2～4μm波长的InAsPSb异质结激光管材料的液相外延

采用液相外延方法,生长出外延层与衬底之间的失配度△α/α≤1.6×10-3界面平直、组分恒定的InAsPSb/InAs外延晶体.单异质结外延层,得到了3.09μm波长的激光输出,双异质结外延片也得到了较好的伏-安特性曲线.     

硅基锗薄膜的异质外延生长及其在光电子器件中的应用

准直接带隙的锗,其禁带宽度小,吸收系数大,迁移率高,更重要的是,它能与硅微电子工艺兼容,在硅基光电集成中得到了广泛的研究和应用．文章综述了硅基锗薄膜的异质外延生长及其在光电子器件（特别是长波长光电探测器和激光器）应用上的进展;介绍了在硅衬底上异质外延生长锗薄膜的缓冲层技术,如组分变化的SiGe缓冲层技术、选区外延技术和低温技术;讨论了硅基锗薄膜光电探测器的性能与结构的关系以及发展趋势;分析了张应变和n型掺杂对锗光电性质的影响;展望了硅基锗薄膜单片集成和电抽运激光器的前景．     

异质外延生长钙钛矿结构氧化物薄膜

影响直接外延生长氧化物薄膜的因素有很多,最主要的是保证氧化物薄膜的正确成相和在单晶衬底上成核．直接外延生长时,衬底温度影响到薄膜的成相．衬底温度还影响薄膜的生长动力学,并因此影响薄膜的外延生长取向．由于薄膜是首先在衬底表面成核、成相并生长的,因此衬底材料晶格的影响是不容忽视的．衬底材料（或异质外延材料）与薄膜的相互作用是影响外延生长的最直接因素,而晶格常数失配会造成薄膜样品中存在应力并影响样品性质．利用脉冲激光淀积法,我们成功地外延生长了ＹＢａ２Ｃｕ３Ｏ７超导薄膜、Ｓｒ０．５Ｂａ０．５ＴｉＯ３铁电介电薄膜、Ｌａ０．７Ｃａ０．３ＭｎＯ３铁磁巨磁电阻薄膜、Ｌａ０．５Ｓｒ０．５ＣｏＯ３导电薄膜等多种具有钙钛矿结构的氧化物功能薄膜．以这些钙钛矿结构氧化物薄膜的外延生长为例,本文讨论影响氧化物薄膜异质外延生长的因素     

原子层外延及其进展

近十年来发展起来的原子层外延技术(ALE)实际上是对现有气相外延技术(蒸发、沉积、分子束外延、氯化物外延和MOCVL)的一种改进.它以固体衬底表面的化学反应为基础.因此用ALE方法可以获得精确膜厚、符合化学比、高化学稳定性和结构完整而均匀的化合物薄膜.本综述介绍了ALE的工作原理、特点及其进展概况.指出,ALE方法除了用于研制成功性能优良的太面积薄膜电致发光显示器以外,近年来还在单晶衬底上生长出突变异质结、多量子阱结构和超晶格,从而为研究低维数半导体薄层结构提供了一个媒介.     

晶体相场法研究衬底小倾角对界面形态演化的影响

采用晶体相场模型模拟了异质外延过程中不同衬底倾角时外延层的生长过程,研究了较大晶格错配度(??10.0)时不同衬底倾角下外延层的生长形貌和界面平均厚度,分析了晶格失配和衬底倾角对外延层的影响。研究表明,在错配度较大时,随着衬底倾角的增大,外延层由层状生长(0°与1°)转变为岛状生长(2°)。     

液相外延生长超薄有源层Al_xGa_（1－x）As／GaAs分别限制双异质结构激光器

报道超薄有源层ＡｌｘＧａ１－ｘＡＳ／ＧａＡｓ分别限制双异质结构半导体激光器的液相外延的过程。讨论了过冷度、生长温度和降温速率等对生长速率的影响。扫描电镜测得生长温度为６８０℃时，ＧａＡｓ有源层厚度可低至２５～３５ｎｍ。宽接触分别限制双异质结构ＬＤｓ的室温连续阈值电流密度多在７００～８００Ａ／ｃｍ２。     

GaAs-Ga_xAl_(1-x)As双异质结激光器的分子束外延生长

本文报道分子束外延生长GaAs-Ga_xAl_(1-x)As双异质结激光器的生长条件.其中包括低温生长的温度-时间循环,欧姆接触电极层的原位生长以及生长后的退火等程序.实验表明,生长过程中采用高纯度的源材料,氮化硼的泻流盒以及生长系统中的低温泵等对降低器件的阈电流密度,改善激光器的光电性能起到重要作用.     

晶体相场法模拟异质外延过程中界面形态演化与晶向倾侧

采用晶体相场模型研究了异质外延过程中失配应变与应力弛豫对外延层界面形态演化的影响, 并对由衬底倾角引起的外延层晶向倾侧进行了分析.研究结果表明: 在有一定倾角的衬底晶体上进行外延生长时,若衬底和外延层之间失配度较大 (ε>0.08),外延层中弹性畸变能会以失配位错的形式释放, 最终薄膜以稳定的流动台阶形式生长且外延层的晶向倾角与衬底倾角呈近似线性关系. 而当衬底和外延层之间失配度较小(ε<0.04)不足以形成失配位错时, 外延层中弹性畸变能会以表面能的形式释放,最终使薄膜以岛状形态生长. 在高过冷度条件下,衬底倾角和失配度较大时,衬底和外延层之间会形成由大量位错规则排列而成的小角度晶界从而显著改变外延层的生长位向.     

GS-MBE生长的GaP/Si的XPS研究

利用X射线光电子能谱(XPS)深度剖析方法对气体源分子束外延(GS-MBE)生长的GaP/Si异质结构进行了详细的分析.其结果表明:(1)外延层内Ga、P光电子峰与GaP相相符,且组份分布均匀,为正化学比GaP.(2)在不同富PH₃流量条件下生长的样品,其表面富P量稍有不同,而GaP外延层内的测试结果相同.界面也未见有P的富集.(3)XPS剖析至GaP/Si界面附近,随外延层界面向衬底过渡,Si2p光电子峰向高结合能方向移动,且其结合能高于原衬底p型Si,接近于n型Si.但Ga、P光电子峰未发现有明显能移.(4)在XPS检测限内,外延层内和界面都未见有C、O等沾污.这一研究表明:无污染的本底超高真空、相对过剩的富₃生长环境、成功的Si衬底清洗方法等措施保证了GS-MBE生长出正化学比GaP/Si外延异质结构.     

p型半导体金刚石膜的磁阻效应

在p型硅(100)衬底上,采用衬底负偏压微波等离子体CVD方法进行了p型异质外延金刚石膜的生长.用O₂等离子体刻蚀技术将金刚石膜刻蚀成长条形,利用四探针法在0—5T的磁场范围内测量了样品的磁阻.实验结果表明,p型异质外延金刚石膜可以产生较大的磁阻.在Fuchs-Sondheimer(F-S)薄膜理论的基础上考虑晶格散射、杂质散射和表面散射,通过求解Boltzmann方程,利用并联电阻模型研究了p型异质外延金刚石膜的磁阻效应,给出了磁阻和金刚石膜厚度、迁移率、空穴密度及磁场的关系.讨论了表面散射和价带形变对p型异质外延金刚石膜磁阻的影响,初步解释了p型异质外延金刚石膜产生较大磁阻的原因 关键词： 金刚石膜 异质外延 磁阻效应 电导率     

Single-step growth of InGaAsP/InP laser array on patterned InP substrate

Arrays of five InGaAsP/InP single mode junction-defined buried stripe heterostructure lasers are described. The laser arrays were grown on multi-channeled InP substrate by single-step liquid phase epitaxy. The buried double heterostructure and the lateral current confining structure were formed in the same growth process. InGaAsP layer growth is dominated by the preferred orientation, with (1 0 0) growth favored over other directions. As a result of low-temperature single-step growth, the device yield is high. These laser arrays are characterized by output power close to 0.6 W, high quantum efficiency, symmetrical far-field patterns and excellent linearity of the light–current curve. Stable single transverse mode operation obtained up to 600 mW emitted power.     

Channeled substrate window twin stripe GaAs/GaAlAs visible laser: Fabrication and steady state analysis

GaAs/GaAlAs high power window stripe lasers are developed with straight ac-tive layer in region adjacent to facet and curved active layer in central part.Only one-step liq-uid-phase epitaxy(LPE)growth is used in the fabvrication to from two internal current patheslaterally,allowing of a very simple fabrication process.Optical coupling from two stimulatingregions makes less beam divergence.The steady state analysis of such laser structure agreewell with experimental results.     

Channelled substrate window twin stripe GaAs/GaAIAs visible lasers: fabrication and steady-state analysis

GaAs/GaAIAs high-power window stripe lasers have been developed with a uniform active layer in the region adjacent to the device facets and with a curved active layer in the central region. A single-step liquid-phase epitaxy growth is used in the fabrication process to form two internal lateral current paths, so allowing for a very simple fabrication process. The optical coupling between the two stimulation emission regions reduces the beam divergence. The steady-state analysis of such a laser structure, including heating effects, agrees well with experimental results.     

The Epilift technique for Si solar cells

We present an overview of the Epilift technique, which allows the fabrication of single-crystal silicon films, suitable for photovoltaic purposes. Epitaxial layers are grown by liquid phase epitaxy on partially masked, single-crystal silicon substrates. The layers are detached from the substrate by selective chemical or electrochemical etching, allowing the substrate to be re-used. Epilayers grown on (100) substrates display highly textured surfaces as well as narrow overgrowth widths of the epitaxial layer over the oxide, making them particularly suitable for photovoltaic devices. Received: 1 March 1999 / Accepted: 28 March 1999 / Published online: 1 July 1999     

Elimination of Crystallographic Wing Tilt of Canti-Bridged Epitaxial Laterally Overgrown GaN Films by Optimizing Growth Procedure

Canti-bridged epitaxial lateral overgrowth （CBELO） of GaN is performed by metalorganic chemical vapour deposition （MOCVD） on maskless V-grooved sapphire substrates prepared by wet chemical etching with different mesa widths. The wing tilt usually observed in ELO is not found in the CBELO GaN with wide mesa widths, while it can be detected obviously in the GaN with narrow mesa widths. The wing tilt of CBELO GaN grown on a grooved sapphire substrate with narrow mesa can be controlled by adjusting the thickness of the nucleation layer. The dependence of the wing tilt on the nucleation layer thickness is studied. Cross-sectional scanning electron microscopy is used to characterize the geometry of the wing regions, and double crystal x-ray diffraction is used to analyse the structural characteristics and to measure the magnitude of the crystalline wing tilt. It is found that the crystalline wing tilt can be eliminated completely by first growth of a thin nucleation GaN layer then the CBELO GaN. Possible reason and the origin of the wing tilt in CBELO GaN films are also discussed.     

GaAs均匀点状结构的分子束外延图形生长

报道了在(311)A腐蚀图形衬底上，用分子束外延(MBE)生长高度规则的三种点状结构的实验研究.样品表面的原子力显微镜和剖面的扫描电子显微镜测试结果表明，在不同尺寸的方形凹面腐蚀图形区域，原凹面之间形成了沿［233］晶向不完全和完全收缩的尖角形点状外延结构；而在方形台面腐蚀图形区域，台顶面之间形成了沿［233］方向收缩的脊形点状结构.分析认为这些均匀有序的三角形点状结构的形成是由非平面(311)A衬底上生长各向异性导致的必然结果，而构成这些点结构的晶面取向与原图形的取向相关.低温阴极荧光谱测试结果清晰地表 关键词：     

GalnAsP-InP double-heterostructure lasers

GaInAsP-InP double-heterostructure lasers which are the most promising optical sources for the long wavelength region have been investigated. In the crystal growth, it was found that the liquidus and solidus isotherms are affected by the orientation of InP source and substrate crystals in the liquid phase epitaxial growth of GaInAsP alloys. The unit cell of the GaInAsP epitaxial layer is tetragonally deformed due to the interface lattice misfit such that the lattice constant parallel to the wafer surface is invariant across the interfaces in the GaInAsP-InP wafers. Two kinds of stripe lasers, planar stripe and buried lasers, have been fabricated by use of GaInAsP cap layer for good p-type contact. The planar stripe lasers of 10,15 and 20 m wide stripe operated in fundamental-transverse mode with 20–30% differential external efficiencies per facet. The 15 m wide stripe laser showed good mode characteristics to operate in a fundamental-transverse mode up to the cw output power of 22 mW per facet and in a single longitudinal mode over a wide range of currents. The buried stripe laser operated in a fundamental-transverse mode with the threshold current as low as 30 mA by making the stripe width narrower than 2 (m. The laser succeeded in cw operation at 100 °C because of its low threshold current and low thermal resistance.The authors would like to thank K. Noda, N. Kuroyanagi and Y. Furukawa for their encouragement. Thanks are also due to H. Kano for permission to use his results of buried stripe lasers prior to publication, and S. Ando for his technical assistance.     

1.5μm波长n-p-n型InGaAsP-InP晶体管激光器材料外延生长

基于器件模拟仿真,设计了一种1.5μm波长InGaAsP-InP晶体管激光器材料外延结构.其多量子阱有源区置于基区非对称波导中.仿真结果显示该外延结构能够获得较好的光场限制和侧向电流限制.对该材料MOCVD生长研究表明,基极重掺杂接触层中Zn2+扩散将导致量子阱严重退化.通过对其扩散过程的模拟仿真,采用平均掺杂浓度为1×1018cm-3的梯度掺杂,有效地抑制了Zn2+向量子阱区的扩散.所获得的外延材料在1.51μm呈现较强的PL峰值,具有卫星峰清晰的XRD谱.     

Comparison of two kinds of AlGaAs terraced substrate inner stripe superluminescent diodes

We report on two kinds of AlGaAs terraced substrate inner stripe superluminescent diodes: those with SiO _x antireflection coatings, and those with unpumped absorbing regions. The devices were fabricated by one-step liquid phase epitaxy. Both kinds of devices suppress stimulating oscillation effectively. The characteristics of the diodes with antireflection coatings are better than those with unpumped absorbing regions. The spectral width of the diodes with antireflection coatings is over 23 nm, the output power is about 7 mW, the modulation depth is less than 5%, and the horizontal divergence angle is smaller than 10–15°.     

Fast Liquid Phase Epitaxial Growth for Perovskite Single Crystals

Semiconductors grown by the solution-processed method have shown low-cost,facile fabrication process and comparable performance.However,there are many reasons why it is difficult to achieve high quality films.For example,lattice constant mismatch is one of the problems when photovoltaic devices made of organ metallic perovskites.In this work,MAPbBr^{MA=CH3NH3^+}perovskites single crystals grown on the surface of MAPbBr2.5 CI0.5 perovskites single crystals via liquid epitaxial growth method is demonstrated.It is found that when the lattice constants of the two perovskite single crystals are matched,another crystal can be grown on the surface of one crystal by epitaxial growth.The whole epitaxy growth process does not require high heating temperature and long heating time.X-ray diffraction method is used to prove the lattice plane of the substrate and the epitaxial grown layer.A scanning electron microscope is used to measure the thickness of the epitaxial layer.Compared with perovskite-based photodetectors without epitaxial growth layer,perovskite-based photodetectors with epitaxial growth layer have lower dark current density and higher optical responsibility.