The kinetics and thermochemistry of S2F10 pyrolysis

Data on the kinetics of S₂F₁₀ pyrolysis, which gives SF₄ + SF₆, have been reinterpreted to give a value for the equilibrium constant of S₂F₁₀ ? SF₄ + SF₆. This, together with statistical estimates of the entropy and heat capacity of S₂F₁₀, can be used to give for this reaction values of ΔH = 19.7 ± 1.0 kcal/mole and ΔS = 47.6 ± 2 gibbs/mole. ΔH(S₂F₁₀) = –494 kcal/mole. A compatible mechanism is shown to be S₂F₁₀ ? 2SF₅ (fast); 2SF₅ ? SF₆ + SF₄ (slow) with step 2 rate-determining. The overall, best first order rate constant is proposed as k_meas = 10^{17.42–43.0/θ} sec^?1 = K₁k₂, where θ = 2.303RT in kcal/mole. Independent measurements of δH and S° for the SF₅ radical, permits the evaluation of the equilibrium constant K₁ = 10^{8.92–(27.1 ± 6)/θ} l./mole-sec and yields k₂ = 10^{8.50–15.9/θ} l./mole-sec. The observed homogeneous catalysis by NO and CHCl ? CHCl can be explained in terms of a direct abstraction of F from S₂F₁₀ : C + S₂F₁₀ → CF + S₂F₉, followed by S₂F₉ → SF₅ + SF₄ and SF₅ + CF ? SF₆ + C (C ? NO or C₂H₂Cl₂).     

Pentafluorethylschwefeltrifluorid: Synthese und Reaktionen

Pentafluorethyl Sulfurtrifluoride: Synthesis and Reactions By oxidation of (C₂F₅S?)₂ ( 1 ) with AgF₂ at 0°C a mixture of C₂F₅SF₃ ( 2 ) and C₂F₅SF₅ ( 3 ) besides C₂F₅S(O)F ( 4 ) is formed. With elemental fluorine only 3 is isolated, an intermediate in this reaction is (C₂F₅SF₄?)₂ ( 5 ). At ?40 to ?30°C the mixture of 2, 3 and 4 was reacted with TASF and AsF₅, to give TAS⁺ C₂F₅SF₄^? ( 6 ), TAS⁺ C₂F₅S(O)F₂^? ( 7 ) and C₂F₅SF₂⁺AsF₆^? ( 8 ), respectively. While 6 and 7 decompose rapidly in solution even at low temperatures, of thermally stable 8 the solid state structure was determined by x-ray diffraction.     

A critical review of the chemical kinetics of SF4, SF5, and S2F10 in the gas phase

The gas phase chemical kinetics of SF₄, SF₅, and S₂F₁₀ are reviewed with particular emphasis on relevance to the general problem of the dielectric breakdown of SF₆. Specific reaction systems treated are SF₄ + F₂, SF₅ + SF₅, and the pyrolysis of S₂F₁₀. Computer modeling calculations were carried out to arrive at the best estimates of rate parameters. Based on the results of these calculations, sets of recommended rate parameters are provided. The major discrepancies and problems in establishing the kinetic data base are described. Thermochemical consequences of different model calculations are given.     

A molecular orbital study of bond energies in compounds of sulfur and fluorine

CNDO/2 molecular orbital theory is employed in a study of the binding energies of the molecules SF, SF₂, SF₄, SF₆, their cations and anions, and of the molecules SSF₂, FSSF and S₂F₁₀. Computed energies, when rescaled according to energy partitioning concepts, compare favorably with available experimental data. Ionization energies and electron affinities are calculated for SF, SF₂, SF₄ and SF₆.

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Zusammenfassung Mit Hilfe der CNDO/2 Theorie werden die Bindungsenergien der SF, SF₂, SF₄ und SF₆ Moleküle, von deren positiven und negativen Ionen und von SSF₂, FSSF und S₂F₁₀ berechnet. Die berechneten Energien stimmen gut mit experimentellen Daten überein, wenn sie nach Energieaufteilungsprinzipien wiederberechnet werden. Ferner werden die Ionisierungsenergien und Elektronenaffinitäten für SF, SF₂, SF₄ und SF₆ angegeben.

     

Assessing the Viability of Extended Nonmetal Atom Chains in MnF4n+2 (M=S and Se)

Theoretical investigations to evaluate the viability of extended nonmetal atom chains on the basis of molecular models with the general formula M_nF_4n+2 (M=S and Se) and corresponding solid‐state systems exhibiting direct S? S or Se? Se bonding were performed. The proposed high‐symmetry molecules were found to be minima on the potential energy surface for all S_nF_4n+2 systems studied (n=2–9) and for selenium analogues up to n=6. Phonon calculations of periodic structures confirmed the dynamic stability of the ‐(SF₄–SF₄)_∞‐ chain, whereas the analogous ‐(SeF₄–SeF₄)_∞‐ chain was found to have a number of imaginary phonon frequencies. Chemical bonding analysis of the dynamically stable ‐(SF₄–SF₄)_∞‐ structure revealed a multicenter character of the S? S and S? F bonds. A novel definition and abbreviation (ENAC) are proposed by analogy with extended metal atom chain (EMAC) complexes.     

Structural determination of a recalcitrant molecule (S2F4)

The structure determination of S₂F₄ (or SF₃SF), the dimer of SF₂, is made difficult by the large variety of possible conformers and the instability of the compound. An electron diffraction and microwave study succeeded only with the help of a molecular model derived from ab initio calculations, after initial experimental attempts had failed. The force field required for a joint electron diffraction and microwave spectroscopy analysis was calculated by ab initio methods and adjusted to the experimental vibrational frequencies. The structure of S₂F₄ is a trigonal bipyramid with the electron lone pair, the SF group and one fluorine atom in equatorial positions. The SF₃ group is strongly distorted with the two axial SF bonds differing by 0.10 Å and bond angles between axial bonds and equatorial plane of about 77° and 92°, respectively. The geometric structure of S₂F₄ in combination with the ab initio calculations allows one to visualize the dissociation process SF₃SF → 2 SF₂ more clearly.     

DC plasma etching of silicon by sulfur hexafluoride. Mass spectrometric study of the discharge products

Polycrystalline silicon wafers were etched in dc discharges of SF₆. SF_x species were extracted from the discharges and measured with a mass spectrometer. A systematic procedure was used to measure the SF _x ⁺ signals such that they are indicators of events in the discharge close to the sample undergoing etching. The picture that emerges is remarkably simple and shows the relative stability of several SF_x species including SF₆, SF₄, SF₂, and SF which are shown to be extracted from the discharge both in the presence and absence of the silicon sample. When silicon is being etched on the cathode of the discharge cell, the only significant additional products are SiF₄ and S₂F₂. A comparison of blank and sample data for opposite substrate polarities shows that there is only a small cation-assisted etching effect and suggests that ions do not play an important role in the etching of silicon by SF₆ discharges.     

The reaction of XeF+MF6− (M = As,Sb) with sulfuranes; preparation of CF3(O)F2+SbF6− and (CF3)2SOXeF+SbF6−

CF₃S(O)F, (CF₃)₂SO, CF₃SF₃, (CF₃)₂SF₂, and SF₄ react in different manner with XeF⁺MF₆^? (M?As, Sb). An oxidative fluorination is observed by CF₃S(O)F forming the persulfonium salt CF₃S(O)F₂⁺SbF₆^?, whereas by (CF₃)₂SO a simple addition product containing xenon can be isolated in form of the sulfonium salt (CF₃)₂SOXeF⁺SbF₆^?. On the contrary, the Lewis-acidic character of the XeF⁺-cation predominates against (CF₃)_nSF_4?n (n = 0 ? 2) leading to the corresponding fluorosulfonium salts (CF₃)_nSF_3?n ⁺MF₆^? (M?As, Sb) and XeF₂.     

Chalkogenfluoride in niedrigen Oxydationsstufen. V. Die ungewöhnlichen chemischen Gleichgewichte F3S?SF ⇌ 2SF2 und CF3SF2?SCF3 ⇌ 2 CF3SF

Lower Chalcogen Fluorides V. Unusual Chemical Equilibria F₃S? SF ? 2 SF₂ and CF₃SF₂? SCF₃ ? 2 CF₃SF SF₂ and CF₃SF form unusual chemical equilibria with their dimers F₃SSF and CF₃SF₂ SCF₃ involving two different bonds (SF and SS). The equilibrium between F₃SSF and SF₂ is disturbed by a decomposition reaction of these compounds yielding SF₄ and SSF₂ · K_p (298) = 2.5 · 10^?3atm, ΔH°₂₉₈ = 68.5 kJ/mol for the system F₃SSF ? 2SF₂ and K_p(298) = 1.3 × 10³ atm, δH₂₉₈ = 42.5 kJ/mol for the system CF₃SF₂SCF₃ ? 2CF₃SF have been determined as the equilibrium constants and the dissociation enthalpies. In both systems kinetic hindrance delays the achievement of the equilibrium. The rates for dissociation and decomposition are strongly surface dependent. Under favourable conditions the half-lives at 298 K for the dissociation of F₃SSF and CF₃SF₂SCF₃ are found to be ca. 8 h and ca. 2 h respectively, and for the decomposition of SF₂ and CF₃SF (p ～ 13 mbar) the values are ca. 10 h and 1 year respectively.     

Mass spectrometric study of SF6-N2 plasma during etching of silicon and tungsten

The reaction products in the SF₆-N₂ mixture rf plasma during reactive ion etching of Si and W have been measured by a mass spectrometric method. Two kinds of cathode materials were used in this work; they were stainless steel for the Si etching, and SiO₂ for the W etching. The main products detected in the etching experiments of Si and W included SF₄, SF₂, SO₂, SOF₂, SOF₄, SO₂F₂, NSF, NF₃, N₂F₄, N_xS_y, NO₂, and SiF₄. In the W etching with the SiO₂ cathode, additional S₂F₂, N₂O, and WF₆ molecules were also obtained. The formation reactions about the novel NSF compound and the sulfur oxyfuorides were discussed.     

Negative ion formation in compounds relevant to SF6 decomposition in electrical discharges

Dissociative and nondissociative electron attachment in the electron impact energy range 0–14 eV are reported for SOF₂ SOF₄, SO₂F₂, SF₄, SO₂, and SiF₄ compounds which can be formed by electrical discharges in SF₆. The electron energy dependences of the mass-identified negative ions were determined in a time-of-flight mass spectrometer. The ions studied include F^– and SOF ₂ ^–* from SOF₂; SOF ₃ ^– and F^– from SOF₄; SO₂F ₂ ^–* , SO₂F^–, F ₂ ^– , and F^– from SO₂F₂; SF ₄ ^–* and F^– from SF₄; O^–, SO^–, and S^– from SO₂; and SiF ₃ ^– and F^– from SiF₄. Thermochemical data have been determined from the threshold energies of some of the fragment negative ions. Lifetimes of the anions SOF ₂ ^–* , SO₂F ₂ ^–* , and SF ₄ ^–* are also reported.     

Nachweis und Bestimmung von Spuren h?hersiedender Verunreinigungen in Schwefelhexafluorid

Zusammenfassung Es wird ein Verfahren mitgeteilt, mit dessen Hilfe sehr geringe Anteile an h?hersiedenden Verunreinigungen in Schwefelhexanuorid nachgewiesen werden k?nnen. Die Verunreinigungsspuren werden dabei durch Adsorption an Al₂O₃-Perlgranulat angereichert. Nach Desorption mit Helium als Spülgas werden die Substanzen gas-chromatographisch getrennt und quantitativ bestimmt. Es konnte auf diese Weise für S₂F₁₀ und S₂F₁₀O eine Nachweisgrenze von 1·10⁻⁸ Mol auf 1 Mol SF₆ erreicht werden.

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Summary A procedure is described for the detection of very small amounts of higher-boiling impurities in sulphur hexafluoride. The traces of impurities are enriched by adsorption on a bead granulate of Al₂O₃. After desorption with helium the substances are separated and determined by gas chromatography. In this way a detection limit of 1×10⁻⁸ Mol of S₂F₁₀ and S₂F₁₀O per 1 Mol of SF₆ has been achieved.

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Wir danken Fr?ulein Arnold und Fr?ulein Haacke für die Durchführung und Auswertung der Messungen.     

Strukturen von SF5-substituierten Metallkomplexen

Structures of SF₅-substituted Metal Complexes Crystal and molecular structure of [(CO)₆Co₂(F₅S? C?C? SF₅)], [(CO)₄Co? CH₂? SF₅] and [(CO)₅Mn? S? CF?N? SF₅] are reported. Whereas the first two complexes are formed as expected, the latter one is the product of an unclear reaction pathway. In decomposition reactions of [(CO)₄Co? CH₂? SF₅] and [(CO)₅Mn? CH₂? SF₅] H₂C?SF₄ is produced. This allows a one step preparation of this elusive, simplest alkylidine sulfur tetrafluoride.     

Compounds containing CSF4 and CS+F4

The preparations of CH₂SF₄ and CH₃CHSF₄ are presented and the structures are discussed. Addition reactions of polar species give a wide range of new compounds, like Hg(CH₂SF₅)₂, F₄AsCH₂SF₅, cisBrSF₄CH₃, cisF₅SeOSF₄CH₂Br, a.o. While CH₂SF₄ decomposes at room temperature slowly to CH₂CH₂ and SF₄, at high temperatures HF and CSF₂ are formed. CH₃CHSF₄ gives mainly CH₃CHF₂ at room temperature. The “saturated” compounds CH₃SF₅ and C₂H₅SF₅ have been prepared. They react with SbF₅ in SO₂ at low temperatures to form the cations CH₃SF₄⁺ and C₂H₅SF₄⁺. The CH₃SF₄⁺ ion has been investigated in detail by nmr methods at low temperatures. It decomposes to CH₃ and SF₄, which react further in the SO₂/SbF₅ system to CH₃OSO⁺ and SF₃⁺.     

Identification of corona discharge-induced SF6 oxidation mechanisms using SF6/18O2/H2 16O and SF6/16O2/H2 18O gas mixtures

The absolute yields of gaseous oxyfluorides SOF₂, SO₂F₂, and SOF₄ from negative, point-plane corona discharges in pressurized gas mixtures of SF₆ with O₂ and H₂O enriched with¹⁸O₂ and H₂ ¹⁸O have been measured using a gas chromatograph-mass spectrometer. The predominant SF₆ oxidation mechanisms have been revealed from a determination of the relative¹⁸O and¹⁶O isotope content of the observed oxyfluoride by-product. The results are consistent with previously proposed production mechanisms and indicate that SOF₂ and SO₂F₂ derive oxygen predominantly from H₂O and O₂, respectively, in slow, gas-phase reactions involving SF₄, SF₃, and SF₂ that occur outside of the discharge region. The species SOF₄ derives oxygen from both H₂O and O₂ through fast reactions in the active discharge region involving free radicals or ions such as OH and O, with SF₅ and SF₄.     

Umsetzungen von Thiazylhalogeniden XSN (X = F,Cl) mit perfluorierten Iminen Rf2NH (Rf = F,CF3, CF3S, (CF3)2C, (CF3)2 S): Versuche zur Darstellung von Aminothiazylen (N?SN)

Reactions of Thiazyl Halides XSN (X = F, Cl) with Perfluorinated Imines R_f2 NH (R_f = F, CF₃, CF₃S, (CF₃)₂C?, (CF₃)₂S?): Attempted Preparations of Aminothiazyls (?N? S?N) Thiazyl halides or their precursors Cl₃S₃N₃ and FC(O)N?SF₂ react with perfluoro imines to provide the corresponding aminothiazyls as unstable and reactive intermediates. While with HNF₂ or KF · HNF₂ the final products N₂F₄ and S₄N₄ are formed, [(CF₃)₂N]₂Hg reacts with Cl₃S₃N₃ to give CF₃N?CF₂, FSN, and HgCl₂. The expected product CF₃SN?S?NSCF₃ ( 4 ) is obtained from (CF₃S)₂NH or Hg[N(SCF₃)₂]₂ and FSN probably via (CF₃S)₂ NSN. Surprisingly, (CF₃)₂C?NLi forms with ClSN, Cl₃S₃N₃ or [S₃N₂Cl]Cl in the presence of NH₄Cl 4,5-Dihydro-3,3,5,5-tetrakistrifluoromethyl-3H-1λ⁴,2,4,6-thiatriazine ( 6 ) and (CF₃)₂C?NS_xN?C(CF₃)₂ (X = 1, 2) ( 7a, b ) as byproducts. A CsF catalyzed reaction at 70 to 80°C between (CF₃)₂C?NLi and FSN provides low yields of (CF₃)₂C?N? S? N?S?NCF(CF₃)₂ ( 8 ) together with 7a, b. The latter are the only products without CsF. When (CF₃)₂S?NH is treated with FSN, the compounds CF₃SCF₃, S₄N₄, and N₂ are identified. It is shown by ¹⁹F and ¹⁴N-n.m.r. spectroscopy that (CF₃)S?NSN is an unstable intermediate.     

Cluster-assisted decomposition reactions of the molecular anions of SF6 and C7F14

The cluster ions formed by the attachment of dimethylsulfoxide (DMSO) and methanol to the molecular negative ions of C₇F₁₄ and SF₆ have been studied by a pulsed e-beam high pressure mass spectrometer (PHPMS) and by an atmospheric pressure ionization mass spectrometer (APIMS). The free energy change (ΔG°) for the clustering equilibria reaction, M⁻ + S M⁻S, at 35 °C are found to be −7.7 and −7.s kcal/mol for S = DMSO and M⁻ = C₇F⁻₁₄ and SF⁻₆, respectively, and −6.4 and −4.5 kcal/mol for S = methanol and M⁻ = C₇F⁻₁₄ and SF⁻₆, respectively. While the cluster ions formed by DMSO are found to be stable against side reactions, those formed by methanol undergo decomposition processes in which the central core ion is fragmented. At 35 °C, the rate law for the decomposition of the SF⁻₆ (CH₃OH)₁ ion is second-order, involving the M⁻ (CH₃OH)₁ cluster ion and another methanol molecule. While the C₇F⁻₁₄(CH₃OH)₁ ion also decomposes through this second-order process, a competing unimolecular mechanism is also operative at 35 °C. With increases in the PHPMS ion source temperature to 150 °C, the unimolecular decomposition process becomes progressively dominant for both of the M⁻(CH₃OH)₁ cluster ions of C₇F₁₄ and SF₆. Methanol cluster ions of the type M⁻S₂ are not observed under any of the conditions examined here. When methanol or water partial pressures of a few torr or higher are present in the buffer gas of the APIMS ion source, the decomposition reactions are very fast and only the fragment ions produced by these reactions are observed in the electron-capture (EC)-APIMS spectra of C₇F₁₄ and SF₆. Also, in the methanol-containing APIMS ion source, the course of the SF⁻₆ decomposition reaction is altered so that fragment ions of the type F⁻(S)_n dominate the EC-APIMS spectrum of SF₆ at all ion source temperatures. For C₇F₁₄, fragment ions of the type F⁻(S)_n become dominant at lower ion source temperatures. These previously unknown reactions are expected to be important in the analysis of perfluorinated compounds by mass spectrometric methods that utilize ionization by electron capture or negative chemical ionization. The nature of the fragment ions produced in these cluster-assisted reactions may also provide a new source of information concerning the structures of the molecular negative ions of SF₆ and C₇F₁₄.     

Reactions of pentafluorosulfanyliminodihalosulfanes,SF5NSX2, with nucleophiles. Preparation and characterization of pentafluorosulfanylsulfinylamine,SF5NSO.

Reactions of SF₅NSF₂ with sodium alkoxides and aryloxides have produced both the mono- and disubstituted derivatives SF₅NS(F)OR and SF₅NS(OR)₂, where RCH₃, CH₂CHCH₂, C₆H₅, p-C₆H₄NO₂, p-C₆H₄Br, p-C₆H₄CN. The reaction of SF₅NSCl₂ with AgNCO produced SF₅NS(NCO)₂. This diisocyanate can also be prepared from the reaction of SF₅NSCl₂ with KOCN in liquid SO₂. The proposed intermediate, SF₅NSO, in the hydrolysis of SF₅NSF₂ was prepared from the low temperature reaction of SF₅NSCl₂ and Ag₂O in C₆H₅NO₂. The new pentafluorosulfanyl derivatives were characterized by IR, ¹H and ¹⁹F NMR, mass spectrometry and where possible ¹³C NMR and elemental analysis.     

Synthese von (C6F5)2SF+MF6− (M  As,Sb) und Kristallstruktur von (C6F5)2SF+SbF6− [1]

Preparation of (C₆F₅)₂SF⁺MF₆^? (M ? As, Sb) and Crystal Structure of (C₆F₅)₂SF⁺SbF₆^? XeF⁺MF₆^? (M ? As, Sb) reacts with (C₆F₅)₂S in HF to form (C₆F₅)₂SF⁺MF₆^?. The deeply violet sulfonium salts can be kept without decomposition up to 24 h at room temperature. The hexafluoroantimonate salt crystallizes in the monoclinic space group P2₁/n with a = 1056.4(7) pm, b = 1446.3(10) pm, c = 1102.9(8) pm, β = 91.29(6)° und Z = 4. The SF-bond distance with 158.4(3) pm is of unusual length. Cations and anions are connected via interionic fluorine contacts to an infinite chain, in which cations and anions form to ABAB sequence along the chain.     

Reaktionen des (Pentafluorsulfanyl)dichloramin

Reactions of Pentafluorosulfanyldichloroamine The previously unexplored reaction chemistry of pentafluorosulfanyldichloroamine has now led to the novel compounds SF₅N?PCl₃ and SF₅N?SeCl₂. Even though both compounds are produced in high yield (>80%), they were found to decompose readily at room temperature. SF₅NCl₂ has also been found to react with S₂Cl₂ or SCl₂ to give SF₅N?SCl₂, and with SF₅N?SCl₂ to give SF₅N?S?NSF₅. Finally, the adduct SF₅NH₂ · HCl is formed from SF₅NCl₂ and HCl.