Adsorption of hydrogen on evaporated cobalt films

Hydrogen adsorption on evaporated Co films has been studied by means of measurements of the surface potential changes that occur during this process, and analysis of the desorption spectrum of hydrogen. It has been observed that hydrogen adsorbed at 78 K on Co films exists in three forms with essentially different electrical properties: atomic, electronegatively polarized β^? form; atomic, electropositively polarized β⁺ form and reversibly adsorbed, molecular, positively polarized α form. The β^? form is not homogeneous from the point of view of the bond energy with the metal surface and consists of the states β_s^? and β^? characterized by activation energy of desorption 10.0 and 18.8 kcal/mol H₂ correspondingly. The Activation energy of desorption of the β⁺ form is low, i.e. 2.1 $\text{kcal}\text{mol}$ H₂.     

Fabrication and structural characterization of nanocomposites consisting of Ni nanoparticles dispersed in polyimide films

Formation and structure of composite layer consisting of polyimide films containing Ni nanoparticles were investigated. The preparation method relies on KOH treatment on polyimide film to form carboxyl acid groups and adsorption of Ni ions by ion exchange followed by hydrogen reduction. The amount of Ni ions adsorbed in polyimide films were found to be systematically controlled by changing initial KOH concentration, subsequent ion exchange time, pH and temperature. Cross-sectional TEM observation revealed that Ni nanoparticles with 3-5 nm in diameter were homogeneously dispersed in the surface modified polyimide layer after heat treatment above 250 ^°C in H₂ atmosphere. The size and distribution of the Ni nanoparticles were strongly dependent on the heat treatment temperature, indicating that this method allows microstructural tuning of metal/polymer nanocomposites.     

Adsorption and coadsorption of carbon monoxide and hydrogen on Pd(111)

The adsorption and coadsorption of CO and H₂ have been studied by means of thermal desorption (TD) and electron stimulated desorption (ESD) at temperatures ranging from 250 to 400 K. Three CO TD states, labelled as β₂, β₁, and β₀ were detected after adsorption at 250 K. The population of β₂ and β₁ states which are the only ones observed upon adsorption at temperatures higher than 300 K was found to depend on adsorption temperature. The correlation between the binding states in the TD spectra and the ESD O⁺ and CO⁺ ions observed was discussed. Hydrogen is dissociatively adsorbed on Pd(111) and no ESD H⁺ signal was recorded following H₂ adsorption on a clean Pd surface. The presence of CO was found to cause an appearance of a H⁺ ESD signal, a decrease of hydrogen surface population and an arisement of a broad H₂ TD peak at about 450 K. An apparent influence of hydrogen on CO adsorption was detected at high hydrogen precoverages alone, leading to a decrease in the CO sticking coefficient and the relative population of CO β₂ state. The coadsorption results were interpreted assuming mutual interaction between CO and H at low and medium CO coverages, the “cooperative” species being responsible for the H⁺ ESD signal. Besides, the presence of CO was proved to favour hydrogen penetration into the bulk even at high CO coverage when H atoms were completely displaced from the surface.     

Ethylene adsorption on thin films of Ni,Pd, Pt,Cu, Au and Al; Work function measurements

The changes in work function φ upon adsorption of C₂H₄ on clean film surfaces of six fcc metals (Ni, Pd, Pt, Cu, Au and Al) have been followed by means of photoelectron emission at 293 K. A marked difference was observed in the behaviour between Ni, Pd and Al on the one side and on Cu, Au and Pt on the other side: while with Ni, Pd and Al, φ as a function of coverage goes through a maximum, with Cu, Au and Pt, φ only decreases. In the discussion, the data obtained by work function measurements are related to other literature data. Several films covered with C₂H₄species were also submitted to a heat treatment while in other experiments H₂ was admitted to the surface covered by C₂H₄ species. In some experiments C₂h₄ was admitted to surfaces covered by H₂. In all cases φ was measured. The experiments reveal that C₂h₄is absorbed only reversibly on Cu and Au. On Ni, Pd and Pt, C₂H₄ is adsorbed initially with dissociation and this leads to an increase in φ on Ni and Pd and a decrease on Pt. Hydrogenated reactive species contribute to the lowering of φ observed with Ni, Pd and Pt. As with Cu and Au also on Ni, Pd and Pt a weakly bound C₂h₄is observed which leads to a decrease in φ as well. The behaviour of φ indicates that upon Al, C₂h₄ adsorbs first dissociatively to a small extent, while the weakly bound C₂H₄species act as intermediates for strongly adsorbed species which were observed after some time.     

MgH2(110)表面Pd单原子催化氢脱附反应的第一性原理研究

本文采用第一性原理密度泛函理论计算研究了MgH₂(110)表面吸附单原子Pd后的氢脱附反应. 计算发现,在吸附一个Pd单原子后,MgH₂(110)表面氢脱附反应的能垒可以从1.802 eV显著地降低到1.154 eV,表明Pd单原子对于氢脱附具有很强的催化效应. 并且,Pd单原子催化还可以将氢脱附的温度从573 K显著地降低到了367 K,从而使MgH₂(110)表面的氢脱附反应更加容易和快速地发生. 此外,通过MgH₂(110)表面氢溢出机制的反向过程来讨论了氢脱附反应的微观过程. 该研究表明Pd/MgH₂薄膜在未来的实验中可作为良好的储氢材料.     

Adsorption of hydrogen and deuterium on potassium-promoted Pd(100) surfaces

The adsorption of H₂ and D₂ has been studied on clean and K-promoted Pd(100) surfaces using thermal desorption, work function changes, ultraviolet photoelectron and Auger spectroscopy. The potassium adlayer significantly lowers the sticking coefficient (from 0.6 to 0.06 at θ_k = 0.2), and the uptake of hydrogen, but increases the desorption energy for H₂ desorption. Calculation showed that each potassium adatom blocks approximately 4–5 adsorption sites for H₂ adsorption. Atomization of hydrogen led to an increase of hydrogen uptake. The adsorption of potassium on the H-covered surface caused a significant decrease in the amount of hydrogen adsorbed on the surface (as indicated by less desorbing hydrogen below 500 K) and promoted the dissolution of H atoms into the bulk of Pd. The dissolved hydrogen was released only above 600–650 K. In the interpetation of the results the extended charge transfer from K-dosed Pd to the adsorbed H atoms and the direct interaction between adsorbed H and K adatoms are taken into account.     

Yields of H+ and He+ at the energy for elastic scattering from H2+3He+ incident on Ag and Pd

Yields, Y, of H⁺ and He⁺ emerging specularly with the energy for single binary elastic collisions have been measured from polycrystalline Ag and Pd surfaces bombarded with mixed monoenergetic (300 < E₀ < 2600 eV) beams of H₂⁺³He⁺ impinging at an angle of 45° from the surface normal. The surfaces were exposed to H₂⁺ at a dynamic pressure of 8 × 10^?3 Pa (6 × 10^?5 Torr) during the measurements. The He⁺ yields from Pd are slightly larger than from Ag, and the H⁺ yields from Pd are 10 to 40 times as large as those from Ag. These results suggest that differences between Pd and Ag in the amount of hydrogen adsorbed and in the character of the hydrogen-metal bond may be responsible for the yield differences through shadowing by, and possibly the sputtering of, adsorbed hydrogen. The Y versus E₀ curves for all four systems have qualitatively the same singly peaked shape which implies that reactive and noble gas ions undergo similar neutralization processes during elastic surface collisions. The ratios of the yields from Ag and Pd do not exhibit the theoretically expected exponential dependence on collision time over the entire range studied, but at the lowest energies the ratios lead to estimates of the difference of neutralization constants which do agree with theory. The potential utility of the large difference in proton yields from Ag and Pd for studying the Ag-Pd alloy system is noted.     

The role of HH interactions in the formation of ordered structures on Ni and Pd single crystals

The interaction between H adatoms on a surface is calculated within the embedded cluster model of chemisorption. The model is first applied to the case of two H atoms on a free electron surface. The interaction energy is found to be an oscillatory function of the H-H separation R_ab. Application of the free electron model to the problem of chemisorption on transition metal surfaces leads to unphysical results with the prediction of formation of ordered H overlayers which are not observed in LEED experiments. We next include the l = 2 TM muffin tins. Results for H adsorption on the low index faces of Ni and Pd substrates are presented. Graphitic structures are predicted for the (111) faces of both Ni and Pd with the H atoms occupying both types of three-fold hollow sites on the surface. This agrees with the results of LEED experiments for H/Ni(111). Comparison with experiment is not possible in the case of H/Pd(111) owing to the lack of low temperature studies for that system. Zig-zag chains with the H atoms adsorbed in sites of three-fold coordination on alternate sides of the TM(110) rows are predicted for both Ni and Pd. This is in agreement with the results of He diffraction experiments for H/Ni(110). No structure determination has been done for H/Pd(110). Adsorption in the four-fold centre sites for H on the (100) faces of Ni and Pd is found to be unfavourable. The H atoms are expected to adsorb in sites of three-fold symmetry below the (100) surface for H on Pd with formation of a c(2 × 2) structure in agreement with the LEED observations. For H/Ni(100) the H atoms are believed to adsorb above the surface, away from the centre site and to bond to two surface Ni atoms. No short-range ordered structures are predicted in this case.     

LEED intensities from clean and hydrogen covered Ni(100) and Pd(111) surfaces

Hydrogen adsorbs on Ni(100) and Pd(111) surfaces without the formation of additional diffraction spots in the LEED patterns. Measurements of LEED intensities revealed that adsorbed hydrogen layers cause considerable changes even in such cases where displacements of surface atoms (“reconstructive adsorption”) may be excluded. After hydrogen adsorption on Ni(100) the intensities of Bragg beams are uniformly lowered whereas the background intensity increases which is attributed to the formation of a disordered adsorbed layer. With Pd(111) adsorbed hydrogen causes a slight decrease of the background intensity and characteristic modifications of the intensity/voltage curve of the (0,0) beam, suggesting the formation of an ordered 1 × 1 structure. In the latter case energy shifts of the primary Bragg maxima were observed and are interpreted as being caused by an expansion of the layer spacing in the surface region by about 2% owing the partial dissolution of the hydrogen.     

Adsorption of hydrogen on palladium single crystal surfaces

The adsorption of hydrogen on clean Pd(110) and Pd(111) surfaces as well as on a Pd(111) surface with regular step arrays was studied by means of LEED, thermal desorption spectroscopy and contact potential measurements. Absorption in the bulk plays an important role but could be separated from the surface processes. With Pd(110) an ordered 1 × 2 structure and with Pd(111) a 1 × 1 structure was formed. Maximum work function increases of 0.36, 0.18 and 0.23 eV were determined with Pd(110), Pd(111) and the stepped surface, respectively, this quantity being influenced only by adsorbed hydrogen under the chosen conditions. The adsorption isotherms derived from contact potential data revealed that at low coverages θ ∞ √p_H2, indicating atomic adsorption. Initial heats of H₂ adsorption of 24.4 kcal/mole for Pd(110) and of 20.8 kcal/mole for Pd(111) were derived, in both cases E_ad being constant up to at least half the saturation coverage. With the stepped surface the adsorption energies coincide with those for Pd(111) at medium coverages, but increase with decreasing coverage by about 3 kcal/mole. D₂ is adsorbed on Pd(110) with an initial adsorption energy of 22.8 kcal/mole.     

In situ infrared spectroelectrochemical studies of cyanide adsorbed on platinum and palladium

In situ FTIR difference spectra of adsorbed cyanide on polished platinum and palladium electrodes in perchlorate media are presented. A linear CN⁻_ads moiety is observed on Pt, while on Pd four surface cyanide species are seen: linear and bridge-bound CN⁻_ads, as well as two surface Pd-CN films.     

Ethylene hydrogenation on Ni(1 0 0) surface

The hydrogenation of ethylene on Ni(1 0 0) surface has been studied by TDS. The decrease in the bonding energy with increasing coverage is revealed for both of adsorbed hydrogen and ethylene by the shift of desorption to lower temperatures. Ethane formation is only observed on the preadsorbed hydrogen coverage exceeding 0.5 monolayer (ML), coupled with the growth of H₂ shoulder peak at lower temperatures. Further increase of H coverage to saturation reduces the bonding energy of subsequently adsorbed ethylene by 15 kJ/mol and decreases the saturation coverage of ethylene to about one-third on the clean surface. This leads to the shift of ethane desorption from 250 to 220 K and an appearance of additional ethane peak at 180 K. The latter ethane formation coincides with the hydrogenation of surface ethyl species derived from ethyl iodide as a precursor. It indicates that the rate of ethyl formation on the surface would be comparable to that of subsequent hydrogen addition to the surface ethyl species in the hydrogenation of ethylene when the preadsorbed hydrogen coverage approaches 1.0 ML.     

Adsorption de l'éthyléne et de l'acétylène sur des films de rhénium evaporés sous ultra-vide; Hydrogénation de l'éthylène: II. Discussion des résultats expérimentaux et interprétation

A qualitative model is proposed in order to explain our experimental results on ethylene chemisorption on evaporated rhenium films and hydrogenation of ethylene (part I). The surface must present at least two kinds of surface sites (A and B). The second type (B), either preexists on the surface, or is induced by the adsorption phenomenon itself. On the most energetic ones (A), dissociation of ethylene and hydrogen is complete. Adsorption of ethylene is characterized by a sticking coefficient value of 0.1 if they are free and 1 if they are hydrogen covered. On sites B, ethylene is adsorbed without full dissociation (sticking coefficients equal to 0.015). independent on adsorption temperature. Hydrogen desorption is due to full dissociation of ethylene on the surface and a displacement reaction while ethane is produced by reaction between non-dissociated adsorbed ethylene and hydrogen in the gas phase. The same Rideal-Eley mechanism applies for hydrogenation of ethylene in quasi-stationary conditions, along with a self-poisoning mechanism involving dehydrogenation leading to C₂H₂ non-hydrogenable adsorbed species.     

Hydrogen, sulphur and chlorine coadsorption on Pd(111): a theoretical study of poisoning and promotion

First principles calculations for the coadsorption of hydrogen with sulphur and chlorine on Pd(111) are presented. Individually, both sulphur and chlorine poison hydrogen adsorption, sulphur being the more efficient poison. The observed sulphur poisoning is a structural effect. The adsorption energy decreases and the diffusion barrier increases for hydrogen atoms in the vicinity of sulphur adatoms. A sulphur coverage of 0.33 ML is sufficient to completely poison hydrogen adsorption on Pd(111). The presence of chlorine adatoms on the sulphur-poisoned surface is found to stabilise localised hydrogen adsorption. The possible promotional effects of chlorine on sulphur-poisoned catalysts are discussed.     

Hydrogen adsorption on rhodium: Hydride formed on the surface of thin rhodium films

H₂ interaction with thin Rh films deposited on Pyrex glass under UHV conditions has been studied by simultaneous measurement of work function changes ΔΦ and hydrogen pressure P, at selected constant temperatures: 78 and 298 K. Prior to the adsorption experiments the thin film topography was illustrated using the AFM and STM methods. The influence of hydrogen adsorption on the resistance of thin Rh film was examined in the course of an independent experiment. The number of sites accessible for adsorption on the thin Rh film surface was found determining population of oxygen adatoms within the monolayer at 78 K, when incorporation of these adspecies below the surface is negligible. It was established that at all examined temperatures hydrogen adsorption led to coverage Θ approaching 1 under equilibrium pressure below 10⁻³ Pa, increasing the work function. Under higher H₂ pressure an additional uptake of hydrogen leading to Θ ∼ 1.68 at 298 K, and to Θ ∼ 2 at 78 K is reached. On this surface at low temperatures there exist weakly bound, reversibly adsorbed, positively charged adspecies characteristic for hydrogen adsorption on transition metal hydrides. The change of thin Rh film resistance caused by hydrogen adsorption was not measurable.     

Surface partition of ion energy during the growth of TiNx thin films

A simple evaluation of ion-deposited energy during surface displacement of adatoms has been presented for physical vapor deposition technology using an appropriate interaction model. The rf reactive magnetron sputtering deposition of titanium nitride (TiN_x) thin films was taken as evidence supporting the theoretical calculation. The evolution of crystallite morphology dependent on bias (or input power) illustrates that surface and subsurface microstructure of growing films can be optimized by increasing the mobility of adatoms through ion-assistance.     

Point-defect properties of and sputtering events in the {001} surfaces of Ni3Al I. Surface and point-defect properties

Constant-area and fully relaxed molecular dynamics methods are employed to study the properties of the surface and point defects at and near {001} surfaces of bulk and thin-film Ni, Al and Ni₃Al respectively. The surface tension is larger than the surface energy for all {001} surfaces considered in the sequence: Al (1005?mJ?m^?2)<?Ni₃Al (mixed Ni–Al plane outermost, 1725?mJ?m^?2)<?Ni₃Al (all-Ni-atoms plane outermost, 1969?mJ?m^?2)<?Ni (1993?mJ?m^?2). For a surface of bulk Ni₃Al crystal with a Ni–Al mixed plane outermost, Al atoms stand out by 0.0679?Å compared with the surface Ni atoms and, for the all-Ni-atoms surface, Al atoms in the second layer stand out by 0.0205?Å compared with Ni atoms in the same layer. Vacancy formation energies are about half the bulk values in the first layer and reach a maximum in the second layer where the atomic energy is close to the bulk value but the change in embedding energy of neighbouring atoms before and after vacancy formation is greater than that in the bulk. Both the vacancy formation energy and the surface tension suggest that the fourth layer is in a bulk state for all the surfaces. The formation energy of adatoms, antisite defects and point-defect pairs at and near {001} surfaces of Ni₃Al are also given.     

Palladium atoms and its dimers adsorbed on graphene: First-principles study

In this work we have studied the stabilty, electronic and magnetic properties of Pd adatoms and dimers adsorbed on graphene system using first-principles calculations. The adsorption energies for Pd adatom and its dimer have been found to range from −0.986 to −1.135 eV and −0.165 to −1.101 eV, respectively, which signify stable configuration and future utilization of this system in catalysis. A shift but no separation of π and π^? bands at the Dirac point has been observed in case of Pd dimer adsorption in perpendicular configuration, which can be accounted for the breaking of symmetry of the graphene structure due to adsorption. 64-68% spin polarization P(E_F) and 1.944-1.990 μ_B magnetic moment have been observed for Pd dimers adsorbed on graphene in perpendicular configuration for different sites. The unequal values of partial density of states for 4d and 5s orbitals of Pd dimers at Fermi level have been found to be responsible for the generation of high spin polarization.     

The water-forming reaction on palladium

The water-forming reaction on Pd has been studied on a PdSiO₂Si (Pd-MOS) structure in the temperature range 323–473 K. The reaction is found to be of the Langmuir-Hinshelwood type with the formation of OH beeing rate limiting. Since the Pd-MOS structure works as a sensitive hydrogen detector unique information on the behaviour of hydrogen during this catalytic reaction has been obtained. The reaction can be described in a model where the hydrogen atoms on the Pd surface have a large temperature activated lateral mobility and with no evidence of beeing in hot precursor states. At T = 473 K this means that for oxygen coverages ? 0.01 monolayers all hydrogen adsorbed will also react with oxygen. For smaller oxygen coverages unreacted hydrogen will not initially desorb towards the vacuum but towards the internal Pd surface of the Pd-MOS structure. Futhermore, hydrogen adsorption is blocked by adsorbed oxygen. The sticking coefficient for hydrogen on the bare Pd surface is, however, close to one and only weakly temperature dependent. An effect giving rise to a hysteresis in the work function versus oxygen coverage curve during oxygen adsorption - desorption is also discussed.     

The adsorption and decomposition of methanol on the Rh(100) surface

The adsorption and decomposition of methanol on the Rh(100) surface have been studied using high-resolution electron energy loss spectroscopy and thermal desorption mass spectrometry. Below 200 K, methanol is molecularly adsorbed and bonds to the surface via the oxygen atom. At 200–220 K, a saturated methanol layer undergoes two competing reactions: desorption and OH bond cleavage to form an O-bonded methoxy species. The methoxy species is stable to approximately 250 K. Between 250 and 320 K, a fraction of the methoxy species decomposes to form coadsorbed CO and hydrogen adatoms while the remainder recombines with hydrogen adatoms to desorb as molecular methanol. The hydrogen adatoms remaining on the surface desorb as H₂ between 270 and 400 K, and the CO desorbs between 450 and 550 K. Following a saturation exposure, approximately 0.2 monolayers of methanol decompose to eventually yield CO and H₂ as desorption products. These results are compared to the chemistry of methanol on other metal surfaces.