Synthesis and Raman analysis of 1D-ZnO nanostructure via vapor phase growth

1D-nanostructural zinc oxide (ZnO) with different shapes have been synthesized on p-type Si(1 0 0) and glass substrates via vapor phase growth by heating pure zinc powder at temperatures between 480 and 570 °C. The different ZnO nanostructures depend on the substrates and the growth temperatures. Scanning electron microscopy and X-ray diffraction revealed that a well-aligned nanowires array, which are vertical to the substrate of Si(1 0 0) with 18 sides on their heads, but six sides on their stems, has been formed at 480 °C. Raman study on the ZnO nanostructures shows that the coupling strength between electron and phonon determined by the ratio of the second- to the first-order Raman scattering cross-sections declines with decreasing diameter of the nanowires. However, a little changes of the coupling strength in terms of the width of the nanobelts have been observed.     

Local plasmon excitations in one-dimensional array of metal nanowires for sensor applications

Optical properties of a one-dimensional periodic array of subwavelength metal nanowires in the regime of local plasmon excitation are investigated experimentally and theoretically. Both gas and liquid sensing by one-dimensional gold nanowires on a glass substrate produced by holographic lithography are demonstrated experimentally. The obtained spectral sensitivity of a local plasmon sensor to the refractive index of the environment is found comparable to that of a surface plasmon polariton sensor based on the grating coupler effect. The influence of nanowire shape on spectral sensitivity is studied theoretically in a differential formalism framework using a curvilinear coordinate transformation for triangular, trapezoidal, and rectangular cross sections of the nanowires. For nanowires with trapezoidal cross section, theoretical calculations for the spectral sensitivity to variation of the refractive index of the environment agree well with experimental data.     

高取向As掺杂ZnO纳米线阵列的制备与表征

在不采用任何金属催化剂的条件下,运用化学气相沉积法,在Si(100)衬底上制备出高取向的As掺杂ZnO纳米线阵列.样品的X射线衍射(XRD)谱显示获得了单一取向的衍射峰,表明样品具有较好的结晶质量.场发射扫描电镜(FE-SEM)观察表明,As掺杂ZnO纳米线阵列具有均一的直径和长度,其顶部和根部直径分别为70 nm和1...     

STM and LEED observations of erbium silicide nanostructures grown on Si(1 0 0) surface: atomic-scale understandings

In this work, erbium silicide is grown on the Si(1 0 0) surface by depositing Er onto the substrate and annealing at 600–700 °C. Many nanowires of Er silicide are formed with lengths in the range 10–100 nm. The formation and evolution of this nanostructure are investigated at atomic scale directly with scanning tunneling microscopy and low-energy electron diffraction. The direction of these nanowires is found perpendicular to that of Si dimer rows. It is shown that Er coverage and annealing temperature have an effect on the formation of nanowires. On the surface between nanowires, new (5×2) and c(5×4) reconstructions are observed, giving an implication to understand the growth behaviors of Er silicide on Si(1 0 0) surface.     

13.4nm软X射线干涉光刻透射光栅的优化设计

基于严格的矢量耦合波方法,结合纳米级光栅实际制作工艺,定量分析了在13.4 nm软X射线(TE偏振)正入射条件下,光栅材料、厚度、占空比、梯形浮雕底角大小等因素对光栅一级衍射效率的影响.结果表明,在此波段处,Si3N4、Cr、Au浮雕的相位作用对光栅衍射起重要影响,其中非金属材料Si3N4比金属材料Cr、Au的相位作用更明显.最后优化得到了用Si(或Si3N4)做衬底的si3N4、Cr、Au光栅,分析结果显示,其一级衍射效率优于目前用于13.4 nm软X射线干涉光刻的Cr、Si3N4复合光栅.     

硅(001)图形衬底上锗硅纳米线的定位生长

纳米线的定位生长是实现纳米线量子器件寻址和集成的前提.结合自上而下的纳米加工和自下而上的自组装技术,通过分子束外延生长方法,在具有周期性凹槽结构的硅(001)图形衬底上首先低温生长硅锗薄膜然后升温退火,实现了有序锗硅纳米线在凹槽中的定位生长,锗硅纳米线的表面晶面为(105)晶面.详细研究了退火温度、硅锗的比例及图形周期对纳米线形成与否,以及纳米线尺寸的影响.     

Growth and characterization of high-quality GaN nanowires by ammonification technique

GaN nanowires were successfully synthesized at high quality and large yield on Si (1 1 1) substrate through ammoniating Ga₂O₃/BN films deposited by radio frequency (RF) magnetron sputtering system. X-ray diffraction (XRD), Fourier transformed infrared spectra (FTIR) and selected-area electron diffraction (SAED) confirm that the as-synthesized nanowires are of a hexagonal GaN with wurtzite structure. Scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM) reveal that the nanowires have a straight and smooth curved structure with extremely uniform diameter of about 60 nm, which is helpful to the application of GaN nanowires. The present results demonstrate that the BN is a very important intermedium in the growth of GaN nanowires by this method.     

High-quality GaN nanowires synthesized using a CVD approach

High-quality GaN nanowires were synthesized on a large-area Si substrate by direct reaction of gallium with ammonia using InCl₃ as a catalyst. The morphology and microstructure of the resulting products were characterized using a field-emission scanning electron microscope (SEM), a high-resolution transmission electron microscope, and X-ray diffraction (XRD). XRD and electron diffraction revealed that the nanowires are of a hexagonal GaN phase with the wurtzite structure. The SEM study showed that the nanowires are straight and have a smooth morphology with lengths up to 500 μm. The present results reveal that InCl₃ is an optimal catalyst in GaN nanowire production. Received: 2 April 2002 / Accepted: 12 April 2002 / Published online: 19 July 2002     

Thermodynamic driving forces governing assembly of disilicide nanowires

Driving forces are investigated for assembling low dimensional, metallic, erbium and dysprosium disilicide nanowires on Si(001), using both scanning probe microscopy and density functional theory. Side-by-side comparison between emulated and measured scanning tunneling microscopy images allows establishment of reliable atomic models for complex adatom surface reconstructions of Er/Si(001) and Dy/Si(001) that are precursors to high aspect ratio disilicide nanowires. Peculiar surface reconstructions and relaxation of Si bonds are identified as the key factors for nucleation of these disilicide nanowires in parallel arrays on vicinal Si(001). Stable nanowire widths and heights are calculated with predicted atomic models that are consistent with experimental observations. A clear understanding of the nanowire–substrate interface is determined by correlating adatom reconstruction patterns with nanowire formation that is imperative to the development of unique procedures for massive fabrication of monodisperse nanosystems.     

Eu掺杂Si纳米线的光致发光特性

利用Si(111)衬底, 以Au-Al为金属催化剂, 基于固-液-固生长机理, 在温度为1100℃, N₂气流量为1.5 L/min、生长时间为30–90 min等工艺条件下, 制备了直径约为100 nm、长度为数微米的高密度、均匀分布、大面积的Si纳米线(～10¹⁰ cm^-2). 对Si纳米线进行了Eu掺杂, 实验研究了不同长度的Si纳米线以及不同掺杂温度、掺杂时间等工艺参数对Eu离子红光发射的影响, 利用扫描电子显微镜和X射线衍射仪对Si纳米线表面形貌和Eu掺杂后Si纳米线的结晶取向进行了测量和表征; 室温下利用Hitachi F-4600型荧光分光光度计对样品的激发光谱和发射光谱进行了测试和分析. 结果表明: 在Si纳米线生长时间为30 min、掺杂温度为1000℃、 最佳激发波长为395 nm时, 样品最强荧光波长为619 nm (⁵D₀→⁷F₂); 同时, 还出现了576 nm (⁵D₀→⁷F₀), 596 nm (⁵D₀→⁷F₁), 658 nm (⁵D₀→⁷F₃)和708 nm (⁵D₀→⁷F₄)四条谱带.     

A study of the interface roughness effect in Si nanowires using a full 3D NEGF approach

The effect of interface roughness in ballistic Si nanowires is investigated using a full 3D non-equilibrium Green's Functions formalism. The current density, the electron density and the transmission function are calculated for nanowires with different interface roughness configurations. Interface roughness is randomly generated using an exponential autocorrelation function. The interface roughness profile in nanowires with 2 nm diameter and 6 nm length is reflected in the current density landscape showing macroscopic 3D patterns. These macroscopic patterns affect the transmission probability causing resonances coming from the constrictions in the channel. The shape of the electron density in cross-sections along the wire follows the distortion of electron transversal wave function.     

Nanostructure size evolution during Au-catalysed growth by carbo-thermal evaporation of well-aligned ZnO nanowires on (100)Si

We report the structural and morphological properties of well-aligned ZnO nanowires grown at 750 °C on Au-deposited and annealed (100)Si substrates using carbo-thermal evaporation. As-grown nanowires are made of wurtzite ZnO, have cylindrical shape and carry droplet-like nanoparticles (NPs) at their tips, as expected for vapour–liquid–solid (VLS) growth. Grazing incidence X-ray diffraction measurements demonstrate that the NPs are made of pure fcc Au. No secondary Au/Zn alloy phases were detected. Bragg diffraction patterns confirmed that the nanowires were grown with their crystal c-axes parallel to the [100] direction of Si (i.e. normal to the substrate surface), while Au NPs are mostly (111)-oriented. The diameter distribution of ZnO nanowires mimics that of the Au NPs at their tips. A quantitative study of the nanostructure size distribution after sequential annealing and growth steps evidences the occurrence of three nanoscale processes: (i) Ostwald ripening and/or coalescence of Au NPs before nanowire nucleation, (ii) Au-catalysed VLS nucleation and axial growth of ZnO nanowires and (iii) radial growth of nanowires by a vapour–solid process. These processes originate the NP and nanowire size evolution during the experiments. The present findings are interpreted in terms of Zn vapour pressure changes during carbo-thermal evaporation. PACS 61.46.+w; 68.65.-k; 81.16.Dn     

Synthesis of epitaxial Si(100) nanowires on Si(100) substrate using vapor–liquid–solid growth in anodic aluminum oxide nanopore arrays

The synthesis of epitaxial Si nanowires with growth direction parallel to Si [100] on Si(100) substrate was demonstrated using a combination of anodic aluminum oxide (AAO) template, catalytic gold film sandwiched between the template and the Si(100) substrate and vapor-liquid-solid growth using SiH₄ as the Si source. After growing out from the AAO nanopores, most Si nanowires changed their diameter and growth direction into larger diameter and 〈111〉 direction. PACS 81.07.-b; 82.45.Cc     

ZnO纳米线的合成与生长机理

采用化学气相沉积系统制备ZnO纳米线,以覆盖一层约5nm厚的Ag薄膜的单晶Si(001)为衬底,纳米线的生长遵循气-液-固(VLS)机理。对得到的样品采用X射线衍射(XRD)和扫描电镜(SEM)进行晶体结构和形貌的表征。XRD结果表明衬底温度在600~700℃时生长的ZnO纳米线具有六方结构和统一的取向。通过扫描电子显微镜分析,比较了生长温度对纳米线直径和长度的影响。实验表明我们可以通过催化剂和温度来实现ZnO纳米线生长的可控。与传统的VLS生长方式不同的是在我们制备的ZnO纳米线顶端并没有看到催化剂颗粒,表明纳米线的生长方式是底部生长,我们对其生长机理进行了研究。     

Ce掺杂Si纳米线的制备及其蓝光发射特性

以抛光和“金字塔”织构表面的单晶Si(100)为衬底,分别以Au和Au-Al为金属催化剂,在温度为1 100 ℃、N₂气流量为1 500 sccm、生长时间为15～60 min等工艺条件下,制备了直径约为50～200 nm、长度为数微米至数十微米和不同分布的Si纳米线。然后,利用CeO₂粉末为掺杂剂,在温度为1 100～1 200 ℃、N₂流量为1 000 sccm、掺杂时间为30～60 min等工艺条件下对Si纳米线进行Ce掺杂。实验研究了不同Si纳米线长度、密度和分布等对Ce3+蓝光发射的影响。室温下利用Hitachi F-4600型荧光分光光度计对样品的激发光谱和发射光谱进行了测试和分析,同时利用FLS920全功能型荧光光谱仪对样品的荧光量子效率进行了测试。结果表明,在Si纳米线生长时间为30 min、织构表面和密度相对较低时以及最佳激发光波长为328 nm时,样品发射光波长为405 nm(5d→2F_5/2)荧光强度较大,实现了强的蓝光发射,其荧光量子效率达到了65.57%。通过光谱功率分布和CIE-1931标准公式进行计算,Ce掺杂Si纳米线样品的色坐标为(0.16, 0.03);发光强度大,量子效率高使其在照明、显示等领域有着潜在的应用价值,同时对Si纳米线在发光领域的研究和应用具有一定的参考价值。     

Unidirectional hexagonal rare-earth disilicide nanowires on vicinal Si(100)-2×1

Rare-earth disilicide nanowires grown on vicinal Si(100) with a miscut of 2–2.5° toward the [110] azimuth at 600 °C were studied by scanning tunneling microscopy and compared with those grown on flat Si(001). In contrast to rare-earth disilicide nanowires grown on flat Si(100) surfaces, the nanowires grow unidirectionally along the [01̄1] direction of the vicinal Si(100) surface. Rare-earth disilicide nanowires form bundles composed of single nanowire units on both flat and vicinal surfaces. Yet, on the vicinal surface, the bundle width is comparable to the width of the terrace. The average nanowire length on the vicinal substrate is longer than that on the flat substrate. Scanning tunneling spectroscopy shows that the rare-earth disilicide nanowires have metallic properties. PACS 81.07.Vb; 81.16.Dn; 68.65.La; 68.37.Ef     

Well-aligned ZnO nanowires grown on Si substrate via metal–organic chemical vapor deposition

ZnO nanowires were grown on silicon substrate by metal–organic chemical vapor deposition (MOCVD) without catalysts. The scanning electron microscopy (SEM) observations along with X-ray diffraction (XRD) results suggest that the ZnO nanowires are single crystals vertically well-aligned to silicon substrate. Room-temperature photoluminescence (PL) measurement reveals strong UV emission and weak green emission, which demonstrates that the nanowires are of good optical properties. The mechanism of the catalyst-free growth of ZnO nanowires on silicon substrate is proposed.     

Inelastic light scattering and X-ray diffraction from thick free-standing porous silicon films

The results of Raman scattering and X-ray diffraction studies of thick, free-standing, porous Si layers with thickness up to 500 μm are presented. The Raman scattering spectra have a distinctive difference from previous data for porous Si films on Si substrate and for thin, free-standing, porous Si layers. The experimental data can be explained by a modified phonon confinement model that accounts for a comprehensive strained Si nanocrystal. The comprehensive strain is a tensile one, and the value of stress can be up to 3 GPa. This interpretation is supported by data of X-ray diffraction measurements.     

Effect of sputtered films on morphology of vertical aligned ZnO nanowires

Vertical aligned ZnO nanowires were grown by MOCVD technique on silicon substrate using ZnO and AlN thin films as seed layers. The shape of nanostructures was greatly influenced by the under laying surface. Vertical nanopencils were observed on ZnO/Si, whereas the nanowires on both sapphire and AlN/Si substrate have the similar aspect ratio. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy (HRTEM) confirmed the single crystalline growth of the ZnO nanowires along [0 0 1] direction. Room-temperature photoluminescence (PL) spectra of ZnO nanowires on AlN/Si clearly show a band-edge luminescence accompanied with a visible emission. More interestingly, no visible emission for the nanopencils on ZnO/Si substrates, were observed.