Laser short-pulse heating of silicon film with the presence of metallic substrate

Laser interaction of silicon film located at he top of metallic substrate is examined and energy transport in electron and lattice sub-systems are formulated using the electron kinetic theory approach. The simulations are repeated for different substrate materials, namely gold, silver, and copper. It is found that electron temperature in the silicon film rises in the vicinity of the silicon–metallic substrate interface, despite the fact that energy absorption from the irradiated filed is significantly low in the silicon film. Lattice site temperature rises rapidly in the early heating period at the interface. In addition, lattice site temperature increase is higher in the silicon film than that corresponding to the metallic substrate.     

On the Discontinuity of Polycrystalline Silicon Thin Films Realized by Aluminum-Induced Crystallization of PECVD-Deposited Amorphous Si

Crystallization of glass/Aluminum (50, 100, 200 nm) /hydrogenated amorphous silicon (a-Si:H) (50, 100, 200 nm) samples by Aluminum-induced crystallization (AIC) is investigated in this article. After annealing and wet etching, we found that the continuity of the polycrystalline silicon (poly-Si) thin films was strongly dependent on the double layer thicknesses. Increasing the a-Si:H/Al layer thickness ratio would improve the film microcosmic continuity. However, too thick Si layer might cause convex or peeling off during annealing. Scanning electron microscopy (SEM) and Energy Dispersive X-ray spectroscopy (EDX) are introduced to analyze the process of the peeling off. When the thickness ratio of a-Si:H/Al layer is around 1 to 1.5 and a-Si:H layer is less than 200 nm, the poly-Si film has a good continuity. Hall measurements are introduced to determine the electrical properties. Raman spectroscopy and X-ray diffraction (XRD) results show that the poly-Si film is completely crystallized and has a preferential (111) orientation.     

Pt/GdFeCo/Pt多层膜的磁性和反常霍尔效应研究

亚铁磁材料因具有反铁磁排列的子晶格磁矩而表现出诸多丰富的物理性质,在磁信息存储和逻辑领域具有广阔的应用前景.本文采用磁控溅射方法在热氧化的硅基片上制备了Pt/GdFeCo(t)/Pt多层膜,系统研究了亚铁磁GdFeCo厚度对多层膜的表面形貌、结构、磁性以及反常霍尔效应(AHE)的影响.结构测试表明薄膜表面粗糙度较小,且GdFeCo层为非晶态;实验中利用GdFeCo层厚度可有效控制Gd元素含量,从而调控GdFeCo趋近反铁磁态特性的磁矩补偿点;通过重金属强自旋轨道耦合效应(SOC)和非晶态亚铁磁薄膜面内压应力,实现了良好垂直各向异性(PMA);进一步阐明了亚铁磁薄膜中磁性和反常霍尔效应的内在产生机制以及磁矩补偿点与温度的内在关系.这些结果为构建新一代低功耗自旋电子器件奠定基础.     

Thermodynamic approach to the size dependence of the melting temperatures of films

The size dependence of melting temperature T _m of metallic films (tin and copper) on different substrates, including amorphous carbon and another refractory metal (i.e., the dependence of T _m on film thickness h) is investigated. It is found that the effect of the interfacial boundary can result in the growth of T _m for thin metallic films on carbon substrates with a reduction in film thickness h. For a system with a metallic film on a metallic substrate, the size dependence of T _m is less pronounced and T _m falls with a reduction in h.     

Sb_2Te_3热电薄膜的离子束溅射制备与表征

采用离子束溅射技术交替沉积Sb-Te-Sb多层薄膜后进行高真空热处理,直接制备Sb2Te3薄膜.利用X射线衍射(XRD)仪、霍尔系数测试仪、薄膜Seebeck系数测量系统对所制备的薄膜特性进行表征.XRD测量结果显示,薄膜的主要衍射峰与Sb2Te3标准衍射峰相同,在[101]/[012]晶向取向明显,存在较多的Te杂质峰;霍尔系数测试结果表明,薄膜为p型半导体薄膜,薄膜电阻率较低,其电导率接近于金属电导率,载流子浓度量级为1023cm-3,具有良好的电学性能;Seebeck系数测量结果显示,薄膜具有良好的热电性能,在不同条件下制备的薄膜的Seebeck系数在7.8—62μV/K范围;在所制备的薄膜中,退火时间为6h、退火温度为200℃的薄膜其Seebeck系数达到最大,约为62μV/K,且电阻率最小.     

椭圆偏振光谱表征单晶硅衬底上生长的非晶硅和外延硅薄膜

本文采用射频等离子体增强化学气相沉积(rf-PECVD)技术在单晶硅衬底上沉积了两个系列的硅薄膜. 通过对样品进行固定角度椭圆偏振测试, 结果表明第一个系列硅薄膜为非晶硅, 形成了突变的a-Si:H/c-Si异质结构, 此结构在HIT电池中有利于形成好的界面特性, 对于非晶硅薄膜采用通常的Tauc-Lorentz摇摆模型(Genosc)拟合结果很好; 第二个系列硅薄膜为外延硅, 对于外延硅薄膜, 随着膜厚增加晶化率降低, 当外延硅薄膜厚度为46 nm时开始非晶硅生长. 对于外延硅通常采用EMA模型(即将硅薄膜体层看成由非晶硅和c-Si构成的混合层)拟合结果较好, 当硅薄膜中出现非晶硅生长时, 将体层分成混合层和非晶硅两层, 采用三层模型拟合结果很好. 本文证实了椭偏光谱分析采用不同的模型可对单晶硅衬底上不同结构的硅薄膜进行有效表征.     

Two hardening mechanisms in single crystal thin films studied by discrete dislocation plasticity

Two-dimensional discrete dislocation plasticity simulations of the evolution of thermal stress in single crystal thin films on a rigid substrate are used to study size effects. The relation between the residual stress and the dislocation structure in the films after cooling is analyzed using dislocation dynamics. A boundary layer characterized by a high stress gradient and a high dislocation density is found close to the impenetrable film-substrate interface. There is a material-dependent threshold film thickness above which the dislocation density together with the boundary layer thickness and stress state are independent of film thickness. In such films the stress outside the boundary layer is on average very low, so that the film-thickness-independent boundary layer is responsible for the size effect. A larger size effect is found for films thinner than the threshold thickness. The origin of this size effect stems from nucleation activity being hindered by the geometrical constraint of the small film thickness, so that by decreasing film thickness, the dislocation density decreases while the stress in the film increases. The size dependence is only described by a Hall–Petch type relation for films thicker than the threshold value.     

Specific features of the Hall effect in Cr/Co bilayer films

The Hall effect and magnetoresistance in Cr(50 Å)/Co(200 Å) bilayer films prepared by ion sputtering on a silicon substrate are investigated at room temperature. The planar Hall effect revealed in the bilayer films differs from the planar Hall effect observed usually in that it is symmetric with respect to the sign of the change in the rotation angle of the magnetic moment in the film plane. Under conditions where the symmetric planar Hall effect is realized, the change in the Hall resistance is more than 10% and exceeds the anisotropic magnetoresistance by two orders of magnitude. The hysteresis loops are measured at different orientations of magnetic fields. The planar Hall effect is studied in a weak longitudinal magnetic field. The results obtained demonstrate that the symmetric planar Hall effect is associated with the multidomain structure of the cobalt film in Cr/Co bilayer composites.     

立方氮化硼薄膜生长过程中的界面控制

在立方氮化硼薄膜气相生长过程中生成的无定形初期层和乱层结构氮化硼中间层，一直是阻碍立方氮化硼薄膜外延生长的主要原因.系统地分析了硅衬底预处理对立方氮化硼薄膜中无定形初期层成分的影响，发现在等离子体化学气相生长法制备薄膜时，硅衬底上形成无定形初期层的可能原因有氧的存在、离子轰击以及高温下硅的氮化物的形成.在H₂气氛中1200K热处理硅衬底可以有效地减少真空室中残留氧浓度，除去硅表面的自然氧化层，保持硅衬底表面晶体结构.控制衬底温度不超过900 K，就能防止硅的氮化物的形成，成功地除去无 关键词： 立方氮化硼薄膜 等离子体化学气相生长 界面 电子显微镜     

用于第一镜表面的金属玻璃薄膜研究

为解决大口径非晶金属第一镜实现难题,在研究块体金属玻璃Co61.2B26.2Si7.8Ta4.8材料基础上,采用金属玻璃块体材料制作拼接成溅射靶材,通过非平衡磁控溅射镀膜方法,实现了Co61.2B26.2Si7.8Ta4.8非晶金属薄膜第一镜。研究结果表明:通过成分设计及合成靶材的设计,能够实现与块体金属玻璃具有相同光学特性的非晶薄膜第一镜;通过Cr成分改进,能够进一步提高非晶金属薄膜第一镜在可见光波段的光谱反射率。     

Fe15.16Ag84.84金属颗粒膜自旋极化相关的霍尔效应研究

采用磁控溅射法分别在玻璃和单晶硅衬底上同时制备了Fe_15.16Ag_{84.84金属颗粒膜样品，并对样品的霍尔效应和霍尔系数RH随外加磁场H的变化关系进行了 实验研究. 观察到霍尔电压UH与外加磁场H的关系曲线呈现出自旋极化相关的反常现象，并 与其磁电阻效应具有对应关系.基于自旋相关的散射理论对此作出了合理的解释. 关键词： 颗粒膜 霍尔效应 c}')" href="#">特征磁场H_c 自旋相关散射     

Influence of Zr_(50)Cu_(50) thin film metallic glass as buffer layer on the structural and optoelectrical properties of AZO films

Aluminum-doped ZnO(AZO) thin films with thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature on structural, optical, and electrical properties of AZO thin film are investigated. Increasing the thickness of buffer layer and substrate temperature can both promote the transformation of AZO from amorphous to crystalline structure, while they show(100)and(002) unique preferential orientations, respectively. After inserting Zr(50)Cu(50) layer between the glass substrate and AZO film, the sheet resistance and visible transmittance decrease, but the infrared transmittance increases. With substrate temperature increasing from 25℃ to 520℃, the sheet resistance of AZO(100 nm)/Zr(50)Cu(50)(4 nm) film first increases and then decreases, and the infrared transmittance is improved. The AZO(100 nm)/Zr(50)Cu(50)(4 nm) film deposited at a substrate temperature of 360℃ exhibits a low sheet resistance of 26.7 ?/, high transmittance of 82.1% in the visible light region, 81.6% in near-infrared region, and low surface roughness of 0.85 nm, which are useful properties for their potential applications in tandem solar cell and infrared technology.     

Development of polycrystalline silicon films on flexible metallic substrates by aluminium induced crystallization

Thin film silicon solar cells on low cost foreign substrates could be attractive for highly efficient and low cost production of photovoltaic electricity. An attempt has been made to synthesise high-quality continuous polycrystalline silicon (pc-Si) layers on flexible metallic substrates using aluminium induced crystallization (AIC) for the first time. Amorphous silicon films deposited by ECR-PECVD were crystallized on diffusion barrier coated metallic substrates at lower temperatures (<577°C). The crystallization was studied using Raman as well as UV reflectance spectroscopy. The as-grown AIC pc-Si films were found to be continuous and densely packed without amorphous phase. The migration of impurities from the substrate to the pc-Si films and the conformability of the barrier layer with the substrate and pc-Si films were studied systematically in terms of chemical and stress level analysis, which are the important aspects to be considered when metallic foils are used as substrates. It was observed that the barrier layer also serves as a buffer layer to minimise the stress level enormously in the AIC grown pc-Si layer, though the supporting material has a thermal expansion coefficient of higher order at higher annealing temperatures. The present investigation proves the possibility to grow better-quality polycrystalline silicon films on flexible metallic foils and further demonstrates the steps that need to be considered to improve the quality of AIC pc-Si films as well as the strength of the barrier layer.     

三明治结构与同轴电缆结构磁性材料巨磁阻抗效应的理论研究

根据两种具有巨磁阻抗（GMI）效应的磁性材料实验样品，提出了两种理论模型（同轴电缆结构——Cu丝外覆软磁材料的圆柱形；三明治结构——Cu或Ag为中间层外包软磁层的三明治膜），利用Maxwell方程和Landau_Lifshitz方程对其GMI效应的机理进行了理论研究.证明了两种模型的差别仅仅是形状因子的不同，从而由理论上证实了两种结构GMI效应增强的内在一致性.证实了在同种磁性材料情况下，双层结构具有结构方面的优越性.并对照实验数据讨论了参数的影响，得到与实验定性相符的结果. 关键词： 巨磁阻抗效应 三明治膜 Maxwell方程 Landau_Lifshit     

非晶粉/硅橡胶复合薄膜应力阻抗性能

选用硅橡胶为基材,Fe73.5Cu1Nb3Si13.5B9非晶纳米晶软磁合金粉体为磁性功能填料,采用机械共混的方法制备非晶粉/硅橡胶力敏复合材料。采用自制测试夹具测试非晶粉/硅橡胶复合材料的阻抗值,采用扫描电镜分析非晶粉颗粒形貌及其在硅橡胶基材中分散情况,在此基础上研究了复合材料界面绝缘性、单层与多层叠加复合薄膜、加入导电层及其层数对复合应力阻抗性能的影响。研究结果表明:铜箔作为界面强化导电层的加入是提高复合薄膜力敏特性的有效途径之一,设计实验中的复合薄膜/铜箔/复合薄膜结构相当于聚合物/金属/聚合物三明治多层膜结构,对敏感性具有增强效应。     

Highly adhesive calcium phosphate layer on UHMWPE prepared by IBAD

A study has been made on adhesive strength and chemical states of calcium phosphate layer deposited on the surface of ultra-high molecular weight polyethylene (UHMWPE) by ion beam assisted deposition (IBAD). IBAD is well known to be able to give an atomic intermixed zone at layer/substrate interface during deposition. The X-ray diffraction (XRD) results demonstrated that the main structure is amorphous calcium phosphate (ACp) in the layer. Tape test and scratch test were used to measure the adhesive strength between layer and substrate. Both results show that the adhesive strength between layer and substrate of samples prepared by IBAD is much stronger than that of contrast samples prepared by ion beam sputtering deposition (IBSD). It has been found by XPS that there are much more stable covalent bonds between layer and substrate in IBAD samples than that in IBSD samples. The results above lead us to a conclusion that besides the atomic intermixed zone at the interface, the increment of covalent bonds between layer and substrate also enhanced the adhesive strength between layer and substrate in IBAD samples.     

Quantum hall effect at low magnetic fields

The temperature and scale dependence of resistivities in the standard scaling theory of the integer quantum Hall effect is discussed. It is shown that recent experiments, claiming to observe a discrepancy with the global phase diagram of the quantum Hall effect, are in fact in agreement with the standard theory. The apparent low-field transition observed in the experiments is identified as a crossover due to weak localization and a strong reduction of the conductivity when Landau quantization becomes dominant.     

Magnetism in nanometer-thick TiOx/Co/TiOx/TiN/Si multilayered structures

Most studies on Co-doped TiO₂ system were focused on thin films grown by MBE-based methods. In this work we report the ferromagnetism of nanometer-thick-layered TiO₂/Co/TiO₂/TiN film grown on Si substrate by conventional magnetron sputtering. For the growth of TiO₂ on silicon, a non-oxide thermally stable material, TiN, was introduced to prevent Ti penetration into the Si substrate. Structural, magnetic, and transport measurements respectively by Raman, SQUID and Hall effect show that our samples are n-type semiconductors and exchange bias effect due to exchange coupling between Co and interfacial CoO. For the rapid vacuum annealed specimen, we found an enhanced loss and a Perminvar-type constricted hysteresis loop, which attributed to pinning of domain walls due to an induced anisotropy by the pair ordering in the metallic alloy of Co-Ti-Si.     

Electronic structure of molecular beam epitaxy grown 1T'-MoTe_2 film and strain effect

Atomically thin transition metal dichalcogenide films with distorted trigonal(1T') phase have been predicted to be candidates for realizing quantum spin Hall effect. Growth of 1T' film and experimental investigation of its electronic structure are critical. Here we report the electronic structure of 1T'-MoTe_2 films grown by molecular beam epitaxy(MBE).Growth of the 1T'-MoTe_2 film depends critically on the substrate temperature, and successful growth of the film is indicated by streaky stripes in the reflection high energy electron diffraction(RHEED) and sharp diffraction spots in the low energy electron diffraction(LEED). Angle-resolved photoemission spectroscopy(ARPES) measurements reveal a metallic behavior in the as-grown film with an overlap between the conduction and valence bands. First principles calculation suggests that a suitable tensile strain along the a-axis direction is needed to induce a gap to make it an insulator. Our work not only reports the electronic structure of MBE grown 1T'-MoTe_2 films, but also provides insights for strain engineering to make it possible for quantum spin Hall effect.     

Deposition of Ni, Ag, and Pt-based Al-doped ZnO double films for the transparent conductive electrodes by RF magnetron sputtering

Ni, Ag, and Pt-based Al-doped ZnO (AZO) films have been deposited as transparent conductivity layers on quartz by RF magnetron sputtering and characterized by X-ray diffraction, Hall measurement, optical transmission spectroscopy, scanning electron microscopy (SEM). The deposition of thicker metal layer in double layers resulted in lowering the effective electrical resistivity with a slight reduction of their optical transmittance. A film consisting of AZO (250 nm)/Ni (2 nm) double structure, exhibits a sheet resistance of 21.0 Ω/sq, a high transmittance of 76.5%, and characterize good adhesion to substrate. These results make the satisfactory for GaN-based light-emitting diodes (LEDs) and solar cells with metal-based AZO double films as current spread layers.