Characterization of the optical properties of LPE InxGa1−xAsyP1−y thin layers grown on InP

A series of In_xGa_1?xAs_yP_1?y single-crystal thin layers have been grown on an InP substrate in a vertical liquid phase epitaxy furnace with a rotating slide boat system. The optical properties of these LPE quaternary alloys lattice-matched to InP have been investigated mainly by photoluminescence and electroreflectance measurements. Photoluminescence spectra of In_xGa_1?xAs_y P_1?y epitaxial layers are dominated by a strong luminescence line due to band-edge emission. At low temperatures, around 4.2 K, we have observed complicated luminescence bands with many fine structures. Electroreflectance spectra for the LPE In_xGa_1?xAs_yP_1?y layers are sufficiently broad to fulfil the low-field condition, and the analysis enabled us to determine precisely the band gap energy.     

Dislocation density in InxGa1–xAs films grown on GaAs substrates with intermediate buffer layer InGaAsP of variable composition

In_xGa_1–xAs films with x = 0.03 and 0.05 were grown from an In Ga As P liquid phase. Because of high value of distribution coefficient of P we have heterojunction GaAs In_yGa_1–yP_zAs_1–x–In_xGa_1–xAs. The influence of Phosphorus atom fraction (X_p) in liquid phase on dislocation density in the top In_xGa_1–xAs layer was studied. It was found that dislocation density (N_d) as a function of X_p is a curve with some minima. The minima of N_d for substrates of (111) A and (111) B orientations are observed in the different intervals of X_p axis. — The width of N_d minimum is decreased if the substrate is misoriented from the (111) plane. — It was supposed that the clusters exist in the liquid phase. On the basis of this assumption one can explain the influence of substrate position over or under the melt on the film perfection. The diameter of these clusters is estimated to be about 500 Å.     

LPE Growth of Ga1 – xInxSb Multi-grading Layers

Electronegativity difference approach (ENDA) has been successfully employed to obtain good prediction of the In atomic fraction, energy bandgap and lattice constant of the Ga_{1 – x}In_xSb/Ga_{1 – y}In_ySb/GaSb system. Nearly lattice-matched GalnSb epilayers with In atomic fraction of 0.42 have been obtained by the liquid phase epitaxy. The cut-off wavelength was 2.2 μm at room temperature.     

Miscibility gap calculation for Ga1−xInxNyAs1−y including strain effects

A method including strain effects is introduced for calculating the miscibility gap of the Ga_xIn_1−xN_yAs_1−y material system. The Gibbs free energy is computed using the delta lattice parameter model and the conventional solution model. The contribution caused by the strain energy due to the mismatch between substrate and epitaxial layer is added. The spinodal points can be calculated from this expression. The critical temperature above which the solid is metastable has been found to be increased due to strain effects. It is pointed out that the result of the calculation depends on the choice of substrate. The miscibility gaps for Ga_xIn_1−xAs, GaN_yAs_1−y and Ga_xIn_1−xN_yAs_1−y are evaluated by this method for a more realistic model of crystal growth.     

A study of phase equilibria and heterojunctions in Ga–In–As–Sb quaternary system

The phase diagram of the Ga–In–As–Sb quaternary system has been determined experimentally and also has been treated on the base of thermodynamic calculations. The liquidus data were obtained by DTA and solidus data were determined using electron microprobe analysis on LPE-layers of Ga_xIn_1–xAs_ySb_1–y on GaSb and InAs substrates. Isolattice-parameter heterostructures prepared on these substrates were free of mismatch dislocations and suitable for application to light-emitting diodes and semiconductor lasers.     

Optical properties of Ga1–xInxAs LPE-layers and p-n structures

The multiple layer structure nGaAs(n Ga_1–xIn_xAs) p Ga_1–xIn_xAs (0 ≦ × ≦ 0.18) was realized by liquid phase epitaxy from In–Ga–As-melts on (111)-oriented GaAs substrates. The InAs-content of the mixed crystal layers was found to be dominating for crystal perfection and growth rate. The cathodoluminescence spectra of p-and n-type Ga_1–xIn_xAs and spectral distribution of the electroluminescence from pn-junctions were measured at T = 77 K and 300 K. The external quantum efficiency wa found to have a maximum for diodes with x ≈ ≈ 0.006. This is caused by the decrease of the optical absorption with increasing x and increasing dislocation density on the other hand.     

Temperature dependence of optical absorption in In1‐xGaxAs solid solutions

Absorption spectra near the fundamental absoption edge of n‐type of In_1‐xGa_xAs are studied. The temperature coefficient of the In_1‐xGa_xAs energy gap, dE_g/dT, has been obtained and compared with calculated data. An exponential dependence of the absorption coefficient on photon energy has been found. The slope of the exponential absorption curve is discussed. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Investigation of GaAs—InyGa1−yPzAs1−z–InxGa1−x-As grading heterojunctions formation

The initial stages of growth of GaAs–InGaAsP_var–In_xGa_1−xAs heterostructures (x = 0.1 and 0.17) were investigated for the equilibrium-cooling method of LPE growth. Similar investigations were carried out for GaAs–InGaAsP_var–In_0.05Ga_0.95As heterocompositions, but for the step-cooling technique. The scheme of growing of In_0.17Ga_0.83As films of GaAs substrates with several intermediate buffler InGaAsP_var layers is represented. These heterostructures were shown to have less than 10⁶ cm⁻² dislocation density on the overall area of the film (> 2 cm²).     

Germanium Incorporation in Ga1–xInxAs LPE Layers and GaAs Bulk Crystals

Atomic absorption spectroscopy (AAS) is used to determine the Ge concentration in Ga_1–xIn_xAs and GaAs. The orientation dependence of Ge incorporation in (111)A-and (111)B oriented samples has been studied. The distribution coefficients for both the orientations were determined to be k_Ge^(111)A = 2.6 · 10⁻² and k_Ge^(111B = 1.4 · 10⁻² for Ga_1–xIn_xAs with 0 ≦ x ≦ 0.13. The differences between the two orientations are explained with the aid of the band bending model. Doping gradients in thick epitaxial layers and along crystal length of polycristalline TGS-grown GaAs ingots have been investigated too. In Ga_1–xIn_xAs layers any Ge concentration gradient couldn't be observed, but in TGS compact crystals Ge concentration increases with crystal length because the melt composition changes significantly during solidification. The results are compared with those of electrical measurements.     

AlGaAs/InGaP interfaces in structures prepared by MOVPE

Al_0.3Ga_0.7As/In_1−xGa_xP structures were prepared by low-pressure MOVPE. Lattice matched and strained ones with top In_1−xGa_xP layers as well as reverse ones with top Al_0,3Ga_0,7As layers were examined. The structures were studied by photoluminescence, X-ray and atomic force microscope (AFM) methods. An additional photoluminescence peak from the Al_0.3Ga_0.7As/In_1−xGa_xP interface was observed in our samples and it was attributed to a type-II band offset. A conduction band offset of 0.121 eV was measured in the Al_0.3Ga_0.7As/In_0.485Ga_0.515P lattice-matched structure and a linear dependence of the conduction band offset on In_1−xGa_xP composition, with a zero offset in the Al_0.3Ga_0.7As/In_0.315Ga_0.685P structure, was determined. The valence band discontinuity had a nearly constant value of 0.152 eV.     

Organometallic vapor phase epitaxy growth of upright metamorphic multijunction solar cells

We demonstrate an integrated metamorphic AlGaInP/AlGaInAs/GaInAs/Ge 4 J solar cell on Ge substrate using organometallic vapor phase epitaxy (OMVPE). A step graded GaInAs buffer was grown right after the Ge subcell was formed to change the lattice constant from that of Ge to that of Ga_0.8In_0.2As lattice constant followed by a 1.14 eV Ga_0.8In_0.2As subcell, a 1.5 eV (AlGa)_0.8In_0.2As subcell, and a 1.85 eV Al_xGa_0.32?xIn_0.68P subcell. Transmission electron microscope (TEM) study shows the threading dislocation density (TDD) is about 6×10⁶ cm^?2. The X-ray diffraction reciprocal space map (RSM) shows that the structure is 100% relaxed. Bandgap dependent (Al_xGa_1?x)_0.32In_0.68P subcell performance is systematically investigated. As the Al_xGa_0.32?xIn_0.68P cell bandgap goes up to 1.9 eV, the external quantum efficiency (EQE) goes down significantly. Theoretical simulation shows that the decrease of diffusion length causes the lower EQE, which indicates the material quality degrades with the increasing Al content. Integrated 4 J solar cells are fabricated and characterized with spectral response and tested under the AM1.5D terrestrial spectrum at both 1 sun and 2000 suns.     

Thermoelectrical properties of In1‐xGaxAs and InAs crystals irradiated with fast electrons

The thermoelectric power in In_1‐xGa_xAs (x = 0,01;0,04) solid solutions and InAs crystals irradiated with fast electrons by the energy of 6 MeV and dose of 10¹⁶‐ 2 x 10¹⁷ el/cm^‐2 on the interval 80‐400 K have been investigated. It is revealed that in the all crystals the value of the thermoelectric power is decreased under irradiation that resulted from the growth of the free electron concentration to form radiation induced defects of the donor type. It has been determined that in the initial InAs after irradiation, the charge carriers scatter on optical phonons and in In_1‐xGa_xAs solid solutions they do on optical phonons and ionized impurities. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

X-ray diffraction studies of interdiffusion in InAs—GaAs powder blends

Interdiffusion in the pseudobinary system In_xGa_1−xAs is investigated by means of X-ray diffractometry of annealed powder blends. The interpretation of the experimental results by means both of the concentric spheres and concentric cubes model yields for In_0.43Ga_0.57As an activation energy of (5.39 ± 0.11) eV. This value shows that the diffusion mechanism could be a vacancy one as in the pure compounds. According to the lower atomic radius the Ga atoms within the temperature interval of 550–625 °C diffuse more easily than the In atoms.     

Optical,structural investigations and band-gap bowing parameter of GaInN alloys

We have performed a detailed investigation of the photoluminescence features taken at 2 K on a series of Ga_xIn_1−xN alloys grown by metal-organic vapour-phase epitaxy through the whole composition range. The evolution of the photoluminescence lineshape of GaInN alloys in the indium-rich region is dominated by doping effects rather than by band-gap tailing effects correlated to existence of random chemical crystal inhomogeneities. The lineshape of the photoluminescence indicates a residual electron concentration of about 10¹⁸–10¹⁹ cm⁻³ in the bulk part of the epilayers. The value we get for the bowing parameter is b=2.8 eV.     

Electron-beam microprobe analysis of epitaxial GaxIn1−xP solid solutions

Ga_xIn_1–xP epitaxial layers were investigated by means of a scanning electron microscope X-ray microanalyser. The conditions for quantitative X-ray microprobe analysis are discussed. The growth of Ga_xIn_1–xP layers is possible on GaP substrates with x > 0,8 and on GaAs with 0,3 < x < 0,6. For the deposition of layers with 0,5 < x < 0,8 two substrate materials are possible: GaAs_1–xP_x or Ga_xIn_1–xP with suitable compositions. These materials must be epitaxially deposited by step by step layer growth or by vapour phase epitaxy, respectively.     

Study of InxGa1–xP/GaAs Films Formation on the Basis of In–Ga–P Liquidus Precised Investigation

It is shown that the In–Ga–P melt which is prepared by contacting with the GaP seed becomes supersaturated in reality. Some peculiarities of In_xGa_1–xP/GaAs films formation at quasi-equilibrium conditions are described. It is observed that the saturated In–Ga–P melt dissolves the GaAs substrate when isothermally contacting if the In_xGa_1–xP equilibrium solid has the lattice parameter less than that of GaAs. As a result some InGaAsp deposit arises on the substrate. This phenomenon takes place if the In–Ga–P melt is just supercooled. This instability of the liquid-solid interface is explained on the basis of the relaxation theory of non-equilibrium liquid-solid contact which has been created by the author in previous papers.     

Shorter wavelength emission with InAs quantum dots growth directly on large bandgap quaternary (In0.68Ga0.32As0.7P0.3) barriers for high current injection efficiency

We present the growth of stacked layers of InAs quantum dots directly on high bandgap In_0.68Ga_0.32As_0.7P_0.3 (λ_g=1420 nm) barriers. The quaternary material is lattice matched to InP forming a double hetero-structure. Indium flux, number of InAs stacked layers and InGaAsP inner separation layer thickness were investigated. Photoluminescence (PL) and atomic force microscopy (AFM) analysis indicate the occurrence of gallium diffusion and the arsenic/phosphorus (As/P) exchange with the InGaAsP barriers. As a result, shorter wavelength emission is observed, making the structures suitable for telecom applications.     

The electrical and structural properties of InyGa1 ? yAs/InxAl1 ? xAs/InP quantum wells with different InAs content

In _x Al_{1 − x} As/In _y Ga_{1 − y} As/In _x Al_{1 − x} As/InP HEMT structures has been investigated with a change in the InAs molar fraction both in the quantum well and the buffer layer. The electrical parameters of the samples are measured at different temperatures. The structural parameters of the layers and the characteristics of the interfaces between them are determined by double-crystal X-ray diffraction. An increase in the Hall mobility and electron concentration, as well as in the structural quality of the samples, is observed alongside an increase in the InAs molar fraction in the quantum well. It is established that high electron mobility is retained at small (to 5%) mismatches between the buffer layer and substrate.     

InGaAsP quaternary layers on InP (100) substrate analysed by ion backscattering and channeling

In_1−xGa_xAs_yP_1−y layers LPE grown on InP(001) substrates are analysed by the Rutherford backscattering and channeling techniques. In addition to the layer thicknesses the compositions are determined from the random spectra and compared with the PL and XRD results. The high dechanneling rate of the He⁺ ions for [100] incidence is attributed to the displaced atoms in the distorted crystal lattice of these otherwise high-quality epitaxial layers. We find a characteristic value of Δ_χdist(0.1) = 2.3 ± 0.3% which must be taken into account for estimations of crystalline quality.     

Vapour Phase Epitaxy of GaxIn1−xAs in the Ga?In?HCl?AsH3?H2-System Using a Mixed Ga/In Source

The mixed crystal composition of Ga_xIn_1−xAs layers is analysed as a function of the composition of a mixed Ga/In source during VPE in the hydride system. Experimental results are compared with thermodynamic calculations. Both thermodynamics of the deposition reactions and thermodynamies of the souree reactions are considered in the calculations.