Efficiency droop in InGaN/GaN-based LEDs with a gradually varying In composition in each InGaN well layer

Temperature-dependent and driving current-dependent electroluminescence spectra of two different InGaN/GaN multiple quantum well structures SA and SB are investigated,with the In composition in each well layer(WL)along the growth direction progressively increasing for SA and progressively decreasing for SB.The results show that SB exhibits an improved efficiency droop compared with SA.This phenomenon can be explained as follows:owing to the difference in growth pattern of the WL between these two samples,the terminal region of the WL in SB contains fewer In atoms than in SA,and therefore the former undergoes less In volatilization than the latter during the waiting period required for warming-up due to the difference in the growth temperature between well and barrier layers.This results in SB having a deeper triangular-shaped potential well in its WL than SA,which strongly confines the carriers to the initial region of the WL to prevent them from leaking to the p-GaN side,thus improving the efficiency droop.Moreover,the improvement in the efficiency droop for SB is also partly attributed to its stronger Coulomb screening effect and carrier localization effect.     

Investigation of wavelength-dependent efficiency droop in InGaN light-emitting diodes

The physical mechanisms leading to the efficiency droop of InGaN/GaN light-emitting diodes (LEDs) are theoretically investigated. We first discuss the effect of Auger recombination loss on efficiency droop by taking different Auger coefficients into account. It is found that the Auger recombination process plays a significant nonradiative part for carriers at typical LED operation currents when the Auger coefficient is on the order of 10⁻³⁰ cm⁶ s⁻¹. Furthermore, the InGaN/GaN multiple-quantum-well (MQW) LEDs with varied indium compositions in InGaN quantum wells are studied to analyze the wavelength-dependent efficiency droop. The simulation results show that the wavelength-dependent efficiency droop is caused by several different effects including non-uniform carrier distribution, electron overflow, built-in electrostatic field induced by spontaneous and piezoelectric polarization, and Auger recombination loss. These internal physical mechanisms are the critical factors resulting in the wavelength-dependent efficiency droop in InGaN/GaN MQW LEDs.     

Temperature-dependent efficiency droop behaviors of GaN-based green light-emitting diodes

The efficiency droop behaviors of GaN-based green light-emitting diodes (LEDs) are studied as a function of temperature from 300 K to 480 K. The overall quantum efficiency of the green LEDs is found to degrade as temperature increases, which is mainly caused by activation of new non-radiative recombination centers within the LED active layer. Meanwhile, the external quantum efficiency of the green LEDs starts to decrease at low injection current level (<1 A/cm2 ) with a temperature-insensitive peak-efficiency-current. In contrast, the peak-efficiency-current of a control GaN-based blue LED shows continuous up-shift at higher temperatures. Around the onset point of efficiency droop, the electroluminescence spectra of the green LEDs also exhibit a monotonic blue-shift of peak energy and a reduction of full width at half maximum as injection current increases. Carrier delocalization is believed to play an important role in causing the efficiency droop in GaN-based green LEDs.     

Optimization towards reduction of efficiency droop in blue GaN/InGaN based light emitting diodes

Light emitting diodes (LEDs) based on GaN/InGaN material suffer from efficiency droop at high current injection levels. We propose multiple quantum well (MQW) GaN/InGaN LEDs by optimizing the barrier thickness and high–low–high indium composition to reduce the efficiency droop. The simulation results reflect a significant improvement in the efficiency droop by using barrier width of 10 nm and high–low–high indium composition in MQW LED.     

Improved light extraction efficiency of GaN-based LEDs with patterned sapphire substrate and patterned ITO

To improve the light extraction efficiency of GaN-based light-emitting diodes (LEDs), periodic semisphere patterns with 3.5 μm width, 1.2 μm height, and 0.8 μm spacing were formed on sapphire substrate by dry etching using BCl₃/Cl₂ gas chemistry. The indium tin oxide (ITO) transparent conductive layer was patterned by wet etching to reduce the total internal reflection existing along between p-GaN, ITO, and air. At 350 mA injection current, the high power LED by integrating patterned sapphire substrate with patterned ITO technology exhibited a 36.9% higher light output power than the conventional LEDs.     

Modeling and simulation of efficiency droop in GaN-based blue light-emitting diodes incorporating the effect of reduced active volume of InGaN quantum wells

The efficiency droop of InGaN-based blue light-emitting diodes (LEDs) is analyzed using numerical simulations with a modified ABC carrier recombination model. The ABC model is modified to include the effect of reduced effective active volume of InGaN quantum wells (QWs) and incorporated into the numerical simulation program. It is found that the droop of internal quantum efficiency (IQE) can be well explained by the effect of reduced light-emitting active volume without assuming a large Auger recombination coefficient. A simulated IQE curve with the modified ABC model is found to fit quite well with a measured efficiency curve of an InGaN LED sample when the effective active volume takes only 2.5% of the physical volume of QWs. The proposed numerical simulation model incorporating the reduced effective active volume can be advantageous for use in the modeling and simulation of InGaN LEDs for higher efficiency.     

Enhanced light output of InGaN LEDs with a roughened p-GaN surface using different TMGa flow rates in p-AlGaN layer

We have demonstrated the enhancement of light output of InGaN-based blue light-emitting diodes (LEDs) using different trimethylgallium (TMGa) flow rates in the growth of p-AlGaN epilayer to facilitate a rougher p-GaN surface. It is found that higher output power can be achieved from the LEDs with rougher surface morphologies when the TMGa flow rate (R_TMGa) is increased up to 60 sccm during p-Al_0.05Ga_0.95N epilayer growth. Such a rough surface obtained at higher R_TMGa is attributed to the fact that the vertical growth rate is faster than the lateral growth rate, thus, leading to the facet of crystal growth focuses mainly in the vertical direction. The output power of devices biased at 20 mA is 15.4, 15.9, 17.5, and 18.9 mW for TMGa flow rates of 10, 20, 40, and 60 sccm, respectively.     

Progress and prospects of GaN-based LEDs using nanostructures

Progress with GaN-based light emitting diodes(LEDs) that incorporate nanostructures is reviewed,especially the recent achievements in our research group.Nano-patterned sapphire substrates have been used to grow an Al N template layer for deep-ultraviolet(DUV) LEDs.One efficient surface nano-texturing technology,hemisphere-cones-hybrid nanostructures,was employed to enhance the extraction efficiency of In GaN flip-chip LEDs.Hexagonal nanopyramid GaN-based LEDs have been fabricated and show electrically driven color modification and phosphor-free white light emission because of the linearly increased quantum well width and indium incorporation from the shell to the core.Based on the nanostructures,we have also fabricated surface plasmon-enhanced nanoporous GaN-based green LEDs using AAO membrane as a mask.Benefitting from the strong lateral SP coupling as well as good electrical protection by a passivation layer,the EL intensity of an SP-enhanced nanoporous LED was significantly enhanced by 380%.Furthermore,nanostructures have been used for the growth of GaN LEDs on amorphous substrates,the fabrication of stretchable LEDs,and for increasing the3-d B modulation bandwidth for visible light communication.     

Efficiency droop alleviation in blue light emitting diodes using the InGaN/GaN triangular-shaped quantum well

The InGaN/GaN blue light emitting diode(LED) is numerically investigated using a triangular-shaped quantum well model,which involves analysis on its energy band,carrier concentration,overlap of electron and hole wave functions,radiative recombination rate,and internal quantum efficiency.The simulation results reveal that the InGaN/GaN blue light emitting diode with triangular quantum wells exhibits a higher radiative recombination rate than the conventional light emitting diode with rectangular quantum wells due to the enhanced overlap of electron and hole wave functions(above 90%) under the polarization field.Consequently,the efficiency droop is only 18% in the light emitting diode with triangular-shaped quantum wells,which is three times lower than that in a conventional LED.     

Current diffusion and efficiency droop in vertical light emitting diodes

Current diffusion is an old issue, nevertheless, the relationship between the current diffusion and the efficiency of light emitting diodes(LEDs) needs to be further quantitatively clarified. By incorporating current crowding effect(CCE) into the conventional ABC model, we have theoretically and directly correlated the current diffusion and the internal quantum efficiency(IQE), light extraction efficiency(LEE), and external quantum efficiency(EQE) droop of the lateral LEDs.However, questions still exist for the vertical LEDs(V-LEDs). Here firstly the current diffusion length L_s(I) and L_s(II) have been clarified. Based on this, the influence of CCE on the EQE, IQE, and LEE of V-LEDs were investigated. Specifically to our V-LEDs with moderate series resistivity, L_s(III) was developed by combining L_s(I) and L_s(II), and the CCE effect on the performance of V-LEDs was investigated. The wall-plug efficiency(WPE) of V-LEDs ware investigated finally. Our works provide a deep understanding of the current diffusion status and the correlated efficiency droop in V-LEDs, thus would benefit the V-LEDs' chip design and further efficiency improvement.     

硅衬底InGaN/GaN基蓝光发光二极管droop效应的研究

InGaN/GaN基阱垒结构LED当注入的电流密度较大时, LED的量子效率随注入电流密度增大而下降, 即droop效应.本文在Si (111)衬底上生长了 InGaN/GaN 基蓝光多量子阱结构的LED,通过将实验测量的光电性能曲线与利用ABC模型模拟的结果进行对比, 探讨了droop效应的成因.结果显示:温度下降会阻碍电流扩展和降低空穴浓度, 电子在阱中分布会越来越不平衡,阱中局部区域中因填充了势能越来越高的电子而溢出阱外, 从而使droop效应随着温度的降低在更小的电流密度下出现且更为严重, 不同温度下实验值与俄歇复合模型模拟的结果在高注入时趋势相反.这此结果表明,引起 droop效应的主因不是俄歇非辐射复合而是电子溢出,电子溢出的本质原因是载流子在阱中分布不均衡.     

Enhancement of light-emission efficiency of ultraviolet InGaN/GaN multiple quantum well light emitting diode with InGaN underlying layer

Two ultraviolet InGaN/GaN light emitting diodes (LEDs) with and without InGaN underlying layer beneath the multiple quantum wells (MQWs) were grown by metal-organic vapor phase epitaxy. Based on the photoluminescence excitation measurements, it was found that the Stokes shift of the sample with a 10-nm-thick In_0.1Ga_0.9N underlying layer was about 64 meV, which was smaller than that of the reference sample without InGaN underlying layer, indicating a reduced quantum-confined Stark effect (QCSE) due to the decrease of the piezoelectric polarization field in the MQWs. In addition, by fitting the photon energy dependence of carrier lifetime values, the radiative recombination lifetime of the sample with and without InGaN underlying layer were obtained about 1.22 and 1.58 ns at 10?K, respectively. The shorter carrier lifetime also confirmed that the QCSE in the MQWs was weakened after inserting the InGaN underlying layer. In addition, although the depth of carrier localization in the sample with InGaN underlying layer became smaller, the nonradiative recombination centers (NRCs) inside it decreased, and thus suppressed the nonradiative recombination process significantly according to the electroluminescence measurement results. Compared to the reference sample, the efficiency droop behavior was delayed in the sample with InGaN underlying layer and the droop effect was also effectively alleviated. Therefore, the enhanced light-emission efficiency of ultraviolet InGaN/GaN MQW LEDs could be attributed to the decrease of QCSE and NRCs.     

无序光子晶体提高GaN基蓝光发光二极管光提取效率的研究

亚波长尺度光子晶体结构可有效提升发光二极管(LED)的光提取效率(LEE),然而在制造过程中会存在缺陷或无序.利用时域有限差分法对理想方形光子晶体结构进行了优化,在此基础上对三种无序光子晶体结构进行了仿真,研究了光子晶体结构参数的无序变化对GaN基蓝光LED LEE的影响.结果表明,光子晶体空气孔位置和半径的无序变化使优化的80 nm光子晶体LED的LEE下降,而可使非优化的60nm光子晶体LED的LEE增加;当光子晶体空气孔位置和半径的无序变化量从0到士20 nm之间变化时,LEE最大会产生53.8％的浮动;光子晶体刻蚀深度的无序变化对LEE影响较小,一般可以忽略,研究结果为高性能蓝光光子晶体LED的设计制作提供了重要的理论参考.     

Effect of carrier spillover and Auger recombination on the efficiency droop in InGaN-based blue LEDs

We have investigated efficiency droop in InGaN-based blue LEDs by considering radiative, nonradiative, and carrier spillover processes in the context of internal quantum efficiency (IQE) vs. injection current. If relied on fitting only, both the Auger recombination and an empirical formula for carrier spillover are consistent with experiments. However, the dependence of IQE on quantum well parameters and lack of droop in optical pumping experiments support the notion that carrier spillover is the main mechanism in play.     

Enhanced performances of InGaN/GaN-based blue light-emitting diode with InGaN/AIInGaN superlattice electron blocking layer

InGaN/AIlnGaN superlattice （SL） is designed as the electron blocking layer （EBL） of an InGaN/GaN-based light- emitting diode （LED）. The energy band structure, polarization field at the last-GaN-barrier/EBL interface, carrier concen- tration, radiative recombination rate, electron leakage, internal quantum efficiency （IQE）, current-voltage （l-V） perfor- mance curve, light output-current （L-l） characteristic, and spontaneous emission spectrum are systematically numerically investigated using APSYS simulation software. It is found that the fabricated LED with InGaN/AIInGaN SL EBL exhibits higher light output power, low forward voltage, and low current leakage compared with those of its counterparts. Meanwhile, the efficiency droop can be effectively mitigated. These improvements are mainly attributed to the higher hole injection efficiency and better electron confinement when InGaN/AIlnGaN SL EBL is used.     

Enhanced performances of InGaN/GaN-based blue light-emitting diode with InGaN/AlInGaN superlattice electron blocking layer

InGaN/AlInGaN superlattice(SL) is designed as the electron blocking layer(EBL) of an InGaN/GaN-based lightemitting diode(LED). The energy band structure, polarization field at the last-GaN-barrier/EBL interface, carrier concentration, radiative recombination rate, electron leakage, internal quantum efficiency(IQE), current–voltage(I–V) performance curve, light output–current(L–I) characteristic, and spontaneous emission spectrum are systematically numerically investigated using APSYS simulation software. It is found that the fabricated LED with InGaN/AlInGaN SL EBL exhibits higher light output power, low forward voltage, and low current leakage compared with those of its counterparts.Meanwhile, the efficiency droop can be effectively mitigated. These improvements are mainly attributed to the higher hole injection efficiency and better electron confinement when InGaN/AlInGaN SL EBL is used.     

Optical excitation study on the efficiency droop behaviors of InGaN/GaN multiple-quantum-well structures

Efficiency droop is generally observed in electroluminescence under high current injection. Optical characterization on efficiency droop in InGaN/GaN multiple-quantum-well structures has been conducted at 12 K. Clear droop behaviors were observed for the sample excited by above-bandgap excitation of GaN with pulse laser. The results show that dislocation is not the crucial factor to droop under high carrier density injection, and Auger recombination just slightly affects the efficiency. The radiative recombination may be mainly affected by a multi-carrier-related process (diffusion and drift with a factor of n ^3.5 and n ^5.5) at the interface between GaN barrier and InGaN well.     

表面InGaN厚度对GaN基发光二极管特性的影响

通过调整GaN基发光二极管(LED)表面InGaN层的厚度,发现在20 mA电流驱动下,LED器件的正向压降有明显差距.本文考虑了极化效应的影响,通过求解InGaN/GaN三角形势阱内二维空穴气浓度以及空穴隧穿概率的变化,求得了表面InGaN层厚度不同时器件正向压降的变化趋势,发现理论结果与实验结果有很好的吻合.同时得到了获得最低正向压降的表面InGaN厚度. 关键词： 极化 二维空穴气 隧穿概率     

表面InGaN厚度对GaN基发光二极管特性的影响

通过调整GaN基发光二极管(LED)表面InGaN层的厚度，发现在20 mA电流驱动下，LED器件的正向压降有明显差距.本文考虑了极化效应的影响，通过求解InGaN/GaN三角形势阱内二维空穴气浓度以及空穴隧穿概率的变化，求得了表面InGaN层厚度不同时器件正向压降的变化趋势，发现理论结果与实验结果有很好的吻合.同时得到了获得最低正向压降的表面InGaN厚度.