InAs/GaSb strained layer superlattice detectors with nBn design

We have investigated the electrical and optical properties of an nBn based Type-II InAs/GaSb strained layer superlattice detector as a function of absorber region background carrier concentration. Temperature-dependent dark current, responsivity and detectivity were measured. At T = 77 K and V_b = 0.1 V, with two orders of magnitude change in doping concentration, the dark current density increased from ～0.3 mA/cm² to ～0.3 A/cm². We attribute this to a depletion region that exists at the AlGaSb barrier and the SLS absorber interface. The device with non-intentionally doped absorption region demonstrated the lowest dark current density (0.3 mA/cm² at 0.1 V) with a specific detectivity D¹ at zero bias equal to 1.2 × 10¹¹ Jones at 77 K. The D¹ value decreased to 6 × 10¹⁰ cm Hz^1/2/W at 150 K. This temperature dependence is significantly different from conventional PIN diodes, in which the D¹ decreases by over two orders of magnitude from 77 K to 150 K, making nBn devices a promising alternative for higher operating temperatures.     

Type II strained layer superlattice: A potential future IR solution

Type II strained layer superlattice (SLS) has been making tremendous progress in the past few years funded by the Missile Defense Agency Advanced Technology Directorate (MDA/DV) under the Passive EO/IR Program. SLS has shown great potential as a future solution for infrared military systems. In this presentation, the most recent progress in SLS development will be presented. The presentation will also discuss the comparison of SLS with mercury–cadmium–telluride (HgCdTe) using Rule 07, SLS minority carrier lifetime issues, and future directions.     

Type-II superlattice detectors for free space optics applications and higher operating temperature conditions

The utmost limit performance of interband cascade detectors optimized for the longwave range of infrared radiation is investigated in this work. Currently, materials from the III–V group are characterized by short carrier lifetimes limited by Shockley-Read-Hall generation and recombination processes. The maximum carrier lifetime values reported at 77 K for the type-II superlattices InAs/GaSb and InAs/InAsSb in a longwave range correspond to ～200 and ～400 ns. We estimated theoretical detectivity of interband cascade detectors assuming above carrier lifetimes and a value of ～1–50 μs reported for a well-known HgCdTe material. It has been shown that for room temperature the limit value of detctivity is of ～3–4×10¹⁰ cmHz^1/2/W for the optimized detector operating at the wavelength range ～10 μm could be reached.     

Type-II superlattice dual-band LWIR imager with M-barrier and Fabry-Perot resonance

We report a high performance long-wavelength IR dual-band imager based on type-II superlattices with 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red channel). Test pixels reveal background-limited behavior with specific detectivities as high as ~5×1011 Jones at 7.9 μm in the blue channel and ~1×1011 Jones at 10.2 μm in the red channel at 77 K. These performances were attributed to low dark currents thanks to the M-barrier and Fabry-Perot enhanced quantum efficiencies despite using thin 2 μm absorbing regions. In the imager, the high signal-to-noise ratio contributed to median noise equivalent temperature differences of ~20 milli-Kelvin for both channels with integration times on the order of 0.5 ms, making it suitable for high speed applications.     

Modeling and simulation of long-wave infrared InAs/GaSb strained layer superlattice photodiodes with different passivants

Current–voltage characteristics of long-wave infrared (LWIR) InAs/GaSb strained layer superlattice photodiodes (cut-off wavelength ∼10 μm), passivated with different surface passivants, have been modeled and simulated using ATLAS software from SILVACO. The simulated results are fitted to previous experimental results obtained on unpassivated devices and those passivated by silicon-dioxide (SiO₂), silicon nitride (Si_xN_y) and zinc sulfide (ZnS). Surface parameters in terms of surface recombination velocity, shunt resistance and interface trap density are extracted for different passivants. The performance of silicon-dioxide passivated diode is solely dominated by a shunt leakage path with a shunt resistance value of 0.56 Ω-cm². Extracted electron and hole surface recombination velocities have values of 10⁵ cm/s and 10⁷ cm/s for unpassivated, 10³ cm/s and 10⁵ cm/s for Si_xN_y passivated and 10² cm/s and 10³ cm/s for ZnS passivated devices. Interface trap density follows a similar trend with values of 10¹⁵ cm⁻², 8.5 × 10¹⁴ cm⁻² and 10¹⁰ cm⁻² for unpassivated, Si_xN_y passivated and ZnS passivated devices respectively. The suitability and limitations of the simulation tool are discussed.     

Detector and readout performance goals for quantum well and strained layer superlattice focal plane arrays imaging under tactical and strategic backgrounds

Advancements in III–V semiconductor based, Quantum-well infrared photodetector (QWIP) and Type-II Strained-Layer Superlattice detector (T2SLS) technologies have yielded highly uniform, large-format long-wavelength infrared (LWIR) QWIP FPAs and high quantum efficiency (QE), small format, LWIR T2SLS FPAs. In this article, we have analyzed the QWIP and T2SLS detector level performance requirements and readout integrated circuit (ROIC) noise levels for several staring array long-wavelength infrared (LWIR) imaging applications at various background levels. As a result of lower absorption QE and less than unity photoconductive gain, QWIP FPAs are appropriate for high background tactical applications. However, if the application restricts the integration time, QWIP FPA performance may be limited by the read noise of the ROIC. Rapid progress in T2SLS detector material has already demonstrated LWIR detectors with sufficient performance for tactical applications and potential for strategic applications. However, significant research is needed to suppress surface leakage currents in order to reproduce performances at pixel levels of T2SLS FPAs.     

Interband emission energy in a dilute nitride quaternary semiconductor quantum dot for longer wavelength applications

Excitonic properties are studied in a strained Ga_1−xIn_xN_yAs_1−y/GaAs cylindrical quantum dot. The optimum condition for the desired band alignment for emitting wavelength 1.55 µm is investigated using band anticrossing model and the model solid theory. The band gap and the band discontinuities of a Ga_1−xIn_xN_yAs_1−y/GaAs quantum dot on GaAs are computed with the geometrical confinement effect. The binding energy of the exciton, the oscillator strength and its radiative life time for the optimum condition are found taking into account the spatial confinement effect. The effects of geometrical confinement and the nitrogen incorporation on the interband emission energy are brought out. The result shows that the desired band alignment for emitting wavelength 1.55 µm is achieved for the inclusion of alloy contents, y=0.0554% and x=0.339% in Ga_1−xIn_xN_yAs_1−y/GaAs quantum dot. And the incorporation of nitrogen and indium shows the red-shift and the geometrical confinement shows the blue-shift. And it can be applied for fibre optical communication networks.     

High-density-plasma (HDP)-CVD oxide to thermal oxide wafer bonding for strained silicon layer transfer applications

Direct wafer bonding between high-density-plasma chemical vapour deposited (HDP-CVD) oxide and thermal oxide (TO) has been investigated. HDP-CVD oxides, about 230 nm in thickness, were deposited on Si(0 0 1) control wafers and the wafers of interest that contain a thin strained silicon (sSi) layer on a so-called virtual substrate that is composed of relaxed SiGe (∼4 μm thick) on Si(0 0 1) wafers. The surfaces of the as-deposited HDP-CVD oxides on the Si control wafers were smooth with a root-mean-square (RMS) roughness of <1 nm, which is sufficiently smooth for direct wafer bonding. The surfaces of the sSi/SiGe/Si(0 0 1) substrates show an RMS roughness of >2 nm. After HDP-CVD oxide deposition on the sSi/SiGe/Si substrates, the RMS roughness of the oxide surfaces was also found to be the same, i.e., >2 nm. To use these wafers for direct bonding the RMS roughness had to be reduced below 1 nm, which was carried out using a chemo-mechanical polishing (CMP) step. After bonding the HDP-CVD oxides to thermally oxidized handle wafers, the bonded interfaces were mostly bubble- and void-free for the silicon control and the sSi/SiGe/Si(0 0 1) wafers. The bonded wafer pairs were then annealed at higher temperatures up to 800 °C and the bonded interfaces were still found to be almost bubble- and void-free. Thus, HDP-CVD oxide is quite suitable for direct wafer bonding and layer transfer of ultrathin sSi layers on oxidized Si wafers for the fabrication of novel sSOI substrates.     

Status and applications of cryogenic detectors

An overview of the actual technical status and achievements of different types of cryogenic detectors is given. Typical applications in several fields are discussed with emphasis put on appropriate nuclear experiments for the planned Princeton facility. The possibility of implementation in low temperature nuclear orientation experiments will be explored.     

Titanium and aluminum nitride synthesis via layer by layer LA-CVD

The possibility of the layer-by-layer synthesis of 3D parts from nitrides of titanium or aluminum by selective laser sintering/melting is discussed. The relationship between laser processing parameters and structure and phase content of sintered/melted samples are studied by means of optical metallography, X-ray diffraction, scanning electron microscopy and energy dispersive X-ray analysis. Optimal parameters of SLM process for AlN and TiN synthesis are determined. Solid 3D parts containing a TiN phase are produced from Ti powder. Distortion of the crystalline lattice of AlN and TiN phases is observed with the laser energy input.     

New mechanism for dislocation blocking in strained layer epitaxial growth

Dislocation interactions play a critical role in plasticity and heteroepitaxial strain relaxation. We use real time transmission electron microscopy observations of the interaction between threading and misfit dislocations in SiGe heterostructures to investigate interactions quantitatively. In addition to the expected long-range blocking of threading segments, we observe a new short-range mechanism which is significantly more effective. Simulations show that this reactive blocking occurs when two dislocations with the same Burgers vector reconnect.     

A strained InAIAs/InGaAs superlattice avalanche photodiode with a waveguide structure for low bias-voltage operation

An InAIAs/InGaAs superlattice (SL) multiplication layer operating at an IC-power supply voltage was realized by introducing strain into the SL. Using this SL as an absorption and multiplication layer, edge-coupled InAIAs/InGaAs SL avalanche photodiodes with waveguide structures were demonstrated. An avalanche multiplication factor larger than 10 was achieved at a bias voltage of less than 7V. A wide 3 dB bandwidth of 8 GHz was obtained at a multiplication factor of 3 and a wavelength of 1.3 m.     

Lasing and high intensity photoluminescence in InGaAs---GaAs strained layer superlattices

A pulsed nitrogen laser was used to excite lasing and photoluminescence (PL) in InGaAs---GaAs strained-layer superlattices (SLS). At moderate excitation intensities the PL spectrum consisted of a single narrow peak. But at higher intensities a second peak, up to 16 meV lower in energy, was also seen due to optical gain induced in the waveguiding SLS structure. In a laser geometry gain could also be seen at an intermediate wavelength, about 4 meV below the spontaneous emission line center.     

Mid-infrared photoluminescence of InAsN dilute nitride alloys grown by LPE and MBE

Dilute nitride InAsN epitaxial layers were produced using both liquid phase and molecular beam epitaxial growth techniques. The spectral features in the photoluminescence of samples containing up to 1% N with emission energies in the mid-infrared spectral region are described and compared. The emission intensities of both LPE and MBE grown materials were found to be comparable. Increasing the N content in the InAsN alloys resulted in a significant increase in the activation energy for thermal quenching of the photoluminescence emission due to a combination of lowering of the conduction band edge and Auger de-tuning.     

High sensitivity detectors for measurement of space potentialfluctuations

A detection technique yielding an order of magnitude increase in the sensitivity of a Proca-Green type energy analyzer to beam energy fluctuations has been demonstrated. A sensitivity of <1 part in 10 ⁶ is possible. The technique can be used to increase the sensitivity of a Heavy Ion Beam Probe (HIBP) to space potential fluctuations in a plasma. The increase in sensitivity is achieved by splitting the detected ion beam into 10 smaller beamlets and summing the signals produced by the beamlets. Experimental results from an ion beam test facility are presented along with the projected results if implemented on the 2 MeV HIBP on the TEXT-Upgrade tokamak     

Wetting layer thickness and early evolution of epitaxially strained thin films

We propose a physical model which explains the existence of finite thickness wetting layers in epitaxially strained films. The finite wetting layer is shown to be stable due to the variation of the nonlinear elastic free energy with film thickness. We show that anisotropic surface tension gives rise to a metastable enlarged wetting layer. The perturbation amplitude needed to destabilize this wetting layer decreases with increasing lattice mismatch. We observe the development of faceted islands in unstable films.