Formic acid desorption from graphitized Ni(110)

The adsorption/desorption behavior of formic acid from a monolayer of graphite carbon on Ni(110) was studied using AES, LEED and flash desorption spectroscopy. Formic acid adsorbed at 165 K did not form multilayers of adsorbate. Instead, due to strong hydrogen-bonding interactions the formic acid formed a two-dimensional condensed phase on the surface and exhibited zero-order desorption kinetics initially for a 30-fold change in initial coverage. The zero-order desorption rate constant was k_d = 10¹⁸ exp[?68.2 kJ mol^?1/RT]s^?1, suggesting a desorption transition state with nearly full translational and rotational freedom on the surface. The desorption kinetics and the coverage limit were consistent with the formation of a surface polymer-monomer equilibrium.     

Chlorine chemisorption and surface chloride formation on Au(111)

The adsorption-desorption properties of the gold(111)-chlorine system have been investigated. Thermal desorption experiments following chlorine adsorption at 298 K indicated two desorption processes: the high temperature peak (ΔH = 217 kJmol^?1) showed desorption of equal numbers of molecukr and atomic chlorine species, while the lower temperature peak (ΔH = 140 kJmol^?1) was due to the desorption of Cl₂ only. Chlorine adsorption led to a maximum work function change of +0.5 V and electron-stimulated desorption proceeded with constant cross-section (1.4 × 10¹⁸ cm²), until all chlorine had been removed from the surface These observations are consistent with the immediate formation of a surface chloride (AuCl₃) during chlorine adsorption on Au(111) at 298 K without the intervention of an initial adsorbed overlayer.     

Determination of the activation energy for OH desorption in the H2 + O2 reaction on Polycrystalline Platinum

We have investigated the temperature dependence of the desorption rate of OH produced in the oxidation of hydrogen on polycrystalline Pt by using laser induced fluorescence (LIF). Arrhenius type plots of OH desorption rates give quite straight lines, with an “apparent” desorption energy, E^a_OH, in the rang 1.4–2.3 eV depending on the relative hydrogen concentration. E^a_OH, differs from the “true” desorption energy, E^d_OH, due to the temperature dependence of the surface coverage of θ_OH,. Knowing θ_OH, from kinetic modelling calculation of this reaction we deduce E^d_OH, to be 2.0 ± 0.15 eV.     

Adsorption of CO on the (110) plane of tungsten electron impact,thermal desorption,and work function measurements

The adsorption of CO on the (110) plane of tungsten has been studied using electron impact desorption, thermal desorption, and work function measurements in a single apparatus combining these various techniques. It is concluded that a single molecular adsorption state exists at 20–250 K (virgin-CO). At 300–400 K, 60% of the low temperature layer desorbs, the remainder converting principally to a beta-1 state, which has very small electron impact cross section; in addition to beta-1 an O⁺ yielding state, which we call beta-precursor is formed. The beta-1 state is stable to 900 K, where some desorption and conversion of the remaineder to a beta-2 state occurs. The O⁺ yielding state decays with increasing T and is gone at 800 K. Readsorption on beta-1 leads to two types of adsorption states called alpha and gamma, which seem to be site specific. Electron impact desorption yields mostly CO⁺ and CO for virgin, O⁺ for beta-precursor, and CO⁺ and CO for the readsorption states. There is no isotopic mixing in virgin or in readsorbed CO, nor does readsorbed CO exchange with beta-1 or beta precursor. There is complete isotopic mixing in beta desorption. In addition, massive EID creates another state, characterized by a large dipole moment, also yielding O⁺ in EID. This state can be converted to beta-1 by heating to 400 K. The total disappearance cross sections for the various states are virgin-CO5 × 10^?17cm²; γ-CO 1.6 × 10^?16cm²; α-CO 5 × 10^?17cm²; β-precursor 6 × 10^?18cm²and 1.2 × 10^?19cm²; EID induced state 8 × 10^?18cm². In addition, cross sections for ion production are determined and found to be several orders of magnitude less than total disappearance cross sections. These results, and Leed and coverage data obtained in parallel investigations are used to formulate models of the various adsorption states. It is concluded that virgin and readsorbed CO are molecular and beta-precursor and beta dissociated, although strong interactions between C and O remain. The electron impact desorption of physisorbed CO was investigated and found to yield C⁺, O⁺, and neutral CO, but very little CO⁺. These results suggest primary dissociation of CO by electron impact, and desorption of neutral physisorbed CO by the energetic fragments. Physisorbed CO⁺, although undoubtedly created, lies on the attractive part of its potential curve relative to the surface, and thus does not desorb as CO⁺.     

Isothermal desorption of indium from √31−In and √3−In on silicon (111) surfaces

Using RHEED (reflection high energy electron diffraction) techniques, superstructures of submonolayer indium films deposited on silicon (111) 7 × 7 surfaces have been investigated. Combination of the deposition experiments at a constant deposition rate and the desorption experiments under isothermal condition has yielded desorption energies and apparent vibrational periods of indium adatoms (66 kcalmol^?1, 6 × 10^?17 s for √31 phase and 63 kcalmol^?1, 3 × 10^?15 s for √3 phase). A pattern overlapping √31 + √31, observed in the desorption process, is interpreted as a fluctuation phenomenon caused by a finite interaction range of indium adatoms on silicon (111) surfaces. The range is determined to be ～24 Å.     

Thermal desorption and surface lifetimes of bromine and iodine adsorbed on an ionizer of LaB6

Thermal desorption of bromine and iodine from an ionizer surface made of cold pressed and sintered LaB₆ powder has been studien in the temperature interval 800–1300°C. A new technique, where the extraction field is accelerating only during short intervals, has been developed to monitor separately the neutral desorption of readily ionized elements. The technique has been combined with the modulated beam and the modulated voltage methods for measurements of residence times and ionization efficiencies. It has also been combined with the temperature programmed desorption method used for determination of the Arrhenius parameters of desorption. The following values were obtained for l_? and l₀, the activation energies of ionic and neutral desorption, and for the corresponding pre-exponential factors C and D (D = 4C) for halogens): Bromine: l_? = 3.8 eV, l₀ = 4.3 eV, C = 2.0 × 10¹³ s^?1; Iodine: l_? = 3.4 eV, l₀ = 3.7 eV, C = 1.1 × 10¹³ s^?1. The ionization efficiencies measured at 1100°C, 0.95 for bromine and 0.7 for iodine, correspond well to what is given by the Saha-Langmuie equation using a work function of 2.7 eV. All measurements were performed with the number of adsorbed particles well below 10¹⁷ atoms/m². For higher coverages l_? was found to increase linearly by about 0.15 eV for an adsorption of 10¹⁸ atoms/m².     

Triple point of the first monolayer of nitric oxide adsorbed on the cleavage face of magnesium bromide

This paper is the first of three articles devoted to the CO/Mo(110) chemisorption. The experimental study of adsorption and desorption kinetics was performed by several methods: thermal desorption, low energy electron diffraction and Auger electron spectroscopy. The adsorption of CO on Mo(110) presents two different states. For these two states the desorption kinetics are first order ones, the desorption energies and frequency factors have been determined (E₁ = 99 kcal mole^?1, E₂ = 50 kcal mole^?1, v₁ = 10¹⁹ s^?1, v₂, = 5 × 10¹⁰ s^?1). The dependence of sticking coefficient on surface coverage θ was investigated and was found different for the two states of adsorption. LEED shows that the adsorption is not ordered. AES investigation suggests that in the two states C and O have different positions with respect to MO atoms.     

The adsorption and desorption of oxygen on the Pt(110) surface; A thermal desorption and LEED/AES study

The interaction of oxygen with a Pt(110) crystal surface has been investigated by thermal desorption mass spectroscopy, LEED and AES. Adsorption at room temperature produces a β-state which desorbs at ~800 K. Complete isotopic mixing occurs in desorption from this state and it populates with a sticking probability which varies as (1 ? θ)², both observations consistent with dissociative adsorption. The desorption is second order at low coverage but becomes first order at high coverage. The saturationcoverage is 3.5 × 10¹⁴ mol cm^?2. The spectra have been computer analysed to determine the fraction desorbing by first (β₁) and second (β₂) order kinetics as a function of total fractional coverage θ using this fraction as the only adjustable parameter. The β₁ desorption commences at θ ～ 0.25 and β₁ and β₂ contribute equally to the desorption at saturation. The kinetic parameters for β₁ desorption were calculated from the variation of peak temperature with heating rate as ν₁ = 1.7 × 10⁹ s^?1 and E^≠₁ = 32 kcal mole^?1 whereas two different methods of analysis gave consistent parameters ν₂ = 6.5 × 10^?7 cm² mol^?1 s^?1 and E^≠₂ = 29 and 30 kcal mole^?1 for β₂ desorption. The kinetics of desorptior are discussed in terms of the statistics for occupation of near neighbour sites. While many fea tures of the results are consistent with this picture, it is concluded that simple models considering either completely mobile or immobile adlayers with either strong or zero adatom repulsion are not completely satisfactory. The thermal desorption surface coverage has been correlated with the AES measurements and it has been possible to use the AES data for PtO as an internal standard for calibration of the AES oxygen coverage determination. At low temperature (170 K) oxygen populates an additional molecular α-state. Adsorption into the α- and β-states is competitive for the same sites and pre-saturation of the β-state at 300 K excludes the α-state. This, together with the AES observation that the adsorption is enhanced and faster at 450 than 325 K suggests a low activation energy for adsorption into the β-state.     

Chemisorption,surface structural chemistry,and electron impact properties of carbon monoxide on rhodium (110)

The adsorption, desorption, surface structural chemistry, and electron impact properties of CO on Rh(110) have been studied by LEED, Auger spectroscopy, thermal desorption, and surface potential measurements. At 300 K, CO adsorbs into a single chemisorbed state whose desorption energy (E_d) is ~130kJmol^-1. The initial sticking probability is unity, and at saturation coverage a (2 × 1)plgl ordered phase reaches its maximum degree of perfection, thus demonstrating that this CO structure is common to the (110) faces of all the cubic platinum group metals. The saturated adlayer corresponds to θ = 1 and shows a surface potential of Δ? = +0.97 V. Under electron impact, desorption and dissociation of CO occur with about equal probability, the relevant cross sections being ~10^-22 m² in each case. Slow thermal dissociation of CO occurs at high temperature and pressure, leaving a deposit of C and O atoms on the surface. The thermal, electron impact, and Δ? properties of Rh(110)CO resemble those of Ni(110)CO rather closely, and are very different from those of Pt(110)CO. Surface carbon is shown to inhibit CO chemisorption, whereas surface oxygen appears to lead to the formation of a new more tightly bound form of CO with a considerably enhanced desorption energy (E_d ~ 183 kJmol^-1). Similar oxygen-induced high temperature CO states have been reported recently on Co(0001) and Ru(101̄1).     

Adsorption and desorption of CO and H2 on Rh(111): Laser-induced desorption

Isosteric heats of adsorption ΔH_ad of CO and sticking coefficients S for CO and H₂ on Rh(111) are determined by laser-induced thermal desorption (LITD) in which a pulsed laser beam is focused onto the surface, and rapid local heating yields a desorption signal that is proportional to the adsorbate coverage θ. ΔH_ad for CO falls from 32.0±2 kcal/mol at low coverage to 14 kcal/mol at saturation, and the desorption pre-exponential factor v_d decreases from 10^14±0.5 to 10¹⁰ s^-1. ΔH_ad, v_d, and S of CO all decline sharply above θ = 0.2, corresponding to the occupation of a second binding state. Sticking coefficients for CO and hydrogen indicate precursor intermediates in adsorption.     

Surface chemistry of the metal-halogen interface: Bromine chemisorption and dibromide formation on palladium (111)

At 300 K and in the coverage regime ($\text{0<θ<}\text{1}\text{3}$) bromine chemisorbs rapidly on Pd(111); the sticking probability and dipole moment per adatom remain constant at 0.8 ± 0.2 and 1.2 D, respectively. This stage is marked by the appearance of a √3 structure: desorption occurs exclusively as atomic Br. At higher coverages, desorption of molecular Br₂ begins (desorption energy ～130 kJ mol^?1) as does the nucleation and growth of PdBr₂ on the surface. This latter stage is signalled by the appearance of a √2 LEED pattern and the observation of PdBr₂ as a desorption product (desorption energy ～37 kJ mol^?1). Some PdBr₂ is also lost by surface decomposition and subsequent evaporation of atomic Br. The data indicate that the transition state to Br adatom desorption is localised and that PdBr₂(a) ? Br(a) interconversion occurs; these surface species do not appear to be in thermodynamic equilibrium during the desorption process.     

Mass spectrometry study of the kinetics of CdTe molecular-beam epitaxy: Part I. Cd, Te2, and CdTe

Surface processes in CdTe molecular-beam epitaxy were studied using in situ mass spectrometry. Modulated molecular Cd and Te₂ beams were used for measuring kinetic parameters. The experiments were performed at crystal temperatures of 600–730 K. The results were processed within a model in which condensation and evaporation occur through adsorption and desorption stages. The desorption rate was 2–10 s^?1 for Te₂ and more than 30 s^?1 for Cd. The CdTe evaporation activation energy and desorption energies were determined as E _ev = 1.1 eV, E _d (Cd) = 1.0 eV, and E _d (Te) = 0.6 eV. The adsorbate coverage was estimated as n(Cd) < 0.01 and n(Te) = 0.1–1 Te.     

Adsorption of sodium and its effect upon some electric properties of clean germanium (111) surfaces

The effect of adsorbed Na on the surface conductivity, Δσ, and surface recombination velocity, S, of a clean (114)Ge surface is studied. The surface conductivity is a complicated function of the surface Na concentration, N_Na; at N_Na ≈ 1.5 × 10¹³ atoms/cm², it has a minimum; at ca. (3–5) × 10¹⁴atoms/cm², it has a maximum. For a monolayer coverage (ca. 7.2 × 10¹⁴atoms/cm²) the values of Δσ are not much different from those of a clean Ge surface. The surface recombination velocity is a three-valued function of the surface potential, U_S (calculated from the Δσ values), depending on the Na overlayer coverage and heat treatment of the sample. Three different surface structures (LEED data) were found to correspond to the three S versus U_S curves reported here. Thermal desorption studies show that Na is desorbed in a wide temperature interval. Two peaks have been isolated, studied and discussed. At low coverages a single peak is found to exist, which obeys the first-order desorption kinetics, with a desorption energy of (52 ± 3)kcal/mol. This peak is attributed to the surface defects. For coverages close to$\text{1}\text{4}$ monolayer a new peak was observed in the spectrum. The desorption energy of this binding state exceeds that of all the other states. When the overlayer coverage is increased, this peak is shifted to higher temperatures, as predicted for a half-order desorption kinetics. By comparing also with LEED data, it may be concluded that this most tightly bound sodium has formed on the Ge(111) surface patches of an ordered structure in which one Na atom is bonded to three Ge atoms.     

Desorption of halogens from some Nb,Mo, Ta and W single crystal surfaces

A systematic investigation of the thermal desorption of halogens from well characterized (111), (100) and (110) 4d (Nb, Mo) and 5d (Ta, W) transition metal surfaces has been carried out under low coverage conditions (θ < 10^?2 of a monolayer). Characterization of the surfaces was achieved by LEED, AES and work function determinations while the desorption kinetics were recorded in a large temperature range (1700–2300 K) using a pulsed ionic beam method. The new data concerning some Ta and W surfaces are presented and the results of this systematic study are discussed. It is shown that the halogen desorption parameters, e.g., desorption energies and preexponential factors, are independent of both surface structure and d bond filling of the substrate; E(F) ～4.75 eV, E(Cl) ～4.1 eV, E(Br) ～3.7 eV and τ₀ ～10^?13 ?10^?14 S. The halogen behaviour is compared with that of other adsorbates and with the predictions of a general chemisorption model.     

Intermittent temperature-programmed desorption study of perovskites used for catalytic purposes

A differential desorption technique, called intermittent temperature-programmed desorption (ITPD), was used to give new insights into the properties of La_1−xSr_xCo_0.8Fe_0.2O₃ perovskites as a contribution to improve their performances with respect to various important application fields such as catalysis, electrocatalysis and solid oxide fuel cells (SOFC). Both ITPD and interrupted TPD (carried out at different heating rates) evidenced two distinct oxygen adsorbed states, desorbing at temperatures lower than 400 °C, corresponding to less than 5% of a compact monolayer of oxide ions. The first one, for low desorption temperatures (lower than 290 °C) exhibits a heat of adsorption (ΔH) distribution from 101 to 121 kJ mol⁻¹. The second one, for higher desorption temperatures (between 290 and 400 °C) corresponds to ΔH = 146 ± 4 kJ mol⁻¹. Additionally, for temperatures higher than 400 °C, we observed a continuous desorption of oxygen species, probably originating from the sub-surface or semi-bulk, with an associated activation energy of desorption ≥175 kJ mol⁻¹.     

Laser desorption of NO from a thick C60 film

The desorption of NO molecules from a thick C₆₀ film is reported. A thermal desorption spectrum indicates two adsorption sites with binding energies of E_b = 0.30 eV and 0.55 eV. For laser desorption the fullerene surface is exposed to NO and excited by 7 ns UV laser pulses. Desorbing NO molecules are recorded state selectively as well as time resolved. The time-of-flight measurement indicates three different desorption pathways. A fast channel shows rovibronic temperatures of T_rot(v″ = 0) = 370 K, T_rot(v″ = 1) = 390 K and T_vib = 610 K as well as strong rotational-translational coupling. The desorption yield for the fast channel increases linearly with pulse energy with a desorption cross section of σ = (5.1 ± 0.9) × 10⁻¹⁷ cm². Dominating the signal for small J″ values is a slow channel with low rotational and translational temperatures of about 110 K. We assign this peak to a laser-induced thermal desorption. For large pump-probe delays the data deviate from the Maxwellian flux distribution and a third channel appears with extremely late arrival times.     

Molecular binding states on clean and oxidized surfaces: SiO(g) + W(clean) and SiO(g) + W(oxidized)

The interactions between a molecular beam of SiO(g) and a clean and an oxidized tungsten surface were examined in the surface temperature range 600 to 1700 K by mass spectrometrically determined sticking probabilities, by flash desorption mass spectrometry (FDMS) and by Auger electron spectroscopy (AES). The sticking probability, S, of SiO has been determined as a function of coverage and of surface temperature for the clean and the oxidized tungsten surface. Over the temperature range studied and at zero coverage S = 1.0 and 0.88 for the clean and oxidized tungsten surfaces respectively. The results are consistent with both FDMS and AES. For coverage up to one monolayer there is one major adsorption state of SiO on the clean tungsten surface. FDMS shows that T_m = constant (T_m is the surface temperature at which the desorption rate is maximum) and that desorption from this state is described by a simple first order desorption process with activation energy, E_d = 85.3 kcal mole^?1 and pre-exponential factor, ν = 2.1 × 10¹⁴ sec^?1. AES shows that the 92 eV peak characteristic of silicon dominates. In contrast on the oxidized tungsten surface, T_m shifts to higher temperatures with increasing coverage. The data indicate a first order desorption process with a coverage dependent activation energy. At low coverage (θ ? 0.14) there is an adsorption state with E_d = 120 kcal mole^?1 and ν = 7.6 × 10¹⁹, while at θ = 1.0, E_d = 141 kcal mole^?1. This variation is interpreted as due to complex formation on the surface. AES shows that on oxidized tungsten, in contrast to clean tungsten, the dominant peaks occur at 64 and 78 eV, and these peaks are characteristic of higher oxidation states of silicon. Thus, it is concluded that SiO exists in different binding states on clean and oxidized tungsten surfaces.     

Electron-stimulated desorption of atomic oxygen from polycrystalline Ag

Emission of neutral oxygen atoms from an oxygen-charged polycrystalline Ag wire has been examined by using electron-stimulated desorption (ESD) in conjunction with threshold ionization detection (appearance potential). A quadrupole mass spectrometer (QMS) was used to detect the neutral oxygen atoms, but the ionizer was operated in the appearance potential (AP) mode to make it possible to distinguish the oxygen atoms from products formed by collision of the oxygen atoms with the walls. Loss of the reactive oxygen atoms was also minimized by enclosing the ESD chamber in fused silica. With a primary beam energy of 100 eV, the ESD cross section for oxygen atom desorption was found to be 7 × 10^-19cm² at 100 °C, and an ESD threshold was found to exist below 34 eV. Flash desorption of oxygen allowed estimation of the bulk diffusivity of oxygen through polycrystalline Ag. A value of 2.64 × 10^-6cm²s^-1 at 500 °C was obtained.     

Adsorption,coadsorption, and reactivity of sodium and nitric oxide on Ag(111)

The adsorption, desorption, and surface structural properties of Na and NO on Ag(111), together with their coadsorption and surface reactivity, have been studied by LEED, Auger spectroscopy, and thermal desorption. On the clean surface, non-dissociative adsorption of NO into the a-state occurs at 300 K with an initial sticking probability of ~0.1, saturation occurring at a coverage of $\text{~}\text{1}\text{20}$. Desorption occurs reversibly without decomposition and is characterised by a desorption energy of E_d ~ 103 kJ mol^?1. In the coverage regime 0 < θ_Na < 1, sodium adsorbs in registry with the Ag surface mesh and the desorption spectra show a single peak corresponding to E_d ~ 228 kJ mol^?1. For multilayer coverages (1 < θ _Na < 5) a new low temperature peak appears in the desorption spectra with E_d ~ 187 kJ mol^?1. This is identified with Na desorption from an essentially Na surface, and the desorption energy indicates that Na atoms beyond the first chemisorbed layer are significantly influenced by the presence of the Ag substrate. The LEED results show that Na multilayers grow as a (√7 × √7) R19.2° overlayer, and are interpreted in a way which is consistent with the above conclusion. Coadsorption of Na and NO leads to the appearance of a more strongly bound and reactive chemisorbed state of NO (β-NO) with E_d ~ 121 kJ mol^?1. β-NO appears to undego surface dissociation to yield adsorbed O and N atoms whose subsequent reactions lead to the formation of N₂, N₂O, and O₂ as gaseous products. The reactive behaviour of the system is complicated by the effects of Na and O diffusion into the bulk of the specimen, but certain invariant features permit us to postulate an overall reaction mechanism, and the results obtained here are compared with other relevant work.     

Application of synchrotron radiation to investigation of the mechanism of increase in the yield of alkali metal ions in electron-stimulated desorption

Core-level photoelectron spectroscopy with synchrotron radiation (hv = 140 eV) has been applied to study the variation in the Si⁺ charge state in silicon films deposited on the W(100) surface after thermal annealing of the substrate. The purpose of this study is to check the mechanism responsible for the sharp increase in the yield of Na⁺ ions in electron-stimulated desorption from a sodium layer adsorbed on the Si/W(100) surface after high-temperature annealing. The evolution of the W 4f _7/2 and Si 2p photoelectron spectra and the valence band photoemission spectra is investigated for two silicon coverages (1 and 3 ML) on the W(100) surface in the temperature range 300<T<2200 K. It is shown that annealing of 1 ML Si on the W(100) surface results in the formation of a W-Si covalent bond, which can weaken the Si-Na bond and lead to an increase in the equilibrium distance X ₀ and, hence, to an increase in the yield of Na⁺ ions in electron-stimulated desorption. The variation in the photoelectron spectra under annealing of 3 ML Si differs from that observed after annealing of 1 ML Si in the direction of charge transfer, thus correlating with the opposite effect of annealing of 3 ML Si/W on the Na⁺ yield in electron-stimulated desorption.