In-plane and out-of-plane defectivity in thin films of lamellar block copolymers

We investigate the ordering of poly(styrene-b-methyl methacrylate) (PS-PMMA) lamellar copolymers (periodicity L₀ = 46 nm) confined between a free surface and brushed poly(styrene-r-methyl methacrylate) silicon substrate. The processing temperature was selected to eliminate wetting layers at the top and bottom interfaces, producing approximately neutral boundaries that stabilize perpendicular domain orientations. The PS-PMMA film thickness (t = 0.5L₀ − 2.5L₀) and brush grafting density (Σ = 0.2–0.6 nm⁻²) were systematically varied to examine their impacts on in-plane and out-of-plane ordering. Samples were characterized with a combination of high-resolution microscopy, X-ray reflectivity, and grazing-incidence small-angle X-ray scattering. In-plane order at the top of the film (quantified through calculation of orientational correlation lengths) improved with tⁿ, where the exponent n increased from 0.75 to 1 as Σ decreased from 0.6 to 0.2 nm⁻². Out-of-plane defects such as tilted domains were detected in all films, and the distribution of domain tilt angles was nearly independent of t and Σ. These studies demonstrate that defectivity in perpendicular lamellar phases is three-dimensional, comprised of in-plane topological defects and out-of-plane domain tilt, with little or no correlation between these two types of disorder. Strong interactions between the block copolymer and underlying substrate may trap both kinds of thermally generated defects. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 339–352     

An in situ GISAXS study of selective solvent vapor annealing in thin block copolymer films: Symmetry breaking of in-plane sphere order upon deswelling

Thin films of asymmetric poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymers are studied by means of in situ grazing-incidence small-angle X-ray scattering (GISAXS) during solvent vapor annealing in tetrahydrofuran, a solvent selective for the PS majority block of the copolymer. Upon swelling, PS-b-P4VP block copolymers form hexagonal arrays of spherical P4VP microdomains in a PS matrix in films 7–9 layers thick. Deswelling the films induces a transition from hexagonal to face-centered orthorhombic (fco) symmetry, which is stable only at ∼7 layers of spherical microdomains. Dry films show co-existing hexagonal and orthorhombic symmetries when the solvent is removed slowly, whereas instantaneous solvent removal suppresses the fco structure, resulting in films with only hexagonal structure. The in-plane order of microdomains is significantly deteriorated in dry films independent of the solvent removal rate.Spherical block copolymer microdomains are known to undergo a transition from hexagonal to orthorhombic packing in isothermally annealed thin films when the number of sphere layers is increased from 4 to 5. In this paper, in situ GISAXS experiments reveal that a similar transition occurs during solvent vapor annealing in a selective solvent. Interestingly, the transition from hexagonal to orthorhombic packing of spheres occurs as solvent is removed from a thin block copolymer film. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 331–338     

Grazing incident small angle x-ray scattering study of polymer thin films with embedded ordered nanometer cells

Analysis of nanostructures is of increasing importance with advances of nanotechnology. Embedded nanostructures in thin films in particular are of recent interest. Grazing incident small angle x-ray scattering (GISAXS) has been recognized to be a powerful method to probe such embedded nanostructures; however, quantitative analysis of scattering pattern is not always trivial due to complex refraction and reflection at surface and interfaces. We prepared nanocellular thin films using block copolymer template with carbon dioxide (CO(2)); CO(2) "bubbles" were formed in the CO(2)-philic block domains. Such nanocellular structures were analyzed by GISAXS and simulated using distorted wave Born approximation (DWBA). Unlike traditional transmission x-ray scattering, GISAXS requires a careful choice of incident angle to analyze the form factor of scatters embedded in a thin film. Nevertheless, the GISAXS measurements under optimized geometry with quantitative calculations using DWBA revealed that the nanocells are spherical and aligned in a single layer of hexagonal lattice and are surrounded by CO(2)-philic block domains.     

Morphology of side chain liquid crystalline block copolymer thin films and effects of thermal annealing

The self-assembly behavior of siloxane based side chain liquid crystalline block copolymer thin films are investigated via grazing incidence small angle X-ray scattering and atomic force microscopy. The as-spun films displayed polystyrene cylinders perpendicular to the substrate and the cylinders reoriented parallel to the surface after thermal annealing. The morphology observed in the as-spun films is resultant from the orientation of the smectic LC mesophase relative to the substrate. Annealing above both the polystyrene glass transition temperature and the smectic to isotropic transition temperature eliminates the influence of the LC phase, leading to a reorientation of the morphology that minimizes the interfacial energy of the system. © 2007 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 3263–3266, 2007     

PS-b-PEO block copolymer thin films as structured reservoirs for nanoscale precipitation reactions

Thin films of PS-b-PEO block copolymers were utilized as structured reservoirs for localized nanoscale precipitation reactions. By consecutively immersing the film into solutions of thioacetamide and cadmium chloride, we were able to obtain a monolayer of cadmium sulfide nanostructures on top of the block copolymer film. AFM and grazing incidence small angle X-ray scattering revealed spherical nanostructures (d = 15 nm) corresponding to the dimensions given by the block copolymer film. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 1569–1573, 2010     

Simulation and interpretation of 2D diffraction patterns from self-assembled nanostructured films at arbitrary angles of incidence: from grazing incidence (above the critical angle) to transmission perpendicular to the substrate

A method to calculate the location of all Bragg diffraction peaks from nanostructured thin films for arbitrary angles of incidence from just above the critical angle to transmission perpendicular to the film is reported. At grazing angles, the positions are calculated using the distorted wave Born approximation (DWBA), whereas for larger angles where the diffracted beams are transmitted though the substrate, the Born approximation (BA) is used. This method has been incorporated into simulation code (called NANOCELL) and may be used to overlay simulated spot patterns directly onto two-dimensional (2D) grazing angle of incidence small-angle X-ray scattering (GISAXS) patterns and 2D SAXS patterns. The GISAXS simulations are limited to the case where the angle of incidence is greater than the critical angle (alpha(i) > alpha(c)) and the diffraction occurs above the critical angle (alpha(f) > alpha(c)). For cases of surfactant self-assembled films, the limitations are not restrictive because, typically, the critical angle is around 0.2 degrees but the largest d spacings occur around 0.8 degrees 2theta. For these materials, one finds that the DWBA predicts that the spot positions from the transmitted main beam deviate only slightly from the BA and only for diffraction peaks close the critical angle. Additional diffraction peaks from the reflected main beam are observed in GISAXS geometry but are much less intense. Using these simulations, 2D spot patterns may be used to identify space group, identify the orientation, and quantitatively fit the lattice constants for SAXS data from any angle of incidence. Characteristic patterns for 2D GISAXS and 2D low-angle transmission SAXS patterns are generated for the most common thin film structures, and as a result, GISAXS and SAXS patterns that were previously difficult to interpret are now relatively straightforward. The simulation code (NANOCELL) is written in Mathematica and is available from the author upon request.     

Morphology Evolution of Block Copolymer Blend Thin Films Induced by Solvent Vapor Annealing

ABSTRACT

Self-assembly of binary block copolymer blends in thin film induced by solvent vapor annealing has been systematically studied. The diblock copolymers polystyrene-b-poly(2-vinylpyridine) with different molecular weights and volume fractions were blended with different molar ratios to cast thin films on silica substrate by spin coating. The films were annealed separately in the vapor of ethanol or toluene over time to induce morphology transformations from spheres, gyroids, and bicontinuous nanostructures, depending on the blending ratio, solvent selectivity, and annealing time, as investigated by atomic force microscopy and X-ray photoelectron spectroscopy. The formation and transformation mechanism of the self-assembly structure are discussed in the context of solvent-copolymer interactions. This study provides new insights into the simple manipulation of self-assembled nanostructures of block copolymer thin films.     

Conjugated block copolymers via functionalized initiators and click chemistry

Conjugated block copolymers are potentially useful for organic electronic applications and the study of interfacial charge and energy transfer processes; yet few synthetic methods are available to prepare polymers with well‐defined conjugated blocks. Here, we report the synthesis and thin film morphology of a series of conjugated poly(3‐hexylthiophene)‐block‐poly(9,9‐dioctylfluorene) (P3HT‐b‐PF) and poly(3‐dodecylthiophene)‐block‐poly(9,9‐dioctylfluorene) (P3DDT‐b‐PF) block copolymers prepared by functional external initiators and click chemistry. Functional group control is quantified by proton nuclear magnetic resonance spectroscopy, size‐exclusion chromatography, and matrix‐assisted laser desorption/ionization time‐of‐flight mass spectrometry. The thin film morphology of the resulting all‐conjugated block copolymers is analyzed by a combination of grazing‐incidence X‐ray scattering, atomic force microscopy, and transmission electron microscopy. Crystallization of the P3HT or P3DDT blocks is present in thin films for all materials studied, and P3DDT‐b‐PF films exhibit significant PF/P3DDT co‐crystallization. Processing conditions are found to impact thin film crystallinity and orientation of the π–π stacking direction of polymer crystallites. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2014 , 52, 154–163     

Synthesis of highly ordered mesoporous alumina thin films and their framework crystallization to γ-alumina phase

Here we report the preparation of highly ordered mesoporous alumina films existing both as P6(3)/mmc and Fm-3m mesostructures by using triblock copolymer Pluronic P123 as the structure-directing agent. 2D grazing-incidence small-angle X-ray scattering (GI-SAXS) completely proves the existence of two different mesopore structures (i.e., [001]-oriented P6(3)/mmc and [111]-oriented Fm-3m symmetries). After calcination at 1000 °C, the amorphous alumina framework is successfully converted to γ-alumina crystals. During the crystallization process, large uniaxial shrinkage occurs along the direction perpendicular to the substrate with the retention of horizontal mesoscale periodicity, thereby resulting in formation of partially vertical mesoporosity in the film. Through detailed electron microscopic study, we discuss the formation mechanism for the vertical mesoporosity upon calcination. The obtained mesoporous γ-alumina film shows high thermal stability up to 1000 °C, which is highly useful in wide research areas such as catalyst supports and separators.     

Control through monomer placement of surface properties and morphology of fluoromethacrylate copolymers

The arrangement of monomers and morphology of fluorinated copolymers of methyl methacrylate (MMA) were found to be important for controlling the surface energy of the materials when formed into thin films. Novel copolymers of MMA and 2,2,3,3,4,4,4‐heptafluorobutyl methacrylate (F3MA) were prepared with different monomer placement, namely statistical and block arrangements of the monomer units. The surface energies decreased with increasing incorporation of F3MA, in a manner consistent with previous reports for similar copolymers; however, the surface energies of the block copolymers were consistently lower than the statistical copolymers. This was interpreted as arising from conformational restriction of presentation of the fluoromonomers to the surface in the statistical copolymers, and formation of phase‐separated domains at the surface of the block copolymers. The morphology of the block copolymers was confirmed by small angle X‐ray scattering measurements, which allowed calculation of a solubility parameter for the fluorinated segments. The results have implications for the design of more environmentally acceptable materials with ultra‐low surface energies. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 2633–2641     

Advances in square arrays through self‐assembly and directed self‐assembly of block copolymers

This review covers recent advances in developing square arrays in thin films using block copolymers. Theoretical and experimental results from self‐assembly of block copolymers in bulk and thin films, directed self‐assembly of block copolymers confined in small wells, on substrates with arrays of posts, and on chemically nanopatterned substrates, as well as applications as nanolithography are reviewed. Some future work and hypothesis are discussed. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013     

SELF ASSEMBLY OF ABC TRIBLOCK COPOLYMER THIN FILMS ON A BRUSH-COATED SUBSTRATE

Self assemblies of ABC triblock copolymer thin films on a densely brush-coated substrate were investigated by using the self-consistent field theory.The middle block B and the coated polymer form one phase and the alternating phase A and phase C occur when the film is very thin either for the neutral or selective hard surface(which is opposite to the brushcoated substrate).The lamellar phase is stable on the hard surface when it is neutral and interestingly,the short block tends to stay on this hard surf...     

Surface engineering of styrene/PEGylated‐fluoroalkyl styrene block copolymer thin films

A series of diblock copolymers prepared from styrenic monomers was synthesized using atom transfer radical polymerization. One block was derived from styrene, whereas the second block was prepared from a styrene modified with an amphiphilic PEGylated‐fluoroalkyl side chain. The surface properties of the resulting polymer films were carefully characterized using dynamic contact angle, XPS, and NEXAFS measurements. The polymer morphology was investigated using atomic force microscope and GISAXS studies. The block copolymers possess surfaces dominated by the fluorinated unit in the dry state and a distinct phase separated microstructure in the thin film. The microstructure of these polymers is strongly influenced by the thin film structure in which it is investigated. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 267–284, 2009     

Lamellar orientation in thin films of symmetric semicrytalline polystyrene-b-poly(ethylene-co-butene) block copolymers: effects of molar mass, temperature of solvent evaporation, and annealing

Orientation of the lamellar microdomains in thin films of three symmetric polystyrene-b-poly(ethylene-co-butylene) block copolymers (S65E155, S156E358, and S199E452) on mica was investigated via atomic force microscopy (AFM), grazing incidence X-ray diffraction (GIXRD) and X-ray photoelectron spectroscopy (XPS). The results show that lamellar orientation in the SxEy block copolymers greatly depends on the molar mass of the block copolymers, the temperature of solvent evaporation, and annealing. The nascent thin film of the low molar mass block copolymer, S65E155, shows a multilayered structure parallel to the mica surface with the PS block at both polymer/mica and polymer/air interfaces, but the high molar mass block copolymers, S156E358 and S199E452, exhibit a structure with lamellar microdomains perpendicular to the mica surface. When the solvent is evaporated at a lower temperature, the crystallization rate is fast and a two-dimensional spherulite structure with the lamellar microdomains perpendicular to the mica surface is observed. Annealing of all the thin films with lamellar microdomains perpendicular to the mica surface leads to morphological transformation into a multilayered structure parallel to the mica surface. In all SxEy thin films on mica, the stems of PE crystals are always perpendicular to the interface between the lamellar PE and PS microdomains. A mechanism is proposed for the formation of different microdomain orientations in the thin films of semicrystalline block copolymers. When the thin film is prepared from a homogeneous solution, microdomains perpendicular to the substrate surface are formed rapidly for strongly segregated block copolymers or at a lower crystallization temperature and kinetically trapped by the strong segregation strength or solidification of crystallization, while for weakly segregated block copolymers or at slower crystallization rate, the orientation of the microdomains is dominated by surface selectivity.     

Selective control over the lamellar thickness of one domain in thin binary blends of block copolymer films

Thin binary blends of poly(styrene‐b‐methyl methacrylate) (PS‐PMMA) block copolymers in films where the lamellar thickness of one domain is controlled while preserving the thickness of the other domain were demonstrated without microphase separation. One of the block copolymers used here was short and symmetric, and the other was long and asymmetric; the molecular weights of the PMMA block chains in the constituents were similar. A random copolymer brush was introduced and film thickness and composition of brush were adjusted to induce perpendicular orientation in thin film. As the blend composition of the long asymmetric block copolymer increased, the PS lamellar thickness increased from 15.8 to 25.1 nm, whereas the PMMA lamellar thickness remained constant at approximately 14 nm (the thickness decreased slightly from 14.0 to 13.3 nm). The domain spacing behavior in thin film was consistent in the bulk. These results were compared with the Birshtein, Zhulina, and Lyatskaya model and the theories for pure block copolymers in the strong segregation limit and in the intermediate segregation regime. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 1393–1399     

Morphology of poly(lactide)-block-poly(dimethylsiloxane)-block-polylactide high-χ triblock copolymer film studied by grazing incidence small-angle X-ray scattering

The morphologies of poly(lactide)-block-poly(dimethylsiloxane)-block-polylactide (PLA-b-PDMS-b-PLA) triblock copolymer films were studied using a combination of grazing-incidence small-angle X-ray scattering, X-ray reflectivity and scanning electron microscopy. This block copolymer is characterized by a high Flory–Huggins interaction parameter which leads to the self-assembly of periodic high-resolution nanodomains. In this article, we performed a detailed analysis of GISAXS patterns, in the frame of the Distorted Wave Born Approximation, in order to determine the morphology of blocks and their spatial arrangement. For a low volume fraction of PLA (17%), a three-dimensional hexagonal lattice of PLA spherical blocks is revealed, while, for a PLA fraction twice larger, in-plane (parallel) PLA lying cylinders adopt a two-dimensional centered rectangular lattice. Moreover, the in-depth electron density profile of the polymer film for the cylindrical morphology was extracted from the XRR data, revealing the presence of interfacial layers at the top surface and at the interface with the Si substrate.     

Synthesis and characterization of block copolymer/ceramic precursor nanocomposites based on a polysilazane

The amphiphilic block copolymer poly(isoprene-block-ethylene oxide) was used as a structure-directing agent for a polysilazane preceramic polymer commercially known as Ceraset. Two block copolymers of different molecular weights and poly(ethylene oxide) weight fractions with body-centered cubic sphere and hexagonal cylinder morphologies were used. To both polymers, 50 wt % of the silazane oligomer (Ceraset) was added. The resulting composites were cast into films and characterized by small-angle X-ray scattering and transmission electron microscopy. The silazane was chemically compatible with the poly(ethylene oxide) microdomains of the block copolymer, and this resulted in a swelling of those domains. After the cooperative self-assembly of the block copolymer and Ceraset, for both systems the structure was permanently set in the lamellar morphology by the crosslinking of the silazane oligomer with a radical initiator at 120 °C. These results suggest that the use of block copolymer mesophases may provide a simple and easily controlled pathway for the preparation of various high-temperature SiCN-type ceramic mesostructures. © 2003 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 41: 3346–3350, 2003     

Synthesis and phase‐separation behavior of α,ω‐difunctionalized diblock copolymers

A series of diblock copolymers of n‐pentyl methacrylate and methyl methacrylate (PPMA/PMMA BCP) with one or two terminal functional groups was prepared by sequential anionic polymerization of PMA and MMA using an allyl‐functionalized initiator and/or and end‐capping with allyl bromide. Allyl functional groups were successfully converted into OH groups by hydroboration. The morphology in bulk was examined by temperature‐dependent small‐angle X‐ray measurements (T‐SAXS) and transmission electron microscopy (TEM) showing that functional groups induced a weak change in d‐spacings L₀ as well as in the thermal expansion behavior. T‐SAXS proved that the lamellar morphologies were stable over multiple heating/cooling cycles without order‐disorder transition (ODT) until 300 °C. While non‐functionalized BCP formed parallel lamellae morphologies, additional OH‐termination at the PMMA block forced in very thin films (ratio between film thickness and lamellar d‐spacing below 1) the generation of perpendicular lamellae morphology through the whole film thickness, as shown by Grazing‐incidence small‐angle X‐ray scattering experiments (GISAXS) measurements. Functionalized BCP were successfully used in thin films as templates for silica nanoparticles in an in‐situ sol–gel process. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Focused laser-induced marangoni dewetting for patterning polymer thin films

Highly-localized focused laser spike (FLaSk) heating of polymer thin films is a resist- and developer-free alternative to two-dimensional (2D) laser direct write for creating patterns on the single micron or, by exploiting overlap effects, submicron scale. The massive temporal and spatial thermal gradients and resulting thermal Marangoni stresses generated by FLaSk are an effective means for the directed dewetting and patterning of such films. Here, the general applicability of this technique to glassy amorphous polymer thin film systems is investigated through systematic investigation of film thickness, glass transition temperature, and polymer mobility. The results reveal that the important parameters are the film thickness (coupled to the optical heating effects through anti-reflection coating effects) and the high-temperature polymer melt mobility, allowing for generation of single features with linewidths of down to ∼1 μm. Further, the introduction of spatial mobility variations by using polymer brushes, bilayers, and microphase separated block copolymers leads to additional profile manipulation effects (i.e. spontaneous 2D pattern generation and flattened top profiles). © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 225–236     

Synthesis of block copolymers comprised of poly(3‐hexylthiophene) segment with trisiloxane side chains and their application to organic thin film transistor

The demand of stretchability for a semiconducting polymer has increased to realize wearable devices and sensors. However, studies involving intrinsically stretchable π‐conjugated polymers are still limited. Here, we develop a soft‐polythiophene derivative, P3SiHT, with a trisiloxane unit in the side chains via a hexylene spacer unit. In addition, diblock (P3HT‐b‐P3SiHT) and triblock (P3HT‐b‐P3SiHT‐b‐P3HT) copolymers could be synthesized based on Kumada catalyst‐transfer polycondensation. The results of atomic force microscopy and grazing incidence small‐angle X‐ray scattering indicate that the block copolymer thin films form a phase‐separated structure between the P3HT and P3SiHT domains. The organic thin film transistor devices were prepared to assess the electrical properties of the block polymers. As a result, the block copolymers showed comparable or even higher hole mobility than that of P3HT homopolymer, thus due to the enhanced phase‐separation and thereby charge transportation. The mechanical test of the bulk films indicates that P3HT‐b‐P3SiHT‐b‐P3HT shows lower tensile modulus and longer elongation at break than P3HT homopolymer and other diblock copolymers. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2018 , 56, 1787–1794