激光淀积YBa2Cu3O7外延超导薄膜

利用准分子脉冲激光成功地在(100)SrTiO_3与(100)Y-ZrO_2衬底上淀积了 YBa_2Cu_3O_7超导薄膜,T_c(R=0)>90K,J_c(T<82K)>1×10~6A/cm~2.研究了衬底温度对外延YBa_2Cu_3O_7薄膜超导性能及结构的影响.     

Tc=95K的NdBa2Cu3Ox高温超导外延薄膜的研制

本采用倒筒式直流溅射法原位生长和Ｔｃ值为９５Ｋ的ＮｄＢａ２３Ｃｕ３Ｏｘ外延薄膜，样品的ＸＲＤ分析表明，样品为强烈ｃ轴织构，ｃ轴晶胞参数为１．１７４ｎｍ，样品衍射峰的ＦＷＨＭ＝０．２９°，ＲＢＳ分析表明：薄膜的化学计量为Ｎｄ１．０Ｂａ２．０Ｃｕ３．３Ｏｘ。对影响ＮｄＢａ２Ｃｕ３ＯＸ薄膜Ｔｃ值的因素进行了讨论。     

激光沉积法制备（Y1—xHox）Ba2Cu3O7—δ薄膜

本文报道了用激光沉积法在（１００）ＬａＡｌＯ３衬底上制备（Ｙ１－ｘＨｏｘ）Ｂａ２Ｃｕ３Ｏ７－δ（ｘ＝０，０．２，０．４）超导薄膜．结果表明，新超导薄膜表面光滑，具有很强的ｃ轴织构，零电阻温度Ｔｃ０约９１Ｋ，最佳临界电流密度Ｊｃ为４．７×１０６Ａ／ｃｍ２（７７Ｋ）．     

高温超导外延薄膜YBa2Cu3O7—x中的空位型缺陷

用正电子寿命技术研究了高温超导外延薄膜ＹＢａ２Ｃｕ３Ｏ７－ｘ中空位型缺陷的性质．结果表明，空位缺陷的类型与沉积条件无关，缺陷浓度随空气分压的增加或衬底温度的降低而增加．正电子平均寿命的温度依赖关系测量结果指出，当温度在室温以上时，几乎所有的正电子都逃逸出浅捕获中心；当温度高于３７５Ｋ时，必须考虑其退火效应．     

脉冲激光沉积制备YBa2Cu3O7-δ/Nb-doped SrTiO3双层结

超导体/半导体结(Superconductor/semiconductor p-n junction)在制备场效应管,晶体管方面具有巨大的潜力.本文通过脉冲激光沉积的方法,使用Nb掺杂的(100)方向SrTiO3作为薄膜衬底,沉积了厚度约为350nm c轴取向的YBa2Cu3O7-δ薄膜,从而得到YBa2Cu3O7-δ/Nb:SrTiO3双层结.R～T曲线,以及XRD曲线显示YBa2Cu3O7-δ薄膜具有良好的超导电性和晶体结构,在零磁场不同温度下测量得电流-电压曲线显示YBa2Cu3O7-δ/Nb:SrTiO3构成的超导体/半导体双层结在小于YBa2Cu3O7-δ临界转变温度Tc时具有p-n结整流特性,当大于YBa2Cu3O7-δ超导转变温度时,呈现出非典型肖特基结的特性.     

退火氧压对YBa2 Cu3O7-x薄膜中的激光感生热电电压效应的影响

测量了在不同氧压下退火生长的YBa2 Cu3O7-x(YBCO)薄膜中的激光感生热电电压(LITV)信号,发现随退火氧压的增大可使LITV信号的峰值有2-4倍的增强,并且变化趋势与薄膜热电势的各向异性随氧含量的变化规律相同.波长在473-808 nm范围内的连续激光辐照,在5000 Pa的氧压下退火生长的YBCO薄膜中探测到的LITV信号最大;而紫外脉冲激光辐照时,IJTV信号的最大值出现在退火氧压为105 Pa的薄膜中.LITV信号的光响应时间随退火氧压的增大而减小.理论分析表明,这一结果是由于退火氧压的提高导致薄膜材料的热扩散系数增大所致.在退火氧压为5000 Pa的YBCO薄膜中探测到响应最快的LITV信号,对紫外脉冲激光的响应时间为78 ns,并且信号的上升时间只有29 ns,与激光的脉冲宽度(约为28 ns)相当.     

用脉冲激光淀积制备具有光滑表面的A-轴取向YBa2Cu3O7薄膜

我们采用脉冲激光淀积方法在(100)SrTiO3基底上制备了a-轴取向外延的YBa2Cu3O7-x薄膜.通过采用活性氧,降低氧压和淀积速率,制备出了Tc超过80K、表面平均粗糙度为4.43nm的薄膜.X-射线衍射谱表明,实验得到的YBa2Cu3O7-x外延薄膜是高度A-轴取向的.     

离子束溅射沉积制备高JcYBa2Cu3O7—δ超导薄膜

本文报道应用离子束溅射沉积制备高 T_c 高 J_c YBa_2Cu_3O_(7-δ)超导薄膜.较详细地考察了影响薄膜组份比和晶粒取向的主要因素.实验表明采用本文提出的组合溅射靶可方便而又精确地调节薄膜 Y、Ba、Cu 组份比.详细描述了获得高度取向薄膜的工艺条件,获得了零电阻温度 T_(c0)=88～90.5K 和临界电流密度 J_c=1.5×10~3A/cm~2(77K)的 YBa_2Cu_3O_(7-δ)超导薄膜.     

Interface microstructure in epitaxial YBa2Cu3Ox/PrBa2Cu3Ox/YBa2Cu3Ox ramp-type Josephson junctions

The interfaces in ramp-type YBa₂Cu₃O_x/PrBa₂Cu₃O_x/YBa₂Cu₃O_x Josephson junctions with different ramp slopes were characterized electrically and structurally. From the cross-sectional TEM images, it has been found that the epitaxy remains through all layers even on the ramp surface, providing the ramp angle is less than 45°. No big defects such as grain boundaries and secondary phases occurred at the interface. The major defects which appeared at the interface are antiphase boundaries which were formed by lattice shifts with c/3 unit between PrBa₂Cu₃O_x and YBa₂Cu₃O_x. The interface between YBa₂Cu₃O_x base-layer and PrBa₂Cu₃O_x barrier is more defective in comparison with that between PrBa₂Cu₃O_x barrier and top-layer. Alteration of the ramp slope from 10° to 45° leads to a significant increase in the density of defects near the base-YBa₂Cu₃O_x/PrBa₂Cu₃O_x interface. The average roughness of the ramp surface created by ion milling is about 10 nm, which seems insensitive to the ramp slope. The damaged ramp surface could be repaired during the subsequent deposition process, leading to a negligible interface resistance.     

采用X-射线衍射测定YBa2Cu3Ox中的氧含量

本文详细介绍了采用X-射线衍射测定YBa2Cu3Ox中氧含量的实验细节并采用此法测定了六个样品的氧含量。结果表明：分别在空气和氧气中生长的名义成分为123 15wt.!1 0.5wt.?O2的样品的氧含量分别为6.63和6.76。经渗氧处理后，氧含量分别增加至6.88和6.94。在名义成分为123 15wt.!1 0.5wt.%Pt的样品中也得到类似的结果。本文对采用X-射线衍射测定YBa2Cu3Ox中氧含量的合理性和测定精度进行了讨论。     

脉冲激光沉积原位生长MgB2薄膜的研究

文章介绍了我们利用脉冲激光沉积(PLD)方法原位生长MgB2超导薄膜的工作.实验采用两步法的方案:高真空条件下在Al2O3(001)衬底上沉积Mg-B混合物加覆盖Mg层的双层结构,然后将该前驱体在630℃左右的Ar气氛中原位退火,成功制备出了有较好重复性的MgB2超导薄膜,其最高的起始转变温度为36.5K,转变宽度在1K左右.我们认为该方法为进一步研究基于MgB2的多层结构器件提供了一种可行的发展思路.     

脉冲激光沉积原位生长MgB2薄膜的研究

文章介绍了我们利用脉冲激光沉积（PLD）方法原位生长MgB2超导薄膜的工作．实验采用两步法的方案：高真空条件下在Al2O3（001）衬底上沉积Mg-B混合物加覆盖Mg层的双层结构，然后将该前驱体在630℃左右的Ar气氛中原位退火。成功制备出了有较好重复性的MgB2超导薄膜，其最高的起始转变温度为36．5K。转变宽度在1K左右．我们认为该方法为进一步研究基于MgB2的多层结构器件提供了一种可行的发展思路．     

在(100)SrTiO3上用PLD制备YBa2Cu3O7-δ/Eu2CuO4/LaNiO3三层结构

钙钛矿结构的金属氧化物LaNiO3与高温超导体YBa2Cu3O7-δ有着相近的晶格常数，并且有良好的导电性．我们在(100)SrTiO3基片上，用脉冲激光沉积法(PLD)成功的制备了单取向的LaNiO3，其表面起伏的均方根为1nm，电阻温度特性呈金属性．在此基础上，我们又原位制备了YBa2Cu3O7-δ／Eu2CuO4／LaNiO3三层结构．实验分析表明，高温超导薄膜YBa2Cu3O7-δ单一取向，临界温度在85K以上，超导转变宽度小于1．5K．这一结构对于研究高温超导体的准粒子注入和采用SIS或SINIS结构构成高温超导约瑟夫森结等方面有着重要意义．     

ECR-PECVD制备Si3N4薄膜沉积工艺的研究

由偏心静电单探针诊断了电子回旋共振等离子体增强化学汽相沉积(ECR-PECVD)反应室内等离子体密度的空间分布规律．结果表明在轴向位置Z=50cm处,直径Φ12cm范围内等离子体密度分布非常均匀．分析了等离子体密度径向均匀性对沉积速率均匀性和薄膜厚度均匀性的影响．讨论了沉积制备一定薄膜厚度的Si₃N₄薄膜的工艺重复性．研究了各种沉积工艺参数与Si₃N₄薄膜沉积速率的相互关系．得到了ECR-PECVD技术在沉积薄膜时的工 关键词：     

THE ANNEALING EFFECT OF CRYSTAL 4H-SiC FILMS PREPARED BY PULSED LASER DEPOSITION

SiC films were prepared by pulsed XeCl laser ablation of ceramic SiC target on Si(100) substrate at temperature 850℃ and post-deposition high temperature annealing above 1100℃ (1100℃-7 Pa). The surface morphology, crystal structure, composition and chemical state of the element in the films before and after annealing were studied by X-ray diffraction, transmission electron microscopy, scanning electron microscopy, Auger electron Spectrum, X-ray photoelectron spectrum and photoluminescence methods. It was found that the films were consisted of polycrystal 4H-SiC structure before annealing and were turned into singlecrystal epitaxial 4H-SiC after annealing. The surfaces of the films were smooth and the adhesion of films with the substrate was good. The films were transparent. Excited by the laser with wavelength 290 nm at room temperature, the films emitted two luminescence bands with the peaks at 377 nm and 560 nm. The emission at 377 nm was attributed to the combination of the transmission among the valence and conductor bands, while the one at 560 nm was possibly to be from exciton emission.     

脉冲激光淀积BaTiO3薄膜的介电与铁电特性

用脉冲激光淀积方法在SrTiO₃衬底上制备了BaTiO₃/YBa₂Cu₃O_7-δ（铁电/超导）双层膜，X射线分析表明BaTiO₃薄膜是高度c取向的．对BaTiO₃薄膜的介电和铁电性能进行了实验研究．观察到铁电薄膜特有的电滞线和蝶型C-V曲线，薄膜呈现出较好的铁电性，在铁电随机存储等领域有重要的应用前景 关键词：