶氮苯衍生物的光学异构特性.在DNA在自组装薄膜固定后,X光电子能谱仪(XPS)结果显示出现了明显的磷元素信号,表明DNA分子可以成功固定在自组装膜表面.     

High-resolution submicron patterning of self-assembled monolayers using a molecular fluorine laser at 157 nm

Using a molecular fluorine laser at 157 nm wavelength, submicron patterning of organosilane self-assembled monolayers (SAMs) is demonstrated utilizing mask-contact photolithography. An organosilane, namely, octadecyltrimethoxysilane [ODS, CH(3)(CH(2))(17)Si(OCH(3))(3)], SAM is chemisorbed onto Si substrates covered with a 2 nm thick oxide layer and subsequently patterned using the laser. The optical path of the laser beam and the photomask-sample space are evacuated and then backfilled and purged with nitrogen during laser firing. The resulting pattern is investigated using various measurement techniques. The scanning probe microscopy images show that patterns are transferred to the SAM-covered Si substrates and that 500 nm features are successfully photoprinted in this way.     

Electroless deposition of poly(2-alkoxyaniline)s

The in situ deposition of poly(2-alkoxyaniline)s onto oxide surfaces is reported. It is demonstrated that the identity of the substrate can have a pronounced effect on the polymerization rate of these substituted polyanilines. Poly(2-alkoxyaniline)s deposit efficiently onto indium-doped tin oxide (ITO), but deposition onto quartz proceeds slowly. The critical stage in the deposition process is shown to be polymerization of the adsorbed oligomeric species. When this polymerization process is catalyzed by the surface, polymer growth is enhanced, and we find that conducting substrates mediate this apparent catalytic process. We demonstrate selective deposition by growing poly(2-alkoxyaniline) adlayers onto patterned ITO/quartz substrates.     

Substrate-induced modulation of the Raman scattering signals from self-assembled organic nanometric films

Raman scattering signals recorded by microscopy from organic self-assembled monolayers (thin nanometric films of calibrated thickness) on silica substrates were found to be much stronger than those obtained from identical films assembled on bulk silicon substrates. This effect, observed in the backscattering geometry, is shown to result from interferences between the direct and reflected beams (including both the excitation and scattered radiation) in front of a smooth reflecting surface. Strong dependence of the effect on the distance between the sampled monolayer and the bulk silicon substrate allows enhancement of the Raman signals of organic monolayer films on silicon by factors up to approximately 70 by using appropriate silica spacers. The dependence of the Raman signal intensity on film thickness was also studied for thicker nanometric films comprising a series of self-assembled organosilane multilayers on bulk silicon and fused silica substrates, and the predicted deviation from linearity in the case of the silicon substrate is experimentally confirmed.     

Influence of Synthesis Conditions on the Electrokinetic Characteristics of Titanium–Oxygen Nanostructures

Influence of synthesis conditions of titanium–oxygen nanostructures on their electrochemical behavior is studied. The nanostructures were prepared by molecular layer-by-layer deposition from the gaseous phase onto the substrates (silicon oxides titanium oxide, and silicon covered with oxide film). It is found that the deposition of a titanium–oxygen nanolayer onto the titanium oxide does not change the position of isoelectric point and the value of electrokinetic potential. Deposition of the titanium–oxygen nanostructure on the initial, as well as on the thermally and chemically modified silicon and silicon oxide substrates at various temperatures yields samples whose isoelectric points lie between the values for the substrate and deposited titanium oxide.     

X-Ray Analysis of Multi-Films for Electrochromic Device Application

Multilayer films based on tungsten oxide (WO₃), ITO (indium tin oxide) and CdS were deposited mainly by reactive dc magnetron sputtering onto glass substrates for electrochromic application. The thin films were analyzed by means of XPS (X-ray photoelectron spectroscopy), GIXD (grazing incidence X-ray diffraction) and XRD (X-ray diffraction). XRD and XPS results confirmed that the films were WO₃, CdS and ITO, respectively. The surface and interface of the CdS/ITO bi-layered film was studied by GIXD in different incidence angles. Detailed results about the amorphous characterization of the films during room temperature growth and post annealing are given.     

Nanopatterning of functional materials by gas phase pattern deposition of self-assembled molecular thin films in combination with electrodeposition

We present a general methodology to pattern functional materials on the nanometer scale using self-assembled molecular templates on conducting substrates. A soft lithographic gas phase edge patterning process using poly(dimethylsiloxane) molds was employed to form electrically isolating organosilane patterns of a few nanometer thickness and a line width that could be tuned by varying the time of deposition. Electrodeposition was employed to deposit patterns of Ni and ZnO on these prepatterned substrates. Deposition occurred only on patches of the substrate where no organosilane monolayer was present. The process is simple, inexpensive, and scalable to large areas. We achieved formation of metallic and oxide material patterns with a lateral resolution of 80 nm.     

In vitro stability study of organosilane self-assemble monolayers and multilayers

The stability of self-assembled monolayers (SAMs) and multilayers formed on silicon surface by amino-terminated silanes and SAMs formed by alkyl and glycidyl terminated silanes were investigated in vitro with saline solution at 37 degrees C for up to 10 days. FTIR and XPS results indicated that amino-terminated SAMs and multilayers are very unstable if the alkyl chain is short ((CH2)3), while stable if the alkyl chain is long ((CH2)11). On the other hand, alkyl-terminated SAMs are very stable regardless of the alkyl chain length, and glycidyl terminated SAM retained approximately 77% of the organosilane molecules after 10 days. Hydrogen bonding between the organosilane monomer and silicon surface and among the organosilane monomers is believed to contribute to the instability of the SAM and multilayer formed by amino-terminated silane with a short alkyl chain ((CH2)3). Therefore, the widely used (3-aminopropyl) trimethoxysilane (APTMS) SAM and multilayer may not be suitable for implantable biomedical applications.     

Phenylphosphonic acid functionalization of indium tin oxide: surface chemistry and work functions

The work function of indium tin oxide (ITO) substrates was modified with phosphonic acid molecular films. The ITO surfaces were treated prior to functionalization with a base cleaning procedure. The film growth and coverage were quantified by contact angle goniometry and XPS. Film orientation was determined by reflection/absorption infrared spectroscopy using ITO-on-Cr substrates. The absolute work functions of nitrophenyl- and cyanophenyl-phosphonic acid films in ITO were determined by Kelvin probe measurement to be 5.60 and 5.77 eV, respectively.     

Characterizing the molecular order of phosphonic acid self-assembled monolayers on indium tin oxide surfaces

Self-assembled monolayers (SAMs) of alkanephosphonic acids with chain lengths between 8 and 18 carbon units were formed on thin films of indium tin oxide (ITO) sputter-deposited on silicon substrates with 400 nm thermally grown SiO(2). The silicon substrates, while not intended for use in near-IR or visible optics applications, do provide smooth surfaces that permit systematic engineering of grain size and surface roughness as a function of the sputter pressure. Argon sputter pressures from 4 to 20 mTorr show systematic changes in surface morphology ranging from smooth, micrometer-sized grain structures to <50 nm grains with 3× higher surface roughness. Near-edge X-ray absorption fine structure (NEXAFS) spectroscopy experiments are conducted for alkanephosphonic acids deposited on these wide range of ITO surfaces to evaluate the effects of these morphological features on monolayer ordering. Results indicate that long-chain SAMs are more highly ordered, and have a smaller tilt angle, than short-chain SAMs. Surprisingly, the 1-octadecyl phosphonic acids maintain their order as the lateral grain dimensions of the ITO surface shrink to ～50 nm. It is only when the ITO surface roughness becomes greater than the SAM chain length (～15 ?) that SAMs are observed to become relatively disordered.