2D-Conductivity of thin Pd films condensed at low temperatures

Resistance measurements have been made on quenched condensed Pd films with thicknesses between 25 Å and 350Å. The films are prepared under different evaporation conditions by varying the system pressure between 10^?8 and 10^?5 mbar. Resistance minima with a logarithmic increase of the sheet resistance are observed for thick films (d<350Å) condensed under intentionally “bad” (10^?5 mbar) vacuum conditions, as well as for thin films (d<50Å) condensed at pressures around 10^?8 mbar. Structure investigations show that the thick films are granular. For these films the relation of granularity to 2D localization is discussed. The thin films are continuous and the logarithmic resistance increase is in agreement with predictions of 2D-theories.     

Ferromagnetism in carbon-doped In2O3 thin films

Carbon-doped In₂O₃ thin films exhibiting ferromagnetism at room temperature were prepared on Si (100) substrates by the rf-magnetron co-sputtering technique. The effects of carbon concentration as well as oxygen atmosphere on the ferromagnetic property of the thin films were investigated. The saturated magnetizations of thin films varied from 1.23 to 4.86 emu/cm³ with different carbon concentrations. The ferromagnetic signal was found stronger in samples with higher oxygen vacancy concentrations. In addition, deposition temperature and different types of substrates also affect the ferromagnetic properties of carbon-doped In₂O₃ thin films. This may be related to the oxygen vacancies in the thin film system. The experiment suggests that oxygen vacancies play an important role in introducing ferromagnetism in thin films.     

Role of deposition temperature and Sn content on structural,optical & electrical properties of In2O3 thin films

High quality indium tin oxide (ITO) thin films (In_2−xSn_xO₃: x = 0, 0.1 and 0.2) have been grown by using pulsed laser deposition technique on quartz substrates. The structural, morphological, optical and electrical investigations of deposited films have been studied as a function of substrate deposition temperatures and the Sn compositions. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM) patterns affirm that each film is polycrystalline in nature with cubic bixbyite single phase structure which preferentially oriented along (222) Miller plane. The existence of chemical bonding and functional groups was investigated by FTIR spectroscopy. The TEM micrograph of films (@450°C) for x = 0.1 and x = 0.2 reveal spherical morphology with average particle size 63 nm and 51 nm, respectively. The SEM and AFM images show uniform flower like surface morphology and well-demonstrated nanosized spherical particles, respectively. The widening of the band gap of all the films were exclusively defined by Burstein-Moss shift. The Hall measurement reveals that each film is degenerate with n-type semiconducting nature along with high mobility. Low resistivity (2.024 × 10⁻⁴ Ω-cm) and high transparency (92.58%) along with high carrier concentration (8.915 × 10²⁰ cm⁻³) were optimized for x = 0.1 film at 450°C deposition temperature.     

Room temperature photoluminescence property of Mo-doped In2O3 thin films

Mo-doped In₂O₃ thin films have been prepared on glass substrates using an activated reactive evaporation method and systematically studied the effect of oxygen partial pressure on the structural, optical, electrical and photoluminescence properties of the films. The obtained films are highly transparent and conductive. The films exhibited the lowest electrical resistivity of 5.2 × 10⁻⁴ Ω cm, with an average optical transmittance of 90% in the visible region. An intensive photoluminescence emission peaks were observed at 415 and 440 nm.     

Conducting and reflecting properties of thin metal films

Amorphous silver, copper, gold, and iron films with a thickness of 6–60 nm have been grown on a polymer substrate by the method of vacuum deposition. The dependences of the specific conductivity and the microwave reflection coefficient on the film thickness are obtained and a relation between these values is established.     

Surface origin of high conductivities in undoped In2O3 thin films

The microscopic cause of conductivity in transparent conducting oxides like ZnO, In{2}O{3}, and SnO{2} is generally considered to be a point defect mechanism in the bulk, involving intrinsic lattice defects, extrinsic dopants, or unintentional impurities like hydrogen. We confirm here that the defect theory for O-vacancies can quantitatively account for the rather moderate conductivity and off-stoichiometry observed in bulk In{2}O{3} samples under high-temperature equilibrium conditions. However, nominally undoped thin-films of In{2}O{3} can exhibit surprisingly high conductivities exceeding by 4-5 orders of magnitude that of bulk samples under identical conditions (temperature and O{2} partial pressure). Employing surface calculations and thickness-dependent Hall measurements, we demonstrate that surface donors rather than bulk defects dominate the conductivity of In{2}O{3} thin films.     

Electrical transport in La1−x Ca x MnO3 thin films at low temperatures

We report here the low-temperature resistivity of the chemical solution deposited La_1−x Ca _x MnO₃ (x=0.2, 0.3 and 0.33) thin films on LaAlO₃ substrates. The films were post-annealed in atmosphere at 850°C. The low temperature resistivity data has been studied in order to understand the nature of low-temperature conduction processes. The data showed T ² dependence from 60 K to 120 K consistent with the single magnon scattering process. The deviation from this quadratic temperature dependence at low temperatures is attributed to the collapse of the minority spin band. The two-magnon and electron-phonon processes contribute to scattering of carriers in the temperature range above 120 K.     

ZrO2 films deposited by photo-CVD at low temperatures

Zirconium oxide layers have been successfully deposited by photo-CVD at low temperatures. ZrO₂ growth was observed at temperatures as low as 100 °C. When deposited at 250 °C and above, these films exhibited a polycrystalline structure with a mixture of different crystal phases. Deposition at 300 °C was found to form moisture-free ZrO₂ films with a high refractive index of 2.1, a very low effective density of trapped electrons of ∼8.8×10⁸ cm^-2 and an interface trap density of 6.6×10⁹ cm^-2 eV^-1 being readily obtained. Received: 17 December 2001 / Accepted: 6 January 2002 / Published online: 3 June 2002     

Sn掺杂对In_2O_3热电性能的影响

本文利用第一性原理结合半经典玻尔兹曼理论研究了Sn掺杂对In_2O_3热电特性的影响.由于一个In_2O_3原胞有80个原子,所以为了清楚表明Sn的掺杂浓度,我们将化学式表述为In_(32-x)Sn_xO_(48).形成能的计算表明Sn比较容易取代In位,且Inb位比Ind位更容易被取代.且只有x=1,形成能是负值,而x=2和3的形成能是正值.电子结构的计算表明Sn掺杂对In_2O_3的能带结构的形状影响很小,只是费米能级向导带方向移动了,基于这一点我们预测刚性带模拟In_2O_3的电子热电特性和实际Sn掺杂的应该比较接近.输运性质的计算表明在价带顶或导带底附近,电子输运性质随化学势发生明显的变化,而在价带以上导带以下的一定化学势范围内,虽然S,σ/τ和n随化学势和温度变化比较大,ZeT随化学势和温度几乎没有变化,且n型和p型掺杂下的ZeT非常接近,大小在1附近.令人兴奋的是,通过将刚性带模型计算In_2O_3电子输运性质和实验结果对比,发现当温度为1000 K,化学势为0.6512 Ry时的实验ZT=0.28和理论0.273非常接近.而此化学势远在导带底以上,说明如果选择较低的掺杂浓度,In_2O_3的输运性质有望进一步提高.     

Enhanced critical current density of MgB2 thin films deposited at low temperatures by ZnO seed impurity

We report a facile method to enhance the critical current density (J_c) of superconducting MgB₂ thin films. MgB₂ thin films were deposited on zinc acetate dehydrate (Zn(CH₃COO)₂2H₂O) spin-coated Al₂O₃ (000l) substrates by using a hybrid physical-chemical vapor deposition system at low temperatures. Synthesis of MgB₂ at low temperatures can reduce the substitution of Zn into the Mg site, hence avoiding the reduction of superconducting critical temperature. MgB₂ thin films grown on ZnO-buffered layers showed a significant enhancement of J_c in the magnetic field due to the creation of additional pinning sources, namely point defects and grain boundaries. Broad peaks were observed in the magnetic field dependence of the flux pinning force density, indicating competition of different pinning sources.     

Nonlinear optical properties of thin films at a low light intensity

Nonlinearity of optical parameters of semiconductor and dielectric films for a 0.63-nm-wavelength light with intensity lower than 100 mW/cm² is discovered and studied.     

LBO晶体上ZrO2薄膜的显微结构和光学性质

用电子束蒸发方法在三种不同取向的三硼酸锂(LiB3O5,简称LBO)晶体上沉积了ZrO2薄膜.采用分光光度计和X射线衍射技术对LBO晶体基底结构对薄膜光学性质和显微结构的影响进行了研究.实验结果表明基底结构对薄膜的显微结构和光学性质具有明显影响,即X-LBO,Y-LBO和Z-LBO上沉积的ZrO2薄膜分别沿m(-212),m(021)和o(130)择优生长,且m(021)择优取向的ZrO2薄膜具有最高的折射率和最小的晶格不匹配.     

热丝化学气相沉积技术低温制备多晶硅薄膜的结构与光电特性

以金属W和Ta为热丝，采用热丝化学气相沉积 ，在250℃玻璃衬底上沉积多晶硅薄膜.研究了热丝温度、沉积气压、热丝与衬底间距等沉积参数对硅薄膜结构和光电特性的影响，在优化条件下获得晶态比X_c＞90%，暗电导率σ_d=10^-7—10-6Ω ^-1cm^-1，激活能E_a=0.5eV，光能隙E_opt≤1.3 eV的多晶硅薄膜. 关键词： 多晶硅薄膜 热丝化学气相沉积 光电特性     

Effect of annealing on the optical properties of In2Te3 thin films

2 Te₃ thin films of different thickness were prepared in a vacuum of 10^-5 Torr onto glass and quartz substrates held at about 300 K during the deposition process. X-ray diffraction analysis showed that the prepared samples in bulk or as-deposited thin-film forms were in an amorphous state. On annealing at 573 K, films have a β-phase polycrystalline structure. Transmittance and reflectance measurements in the spectral range of 400–2500 nm for films deposited onto quartz substrates were used to calculate the optical constants (the refractive index n, the absorption index k and the absorption coefficient α) for In₂Te₃ films, either as-deposited or annealed at different temperatures. The refractive index has anomalous behavior in the region of the fundamental absorption edge. The allowed optical transitions were found to be nondirect transitions, with an optical gap of 1.02 eV for the samples under test. The effect of annealing on the optical gap is interpreted in terms of the density of states proposed by Mott and Davis. Received: 22 June 1997/Accepted: 9 July 1997     

Exciton-phonon interaction in Y2O3 and Sc2O3 thin films

An investigation is made of the fundamental absorption edge of Y₂O₃ thin films. Based on its temperature dependence the exciton-phonon interaction is studied, which makes it possible to interpret the absorption edge as the absorption of self-localized excitons. A number of parameters of the energy spectrum of the investigated films are determined. I. Franko State University, 50, Dragomanov St., L'vov, 290005, Ukraine. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 66, No. 1, pp. 132–134, January–February, 1999.     

Ferroelectric properties of Nd-substituted bismuth titanate thin films processed at low temperature

Nd-substituted bismuth titanate Bi_3.54Nd_0.46Ti₃O₁₂ (BNT) thin films were prepared on (111)Pt/Ti/SiO₂/Si substrates by a sol–gel method. The BNT thin films processed at a low annealing temperature of ∼600 °C showed good ferroelectric properties. The randomly oriented BNT single phases and the improved ferroelectric properties were confirmed by X-ray diffraction and polarization–electric field hysteresis loops, respectively. The remanent polarization of the BNT thin films is 64 μC/cm², which is larger than that of Bi_3.25La_0.75Ti₃O₁₂ (BLT) thin films. After 10¹⁰ read/write switching cycles, the effective non-volatile charges showed no polarization fatigue. Regardless of the low annealing temperature of 600 °C, the BNT thin films had good ferroelectric properties with high remanent polarizations and strong fatigue resistances. PACS 77.84.Dy