Report on the 34th IUVSTA workshop ‘XPS: From Spectra to Results—Towards an Expert System’

A summary is given of the workshop entitled ‘XPS: From Spectra to Results–Towards an Expert System’ that was held in St. Malo, France, on 22–26 April 2002 under the sponsorship of the International Union of Vacuum Science, Technique and Applications (IUVSTA). This workshop was held to develop the structure and initial content of a possible future expert system for XPS. Following three plenary presentations, the participants met in six groups to discuss the following topics: instrument and specimen characterization; experimental objectives; wide‐scan interpretation–trial composition and structure; protocols for narrow scans, instrument set‐up and data acquisition; reduction of narrow‐scan data–chemical‐state and morphology analysis; and reduction of narrow‐scan data–quantification. These discussions led to many recommendations for elements of an expert system for XPS. Some of these recommendations are included in this summary but additional recommendations are included in the reports of the six groups available on the internet ( http://www.iuvsta.org/W34.html ). Copyright © 2004 John Wiley & Sons, Ltd.     

Encoding of stoichiometric constraints in the composition depth profile reconstruction from angle resolved X‐ray photoelectron spectroscopy data

The inversion of angle resolved XPS data is a difficult problem, due to mathematical complexity of accurate model of electron transport, sensitivity to noise and small number of measured points limiting the depth resolution and the accuracy of the calculated depth profiles. Extended maximum entropy model for the calculation of apparent compositions (measured intensity ratios) is presented which allows to encode linear relationship between element concentrations. These can be used to calculate a solution with additional stoichiometric relationships and analyze, simultaneously, signals from several synthetic peak components. The synthetic peak components used in the model can represent various core level energy shifts, which are otherwise difficult to determine unambiguously from the measured signal. Element concentrations linked with stoichiometric relationships are used to identify compound materials with known density and inelastic scattering properties. The new model, thus allows self‐consistent recovery of depth profiles using maximum entropy method without the assumption of homogeneous density. The improved accuracy of the recovered depth profiles is demonstrated on the analysis of HfON/SiON overlayers. Various artefacts in the depth profiles obtained with standard maximum entropy model, which assumes constants density are identified. Copyright © 2011 John Wiley & Sons, Ltd.     

Report on the 42nd IUVSTA workshop ‘Electron scattering in solids: from fundamental concepts to practical applications’

A summary is given of the workshop entitled ‘Electron Scattering in Solids: from fundamental concepts to practical applications,’ which was held in Debrecen, Hungary, on July 4–8, 2004, under the sponsorship of the International Union of Vacuum Science, Technique, and Applications (IUVSTA). This workshop was held to review the present status and level of understanding of electron‐scattering processes in solids, to identify issues of key importance (hot topics) in the light of the most recent scientific results, and to stimulate discussions leading to a deeper understanding and new solutions of current problems. This report contains summaries of presentations and discussions in sessions on elastic scattering of electrons by atoms and solids, inelastic scattering of electrons in solids, modeling of electron transport in solids and applications, and software. The principal areas of application include Auger‐electron spectroscopy (AES), X‐ray photoelectron spectroscopy, elastic‐peak electron spectroscopy (EPES), reflection electron energy‐loss spectroscopy (REELS), secondary‐electron microscopy, electron‐probe microanalysis (EPMA), and the use of coincidence techniques in electron‐scattering experiments. A major focus of the workshop was determination of the inelastic mean free path of electrons for various surface spectroscopies, particularly corrections for surface and core‐hole effects. Published in 2005 by John Wiley & Sons, Ltd.     

Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 – Surface chemical analysis – Auger electron spectroscopy and X‐ray photoelectron spectroscopy – Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials by Auger electron spectroscopy (AES) and X‐ray photoelectron spectroscopy (XPS). This article provides a brief summary of this International Standard. Copyright © 2005 John Wiley & Sons, Ltd.     

Summary of ISO/TC 201 Technical Report: ISO/TR 19319: 2003—Surface chemical analysis—Auger electron spectroscopy and x‐ray photoelectron spectroscopy—Determination of lateral resolution,analysis area and sample area viewed by the analyser

ISO Technical Report 19319:2003 contains information on the determination of lateral resolution, analysis area and sample area viewed by the analyser in surface analyses by Auger electron spectroscopy and x‐ray photoelectron spectroscopy. This article provides a brief summary of this information. Copyright © 2004 John Wiley & Sons, Ltd.