Ti离子注入和退火对ZnS薄膜结构和光学性质的影响

利用真空蒸发法在石英玻璃衬底上制备了ZnS薄膜,将能量80 keV,剂量1×10¹⁷ cm^-2的Ti离子注入到薄膜中,并将注入后的ZnS薄膜进行退火处理,退火温度500—700 ℃.利用X射线衍射（XRD）研究了薄膜结构的变化,利用光致发光（PL）和光吸收研究了薄膜光学性质的变化.XRD结果显示,衍射峰在500 ℃退火1 h后有一定程度的恢复;光吸收结果显示,离子注入后光吸收增强,随着退火温度的上升,光吸收逐渐降低,吸收边随着退火温度的提高发生蓝移;PL显示,薄 关键词： ZnS薄膜 离子注入 X射线衍射 光致发光     

Cu,Zn离子注入SiO_2纳米颗粒合成及氧气氛围下的热稳定性研究

通过45 keV,1.0×1017cm-2的Cu离子注入SiO2基底合成了嵌入式的Cu纳米颗粒,采用不同剂量的50 keV Zn离子对Cu纳米颗粒进行后续辐照,详细研究了Zn离子后续辐照对Cu纳米颗粒结构、光学性质的影响及其氧气气氛下的热演变规律.研究结果表明,Cu和0.5×1017cm-2的Zn离子顺次注入可在SiO2基底中形成Cu-Zn合金纳米颗粒,它们可以在516 nm附近引起独特的表面等离子共振(SPR)吸收峰.后续O2气氛中450?C退火可以导致Cu-Zn合金纳米颗粒分解,并在基体中形成了ZnO和Cu纳米颗粒.研究结果还表明后续Zn离子的辐照可以有效地提高Cu纳米颗粒的抗氧化能力;同时基体中Cu的存在也会加速Zn向样品表面的扩散,从而促进了ZnO的形成.     

氢钝化对硅纳米晶发光强度的影响

通过热蒸发方法在单晶硅衬底上沉积了SiO/SiO₂超晶格样品,在氮气保护下对样品进行高温退火,得到硅纳米晶/SiO₂超晶格结构。随后将该结构样品分别注入3.0×1014和3.0×1015 cm-2两种剂量的H+。通过对样品的光致发光光谱的分析发现,H+注入后未经过二次退火的样品发光强度急剧下降;二次退火后的样品,随着退火温度的升高,发光强度逐渐增强;注入足够剂量的H+,其发光强度可以远远超过未注入时的发光强度。研究表明,样品发光强度的变化取决于样品内部缺陷面密度的改变,而缺陷面密度是由氢离子的注入剂量和注入后再退火的温度等因素决定的。     

H_2气氛退火处理对Nb掺杂TiO_2薄膜光电性能的影响

采用电子束沉积方法,以钛酸锶(SrTiO3)为衬底制备铌(Nb)掺杂TiO2薄膜并研究后续H2气氛退火处理对其薄膜样品光电性能的影响.结果发现H2气氛热退火处理能有效改善Nb掺杂TiO2薄膜的导电率,最佳电阻率达到5.46×10-3Ω·cm,在可见光范围内的透光率为60%—80%.导电性能的改善与H2气氛退火处理后多晶薄膜的晶粒尺寸变大和大量的氧空位形成及H原子掺杂有关.     

Ag离子注入非晶SiO2的光学吸收、拉曼谱和透射电镜研究

能量为200keV的Ag离子,以1×1016,5×1016,1×1017cm-2的剂量分别注入到非晶SiO2玻璃,光学吸收谱显示:注入剂量为1×1016 cm-2的样品的光吸收谱为洛伦兹曲线,与Mie理论模拟的曲线形状一致;注入剂量较大的5×1016,1×1017 cm-2的谱线共振吸收增强,峰位红移并出现伴峰.透射电镜观察分析表明,注入剂量不同的样品中形成的纳米颗粒的大小、形状、分布都不同,注入剂量较大的还会产生明显的表面溅射效应,这些因素都会影响共振吸收的峰形、峰位和峰强.当注入剂量达到1×1017 cm-2时,Ag纳米颗粒内部可能还形成了杂质团簇.     

离子注入合成β-FeSi2薄膜的显微结构

采用MEVVA源(MetalVaporVacuumArcIonSource)离子注入合成βFeSi2薄膜,用常规透射电镜和高分辨电镜研究了不同制备参数下βFeSi2薄膜的显微结构变化.研究结果表明:调整注入能量和剂量,可以得到厚度不同的βFeSi2表面层和埋入层.制备过程中生成的α,β,γ和CsCl型FeSi2相的相变顺序为γFeSi2→βFeSi2→αFeSi2,CsClFeSi2→βFeSi2→αFeSi2或βFeSi2→αFeSi2.当注入参数增加到60kV,4×1017ionscm2,就会导致非晶 关键词： β-FeSi2 半导体薄膜 金属硅化物 离子注入 透射电子显微镜     

Ce~(3+)注入对超晶格中硅纳米晶光致发光强度的影响

研究了铈离子注入和二次退火等因素对硅纳米晶(nc-Si)发光强度的影响.利用电子柬蒸发以及高温退火得到nc-Si/SiO2超晶格结构.随后将该结构样晶分别注入2.0×1014cm2和2.0×1015cm-2剂量的铈离子(Ce3+),再分别以不同温度对其进行二次退火,获得多种样品.通过对样品光敏发光光谱的分析发现,Ce3+注入后未经过二次退火的样品发光强度急剧下降.二次退火后的样品,随着退火温度的升高,样品的光致发光灶度逐渐增强,但当温度超过600℃时,发光强度反而下降,600℃为二次退火的最佳退火温度.注入适当剂量的Ce3+,其发光强度可以超过未注入时的发光强度,Ce3+的注入存在饱和剂量.研究表明,样品发光强度的变化受到铈离子注入剂量和注入后二次退火温度等因素的影响,并且存在着Ce3+到nc-Si的能量传递.     

AuSi_x(x=1/2,1/7)纳米颗粒的制备及光致发光性能研究

采用射频磁控溅射法在n型单晶Si(100)衬底上制备Au/Si/Au多层薄膜,并在300℃真空原位退火30min。扫描电子显微镜(SEM)及透射电子显微镜(TEM)观察发现,退火前样品表面是一层平整的薄膜,而退火后样品表面形成均匀分布的岛状纳米颗粒,颗粒直径为10～20nm,面密度约1×1011cm-2。X射线光电子能谱(XPS)及TEM分析表明,退火后样品表面形成单晶结构的AuSix(x=1/2,1/7)纳米颗粒。室温下对退火后样品的光致发光(PL)特性进行测试,样品在580,628和700nm处出现三个发光峰,经过分析这些发光峰与样品表面的SiO2结构,AuSix纳米颗粒周围的悬挂键等缺陷以及样品表面SiO2纳米结构中的无桥联氧等因素有关。     

Co离子注入TiO2薄膜的显微结构和磁性研究

利用直流磁控溅射技术在玻璃衬底上沉积了TiO₂薄膜,并对其进行了Co离子注入,最后在真空中500 ℃退火50 min,得到系列薄膜样品. 利用剥离-分散方法制备了薄膜的透射电镜样品,并用扫描电镜(SEM)、X射线能量散射谱(EDX)和高分辨透射电镜(HRTEM)对样品做了近似原位观察,研究了薄膜样品中不同Co离子注入深度的成分分布和显微结构. 结果表明,薄膜呈锐钛矿结构,Co元素主要分布在薄膜表层,Co离子的注入使TiO₂薄膜的晶粒被部分破坏,并形成CoO,而5 关键词： 2薄膜')" href="#">Co注入TiO₂薄膜 电镜原位观察 室温铁磁性     

Ag/TiO2纳米材料的制备和光致变色性能研究

 采用光催化还原法在不同温度热处理的TiO2薄膜表面沉积Ag纳米颗粒,制备了Ag/TiO2纳米薄膜材料。通过UV-Vis吸收光谱表征对比了不同温度热处理的TiO2对Ag粒子光催化沉积的影响,发现500℃退火处理TiO2薄膜较利于Ag纳米粒子的光催化沉积;在650 nm红色激光照射下,500℃退火处理的Ag/TiO2样品具有明显的光致变色现象,对此变色过程中涉及的机理进行了讨论,且发现随着Ag纳米颗粒光催化沉积时间的增长,Ag/TiO2薄膜光致变色的响应速率提高,但Ag纳米颗粒过多会抑制Ag/TiO2薄膜的变色响应速率。     

快重离子辐照金红石型TiO2的肿胀效应及化学蚀刻行为研究

二氧化钛（Titatium Dioxide,简称TiO₂）晶体在中能重离子辐照时表面会出现肿胀效应, 肿胀高度与入射离子的电子能损和辐照注量有关。 辐照后的TiO₂在一定条件下能够被氢氟酸溶液化学蚀刻,化学蚀刻的电子能损阈值为8.2keV/nm,未辐照TiO₂呈现几乎零蚀刻率。要达到饱和蚀刻深度,辐照离子的注量必须大于或等于1×1013ions/cm2。采用离子辐照的潜径迹理论分析研究了辐照损伤及对化学蚀刻的影响, 快重离子辐照结合化学蚀刻是制备TiO₂微结构的有效方法。 There appears volume swelling on the surface of the irradiated rutile TiO₂ crystal and the volume swelling is affected by the ion fluence and the electronic stopping power. To induce adequate irradiation damage for the chemical etching, the irradiation parameters must fulfill some requirement. There is minimum electronic stopping power for the chemical etching of the irradiated region in TiO₂ crystal, which is about 8. 2 keV/nm. If the ion fluence is below 1×1013ions/cm2, the saturated etching depth of the irradiated region in TiO₂crystal cannot be reached. The irradiation damage based on latent track formation frame and the theoretical linkage to the etching technique is investigated. It is hopeful to fabricate micro and nano scale structurce in rutile TiO₂ crystal by using the ion irradiation and chemical etching technique.      

Co+离子注入单晶TiO2铁磁性来源与微结构研究

在室温下,将能量为80 keV, 注量分别为1×1016和1×1017ions/cm2的Co+离子注入到10 mm×10 mm×0.5 mm的单晶TiO₂样品。在氮气保护下, Co+离子注量为1×1017 ions/cm2时样品在温度为900 ℃的条件下退火30 min。 利用超导量子干涉仪 （SQUID）测量样品磁性, 并应用X射线衍射（XRD）和扩展边X射线吸收精细结构谱（EXAFS）研究Co+离子注入后样品的微观结构。 样品磁性测量结果表明:Co+离子注入后的样品具有室温铁磁性, 并且其饱和磁化强度的大小与Co+离子注量及样品是否经退火处理有关。 EXAFS研究表明: Co元素在Co+离子注量为1×1017ions/cm2的样品中主要以团簇形式存在;样品经退火处理后, Co团簇消失, 并发现Co部分替代TiO₂单晶中的Ti。Co+离子注入后, 在样品中形成Co团簇与否受离子注量的影响。 阐述了样品微观结构与铁磁性来源之间的关系。 At room temperature, monocrystalline plates of rutile (TiO₂) were implanted with cobalt ions of an energy of 80 keV to fluences of 1×1016 and 1×1017 ions/cm2 respectively . The 1×1017 ions/cm2 Co implanted samples were annealed in nitrogen at 900 ℃ for 30 min. The magnetic properties of Co implanted samples were measured with a superconducting quantum interference device magnetometer (SQUID) at room temperature. Furthermore, the X ray diffraction (XRD) and Extended X ray Absorption Fine Structure (EXAFS) were applied to investigate the structural and compositional properties of Co implanted samples. The magnetic measurements of samples showed that the size of the saturation magnetization of the Co implanted samples were related to the fluence of ions, and the saturation magnetization of the sample after annealed decreased significantly. The EXAFS measurements showed the presence of cobalt metallic clusters in the sample implanted to ion fluence of 1×1017 ions/cm2. The Co metallic clusters disappeared in the sample after annealed, and resulted in the oxidized Co, which is presumed to substitute into the Ti site. The formation of Co clusters or not was determined by the ion fluence. The relation between ferromagnetic behavior and microscopic structure of the Co implanted samples is discussed.     

FORMATION OF A BURIED LAYER OF ALUMINIUM NITRIDE BY HIGH DOSE N2+ IMPLANTATION INTO ALUMINIUM

Aluminium films with various thickness between 700 nm and 1μm were deposited on Si (100) substrates, and 400 keV N₂⁺ ions with doses ranging from 4.3×10¹⁷ to 1.8×10¹⁸ N/cm² were implanted into the alu-minium films on silicon, Rutherford Backscattering (RBS) and channeling, secondary ion mass spectroscopy (SIMS), Fourier transform infrared spectra (FTIR), X-ray diffraction (XRD), transmission electron microscopy (TEM) and spreading resistance probes (SRP) were used to characterize the synthesized aluminium nitride. The experiments showed that when the implantation dose was higher than a critical dose N_c, a buried stoichiometric AlN layer with high resistance was formed, while no apparent AlN XRD peaks in the as-implanted samples were observed; however, there was a strong AlN(100) diffraction peak appearing after annealing at 500 ℃ for 1h. The computer program, Implantation of Reactive Ions into Silicon (IRIS), has been modified and used to simulate the formation of the buried AlN layer as N₂⁺ is implanted into aluminium. We find a good agreement between experimental measurements and IRIS simulation.     

聚合物/TiO2分层光电导型器件的电荷传输特性

研究了聚合物PVK与TiO₂分层光电导器件的电荷传输特性,分别比较了两种器件:器件S₁(ITO/TiO₂/PVK/Al)和器件S₂(ITO/PVK/TiO₂/Al)。实验发现,器件S₁的暗电流远小于器件S₂的暗电流,S₁的正向峰值光电流约是其反向峰值光电流的4倍,而S₂的正向和反向峰值光电流都基本与S₁的反向峰值光电流相近。这是由于PVK/TiO₂界面处有效的电荷转移、恰当的电荷传输层、器件各层间能级匹配及其与电极功函数的匹配影响了光电流的强度大小。由此判断,器件S₁的性能要优于器件S₂。随电压的增大,S₁结构的光电导响应谱在短波区域的拖尾增大,而S₂结构几乎没有拖尾,这可能是两种结构的吸收和陷阱能级的差别造成的。     

Surface chemical disorder and lattice strain of GaN implanted by 3-MeV Fe10+ ions

Chemical disorder on the surface and lattice strain in GaN implanted by Fe¹⁰⁺ ions are investigated. In this study, 3-MeV Fe¹⁰⁺ ions fluence ranges from 1×10¹³ ions/cm² to 5×10¹⁵ ions/cm² at room temperature. X-ray photoelectron spectroscopy, high-resolution x-ray diffraction, and high-resolution transmission electron microscopy were used to characterize lattice disorder. The transition of Ga-N bonds to oxynitride bonding is caused by ion sputtering. The change of tensile strain out-of-plane with fluence was measured. Lattice disorder due to the formation of stacking faults prefers to occur on the basal plane.     

Structure and properties of molybdenum implanted with high-flux carbon ion

High purity molybdenum was implanted by C ion in a metal vapour vacuum arc (MEVVA) implanter. The influence of implantation parameters was studied by varying ion fluence and ion current density. The samples were implanted by 45 keV C ion with fluences from 1×10¹⁵ to 1×10¹⁸ ions/cm², respectively. The as-implanted samples were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), and nanoindenter. Different morphologies were observed on the surfaces of the as-implanted samples due to irradiation damage, and clearly related to implantation parameters. XRD spectra confirm formation of β-Mo₂C with ion fluences equal to or larger than 1×10¹⁶ ions/cm², and formation of -Mo₂C with ion fluence of 1×10¹⁸ ions/cm². The maximum nanohardness and maximum modulus of the as-implanted samples increased gradually with increasing ion fluence, and reached the corresponding maximum values with ion fluence of 1×10¹⁸ ions/cm². The experimental results suggest that the structure and properties of the as-implanted Mo samples exhibited strong dependence on implantation parameters.     

黑龙江穆棱地区宝石级石榴石的宝石学及谱学特征

对黑龙江穆棱新生代玄武岩产出的宝石级石榴石进行了宝石学常规测试、电子探针测试、拉曼光谱、红外光谱和紫外-可见光谱测试,以获得该区石榴石的宝石学特征和谱学特征。化学成分分析表明,该区石榴石为镁铝榴石,含有Fe,Ca,Mn,Cr,Ti等杂质元素。其平均晶体结构化学式为 (Mn_0.022Ca_0.455, Fe2+_0.720, Mg_1.793)_∑=2.990(Ti_0.003Cr_0.009Fe3+_0.062Al_1.951)_∑=2.025(SiO₄)₃。拉曼光谱分析表明该区石榴石存在混合相,由石榴石桥氧振动引起的拉曼位移峰反映出该特征。镁铝榴石桥氧弯曲振动拉曼位移峰位于560 cm-1(A₁g模)和641 cm-1(E_g+F₂g模),钙铝榴石和铁铝榴石桥氧弯曲振动E_g+F₂g模形成的拉曼位移峰分别位于507和486 cm-1。官能团区红外光谱显示该区镁铝榴石中不存在分子水,但少数镁铝榴石中存在少量的结构水,它们在3 585,3 566和3 544 cm-1处形成阶梯状的弱小吸收峰。该区镁铝榴石多为褐红色,其颜色由杂质离子Cr3+,Fe3+,Mn2+产生。紫外-可见吸收光谱显示,Fe3+的电子跃迁致570,521和502 nm吸收峰,Mn2+的电子跃迁致460和430 nm吸收峰,Cr3+电子跃迁致690和367 nm吸收峰。     

离子束注入胸腺嘧啶的紫外、红外效应研究

本文中我们利用紫外、红外光谱等分析手段获取低能离子束生物诱变的信息。发现用30 ke V低能氮离子和氩离子在 0 - 2× 1 0 16 ions/cm2注入剂量范围内注入胸腺嘧啶 ,其残存率随剂量的变化趋势均出现了不同于γ射线等辐照时的线性或肩型曲线 ,而呈现一种新的变化趋势——“马鞍型”曲线 ,表明参与结构的质量沉积不足以解释“马鞍型”曲线。红外光谱的分析结果表明在离子束注入过程中胸腺嘧啶分子确实存在结构上的修复。研究结果表明紫外、红外光谱可以给出离子束注入前后生物分子结构突变或重组、分子结构突变与注入剂量的关系以及分子的修复等信息。     

水合TiO2的太赫兹特性和介电动力学研究

用太赫兹时域光谱技术研究不同加热时间后水合TiO₂在0.2～1 THz波段的THz时域谱、频域谱、吸收谱、折射率谱和复介电常数。结果表明水合TiO₂在THz波段出现明显吸收峰,随加热时间增加,含水量降低,吸收系数减小;样品折射率变化位置与吸收峰位置相对应。水合TiO₂在太赫兹波中的电极化响应与频率不存在明显的关系,介电损耗随频率的升高先降低后趋于稳定,介电响应均随加热时间延长而减弱。     

Surface defects,stress evolution,and laser damage enhancement mechanism of fused silica under oxygen-enriched condition

Oxygen ions (O⁺) were implanted into fused silica at a fixed fluence of 1×10¹⁷ ions/cm² with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E' centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si-O-Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si-O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.