不同工艺制备的高反射薄膜在真空与大气环境下的激光损伤特性

 建立了光学元件在真空环境下的激光损伤测量系统,采用电子束蒸发和离子辅助技术制备了Hf­₂/SiO₂高反射薄膜。对不同工艺制备的薄膜在真空与大气环境下的1 064 nm波长的激光损伤阈值进行了测量,对薄膜的损伤形貌进行了观测。对薄膜的损伤特性研究分析结果表明：薄膜在真空环境中的损伤阈值相对大气环境中有明显下降,其1∶1测试和R1测试损伤阈值下降约30%;两种环境中的薄膜损伤特性也不同,真空环境中损伤阈值的下降可能与热传导的不同有关。     

基频HfO2/SiO2高反射薄膜激光损伤生长特性

以1064 nm波长作用下的HfO2/SiO2高反射薄膜为研究对象,研究了高反射薄膜在损伤生长过程中分层剥落初始损伤结构的变化规律、损伤形貌特征和损伤生长阈值等特性。实验结果表明:分层剥落初始损伤结构的横向尺寸随激光能量密度的增加呈分段线性增长,破斑沿纵向拓展的损伤生长阈值是沿横向拓展的损伤生长阈值的2倍以上,初始损伤结构横向尺寸的生长率与能量密度呈指数关系,且生长阈值随着辐照次数的增加显著降低。     

横向电场下的类金刚石薄膜激光损伤

类金刚石(DLC)薄膜在红外区有很高的透过率,但激光损伤阈值低,严重限制了其应用领域。采用直接在DLC薄膜上沉积Ti电极,基于激光损伤阈值(LIDT)测试平台,用1-on-1零几率损伤法,研究了在不同偏置电场下DLC薄膜损伤阈值及损伤形貌的变化。发现电场强度从0增加到700V/cm,损伤阈值明显增大;进一步增大偏置电场,损伤阈值相对不变。分析认为偏置电场改变了激光辐照DLC薄膜区域的光生载流子漂移速度,减小了DLC薄膜的局部热累积,减缓了薄膜的石墨化进程,提高了DLC薄膜的抗激光损伤阈值。     

HfO2/SiO2双色膜在1 064 nm和532 nm激光辐照下的损伤特性

 采用电子束蒸发的方式,制备了有氧化硅内保护层和没有氧化硅内保护层的1 064 nm高透过、532 nm高反射的HfO₂/SiO₂双色膜,测量了它们的光学性能以及在基频和倍频激光辐照下的抗损伤性能。结果表明:氧化硅内保护层提高了双色膜在基频光辐照下的损伤阈值,对双色膜在倍频光辐照下的损伤阈值无明显影响。通过观察薄膜的损伤形貌,分析破斑的深度信息结合驻波场分布,对两类双色膜在基频光和倍频光下的损伤机制做了初步探讨。分析表明:氧化硅内保护层提高了膜基界面的抗损伤性能,从而提高了双色膜在基频光下的损伤阈值。     

超声清洗与激光预处理对减反膜阈值的影响

 研究了超声清洗和激光预处理两种后处理手段对减反膜的损伤特性的影响。采用电子束蒸发技术制备了1 064 nm减反膜,利用超声清洗及激光预处理的方法分别对样品进行处理,并对处理前后的样品分别进行激光损伤阈值测试及破斑深度测量。结果表明：处理后减反膜的损伤阈值均有所提升,但激光预处理的阈值增强效果更加明显;超声清洗前后的破斑深度没有大的变化,而激光预处理后的破斑深度比处理前浅得多;原因在于超声清洗只能去除表面杂质,激光预处理可减少和抑制膜层内较深处的缺陷。     

三倍频分光膜在1064 nm的破斑特性研究

采用电子束蒸发方式制备了两种不同材料组合的分光膜,分别对其在波长1064 nm激光辐照下的损伤阈值进行了测试,用Alpha-Step 500台阶仪对破斑进行了深度测量。实验结果表明,破斑呈现出表面层的剥落和深坑破坏两种形态。表面层的剥落深度在一定范围内不随能量密度的变化而变化;深坑破坏深浅不一,是膜内缺陷融化、汽化及喷发的综合作用的结果,是损伤阈值降低的主要原因。     

缓冲层对LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤阈值的影响

采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1%和0.2%.与无缓冲层样品相比,采用SiO2和MgF2缓冲层薄膜的激光损伤阈值分别提高了23.1%和25.8%,而Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO2或MgF2缓冲层可改进Al2O3膜层的质量,从而有利于提高薄膜的激光损伤阈值.     

缓冲层对LBO晶体上1 064 nm|532 nm二倍频增透膜的激光损伤阈值的影响

采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1％和0.2％.与无缓冲层样品相比,采用SiO2和MgF2缓冲层薄膜的激光损伤阈值分别提高了23.1％和25.8％,而Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO2或MgF2缓冲层可改进Al2O3膜层的质量,从而有利于提高薄膜的激光损伤阈值.     

真空退火对355nm Al2O3/MgF2高反射薄膜性能的影响

 采用电子束蒸发沉积技术制备了355nm Al₂O₃/MgF₂ 高反射薄膜，并在真空中进行不同温度梯度的退火，用X射线衍射（XRD）观察了薄膜微结构的变化，用355nm Nd：YAG脉冲激光测试了薄膜的激光损伤阈值，用Lambda 900光谱仪测试了薄膜的透过和反射光谱。结果表明在工艺条件相同的条件下真空退火过程对薄膜的性能有很大的影响，退火温度梯度越小的样品，吸收越小，阈值越大，并且是非晶结构。选择合适的真空退火过程可以减少355nm Al₂O₃/MgF₂ 高反射膜的膜层吸收，提高薄膜的激光损伤阈值。     

重复频率脉冲激光作用下膜内包裹物对损伤阈值的影响

 利用介质薄膜中包裹物的热理论模型,结合S.Papernov 等利用电子束蒸发技术在熔融石英上沉积含Au包裹物的HfO2薄膜实验,得出Au的吸收截面。以包裹物Au为例,计算了脉冲激光作用下不同包裹物半径对损伤阈值的影响,分析了重复率脉冲激光作用下薄膜损伤阈值的变化及重复频率与激光损伤阈值的关系。结果表明：随着包裹物半径的增加,激光损伤阈值先减小,接着增加而后再减小。激光损伤阈值与脉冲宽度的0.4次方成正比。随着脉冲重复频率的增加,激光损伤阈值单调下降,产生损伤所需的最小脉冲数则单调上升。     

Nanosecond multi-pulse damage investigation of optical coatings in atmosphere and vacuum environments

The cumulative effect of nanosecond multi-pulse irradiation on the dielectric coatings in atmosphere and vacuum environments was investigated. The laser-induced damage thresholds (LIDT) and the life span submitted to multi-pulse irradiation in two environments were compared. For both environments, we observe a decrease in laser-induced damage thresholds (LIDT) when shot number increase. However, the fatigue effect under repetitive shots under atmosphere environments and vacuum cases leads to different speeds of degradation. The correlative theory models were built to explain the experimental results.     

Laser conditioning of high-reflective and anti-reflective coatings in vacuum environments

Laser conditioning effects of the dielectric mirror coatings in vacuum environments were investigated. The laser-induced damage thresholds (LIDT) in vacuum environments before and after laser conditioning were compared. It is found that laser conditioning in vacuum environments decrease the LIDT of the component. Laser conditioning effects in vacuum and atmosphere environments were also compared and investigated. The negative effects of laser conditioning in vacuum environments were discussed and analyzed with defect statistical model, energy dispersive X-ray analysis and absorption measurements.     

Damage investigations of AR coating under atmospheric and vacuum conditions

The damage characteristics of anti-reflection films exposed to 1064 nm nanosecond laser pulses in vacuum and air were investigated. The laser-induced damage thresholds (LIDT) in vacuum and air environments were compared. The damage morphologies were locally analyzed using optical microscopy and scanning electron microscopy (SEM). The depth of the damage sites in the two environments was analyzed by Alpha2Step 500 m. The differences between the damage observed in the two environments were discussed based on the temperature distribution, absorption and vacuum gaseous composition measurements and gas pressure influence analysis. Increased coupling of the plasma shock wave and adsorbing water in the coating layer may be considered as the primary cause of the low LIDT observed in vacuum.     

两种反射膜系的激光热力损伤特性

 在驻波场理论基础上,用表面和界面强吸收理论模型,计算出了激光辐照下两种不同反射膜系中温度场的“多峰”分布特性,分析了激光对薄膜的热力损伤特性、主要破坏模式和阈值条件。结果表明,光学薄膜对激光能量的吸收,主要由驻波场分布及膜层的消光系数决定;膜系表面的杂质吸附层和界面吸收层是膜系的主要能量沉积区,从而在这些界面形成温度场的“多峰”分布,界面因此成为最容易受激光损伤的部分。导致光学薄膜激光损伤的主要模式为膜层熔融和脱落两种。如果膜层中含有杂质,则容易诱导杂质处膜层剥落破坏。     

Laser-induced damage of the optical films prepared by electron beam evaporation and ion beam sputtering in vacuum

The laser-induced damage characteristics and adsorption effects of organic contamination molecules of two high reflectors (HR) prepared by electron beam evaporation (EB) and ion beam sputtering (IBS) method at 1064 nm is investigated in vacuum. It is found that EB films show the performance degradation of laser induced damages in vacuum while for IBS film, seems to have no this effect, in comparison with air environment. In addition, EB coatings also have the strong affinity with organic contamination molecules, in contrast of IBS films. The results reveal that ion beam sputtering (IBS) method seem to be one of the favorite film deposition techniques of the optical films used in vacuum and space environments.     

He-Ne散射光检测光学薄膜激光损伤阈值

准确测定光学薄膜的激光损伤阈值可以衡量光学薄膜的抗激光损伤能力,测定损伤阈值的关键是准确地判定损伤的发生与否。建立了He-Ne散射光检测光学薄膜激光损伤阈值系统。通过测量同一样品点的He-Ne散射光能量变化来判断薄膜表面发生的损伤,并对制备的类金刚石薄膜与HfO₂/SiO₂反射膜进行了阈值测试。与等离子体闪光法的阈值测试结果进行比较,具有较好的一致性。分析表明：He-Ne散射光测试系统能有效地判断出激光诱导损伤,易于实现在线检测。     

PECVD技术制备单层光学薄膜抗激光损伤特性研究

采用PECVD技术在BK7玻璃基底上沉积了不同厚度的单层SiO2（折射率为1.46）和SiNx（折射率为1.84）光学薄膜,并对这2种膜层进行抗激光损伤阈值（LIDT）测试,分析讨论了PECVD技术制备的单层光学薄膜与抗激光损伤特性之间的关系。实验结果表明:PECVD技术制备的单层SiO2薄膜有较高的LIDT,薄膜光学厚度在o/4~o/2之间时,在光学厚度为350 nm时,LIDT有最小值21.7 J/cm2,光学厚度为433 nm时,LIDT有最大值27.9 J/cm2。SiNx薄膜的LIDT随着光学厚度增加而减小,在光学厚度为o/4时,LIDT有最大值29.3 J/cm2,光学厚度为o/2时,LIDT有最小值4.9 J/cm2。     

氧化物薄膜的离子束溅射沉积

用离子束溅射沉积的方法制备的TiO_2、ZrO_2薄膜的光吸收损耗明显降低,对其折射率、光吸收和抗激光损伤阈值等特性进行了分析.     

Analysis of material modifications induced during laser damage in SiO2 thin films

The damage mechanisms in silica thin films exposed to high fluence 1064 nm nano-second laser pulses are investigated. The thin films under study are made with different techniques (evaporation and sputtering, with and without ion assistance) and the results are compared. The material morphological, optical and structural modifications are locally analyzed with optical microscopy and profilometry, photoluminescence and absorption microscopies. These observations are made for fluences near and above the laser damage threshold, and also in the case of multiple pulse irradiations. An increase in absorption in and around the damages is observed, as well as the generation of different defects that we spatially resolve with absorption and luminescence mappings.     

化学法制备的HfO2薄膜的激光损伤阈值研究

 采用化学法制备了HfO₂介质膜，研究了热处理、紫外辐照以及Al₂O₃复合对HfO₂介质膜激光损伤阈值的影响。采用红外光谱（FTIR）和X射线衍射仪对薄膜进行了表征，并用输出波长为1.064 μm、脉宽为10 ns的电光调Q激光系统测试薄膜的激光损伤阈值。实验结果表明：采用150 ℃左右的温度对薄膜进行热处理可以提高薄膜的激光损伤阈值，所获得的薄膜的激光损伤阈值高达42.32 J/cm²，比热处理前的激光损伤阈值提高了82%；无机材料Al₂O₃的适量添加能够提高薄膜的激光损伤阈值，其中HfO₂与Al₂O₃的最佳质量配比约为95∶5；另外，对薄膜进行适当的紫外辐照也可改善HfO₂ 薄膜以及HfO₂-Al₂O₃复合薄膜的抗激光损伤性能。紫外辐照对提高HfO₂-Al₂O₃复合薄膜的激光损伤阈值效果尤为显著，辐照40 min后的激光损伤阈值达到44.33 J/cm²，比紫外辐照前的激光损伤阈值提高了90%。