Synthesis and characterization of hyperbranched polymers with increased chemical versatility for imprint lithographic resists

Hyperbranched polymers were prepared from a variety of mono‐ and difunctional monomers and used in the development of novel UV‐imprint lithography (UV‐IL) resists. The unique physical and chemical properties of these hyperbranched materials significantly increase the range of molecular systems that could be imprinted. Traditional challenges, such as the use of monomers that have low boiling points or the use of insoluble/highly crystalline momomers, are overcome by the preparation of hyperbranched polymers that incorporate these repeat units. In addition, the low viscosity of the hyperbranched macromolecules and the large number of reactive chain ends overcome many difficulties that are traditionally associated with the use of polymeric materials as imprint resists. Hyperbranched polymers containing up to 12 mol % pendant vinyl groups, needed for secondary crosslinking during imprinting, were prepared with a wide range of repeat unit structures and successfully imprinted with features from tens of microns to ∼ 100 nm. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 6238–6254, 2008     

Radiation degradation susceptibility of vinyl polymers: Nitriles and anhydrides

The effect of γ irradiation on a series of vinyl polymers, which included polymethacrylonitrile, poly(α-chloroacrylonitrile), poly(dimethyl itaconate), poly(acrylic anhydride), and poly(methacrylic anhydride), was studied as part of a program to develop improved positive lithographic resists. Radiation-induced degradation was observed for polymethacrylonitrile, poly(α-chloroacrylonitrile), and poly(methacrylic anhydride). Molecular weight degradation as a function of dose was monitored by membrane osmometry or GPC techniques. For γ-irradiated poly(dimethyl itaconate) and poly(acrylic anhydride) crosslinking was found to predominate over chain scission. [G(s)–G(x)] values, calculated from molecular weight inverse versus dose curves, indicate that both nitrile polymers degraded more efficiently than a poly(methyl methacrylate) reference standard on the basis of M _n changes. The radiation behavior of the first three polymers confirms earlier findings than vinyl polymers with quaternary carbons predominantly degrade when subjected to ionizing radiation.     

Synthesis of vinyl polymers with pendant phenoxazinyl group

Vinyl monomers bearing phenoxazine units, were synthesized: 2-vinyl-phenoxazine starting with phenoxazine in a five-step synthesis; 3-acrylamido- or 3-methacrylamido-phenoxazines with or without 10-PhCH₂ or 10-Me-substituent starting with o-benzylideneaminophenol or o-anisidine via 3-aminophenoxazines; and 3-(p-styrenesulfonamido)phenoxazines with or without 10-PhCH₂- or 10-Me-substituent, also via 3-aminophenoxazines. Polymerizations of these noval monomers proceeded smoothly, except those having no 10-substituent. Changes of the visible absorption spectrum of iodine in THF with addition of the polymers and oligomers thus prepared were considerable, with the appearance of new absorption peaks for polymers with 10-Me-substituent.     

Characterization of the morphology and composition of commercial negative resists used for lithographic processes

We present a spectroscopic and microscopic characterization of the chemical composition, structure, and morphology of two commercial negative resists using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). For this purpose, films of a novolak-based resist (ma-N 2400) and hydrogen silsesquioxane (HSQ) are treated under different conditions (temperature, deep ultraviolet (DUV) exposure, CHF₃ plasma). Topographic AFM images show that both heating and DUV exposure strongly affect the surface morphology of as-prepared ma-N 2400 resist films. These different treatment conditions also lead to decreasing roughnesses, which indicates structural reorganization. Furthermore, the decrease of the photoactive compound (bisazide) in the ma-N 2400 resist films, observed in FTIR spectra, suggests cross-linking of the resist after CHF₃ plasma treatment, heating, or DUV exposure. XPS measurements on different CHF₃ plasma-treated surfaces reveal that a structurally homogeneous fluorine-containing polymer is generated that is responsible for an enhanced etch resistance. FTIR measurements of HSQ films show a correlation between the degree of HSQ cross-linking and baking time.     

Correlation of thermal degradation mechanisms: Polyacetylene and vinyl and vinylidene polymers

The thermal degradation of poly(vinyl bromide) (PVB), poly(vinyl chloride) (PVC), poly(vinyl alcohol) (PVA), poly(vinyl acetate) (PVAc), poly(vinyl fluoride) (PVF), poly(vinylidene chloride) (PVC₂), and poly(vinylidene fluoride) (PVF₂) has been studied by direct pyrolysis–mass spectrometry (DP-MS) and flash pyrolysis–gas chromatography–mass spectrometry techniques. Vinyl and vinylidene polymers exhibit two competitive thermal degradation processes: (1) HX elimination with formation of polyene sequences which undergo further moleculaar rearrangements, and (2) main-chain cleavage with formation of halogenated or oxigenated compounds. The overall thermal degradation process depends on the prevailing decomposition reaction in each polymer; therefore, different behaviors are observed. The thermal degradation of polyacetylene (PA) has also been studied and found important for the elucidation of the thermal decomposition mechanism of the title polymers.     

Synthesis and properties of cyclolinear methylcyclotetrasiloxane polymers with vinyl groups

Atactic cyclolinear organosilicon polymers carrying vinyl groups in RSiO_1.5 or R₂SiO moieties or concurrently in two moieties of the polymer unit have been synthesized by the heterofunctional polycondensation of 2,6-dihydroxymethyl(vinyl)cyclotetrasiloxanes with 2,6-dichloromethyl(vinyl)cyclotetrasiloxanes. The structure of the polymers has been studied by ¹H and ²⁹Si NMR spectroscopy, IR measurements, and elemental analysis. According to DSC, X-ray diffraction, and polarization optical microscopy, the polymers are amorphous in the range from ?100 to +200°C; the interlayer spacing and the type of packing remain unchanged with an increase in the content of vinyl substituents in the repeating units of cyclolinear polymethylvinylsiloxanes.     

Synthesis and characterization of topologically interesting vinyl polymers

A series of macrocyclic poly(2-vinylpyridine)&s were synthesized by high dilution (∼10⁻⁵ M) coupling of the two-ended living precursor dianions with 1, 2- and 1, 4-bis-(bromomethyl)benzene (1, 2- or 1, 4-DBX). SEC measurements indicate that the macrocycles contain less than 5% linear precursor and that the hydrodynamic size of the macrocycles is substantially (∼30%) less than that of the linear precursor. At very low MW, the sizes of macrocyclic and linear polymers differ less, particularly for the case of the 1, 2-DBX product. Viscometry measurements in THF of linear and macrocyclic polymers also indicated substantial size differences of linear and macrocyclic P2VP. The values of the glass transition temperature (T_g) for both the 1, 2- and 1, 4-DBX macrocycles were found to increase with decreasing MW as qualitatively predicted by entropy calculations. Thus, as the degree of polymerization decreases, the macrocyclic chains become conformationally stiffer and this is reflected by higher T_g values. The differences in T_g between linear and macrocyclic P2VP are quite large (∼40K) around a DP of 40 and decrease to values of a few degrees at a DP of around 200. These differences are diagnostically useful in estimating the linear content of the macrocycles below a DP of 100.     

Synthesis and characterization of macrocyclic vinyl aromatic polymers

The synthesis and characterization by size exclusion chromatography, liquid chromatography, NMR, matrix‐assisted laser desorption/ionization, thermal analysis, and other techniques of well‐defined and narrow molecular weight distribution macrocyclic polystyrene (PS), poly(2‐vinylpyridine), poly(α‐methylstyrene), poly (2‐vinyl‐naphthalene) (P2VN), and poly(9,9‐dimethyl‐2‐vinylfluorene) (PDMVF) containing a single 1,4‐benzylidene, methylidene, or 9,10‐anthracenylidene unit are reviewed. The absorption and emission spectroscopy of PS, P2VN, and PDMVF is also discussed. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 2139–2155, 2006     

Synthesis of N-substituted phenoxazine polymers bearing vinyl backbone

Vinyl monomers bearing N-substituted phenoxazine or 2,8-dimethylphenoxazine units were synthesized starting with the corresponding phenoxazines. N-substituents were 2-vinylbenzyl-oxycarbonylethyl group prepared via 2-carboxyethyl group, 3-methacrylamido-, 3-acrylamido-, or 3-(4-styrenesulfonamido)-propyl group prepared via 3-aminopropyl group, vinylbenzyl, or 2-vinyloxyethyl group attached by the displacements of sodium salts of the phenoxazines to the chlorides, and 2-methacryloyl- or 2-acryloyl-oxyethyl group prepared via 2-hydroxyethyl group. Free-radical polymerixations of these novel monomers proceeded smoothly, except those with 2-vinyloxyethyl group, which were susceptible to BF₃-etherate. Changes of the visible absorption spectrum of iodine in THF with addition of the monomers and polymers were considerable, with the appearance of new absorption peaks or shoulders in major cases.     

Synthesis and thermal and spectroscopic properties of macrocyclic vinyl aromatic polymers

Well‐defined and narrow molecular weight distribution macrocyclic poly(2‐vinylnaphthalene) (P2VN) and poly(2‐vinyl‐9,9‐dimethylfluorene) (PDMVF) containing a single 1,4‐benzylidene or 9,10‐anthracenylidene unit have been synthesized via the potassium naphthalide initiated polymerization of the monomers followed by the end‐to‐end coupling of the resulting P2VN dianions under high‐dilution conditions with 1,4‐bis(bromomethyl)benzene or 9,10‐bis(chloromethyl)anthracene. Molecular characterization has been carried out by size exclusion chromatography, nuclear magnetic resonance, differential scanning calorimetry, ultraviolet–visible spectroscopy, and matrix‐assisted laser desorption/ionization time‐of‐flight mass spectrometry. The thermal properties show distinct differences between the cyclic and matching linear polymers, with the macrocycles showing much higher glass‐transition and decomposition temperatures. The absorption bands are both hyperchromic and hypochromic with respect to the model aromatic compounds, and this is consistent with intensity borrowing. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 5488–5503, 2004     

Optically active vinyl polymers containing fluorescent groups—4: Synthesis and properties of copolymers of 9-vinylcarbazole with (−)menthyl vinyl ether

9-Vinylcarbazole (1) has been copolymerized with (?)menthyl vinyl ether (2) by a conventional cationic catalyst [Al(C₂H₅)Cl₂] in CH₂Cl₂ at ?78°. Reactivity ratios were estimated using a relatively new method valid up to high conversions. Chiroptical properties, including differential dichroic adsorption (Δε) of the various copolymers, have been studied in an attempt to investigate correlations between physico-optical properties, and the chemical compositions, distributions of monomeric units and stereoregularity of the copolymerization products.     

Miscibility of cellulose acetate with vinyl polymers

Binary blend films of cellulose acetate (CA) with flexible syntheticpolymers including poly(vinyl acetate) (PVAc), poly(N-vinyl pyrrolidone) (PVP),and poly(N-vinyl pyrrolidone-co-vinyl acetate) [P(VP-co-VAc)] were preparedfrommixed polymer solutions by solvent evaporation. Thermal analysis by DSC showedthat CA of any degree of substitution (DS) was not miscible with PVAc, but CAwith DS less than 2.8 was miscible with PVP to form homogeneous blends. Thestate of mixing in CA/P(VP-co-VAc) blends was affected not only by the DS of CAbut also by the VP/VAc copolymer composition. As far as CAs of DS<2.8 andP(VP-co-VAc)s with VP contents more than ca. 25 mol% were used,theCA/copolymer blends mostly showed a miscible behaviour irrespective of themixing ratio. FT-IR measurements for the miscible blends of CA/PVP andCA/P(VP-co-VAc) revealed the presence of hydrogen-bonding interactions betweenresidual hydroxyls of CA and carbonyls of N-vinyl pyrrolidone units, which maybe assumed to largely contribute to the good miscibility.     

The effect of orientation on the radiation induced degradation of polymers

A study has been made of the effect of orientation on the oxidative degradation of poly(vinylchloride) (PVC), low density polyethylene (LDPE) and high density polyethylene (HDPE) under the influence of γ- and u.v.-radiation. The effect of drawing in PVC is to increase the rate of oxidative degradation; in LDPE and HDPE, this rate decreases (especially for HDPE) both under u.v. and γ-radiation.     

Synthesis,UV-curing behavior and surface properties of fluorine-containing vinyl ether polymers

Five fluorine-containing vinyl ether monomers were prepared by the reaction between 2-vinyloxy ethanol, a fluorinated alcohol and hexafluorobenzene in the presence of sodium hydride in dimethylformamide. Two representative properties of these monomers, UV-curing behavior initiated by a cationic photo-initiator PAG 201 and surface free energy of coating films, were investigated. Photo-polymerization proceeded both rapidly and completely with a high double-bond conversion （〉 90%） and a fast curing rate （maximum curing time 〈 21 s） for three monomers. The surface energies of the monomers and the resulting polymer films were then investigated. The minimum surface free energy of the UV-cured homopolymer films reaches 7.1 mJ/m2. X-ray photoelectron spectroscopy data show that the low surthce tension is influenced by fluorine content in the soft segments and fluorinated chains＇ migration to the surface. The five monomers exhibit low viscosity, low surface energy, good thermal stability and good photo-polymerization properties, which make them great candidates for UV coating and photoresist applications.     

Synthesis of water-soluble fullerene-containing vinyl polymers by low-temperature radiation-induced living polymerization

Water-soluble polymers of acrylamide and acrylic acid that contain fullerene (more than 90% C₆₀) have been prepared by the low-temperature radiation-induced living polymerization. In the absorption spectra of these polymers, a monotonically decaying absorption typical of the covalently bound fullerene or its associates is observed in the range 240–700 nm. The radiation initiation of the process allows preparation of high-purity polymers useful for designing medicinal preparations.     

Synthesis and characterization of optically active helical vinyl polymers via free radical polymerization

A facile synthetic route to prepare the dual‐functional molecule, 2,5‐bis(4′‐carboxyphenyl)styrene, was developed. The esterification of this compound with chiral alcohols, that is, (S)‐(+)‐sec‐butanol/(R)‐(?)‐sec‐butanol, (S)‐(+)‐sec‐octanol/(R)‐(?)‐sec‐octanol, and D ‐(+)‐menthol/L ‐(?)‐menthol, respectively, yielded three enantiomeric pairs of novel vinyl monomers, which underwent radical polymerization to obtain helical polymers with an excess screw sense. These polymers exhibited optical rotations as large as fourfold those of the corresponding monomers. Their helical conformations were quite stable as revealed by the almost unchanged chiroptical properties measured at different temperatures. The polymers with linear alkyl tails in the side‐groups formed irreversibly columnar nematic phases in melt although the corresponding monomers were not liquid crystalline. Whereas, the polymers with cyclic tails generated no mesophase. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 2408–2421, 2009     

Synthesis and lithographic applications of highly metallized cluster-based polyferrocenylsilanes

We report the use of a cobalt-clusterized polyferrocenylsilane (Co-PFS) as a precursor to patterned ferromagnetic ceramics. Co-PFS was synthesized. Functioning as a negative resist, Co-PFS lines with widths of 10-300 μm were patterned using UV-photolithography, while features as small as 500 nm were afforded by electron-beam lithography. Subsequent pyrolytic treatment of the lithographically patterned Co-PFS yielded ferromagnetic ceramics containing Fe/Co nanoparticles. Due to its high metal-loading, Co-PFS is a good etch resist for oxygen and hydrogen plasma reactive ion etching. Reactive ion etching of a thin film of Co-PFS in a secondary magnetic field allowed direct access to ferromagnetic ceramic films, providing a viable alternative to pyrolysis.     

Synthesis of end‐functionalized polymers and copolymers of cyclopentadiene with vinyl ethers by cationic polymerization

A series of cyclopentadiene (CPD)‐based polymers and copolymers were synthesized by a controlled cationic polymerization of CPD. End‐functionalized poly(CPD) was synthesized with the HCl adducts [initiator = CH₃CH(OCH₂CH₂X)Cl; X = Cl ( 2a ), acetate ( 2b ), or methacrylate] of vinyl ethers carrying pendant functional substituents X in conjunction with SnCl₄ (Lewis acid as a catalyst) and n‐Bu₄NCl (as an additive) in dichloromethane at −78 °C. The system led to the controlled cationic polymerizations of CPD to give controlled α‐end‐functionalized poly(CPD)s with almost quantitative attachment of the functional groups (F_n ∼ 1). With the 2a or 2b /SnCl₄/n‐Bu₄NCl initiating systems, diblock copolymers of 2‐chloroethyl vinyl ether (CEVE) and 2‐acetoxyethyl vinyl ether with CPD were also synthesized by the sequential polymerization of CPD and these vinyl ethers. An ABA‐type triblock copolymer of CPD (A) and CEVE (B) was also prepared with a bifunctional initiator. The copolymerization of CPD and CEVE with 2a /SnCl₄/n‐Bu₄NCl afforded random copolymers with controlled molecular weights and narrow molecular weight distributions (weight‐average molecular weight/number‐average molecular weight = 1.3–1.4). © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 398–407, 2001