The structural,optical, and electrical properties of vacuum evaporated Cu-doped ZnTe polycrystalline thin films

We have studied the structural, optical, and electrical properties of thermally evaporated, Cu-doped, ZnTe thin films as a function of Cu concentration and post-deposition annealing temperature. X-ray diffraction measurements showed that the ZnTe films evaporated on room temperature substrates were characterized by an average grain size of 300Å with a (111) preferred orientation. Optical absorption measurements yielded a bandgap of 2.21 eV for undoped ZnTe. A bandgap shrinkage was observed for the Cu-doped films. The dark resistivity of the as-deposited ZnTe decreased by more than three orders of magnitude as the Cu concentration was increased from 4 to 8 at.% and decreased to less than 1 ohm-cm after annealing at 260°C. For films doped with 6–7 at.% Cu, an increase of resistivity was also observed during annealing at 150–200°C. The activation energy of the dark conductivity was measured as a function of Cu concentration and annealing temperature. Hall measurements yielded hole mobility values in the range between 0.1 and 1 cm²/V·s for both as-deposited and annealed films. Solar cells with a CdS/CdTe/ZnTe/metal structure were fabricated using Cudoped ZnTe as a back contact layer on electrodeposited CdTe. Fill factors approaching 0.75 and energy conversion efficiencies as high as 12.1% were obtained.     

Effects of Sn-doping on morphology and optical properties of CdTe polycrystalline films

Sn-doped CdTe polycrystalline films were successfully deposited on ITO glass substrates by close space sublimation. The effects of Sn-doping on the microstructure, surface morphology, and optical properties of polycrystalline films were studied using X-ray diffraction, scanning electron microscopy, and ultraviolet-visible spectrophotometry, respectively. The results show that the lower molar ratio of Sn and CdTe conduces to a strongly preferential orientation of (111) in films and a larger grain size, which indicates that the crystallinity of films can be improved by appropriate Sn-doping. As the molar ratio of Sn and CdTe increases, the preferential orientation of (111) in films becomes weaker, the grain size becomes smaller, and the crystal boundary becomes indistinct, which indicates that the crystallization growth of films is incomplete. However, as the Sn content increases, optical absorption becomes stronger in the visible region. In summary, a strongly preferential orientation of (111) in films and a larger grain size can be obtained by appropriate Sn-doping (molar ratio of Sn : CdTe = 0.06 : 1), while the film retains a relatively high optical absorption in the visible region. However, Sn-doping has no obvious influence on the energy gap of CdTe films.     

Nd掺杂对BiFeO3薄膜微结构和电学性能的影响

采用化学溶液方法,在LaNiO3/Si(100)衬底上生长了Nd掺杂的BiFeO3薄膜.XRD分析结果表明,随着Nd掺杂量的增加,薄膜晶格变小,Nd掺杂量为20%时,薄膜出现杂相.介电测试表明,随着Nd掺杂量的增加,介电常数和损耗减小,Nd掺杂量为2%的薄膜表现出很强的介电色散现象并出现介电损耗弛豫峰,其符合类德拜模型特征.随着Nd掺杂量增加,薄膜的漏电流减小,在低电场下,电流输运遵从SCLC模型,在高场下,电流输运遵循Poole-Frenkel模型.分析结果表明Nd掺杂对薄膜微结构和电学性能有显著影响.     

Effect of Co doping on structural, optical, electrical and thermal properties of nanostructured ZnO thin films

Nanocrystalline Zn1-x CoxO(where x varies from 0 to 0.04 in steps of 0.01) thin films were deposited onto glass substrate by the spray pyrolysis technique at a substrate temperature of 350 ℃. The X-ray diffraction patterns confirm the formation of hexagonal wurtzite structure. The crystal grain size of these films was found to be in the range of 11–36 nm. The scanning electron micrographs show a highly crystalline nanostructure with different morphologies including rope-like morphology for undoped ZnO and nanowalls and semispherical morphology for Co-doped Zn O. The transmittance increases with increasing Co doping. The optical absorption edge is observed in the transmittance spectra from 530 to 692 nm, which is due to the Co2C absorption bands corresponding to intraionic d–d shifts. The direct and indirect optical band gap energies decrease from 3.05 to 2.75 eV and 3.18 to 3.00 eV, respectively for 4 mol% Co doping. The electrical conductivity increases with increasing both the Co doping and temperature, indicating the semiconducting nature of these films. The temperature dependence thermal electromotive force measurement indicates that both undoped and Co-doped ZnO thin films show p-type semiconducting behavior near room temperature. This behavior dies out beyond 313 K and they become n-type semiconductors.     

锡掺杂对碲化镉多晶薄膜形貌和光学性能的影响

Sn-doped CdTe polycrystalline films were successfully deposited on ITO glass substrates by close space sublimation. The effects of Sn-doping on the microstructure, surface morphology, and optical properties of polycrys- talline films were studied using X-ray diffraction, scanning electron microscopy, and ultraviolet-visible spectrophotometry, respectively. The results show that the lower molar ratio of Sn and CdTe conduces to a strongly preferential orientation of （111） in films and a larger grain size, which indicates that the crystallinity of films can be improved by appropriate Sn-doping. As the molar ratio of Sn and CdTe increases, the preferential orientation of （111） in films becomes weaker, the grain size becomes smaller, and the crystal boundary becomes indistinct, which indicates that the crystallization growth of films is incomplete. However, as the Sn content increases, optical absorption becomes stronger in the visible region. In summary, a strongly preferential orientation of （111） in films and a larger grain size can be obtained by appropriate Sn-doping （molar ratio of Sn ： CdTe = 0.06 ： 1）, while the film retains a relatively high optical absorption in the visible region. However, Sn-doping has no obvious influence on the energy gap of CdTe films.     

Effect of fluorine doping on the structural,optical and electrical properties of spray deposited cadmium stannate thin films

Cadmium stannate (Cd₂SnO₄) thin films were coated on Corning 1737 glass substrates at 540 °C by spray pyrolysis technique, from the aqueous solution of cadmium acetate and tin (II) chloride precursors. Fluorine doped Cd₂SnO₄ (F: Cd₂SnO₄) thin films were prepared by adding ammonium fluoride in the range of 0–5 wt% of the total weight of cadmium acetate and tin (II) chloride in the spray solution. Thickness of the prepared films is about 300 nm. X-ray diffraction analysis of the Cd₂SnO₄ and 3 wt% F: Cd₂SnO₄ films shows the signature for the growth along (222) direction. Scanning electron micrographs showed that fluorine doping effectively modifies the surface morphology of Cd₂SnO₄ films. Average optical transmittance in the visible region (500–850 nm) for Cd₂SnO₄ is ~79% and it is increased to ~83% for 1 wt% doping concentration of the NH₄F in the solution. Fluorescence spectra of F: Cd₂SnO₄ (1 wt% and 3 wt%) exhibit peak at 601 nm. F: Cd₂SnO₄ film (1 wt%) shows mobility of ~42 cm²/V s, carrier concentration of ~9.5×10¹⁹ cm^?3 and resistivity of ~1.5×10^?3 Ω cm.     

Effects of Sb,Zn doping on structural,electrical and optical properties of SnO2 thin films

Highly transparent, low resistive pure and Sb, Zn doped nanostructured SnO₂ thin films have been successfully prepared on glass substrates at 400° C by spray pyrolysis method. Structural, electrical and optical properties of pure and Sb, Zn doped SnO₂ thin films are studied in detail. Powder X-ray diffraction confirms the phase purity, increase in crystallinity, size of the grains (90–45 nm), polycrystalline nature and tetragonal rutile structure of thin films. The scanning electron microscopy reveals the continuous change in surface morphology of thin films and size of the grains decrease due to Sb, Zn doping in to SnO₂. The optical transmission spectra of SnO₂ films as a function of wavelength confirm that the optical transmission increases with Sb, Zn doping remarkably. The optical band gap of undoped film is found to be 4.27 eV and decreases with Sb, Zn doping to 4.19 eV, 4.07 eV respectively. The results of electrical measurements indicate that the sheet resistance of the deposited films improves with Sb, Zn doping. The Hall measurements confirm that the films are degenerate n-type semiconductors.     

Effect of doping concentration on the grain boundary trap density and threshold voltage of polycrystalline SOI MOSFETs

PolySOI MOSFETs have been fabricated on undoped and doped polycrystalline silicon films and characterized to study the effect of doping on grain boundary passivation. The grain boundary trap density (N_ST) and threshold voltages have been extracted experimentally to evaluate the extent of grain boundary passivation by the dopants. Charge sheet model based on the effective doping concentration has been employed to analytically estimate the threshold voltages using the experimentally determined grain boundary trap density and grain size (L_g) as model parameters. The variation of threshold voltages with increasing doping concentration for the range of N_A ? (N_ST/L_g) has been studied both by simulation and experiments and the results are presented. Analytically estimated threshold voltages and experimental results show that the threshold voltage falls with increase in the dopant concentration and that this effect is indeed due to the reduction in N_ST as a result of the grain boundary passivation by the dopants.     

Cu掺杂CaCu_3Ti_4O_(12)陶瓷的介电性能和晶界特征

采用传统的固相反应工艺制备了Cu掺杂的CaCu3Ti4O12(Cu-CCTO)陶瓷。采用Schottky热电子发射模型研究了其晶界特征。研究了保温时间对Cu-CCTO陶瓷的介电性能和晶界特征的影响。结果表明:保温时间从1 h延长到30 h,Cu-CCTO陶瓷在100 kHz下的介电损耗保持在0.135,相对介电常数由3 600增至20 000以上。随着保温时间的延长,Cu-CCTO陶瓷的I-V非线性系数由1.8增至3.37,但击穿电场强度却由1 500 V/cm降至约700 V/cm。随着保温时间的延长,Cu-CCTO陶瓷的势垒高度和耗尽层宽度均增加。     

Li~+对ZnO压敏陶瓷电性能和能带结构的影响

采用氧化物固相合成法,制备了掺Li2CO3的ZnO压敏陶瓷。研究了掺Li2CO3量对ZnO压敏陶瓷电性能和能带结构的影响。结果表明:当x(Li2CO3)从0增加到0.50%时,压敏电位梯度从529V/mm增大到2170V/mm。XRD测试发现,掺Li2CO3并未出现新相结构。晶界势垒高度揭示,ZnO晶粒尺寸的迅速减小是压敏电位梯度急剧增高的主要原因。Li+置换Zn2+,将会在禁带中价带的顶部形成附加的受主能级,使能带发生畸变。     

Effect of si—h and n—h bonds on electrical properties of plasma deposited silicon nitride and oxynitride films

Strong correlations were observed between the improvement in the metal-insulator-semiconductor (MIS) (aluminum-nitride-semiconductor) electrical properties of plasma deposited silicon nitride and oxynitride films and their (Si—H/N—H) bonding ratios in the film bulk. Total hydrogen concentration and spin density of all deposited films decreased with post-deposition annealing. Films with more Si—H bonds and stable (Si—H/ N—H) ratios generally have lowerV _fb shift, less positive trap charge and higher breakdown dielectric strength. Silicon oxynitride films with refractive indices of 1.75-1.80, as-deposited and after annealing in forming gas (10% H₂ + 90% N₂) at various temperatures, were found to have stable (Si—H/N—H) bonding ratios, lower silicon dangling bond density, and better MIS electrical properties compared to other plasma deposited nitride and oxynitride films.     

不同离子比的锰钴镍薄膜材料结构和电学性能

采用磁控溅射法分别制备了不同组分的Mn-Co-Ni-O(MCNO)薄膜材料。通过对材料结构分析,发现在Mn离子数目不变的情况下,随着Co离子的增加,晶粒尺寸逐渐增大,且晶格常数先增大后减小;在Co离子数目不变的情况下,随着Mn离子的增加,薄膜的择优生长晶面由(311)不晶面向(400)晶面转变。对电学性能测试进行分析,可知薄膜材料既有Mn离子的导电机制,也有Co离子的导电机制;Mn_1.2Co_1.5Ni_0.3O₄具有最低的电阻率(235 Ω.cm),具有最高的室温负温度电阻系数︱a₂₉₅︱(4.7%.K_-1)值。     

Influence of heat treatment on the structural,optical and electrical properties of Cd20Sn10Se70 thin films

The effect of annealing temperature (T_a) on the structural, optical, and electrical properties of thermally evaporated Cd₂₀Sn₁₀Se₇₀ thin films has been investigated. Differential Thermal Analysis (DTA) was used to determine the glass transition temperature (T_g) of the prepared alloy. X-ray diffraction studies showed that the as-deposited film and the films that were annealed at T_a<T_g are of low crystallinity. On annealing above T_g, these films showed a polycrystalline nature. The surface morphology and microstructure of as-deposited and annealed films have been examined by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Their optical constants were calculated from the transmittance measurements in the range 200–2500 nm. The dispersion of refractive index was analyzed in terms of the single-oscillator Wemple-Di Domenico model. Analysis of the optical absorption data indicates that the optical band gap E_g of these films obeys Tauc׳s relation for the allowed direct transition. The optical band gap E_g as well as the activation energy for the electrical conduction ∆E were found to increase with increase of annealing temperature up to T_g, whereas above T_g there is a remarkable decrease in both E_g and ∆E. The obtained results were interpreted in terms of the Mott-Davis model and amorphous–crystalline transformation.     

Influence of Mn doping on structural,optical and electrical properties of CdO thin films prepared by cost effective spray pyrolysis method

Transparent and conducting cadmium oxide (CdO) and manganese doped CdO (Mn: CdO) thin films were deposited using a low cost spray pyrolysis method on the glass substrate at 300 °C. For Mn doping, various concentrations of manganese acetate (1–3 wt%) was used in the spraying precursor solution. The structural, electrical and optical properties of CdO and Mn: CdO films were investigated using X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), UV–vis and Hall measurement. X-ray diffraction study reveals that the CdO and Mn: CdO films are possessing cubic crystal structures. SEM and AFM studies reveal that the grain size and roughness of the films are increased with increasing Mn doping concentration. Optical transmittance spectra of the CdO film decreases with increasing doping concentration of manganese. The optical band gap of the films decreases from 2.42 eV to 2.08 eV with increasing concentration of manganese. A minimum resistivity of 1.11×10⁻³ Ω cm and maximum mobility of 20.77 cm² V⁻¹ s⁻¹ is achieved for 1 wt% of manganese doping.     

Effect of thickness on the structural,optical and electrical properties of RF magnetron sputtered GZO thin films

Gallium-doped zinc oxide (GZO) thin films with very high conductivity and transparency were successfully deposited by RF magnetron sputtering at a substrate temperature of 400 °C. The dependence of the film properties over the thickness was investigated. X-ray diffraction (XRD) results revealed the polycrystalline nature of the films with hexagonal wurtzite structure having preferential orientation along [001] direction normal to the substrate. The lowest resistivity obtained from electrical studies was 5.4×10⁻⁴ Ω cm. The optical properties were studied using a UV–vis spectrophotometer and the average transmittance in the visible region (400–700 nm) was found to be 92%, relative to the transmittance of a soda–lime glass reference for a GZO film of thickness 495 nm and also the transparency of the films decreases in the near IR region of the spectra. The mobility of the films showed a linear dependence with crystallite size. GZO film of thickness 495 nm with the highest figure of merit indicates that the GZO film is suitable as an ideal transparent conducting oxide (TCO) material for solar cell applications.     

Effect of annealing temperature on structural,electrical and optical properties of spray pyrolytic nanocrystalline CdO thin films

Nanocrystalline CdO thin films were prepared onto a glass substrate at substrate temperature of 300 °C by a spray pyrolysis technique. Grown films were annealed at 250, 350, 450 and 550 °C for 2.5 h and studied by the X-ray diffraction, Hall voltage measurement, UV-spectroscopy, and scanning electron microscope. The X-ray diffraction study confirms the cubic structure of as-deposited and annealed films. The grain size increases whereas the dislocation density decreases with increasing annealing temperature. The Hall measurement confirms that CdO is an n-type semiconductor. The carrier density and mobility increase with increasing annealing temperature up to 450 °C. The temperature dependent dc resistivity of as-deposited film shows metallic behavior from room temperature to 370 K after which it is semiconducting in nature. The metallic behavior completely washed out by annealing the samples at different temperatures. Optical transmittance and band gap energy of the films are found to decrease with increasing annealing temperature and the highest transmittance is found in near infrared region. The refractive index and optical conductivity of the CdO thin films enhanced by annealing. Scanning electron microscopy confirms formation of nano-structured CdO thin films with clear grain boundary.     

Influence of alloy composition,substrate temperature,and doping concentration on electrical properties of Si-doped n-Alx Ga1−x As grown by molecular beam epitaxy

Capacitance and Hall effect measurements in the temperature range 10-300 K were performed to evaluate the deep and shallow level characteristics of Si-doped n-Al_xGa_-xAs layers with 0 × 0.4 grown by molecular beam epitaxy. For alloy compositions × 0.3 the overall trap concentration was found to be less than 10⁻² of the carrier concentration. In this composition range the transport properties of the ternary alloy are comparable to those of n-GaAs:Si except for lower electron mobibities due to alloy scattering. With higher Al content one dominant electron trap determines the overall electrical properties of the material, and in n-Al_0.35Ga_0.65As:Si the deep trap concentration is already of the order of the free-carrier concentration or even higher. For the composition × = 0.35 ± 0.02 the influence of growth temperature and of Si dopant flux intensity on the deep trap concentration, on shallow and deep level activation energy, and on carrier freeze-out behaviour was studied and analyzed in detail. Our admittance measurements clearly revealed that the previously assumed deepening of the shallow level in n-Al_x Ga_1-x As of alloy composition close to the direct-indirect cross-over point does actuallynot exist. In this composition range an increase of the Si dopant flux leads to a reduction of the thermal activation energy for electron emission from shallow levels due to a lowering of the emission barrier by the electric field of the impurities. The increasing doping flux also enhances the concentration of the dominant electron trap strongly, thus indicating a participation of the dopant atoms in the formation of deep donor-type (D,X) centers. These results are in excellent agreement with the model first proposed by Lang et al. for interpretation of deep electron traps in n-Al_x Ga_1-x grown by liquid phase epitaxy.     

The effect of annealing on the physical properties of thermally evaporated CuIn2n+1S3n+2 thin films (n=0, 1, 2 and 3)

In this study, the annealing effect on structural, electrical and optical properties of CuIn_2n+1S_3n+2 thin films (n=0, 1, 2 and 3) are investigated. CuIn_2n+1S_3n+2 films were elaborated by vacuum thermal evaporation and annealed at 150 and 250 °C during 2 h in air atmosphere. XRD data analysis shows that CuInS₂ and CuIn₃S₅ (n=0 and 1) crystallize in the chalcopyrite structure according to a preferential direction (112), CuIn₅S₈ and CuIn₇S₁₁ (n=2 and 3) crystallize in the cubic spinel structure with a preferential direction (311). The optical characterization allowed us to determine the optical constants (refractive indexes 2.2–3.1, optical thicknesses 250–500 nm, coefficients of absorption 10⁵ cm^?1, coefficients of extinction <1, and the values of the optical transitions 1.80–2.22 eV) of the samples of all materials. We exploited the models of Cauchy, Wemple–DiDomenico and Spitzer–Fan for the analysis of the dispersion of the refractive index and the determination of the optical and dielectric constants.     

Optical and electrical properties of epitaxial (Mg,Cd)xZn1−xO, ZnO, and ZnO:(Ga,Al) thin films on c-plane sapphire grown by pulsed laser deposition

A consistent set of epitaxial, n-type conducting ZnO thin films, nominally undoped, doped with Ga or Al, or alloyed with Mg or Cd, was grown by pulsed laser deposition (PLD) on single-crystalline c-plane sapphire (0 0 0 1) substrates, and characterized by Hall measurement, and UV/VIS optical transmission spectroscopy.The optical band gap of undoped ZnO films at nearly 3.28 eV was shifted by alloying with Mg up to 4.5 eV and by alloying with Cd down to 3.18 eV, dependent on the alloy composition. In addition, highly doped ZnO:Al films show a blue-shifted optical absorption edge due to filling of electronic states in the conduction band.The Hall transport data of the PLD (Mg,Zn,Cd)O:(Ga,Al) thin films span a carrier concentration range of six orders of magnitude from 3 × 10¹⁴ to 3 × 10²⁰ cm⁻³, which corresponds to a resistivity from 5 × 10⁻⁴ to 3 × 10³ Ω cm. Structurally optimized, nominally undoped ZnO films grown with ZnO nucleation and top layer reached an electron mobility of 155 cm²/V s (300 K), which is among the largest values reported for heteroepitaxial ZnO thin films so far.Finally, we succeeded in combining the low resistivity of ZnO:Ga and the band gap shift of MgZnO in MgZnO:Ga thin films. This results demonstrate the unique tunability of the optical and electrical properties of the ZnO-based wide-band gap material for future electronic devices.     

Sn掺杂对(In0.95-xSnxFe0.05)2O3薄膜的结构、电学及磁特性的影响

我们利用脉冲激光沉积的方法制备了一系列(In0.95-xSnxFe0.05)2O3 (x=0~0.09)薄膜,并在其中发现了室温铁磁性。X射线衍射结果表明锡与铁离子已掺入氧化铟晶格。随着锡的掺入,样品内的载流子浓度得到了很大的提高,但相应的铁磁性却几乎没有变化。我们认为氧空位相关的束缚磁极化子模型能够跟好的解释我们的铁掺杂氧化铟薄膜中的铁磁耦合的机制,而载流子传导的RKKY相互作用则不适用于这一系统。